Professional Documents
Culture Documents
Materials Science
1984 Kudo
FET
FET 1 cm2/Vs
3
50 cm2/Vs
FET
4
2010 6
1. ............................................................................................................ 2
2. .................................................. 2
2.1 .................................................................. 2
2.2 ................................. 3
2.3 FET MOS-FET ......................................... 3
2.4 ......................................................... 4
3. .......................................................................... 5
3.1 .................................................................................. 5
3.2 ........................................................................ 6
3.3 TFT ............................................... 6
4. .........................................................................13
4.1 Cr/Au .................13
4.2 ......................14
4.3 .......................................................................15
4.4 FET .......................................................................16
5. ...........................................................................................................16
6. ...........................................................................................................17
EL 5
6
RFID 7
8
9
2.
2.1
1.
2-1
(A)
OFET
(B)
Gate
Gate
(A)
Gate
Gate
Gate
Gate
Gate
Gate
1950
(C)
(D)
Gate
Gate
Gate
Gate
Gate
Gate
Gate
Gate
AB
C
D 1 , 2
, 3 , 4 , 5 , 6
2-1
1980
2-1 AC
1983
FET 1
Tel:03-5796-7330Fax:03-5796-7335 E-mail:sialjpts@sial.com
2-1
BD
14
2-2
15,16
4
MIS
Metal Insulator Semiconductor
(A)
AB
C
D
Gate
Gate
Gate
Gate
Gate
Gate
Gate
Gate
10
(C)
Emitter
Emitter
(B)
Floating
Metal
FloatingMetal
n
n
11
Base
Base
2-2
Gate
Gate
A - B
C
Gate
Gate
p
p
Collector
Collector
FET
MOSMetal-Oxide-SemiconductorMOSFET
2-3
CVD
n-
n-
12,13
2.2
2.1
MIS-FET
OFFn-p-n
pn
OFF
pp
MOS-FET
FET
/ p n
AsP
FET
FET /
OFF
FET FET
p p
MOS-FET
30 m
SUS
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2.4
Organic FETOFET
Id
Vg
/ / MIS
MIS
2-5
1Vg 0 V Vd
Ld
Vg 2-5
2Vg VthVd
Vg-VthVg V
ground
s
2-4 FET
Vth
W L
Vg VthVg
FET
Vd
Id
Vd
Vg
2-5
3
Vg VthVd Vg-Vth Vd
Vd Vg-Vth
Vd Vd
Vg-Vth 2-54 Vd
L
2-4 FET
Vd Id
Id-Vd
W2 mmL100 m
-0.7
-250
-0.5
-0.4
-0.3
-0.2
-0.6
-0.1
0
-250
-250
-200
-200
-150
-100
-50
0
0
V d
-50
-20 -40 -60 -80 -100 -120
Drain voltage (V)
2VgVthVd Vg -Vth
-150
-100
-50
0
0
Vg-100 V
-100
Vg-100 V
VgVs
1Vg0 V
-150
0
0
Vg0 V
-200
Vd
Id
3VgVthVdVg -Vth
Vg-100 V
4VgVthVdVg -Vth
2-5
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3.
Si n
n-
3.1
22
10,000
10,000
1980
Processability
p HOMO
Highest
poly
9,9-dioctylfluorene-co-bithiophene
F8T223poly3-hexylthiophene
P3HT24,25P3HT
ambipolar 17
0.1 cm2/Vs
1 cm2/Vs
2009
Facchetti
26
3.2
p 50 cm /Vs
2
n 0.85 cm2/
Vs
p n
18,19
n
0.2 cm2/Vs n
3 cm2/Vs n 20,21
1980 OFET
p 27,281990
29,30 1 cm2/Vs
1 cm /Vs
1997
1 cm2/Vs 31
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pn
3-2
1980
15
5 3-1
103
cm2/Vs
102
EL
10
1
46,47
10-1
10-2
10-3
10-4
10-5
1985
1990
1995
2000
2005
2010
2015
2004216P111
3-1 TFT
48
2000
TIPS-
Pentacene 32
33,34,35
3-2
1 cm2/Vs
36,37,38,39,40,41
3.2
FET
FET 3
/
Au Au
p n
EL
p
42,43,44,45
p
Au Cu49Ag50Ca51 ITO
Indium Tin Oxide52 53 54
PEDOT-PSS 55,56
5758
pn
Au 4.9 eV n
p
HOMO 59
60,61,62,63
3.3 FET
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SiO2 64,65
Al2O366 Ta2O567OFET
SiO2
1 1
FET
HexamethyldisilazaneHMDS OctadecyltrichlorosilanOTS
OTS
PFOTS
1-1Aldrich 551112 50
-6T
- CYEPL
PVA
PVC
cm2/Vs
1-2Aldrich
698423 Vth
PMMA
OPV 1-3
68 PI
PVP
69,70
DNTT
1-4
FET
FET 12
1
1-1
Rubrene
Aldrich 551112
1-2
Pentacene
1-3
Oligo
p-phenylenevinylene
OPV
1-4
Dinaphtho2,3-b:2',3'-f
thiopheno3,2-bthiophene
DNTT
Aldrich 698423
!
