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NSC 101-2120-S-007-001
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1.1
1.2
1.3
2.1
10
2.1.1
13
2.1.2
14
2.1.3
19
2.1.4
31
2.2
33
2.2.1
33
2.2.2
36
2.2.3
39
2.2.4
40
2.2.5
43
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2.3
44
2.3.1
44
2.3.2
46
2.3.3
47
2.3.4
49
2.3.5
50
2.3.6
52
2.3.7
53
3.1
57
58
3.1.1
59
3.1.2
60
3.1.3
68
3.2
76
3.2.1
76
3.2.2
79
3.3
82
3.3.1
83
3.3.2
85
3.3.3
86
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3.3.4
90
3.3.5
90
3.3.6
92
3.3.7
93
3.4
94
3.4.1
94
3.4.2
96
99
4.1
100
4.2
102
105
4.3
110
4.4
121
4.4.1
123
4.4.2
126
4.4.3
132
4.4.4
141
4.4.5
146
4.4.6
148
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5.1
151
152
5.1.1
154
5.1.2
155
5.1.3
155
5.2
159
5.2.1
160
5.2.2
161
5.2.3
164
5.2.4
166
5.3
168
5.3.1
168
5.3.2
171
5.3.3
174
5.3.4
177
5.3.5
178
5.4
181
5.4.1
182
5.4.2
183
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6.1
191
192
6.1.1
194
6.1.2
195
6.2
197
6.2.1
198
6.2.2
201
6.3
202
6.4
208
6.4.1
209
6.4.2
211
6.4.3
211
6.4.4
212
6.4.5
213
6.5
215
6.6
223
6.6.1
224
6.6.2
225
6.6.3
225
6.6.4
226
6.6.5
226
6.6.6
227
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6.6.7
228
6.6.8
229
6.7
230
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1
2
3
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1.1
bottom up
nanotechnologyTheres Plenty
of Room at the Bottom.
Ryogo Kubo1962
quantum connement
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CHAPTER 1
19811986
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1988M. N. Baibich
Fe/Cr
Fe/Al
Fe/AuFe/AgFe/CuCo/Au
Co/AgCo/Cu
1989IBMDonald Eigerscanning
tunneling microscope35Xenon
atomsIBM
1991NECSumio Iijima
carbon nanotube
1998
Delft University of Technology
1996P. HoyerTiO2
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CHAPTER 1
2000
NNINational Nanotechnology Initiative: The Initiative
and Its Implementation Plan20014.95
2003TsukubaNIMSNational Institute
for Material ScienceNanotechnology
Support Project Center
200012
20011
2002
9
2003
1.2
nanometernano10910-9nano
nanusnanos
meter
1.52
nanometer
100
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25
100DNA
0.52
1100
100
1100
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CHAPTER 1
2.1specific
surface area
m2/g
2.2
1.3
GMPCAS
http://proj3.moeaidb.gov.tw/
nanomark/1-1
8
nano
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1-1
201212
PU
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1
2
3
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2.1
(1)(2)
(3)2-1
2-1
(1)
(2)
10
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CHAPTER 2
e
e
e2-1
(3)
m10-6
bulk materials
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macroscopic
microscopicquantum physics
mesoscopic
12
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CHAPTER 2
2.1.1
1. Nano Powder
100
2. Nano Fiber
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3. Nano Film
4. Nano Bulk
C60
Carbon nanotube
Graphene
2.1.2
quantum dot
14
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CHAPTER 2
2-2
artificial atom
super-atom
e-
2-2
2-2
tunneling effect
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2-3(a)
quantum well
2-3(b)
quantum wire
photolithography
photoresist
16
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CHAPTER 2
E-beam lithography
2-3(c)
(a)
(b)
(c)
2-3(a)(b)(c)
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self-organized growth
self-assembly
molecular beam epitaxy
MBE
2-4(1)Volmer-Weber
growth mode(2)Frank-van der Merwe growth
mode(3)Stranski-Krastanov growth
mode
18
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CHAPTER 2
2-4
2.1.3
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single crystalline
poly-crystal
2-5
2-5
Ct200
20
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CHAPTER 2
photonic crystal
2-6
2-6
Lattice constant
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Bragg diffractionscattering
(1)
(2)
wavelength
X
1987Eli YablonovitchSajeev John
photonic band gap,
PBG
2-7
22
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CHAPTER 2
2-8
photonic bandgap
waveguide2-9
(a)
(b)
(c)
2-7(a)(b)(c)
2-8
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2-9
(1)
(2)
dielectric constant
permittivity
2-8
24
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CHAPTER 2
Eli Yablonovitch
Sajeev John
Anderson localization
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. .
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