You are on page 1of 5

International Journal of Electronics and Communication Engineering & Technology (IJECET),

ISSN 0976 6464(Print), ISSN 0976 6472(Online), Special Issue (November, 2013), IAEME
International Conference on Communication Systems (ICCS-2013) October 18-20, 2013
B K Birla Institute of Engineering & Technology (BKBIET), Pilani, India Page 150












Analytical Solution of 2d Poissons Equation Using Separation of
Variable Method for FDSOI MOSFET

Prashant Mani
1
, Manoj Kumar Pandey
2


Research Scholar
1
, Director
2

SRM University, NCR Campus Ghaziabad, India

1
prashantmani29@gmail.com,
2
mkspandey@gmail.com

ABSTRACT: A twodimensional (2-D) analytical model for the surface potential variation along
the channel in fully depleted silicon-on-insulator MOSFETs is developed .Our Approach to solve
poissons equation using suitable boundary conditions, results high accuracy to calculate the
potential of the channel as compare to various approaches. A Simple and accurate analytical
expression for surface potential in channel are derived. The proposed model will help to
reduce Short Channel Effect, Drain Induced Barrier Lowering in Fully Depleted SOI MOSFETs
etc

KEYWORDS: SOI MOSFET, Poisson Equation, 2D Solution

I. INTRODUCTION

FULLY DEPLETED single-gate SOI MOSFETs are expected to become next-generation devices
due to their superior short-channel immunity and ideal subthreshold characteristics. There
have been many reports on their modeling of devices [1][11]. The assumption of constant
surface potential used in the charge sharing models is invalid for submicrometer channel
lengths. The solution of 2-D Poissons equation has been obtained using various approaches.
Pseudo-2-D solutions of Poissons equation [12], [13] and a quasi-2-D technique [14], [15] have
been reported in literature.

The solution of 2-D Poissons equation by power series approach has also been obtained
[16].However, the solution of 2-D Poissons equation by power series approach is obtained by
neglecting the higher order terms and, hence, it is not as accurate as the other approaches.
Analytical solution of 2-D Poissons equation by means of Greens function technique [17] is
another method to solve 2-DPoissons equation. This model solves 2-D Poissons equation
using the separation of variables method. However, the boundary conditions used for the
solution of Poissons equation are applicable only for bulk MOSFETs. This model solve the 2 D
POISSONS equation by using separation of variable method .First split the 2D Poissons
equation in to one dimensional poissons equation and 2D laplace equation .

INTERNATIONAL JOURNAL OF ELECTRONICS AND
COMMUNICATION ENGINEERING & TECHNOLOGY (IJECET)


ISSN 0976 6464(Print)
ISSN 0976 6472(Online)
Special Issue (November, 2013), pp. 150-154
IAEME: www.iaeme.com/ijecet.asp
Journal Impact Factor (2013): 5.8896 (Calculated by GISI)
www.jifactor.com


IJECET
I A E M E
International Journal of Electronics and Communication Engineering & Technology (IJECET),
ISSN 0976 6464(Print), ISSN 0976 6472(Online), Special Issue (November, 2013), IAEME
International Conference on Communication Systems (ICCS-2013) October 18-20, 2013
B K Birla Institute of Engineering & Technology (BKBIET), Pilani, India Page 151


II. SOLUTION OF 2D POISSONS EQUATION


Fig. 1: Cross-sectional View MOSFET

The cross-sectional view of an n-channel SOIMOSFET along the channel length is shown in Fig.
1. The sourceSOI film and drainSOI film junctions are located at y=0 and y= Leff, where Leff
is the effective channel length .The front and back interfaces are located at Si-SiO2 at x=0 and
x= ts, where ts is SOI film thickness. toxf and toxb are the thickness of frontgate an backgate
oxide thickness Vgf and Vgb are the applied potential.