Aldrich
DPh-BDT : 2,6-Diphenylbenzo1,2-b:4,5-b
dithiophene
DPh-BTBT: 2,7-Dipheny1benzothieno3,2-b
benzothiophene
DT-BDT: 2,6-Ditolylbenzo1,2-b:4,5-b
dithiophene
3,2-bthiophene
!
WEB
:
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2-1p 2
2-1PentaceneAldrich P1802,
684848, 698423 p
FET
75
2-4 FET
P3HT
FET
76
71,72
73
741 cm2/Vs
2-5 BDT
2-2
2-6 BTBT
2.0 cm2/VsHOMO
0.3 cm /Vs
BTBT
DNTT 2-7
2-3Copper
IIphthalocyanineCuPcAldrich
546674, 702854 EL
p FET
0.02 cm2/Vs FET
7.9 cm2/Vs 77
2p
2-1
Pentacene
Aldrich P1802, 684848,
698423
2-2
2,3,9,10-Tetramethylpentacene
Me4PENT
2-3
CopperIIphthalocyanine
CuPc
Aldrich 546674, 702854
Bao, Z.Lovinger, A.J.Dodabalapur, A., Appl. Phys. Lett., 1996, 69, 3066.
2-4
Aldrich
2-5
2,6-Diphenylbenzo1,2-b:4,5-b
dichalcogenophene
DPh-BDX
2-6
2,7-Diphenyl1benzothieno3,2-b
benzothiophene
DPh-BTBT
2-7
,3
-f thieno
3,2-b
Dinaphtho2,3-b:2
thiophene
DNTT
2-4
Name
Structure
-Sexithiophene(6T)
S
S
5,5-Dihexyl-2,2:5,2:5,2:5,2:5,2-sexithiophene
(DH-6T)
S
S
594687-1G
S
S
S
CH3(CH2)4CH2
Cat. No.
S
S
CH2(CH2)4CH3
633216-500MG
sigma-aldrich.com/organicelectronics-jp
Tel:03-5796-7330Fax:03-5796-7335 E-mail:sialjpts@sial.com
2-2n 3
1.8 cm2/Vs
Vth
2-11
2-12
HOMO
0.2 cm2/Vs
2-9Copper
II
1,2,3,4,8,9,10,11,15,16,17,18,22,23,24,25-hexadecafluoro29H,31H-phthalocyanineAldrich 446653
0.03 cm2/Vs
n
CMOS n
2-10 n
FET
SiO2 OTS 0.1
cm2/Vs
FET n
FET
C60
2-13Fullerene -C60Aldrich
3
cm2/Vs
PCBM
2-14Aldrich 684457,
684449, 684430
n
0.2 cm2/Vs
78
79
3n
2-8
N,N'-dioctyl-3,4,9,10-perylene
tetracarboxylic diimide
PTCDI-C8HPTCDI-C8
Aldrich 663913
2-9
CopperII1,2,3,4,8,9,10,11,15,16,17,
18,22,23,24,25-hexadecafluoro-29H,
31H-phthalocyanine
F16CuPc
Aldrich 446653
Bao, Z.Lovinger, A.J.Brown, L., J. Am. Chem. Soc., 1998, 120, 207.
