Professional Documents
Culture Documents
Course
Topic
No.
NE 201
Micro and Nano Charectarisation Methods
2:1
Instructor
Time
Venue
12.00 pm - 1.00 pm
NE 202
Micro and Nano Fabrication
0:1
2.00 pm - 5.00 pm
Digbijoy N Nath
9.00 am - 10.00 am
NE 215
Applied Solid State Physics
3:0
Akshay Naik/Shivshankar
NE 312
Nonlinear Photonics and Lasers
3:0
V R Supradeepa
12.00 pm - 12.55
pm
NE241
3:0
Srinivasan Raghavan
FF11,CeNSE
TF10, CeNSE
TF10, CeNSE
TUESDAY
Course
Topic
No.
NE 213
Introduction to Photonics
3:0
NE 231
Microfluidics
3:0
NE 203 Advanced micro and nano fabrication technology
3:0
and process
Instructor
Time
Venue
9.00 am - 10.30 am
FF11, CeNSE
11.30 am - 1.00 pm
TF10, CeNSE
WEDNESDAY
Course
Topic
No.
NE 201
Micro and Nano Charectarisation Methods
2:1
NE 202
Micro and Nano Fabrication
0:1
NE 205 Semiconductor Devices and Integrated Circuit
3:0
Technology
NE 215
Applied Solid State Physics
3:0
NE 312
Nonlinear Photonics and Lasers
3:0
NE241 Material Synthesis: Quantum Dots to Bulk
3:0
Crystals
Instructor
Time
Venue
12.00 pm - 1.00 pm
FF11,CeNSE
Shankar Kumar
Selvaraja/Sushobhan Avasthi
2.00 pm - 5.00 pm
Digbijoy N Nath
9.00 am - 10.00 am
Akshay Naik/Shivshankar
V R Supradeepa
12.00 pm - 12.55
pm
Srinivasan Raghavan
TF10, CeNSE
TF10, CeNSE
THURSDAY
Course
Topic
No.
NE 213
Introduction to Photonics
3:0
Instructor
Time
Venue
NE 231
Microfluidics
3:0
Prosenjit Sen
9.00 am - 10.30 am
FF11, CeNSE
11.30 am - 1.00 pm
TF10, CeNSE
FRIDAY
Course
Topic
No.
NE 202
Micro and Nano Fabrication
0:1
Instructor
Time
Venue
2.00 pm - 5.00 pm
Digbijoy N Nath
9.00 am - 10.00 am
TF10, CeNSE
NE 312
Nonlinear Photonics and Lasers
3:0
V R Supradeepa
12.00 pm - 12.55
pm
TF10, CeNSE
NE241
3:0
Srinivasan Raghavan
NE 215
Applied Solid State Physics
3:0
NE 205 Semiconductor Devices and Integrated Circuit
3:0
Technology