In this paper, we consider a fully depleted (FD) SOI film. The Poissons equation inthe FD SOI
film region is given by

( )

( )

()

where NA is the doping concentration and is the potential at a particular point (x,y) in the SOI
film. The boundary conditions required to solve the 2-D Poissons equation are

( )


()

(2)
Where x=0

( )


()

(3)
Where x=ts

( ) (4)
Where y=0

( ) (5)
Where y=Leff

The separation of variable method applied on equation (1), following step involve

Split the 2D Poissons Equation in two parts, first one is one dimensional poissons
equation and two dimensional laplace equation.
Now 2D Laplace equation has all variable in one side.

International Journal of Electronics and Communication Engineering & Technology (IJECET),
ISSN 0976 6464(Print), ISSN 0976 6472(Online), Special Issue (November, 2013), IAEME
International Conference on Communication Systems (ICCS-2013) October 18-20, 2013
B K Birla Institute of Engineering & Technology (BKBIET), Pilani, India Page 152


()

()

( )

( )

()

Where ( ) () ( ) (8)

In equation (8) () is the solution of equation (6) and ( ) is the solution of equation
(7) with boundary conditions.

III. SOLUTION OF L(X)

In equation l is the solution of 1 D POISSON equation, using the boundary condition given
below
(9)

(10)

Now after solving the above boundary condition we find the solution in the form of



(11)



The following graph is plotted between l and xi. From the graph we find out the result as in
parabolic form. As the thickness of the silicon layer increases from 0 to 1.25*10
-8
nm the
surface potential decreases, but after more increase in si thickness the surface potential also
increase.


Fig. 2: Potential variation along the channel thickness vary from ts=0 to ts=2.5*10
-8
nm
0 4.17
.
10
9
8.33
.
10
9
1.25
.
10
8
1.67
.
10
8
2.08
.
10
8
2.5
.
10
8
1.55
1.56
1.57
1.58
1.59
1.6
1.61
1.62
l
i
x
i
International Journal of Electronics and Communication Engineering & Technology (IJECET),
ISSN 0976 6464(Print), ISSN 0976 6472(Online), Special Issue (November, 2013), IAEME
International Conference on Communication Systems (ICCS-2013) October 18-20, 2013
B K Birla Institute of Engineering & Technology (BKBIET), Pilani, India Page 153

Where l is the potential of one dimensional poission equation and xi is the thickness of silicon
film.

IV. SOLUTION OF S (X,Y)

In equation (8) s is the solution of 2 D Laplace equation, the boundary conditions required to
solve the Laplace equation are given below.

( )


( )

()

Where x=0
( )


( )

()
Where x=ts
( ) (14)
Where y=0
( ) (15)
Where y=Leff

(16)

The solution comes in the form of summation of sin and sin hyperbolic terms. Here the terms
can be explained as below .Where the Vr and Vr are defined as given below.


Fig. 3: The Potential Variation along the Channel length. Leff =0 to Leff =3.5 10-7 nm

The graph shows as the effective channel length increase the potential decrease.
1
.
10
7
1.5
.
10
7
2
.
10
7
2.5
.
10
7
3
.
10
7
3.5
.
10
7
179.894
179.89405
179.8941
179.89415
179.8942
s
j
Leff
j
Vr Vr
Vds
1

1 cos ts ( )
c si
c ox
toxf sin ts ( ) +
|

\
|
|
.




(
(


iDnum
+ :=
Vr
inum1
c si
c ox
toxf inum2 +
iDnum
:=
International Journal of Electronics and Communication Engineering & Technology (IJECET),
ISSN 0976 6464(Print), ISSN 0976 6472(Online), Special Issue (November, 2013), IAEME
International Conference on Communication Systems (ICCS-2013) October 18-20, 2013
B K Birla Institute of Engineering & Technology (BKBIET), Pilani, India Page 154

V. RESULT AND FUTURE WORK

SOI MOSFET based on an analytical solution of 2-D Poissons equation is presented. The effect
of change in thickness of silicon film can be analyzed by fig. 2 and fig. 3 shows the outcome of
potential as changes the effective channel length of proposed model. The 2D Poissons
equation is solved analytically using the separation of variables technique. The solution will
then extend to obtain the 3D Poissons equation of the small geometry SOI MOSFET.