2-10
Perfluoropentacene
2-11
2,2'-Bis4-trifluoromethylphenyl
-5,5'-bithiazole
2-12
4,7-Bis5-4'-trifluoromethylphenyl
thiophen-2-ylbenzo1,2,5thiadiazole
2-13
Fullerene-C60
C60
2-14
ester
PCBM60PCBM
Aldrich 684457, 684449,
684430
Tel:03-5796-7340Fax:03-5796-7345 E-mail:safcjp@sial.com
2-15
6,13-Bistriisopropylsilylethynyl
pentacene
TIPS-pentacene
Aldrich 716006
2-16
5,11-Bistriethylsilylethynylanthra
2,3-b:6,7-b' dithiophene
TES anthradithiophene
2-17
2,7-Dialkyl1benzothieno3,2-b
benzothiophene
alkyl-BTBT
2-3 4
2-15
TIPS-PentaceneAldrich 716006
FET
TIPS
0.17
cm2/Vs
1 cm2/Vs
3-2 6
90 3-4
3-5
80
2-16 1 cm2/Vs
A
SmA 10-4 cm2/
HOMO
SmH
BTBT 2-17
1 cm2/Vs
Vs
3-1 5
3-1
H0.1 cm2/Vs
Mllen p
on/off 10715
3-2
PR-TRMC
Pulse-
10
3-8
4 7
FET 90
4-1 3-
P3RT
Tel:03-5796-7330Fax:03-5796-7335 E-mail:sialjpts@sial.com
3-1
2,3,6,7,10,11-Hexahexylthiotriphenylene
HHTT
3-2
Alkyl-hexabenzocoronene
HBC
3-3
1,4,8,11,15,18,22,
25-Octaoctylphthalocyanine
3-4
2-4'-heptyloxyphenyl
-6-dodecylthiobenzothiazole
3-5
2-4'-octylphenyl
-6-dodecyloxynaphthalene
8-PNP-O12
3-6
1Benzothieno
3,2-b
1
benzothiophene-2,7-dicarboxylate
BTBT
3-7
5-Propyl-5''''-henynyl-2,2':5',2'':
5'',2'''-quanterthiophene
3-QTP-yne-4
3-8
5,5'-Bis7-hexyl-9H-fluoren-2-yl
-2,2'-bithiophene
DHFTTF
3-9
Bis-5'-hexylthiophen-2'-yl
-2,6-anthracene
DHTAnt
TM
Vol.4 No.3
TIPS
John E. Anthony
Tobin Marks
Iain McCullochMartin Heeney
Thomas Bjrnholm
www.sigma-aldrich.com/sacatalog-jp
Tel:03-5796-7340Fax:03-5796-7345 E-mail:safcjp@sial.com
11
PF
PF 4-6 265
MEH-PPV P3RT
4-6
FET-LED
4-2
FET 0.1
0.1 cm /Vs
4-3
FET
5 m
0.15 cm2/Vs
1
4-4
0.6 cm2/Vs
4-5 4-4
FET
0.08 cm2/Vs Tg 150
2
0.2 cm2/Vs
5 8 PF
PF 4-8PF
0.01 cm2/Vs
0.25 cm2/Vs
4-1
Poly3-alkylthiophene
P3RT
4-2
Poly3,3'''-dialkyl-quaterthiophene
PQT
Ong, B. S.Wu, Y.Liu, P.Gardner, S. J. Am. Chem. Soc. 2004, 126, 3378.
4-3
Poly2,5-bis3-decylthiophen-2-yl
thieno2,3-bthiophene
4-4
Poly2,5-bis3-alkylthiophen-2-yl
thieno3,2-bthiophene
4-5
Poly2,5-bis2-thienyl-3,6-dialkylthieno
3,2-bthiophene
4-6
Poly-9,9'-dioctyl-uorene-cobithiophene
F8T2
Aldrich 685070
Polytriarylamine
PTAA
Aldrich 702471
4-7
4-8
Poly9,9-dioctylfluorenyl-2,7-diyl
-co-4,4-N-4-sec-butylphenyl
diphenylamine
TFB
4-13-
Name
S-tructure
Mobility
Cat. No.
regioregular
445703-1G
104 - 101cm2/Vs
average Mn 25,00035,000
regioregular, electronic grade, Plexcore OS 1100
698989-250MG
698989-1G
698989-5G
104 - 101cm2/Vs
average Mn 45,00065,000
regioregular, electronic grade, Plexcore OS 2100
698997-250MG
698997-1G
Poly(3-hexylthiophene-2,5-diyl) (P3HT)
CH2(CH2)4CH3
S
n
12
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4.
