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technology
NAVAL RESEARCH LABORATORY
TECHNOLOGY LICENSING OPPORTUNITY
P
ULSED
L
ASER
D
EPOSITION OF
C
ERAMIC
F
ILMS
Photograph of a typical plasma plume generated during the PLD process.
Thin film electronic ceramics will play a prominent role in the next generation of electronicdevices. Pulsed laser deposition (PLD) is a versatile vapor deposition technique which hassolved many of the problems associated with the growth of high quality ceramic thin films.PLD has demonstrated the ability to rapidly deposit epitaxial quality thin films with an extremelylow defect density. PLD allows the growth of high quality ceramics at low temperatures,which enables the growth of materials on plastic substrates for flexible electronics. At NRL,this technique has been applied to a broad spectrum of ceramic systems to meet specificdevice application needs. Sophisticated analysis techniques are employed to characterizefilm phase, structure, morphology (X-ray diffraction, Rutherford backscattering, SEM, andTEM), and film-specific properties (resistance, polarization, magnetization, and optic).
References
"Transparent Conductive F-Doped SnO
2
Thin Films Grown by Pulsed Laser Deposition,"
Thin Solid Films 
 (2007)doi:10.1016/j.tsf.2007.11.079."Fabrication of Zr-N Codoped p-type ZnO Thin Films by Pulsed Laser Deposition,"
Applied Physics Letters 
 90 (2007)203508-1 - 203508-3."Transparent Conducting Oxide Thin Films."
Pulsed Laser Deposition of Thin Films.
 Ed. R. Eason.Wiley-Interscience, 2007. p 239-260.
Available for License: US Patent Nos. 6,645,843 and 6,818,924.Advantages/Features
Growth of high quality films at lowertemperaturesDeposit transparent conductiveoxides on plastic substrates forflexible display applicationsSynthesize transparent conductiveoxide films with smooth surfaces,lower electrical resistivity, and veryhigh transmission of light in thevisible spectrum
Applications
High temperature superconductorsfor high Q microwave filters andresonatorsFerroelectrics for NVRAMS,DRAMS, optoelectronics, andMEMSFerrites for circulators, filters, andmagnetic recordingGiant magnetoresistance forrecording heads and magneticsensorsTransparent conductive oxides fordisplays and optically transparentelectronics
For more information contact:
Rita Manak, Ph.D.Head, Technology Transfer Office202 767-3083rita.manak@nrl.navy.mil
Identification Number:
MAT19

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