REFERENCES

[1] K. K. Young, Short-channel effect in fully depleted SOI MOSFETs, IEEE Trans. Electron
Devices, vol. 36, pp. 399401, 1989.
[2] Analysis of conduction in fully depleted SOI MOSFETs, IEEE Trans. Electron Devices, vol.
36, pp. 504506, 1989.
[3] R. H. Yan, A. Ourmazd, and K. F. Lee, Scaling the Si MOSFET: From bulk to SOI to bulk, IEEE
Trans. Electron Devices, vol. 39, pp. 17041710, 1992.
[4] H.-O. Yoachim, Y. Yamaguchi, K. Ishikawa, Y. Inoue, and T. Nishimura,Simulation and 2D
analytical modeling of sub threshold slope in ultrathin-film SOI MOSFETs down to 0.1 _m gate
length, IEEE Trans.Electron Devices, vol. 40, pp. 18121817, 1993.
[5] S. R. Banna, P. C. H. Chan, P. K. Ko, C. T. Nguyen, and M. Chan,Threshold voltage model for
deep-submicrometer fully depleted SOI MOSFETs, IEEE Trans. Electron Devices, vol. 42, pp.
19491955,1995.
[6] S. Pidin and M. Koyanagi, Two-dimensional analytical subthreshold model and optimal
scaling of fully-depleted SOI MOSFET down to 0.1_m channel length, in Solid State Devices
Mat. Tech. Dig., 1996, pp.309310.
[7] K. Suzuki, Y. Tosaka, T. Tanaka, H. Horie, and Y. Arimoto, Scalingtheory for double-gate SOI
MOSFETs, IEEE Trans. Electron Devices, vol. 40, pp. 23262329, 1993.
[8] K. Suzuki and T. Sugii, Analytical models for n -p double-gate SOI MOSFETs, IEEE Trans.
Electron Devices, vol. 42, pp. 19401948,1995.
[9] T. K. Chiang, Y. H. Wang, and M. P. Houng, Modeling of threshold voltage and subthreshold
swing of short-channel SOI MOSFETs, Solid-State Electron, vol. 43, pp. 123129, 1999.
[10] D. J. Frank, Y. Taur, and H.-S. P. Wong, Generalized scale length for 2D effects in
MOSFETs, IEEE Trans. Electron Devices, vol. ED-19, pp. 385387.
[11] S.-L. Jang, B.-R. Huang, and J.-J. Ju, A unified analytical fully depleted and partially
depleted SOI MOSFET model, IEEE Trans. Electron Devices, vol. 46, pp. 18721876, 1998.
[12] K. K. Young, SCEs in fully depleted SOI MOSFETs, IEEE Trans.Electron Devices, vol. 36,
pp. 399402, Apr. 1989.
[13] H.-O. Joachim, Y. Yamaguchi, K. Ishikawa, I. Yasuo, and T. Nishimura,Simulation and two
dimensional analytical modeling of subthresholdslope in ultrathin-film SOI MOSFETs down to
0.1_m gate length, IEEE Trans. Electron Devices, vol. 40, pp. 18121817, Nov. 1993.
[14] J.-Y. Guo and C.-Y. Wu, A new 2-D analytic threshold voltage model for fully depleted short
channel SOI MOSFETs, IEEE Trans. Electron Devices, vol. 40, pp. 16531661, Nov. 1993.
[15] J. C. S.Woo, K.W. Terrill, and P. K.Vasudev, Two dimensional analytic modeling of very thin
SOI MOSFETs, IEEE Trans. Electron Devices, vol. 37, pp. 19992006, 1990.
[16] K.-W. Su and J. B. Kuo, Analytical threshold voltage formula including narrow channel
effects for VLSI mesa-isolated fully depleted ultrathin silicon-on-insulator n-channel metal
oxidesilicon devices,Jpn. J. Appl. Phys., vol. 34, pp. 40104019, 1995.
[17] K. O. Jeppson, Influence of the channel width on the threshold voltage modulation of
MOSFETs, Electron. Lett., vol. 11, pp. 297299, 1975.

You might also like