4.1
Cr/Au
TFT
50 ml 10 ml
40 ml
photolithography
14
vol ratio
300 nm
70
n++-Si
10
10
dangling bond
3 2
pH pH
IPAisopropyl alcohol
3 IPA
IPA
50ml
100
HMDS
1,1,1,3,3,3Hexamethyldisilazane LOL1000Lift
off layerTSMR-8900
Orientation Flat
15mm
4-1
HMDS
1,000 rpm
30
110
100
HMDS 5
HMDS
HMDS
4-1
HMDS LOL
HMDS
LOL1000 0.45 m
111
HMDS
45
4,000 rpm 30
150
Tel:03-5796-7340Fax:03-5796-7345 E-mail:safcjp@sial.com
13
5 HMDS
2 LOL1000
Au Cr Au
Cr
TSMR-8900
EB
3,000 rpm 30
110 5
1.0 10-4 Pa
rpm
EB Cr 30 Au 500
y1
4 m
30
Cr Au
IPA
4-3
Cr/Au Micro
Posit Remover 1165
70
20 30
Au
NMD-3
30
2 IPA
4-2
4.2
FET
W
2mm
20
25mm
4mmW
4mm
100mm50mm25mm10mm5mm
UV/ UV/
UV253
1 3.7
mW/cm2 3 12 UV
4-2
(a)
Pt
TSMR-8900 m
100nm
Si
Au
BC
SiO2
LOLBC
SEM
mmol/L 100 ml
(b)
40
Au
Pt
BC
SiO2
LOLBC
SEM
4-3
14
1
110 5
HMDS
HMDS
Tel:03-5796-7330Fax:03-5796-7335 E-mail:sialjpts@sial.com
110
HMDS
4 /
4-4
FET /
HMDS
FET /
110 5
n FET
Au
Cr
50 m
/
Si
HMDS
4-4HMDS
3
FET FET
5
10-4 Pa 2.0 /s 3.0 /s
300 500
4.3
FET
4-5
FET
Agilent
10-4 Pa 10-6 Pa
0.1 /s
0.5 /s 500
Triaxial
70
cableTXA
L =100mm
L =150mm
L =200mm
L =50mm
TXA-
BNC
4-6
bBNC
(
)
a
TXA
(
)
a
FET
c
TXA-BNC
b
FET
TXABNC
4-6
4-5 FET
TXA
Tel:03-5796-7340Fax:03-5796-7345 E-mail:safcjp@sial.com
15
Ground
Q
xId
4-2
Ground
12
4-3
4-3Id x
Id x Id x 0 L
Id-Vd
4-4
300 nm
100V
4-3 V
0 0V
L Vd
20 V -100 V -10 V
Id-Vd
+20 V -100 V -1 V
4-5
4-7
a
Id-Vd
Id-Vg
4-6
-100 V
+20 V -100 V -1 V 4-7b
Id-Vg
-90V
-150
-80V
-100
-50
Drain current ( A)
Vg=-100V
-200
-70V
-60V
~20V
-3
10
-4
10
-5
0.012
10
-6
0.010
-7
0.008
10
-8
0.006
10
-9
0.004
-10
0.002
10
0.014
10
10
0
-140 -120 -100 -80 -60 -40 -20
Vd =-100 V
=0.7 cm2/Vs
Vth=-37 V
-11
0.016
-250
10
Ci
0
0 20 40
Vg Vth Vg Vth
Vg
Vg-Vth
4-7
Vp dId/dVd 0
aFET Id -Vd
b
FETId -Vg
Vg =-100V
4-7 FET
W 2 mmL 100 m FET
4-8
4-7 Idsat
4-9
4.4 FET
Id-Vg
4-8 L FET
- 0
4-9
4-10
Q(x)V(x)F(x)
S
G
0
Id1/2-Vd WC/2L1/2
4-8 FET
WSiO2 d
r 3.9
m x
5.
- V
x
cm2/Vs n
2010 5 432
240 RGB EL
4-1
16
Tel:03-5796-7330Fax:03-5796-7335 E-mail:sialjpts@sial.com
EL FET
FET
peri-Xanthenoxanthene
PXX
0.4 cm2/Vs FET
FET
2000
6.
1 Ebisawa, F.; Kurokawa, T.; Nara, S. J. Appl. Phys. 1983, 54, 3255.
2 Kudo, K.; Yamashina, M.; Moriizumi, T. Jpn. J. Appl. Phys. 1984, 23, 130.
3 Kelley, T. W.; Boardman, L. D.; Dunbar, T. D.; Muyres, D. V.; Pellerite, M. J., Smith; T. P. J. Phys.
Chem. B, 2003, 107, 5877.
4 Takeya, J.; Yamagishi, M.; Tominari, Y.; Hirahara, R.; Nakazawa, Y.; Nishikawa, T.; Kawase, T.;
Shimoda T.; Ogawa S. Appl. Phys. Lett. 2007, 90, 102120.
5 http://www.sony.co.jp/SonyInfo/News/Press/201005/10-070/
6 Sekitani, T.; Noguchi, Y.; Hata, K.; Fukushima, T,; Aida, T.; Someya, T. Science, 2008, 321, 1468.
7 Myny, K.; Steudela, S.; Viccaa, P.; Beenhakkersd, M. J.; van Aerled, N. A.J.M.; Gelincke, G. H.;
Genoe, J.; Dehaenea, W.; Heremans, P. Solid-State Electronics. 2009, 53, 1220.
8 Hepp, A.; Heil, H.; Weise, W.; Ahles, M.; Schmechel, R.; von Seggern, H. Phys. Rev. Lett. 2003,
91, 157406.
9 Nakanotani, H.; Saito, M.; Nakamura, H.; Adachi, C. Appl. Phys. Lett.,2009, 95, 033308.
10 Ohmori, Y.; Muro, K.; Onoda, M.; Yoshino, K. Jpn. J. Appl. Phys., 1992, 31, L646.
11 Maddalena, F.; Spijkman, M.; Brondijk, J.J.; Fonteijn, P.; Brouwer, F.; Hummelen, J.C.; de Leeuw,
D.M.; Blom, P.W.M.; de Boer, B. Org. Electronics,2008, 9, 839.
12 Newman, C. R.; Chestereld, R. J.; Panzer, M. J.; Frisbie, C. D. J. Appl. Phys., 2005, 98, 084506.
13 Diallo, K.; Erouel, M.; Tardy, J.; Andr, E.; Garden, J.-L. Appl. Phys. Lett., 2007, 91, 183508.
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16 Nakayama, K.; Fujimoto, S.; Yokoyama, M. Appl. Phys. Lett., 2006, 88, 153512.
17 Yasuda, T.; Goto, T.; Fujita, K.; Tsutsui, T. Mol. Cryst. Liq. Cryst., 2006, 444, 219.
18 Nakanotani, H.; Saito, M.; Nakamura, H.; Adachi, C. Appl. Phys. Lett., 2009, 95, 033308.
19 Sakanoue, T.; Yahiro, M.; Adachi, C.; Uchiuzou, H.; Takahashi, T.; Toshimitsu, A. Appl. Phys. Lett.,
2007, 90, 171118.
20 Itaka, K.; Yamashiro, M.; Yamaguchi, J.; Haemori, M.; Yaginuma, S.; Matsumoto, Y.; Kondo, M.;
Koinuma, H. Adv. Mater., 2006, 18, 1713.
21 Kinoshita, S.; Sakanoue, T.; Yahiro, M.; Takimiya, K.; Ebata, H.; Ikeda, M.; Kuwabara, H.; Adachi, C.
Solid State Comm., 2008, 145, 114.
22 Kato,T.; Origuchi, C.; Shinoda, M; Adachi, C. Jpn. J. Appl. Phys., 2011, 50, 050202.
23 Sirringhaus, H.; Kawase, T; Friend, R. H.; Shimoda, T.; Inbasekaran, M.; Wu, W.; Woo, E. P.
Science, 2000, 290, 2123.
24 Kline, R.J.; McGehee, M.D.; Kadnikova, E.N.; Liu, J.; Frchet, J. M. J. Adv. Mater., 2003, 15, 1519.
25 Sirringhaus, H; Brown P. J.;Friend R. H.; Nielsen M. M.; Bachgaard K.; Langeveld-Voss B. M. W.;
Spiering A. J. H.; Janssen R. A. J.; Meijer E. W.; Herwing P.; Leeuw D. M. Nature 1999, 401, 685.
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Zschieschang, U.; Schmid, G. Chem. Mater., 2006, 18, 579.
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D. D. C. Appl. Phys. Lett., 2000, 77, 406.
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32 Anthony, J. E.; Brooks, J. S.; Eaton, D. L.; Parkin, S. R. J. Am. Chem Soc., 2001, 123, 9482.
33 Aramaki, S.; Sakai, Y.; Ono, N. Appl. Phys. Lett., 2004, 84, 2085.
34 Brown, A. R.; Pomp, A.; de Leeuw, D. M.; Klaassen, D. B. M.; Havinga, E. E.; Herwig, P.; Mllen, K.
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www.sigma-aldrich.com/sacatalog-jp
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17
sigma-aldrich.com/organicelectronics-jp
Name
Thieno[2,3-b]thiophene
Structure
S
Thieno[3,2-b]thiophene
Purity
95%
Catalog No.
702641-1G
702641-5G
95%
702668-1G
702668-5G
97%
710172-500MG
97%
691925-1G
691925-5G
95%
697400-1G
697400-5G
95%
688312-1G
97%
694258-1G
97%
456373-1G
456373-5G
456373-25G
515493-1G
515493-5G
S
S
Dithieno[3,2-b:2',3'-d]thiophene
2-Bromo-3-hexylthiophene
CH2(CH2)4CH3
S
S
Br
2-Bromo-3-dodecylthiophene
CH2(CH2)10CH3
Br
5-Bromo-2-hexylthiophene
Br
CH2(CH2)4CH3
2,5-Dibromo-3-hexylthiophene
CH2(CH2)4CH3
Br
Br
5,5'-Dibromo-2,2'-bithiophene
99%
97%
647020-1G
647020-5G
3,3'-Dibromo-2,2'-bithiophene
97%
733725-1G
733725-5G
97%
699098-500MG
97%
701254-1G
97%
704199-1G
95%
702803-1G
4,7-Dibromobenzo[c]-1,2,5-thiadiazole
95%
693847-1G
693847-5G
4,7-Bis(2-bromo-5-thienyl)-2,1,3-benzothiadiazole
99.0% (HPLC)
732435-1G
97%
708283-500MG
95%
708267-500MG
>97%
731757-1G
97%
717274-5G
5,5''-Dibromo-2,2':5',2''-terthiophene
Br
Br
2-Bromo-7-hexyl-9H-fluorene
Br
CH2(CH2)4CH3
H3C
H3C
H3C
O
CH3
O
B
B
O
5-Fluoro-2,3-thiophenedicarboxaldehyde
CH3
CH3
CH3
CH3
H
H
S
O
2,8-Dibromo-6,12-dihydro-6,6,12,12-tetraoctylindeno[1,2-b]fluorene
CH2(CH2)6CH3
CH3(CH2)6CH2
Br
Br
CH3(CH2)6CH2
CH2(CH2)6CH3
1,3,6,8-Tetrabromopyrene
Br
Br
Br
Br
18
Tel:03-5796-7330Fax:03-5796-7335 E-mail:sialjpts@sial.com
sigma-aldrich.com/organicelectronics-jp
Name
Anthracene
Structure
Purity
sublimed grade 99%
Catalog. No.
694959-5G
694959-25G
max = 277 nm
em = 481, 514 nm in
dichloromethane-d2
698415-1G
Benz[b]anthracene
Pentacene
triple-sublimed grade
99.995% trace metals basis
698423-500MG
sublimed grade
99.9% trace metals basis
684848-1G
Perylene
max = 436 nm
em = 447 nm in
tetrahydrofuran
394475-1G
394475-5G
4,4'-Bis(N-carbazolyl)-1,1'-biphenyl (CBP,
DCBP)
max = 532 nm
699195-1G
699195-5g
556696-500MG
556696-1G
Rubrene
sublimed grade
max = 299 nm
em = 550 nm in
tetrahydrofuran
551112-100MG
551112-1G
551112-5G
Bathocuproine
max = 277 nm
em = 386 nm in
tetrahydrofuran
699152-500MG
max = 282 nm
ex = 305nm
em = 507 nm in
chloroform
694924-250MG
sublimed grade
max = 324 nm
ex = 324nm
em = 615 nm in
tetrahydrofuran
688118-250MG
max = 259 nm
ex = 390nm
em = 519 nm
697737-1G
triple-sublimed grade
>99.99% trace metals basis
max = 678 nm
em = 404 nm
702854-500MG
max = 678 nm
em = 404 nm
546674-1G
546674-5G
N
CH3
H3C
Tris[2-phenylpyridinato-C2,N]iridium(III)
(Ir(ppy)3)
Ir
N
3
Tris[1-phenylisoquinoline-C2,N]iridium(III)
(Ir(piq)3)
Ir
N
3
Tris-(8-hydroxyquinoline)aluminum (Alq3)
N
O
N
Al
O
N
N
Cu
N
N
N
N
Fullerene-C60
sublimed 99.9%
572500-250MG
572500-1G
572500-5G
[5,6]-Fullerene-C70
sublimed,99 (HPLC)
709476-250MG
Tel:03-5796-7340Fax:03-5796-7345 E-mail:safcjp@sial.com
19
Materials Science
Material Matters
CAS
Web
E-mail
http://www.sigma-aldrich.com/ms-jp
TM
5-2
4-1
5-3
4-2
35-4
4-3
6-1
4-4
2
6-2
5-1
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SAJ1366 2011.8