Professional Documents
Culture Documents
1) 2) 3) 4)
Disadvantage
Directionality
E. Chen (4-12-2004)
Liftoff
Lithography
Mask Film
Mask
Lithography
Substrate
Substrate
Etching
Deposit Film
Mask
Substrate
Substrate
Film
Film
Substrate
Substrate
E. Chen (4-12-2004)
RL = 1
Mask
RL =
0 < RL < 1
Mask
Bias: the difference in lateral dimensions between the feature on mask and the actually etched pattern smaller RL results in smaller bias
Applied Physics 298r 3
RL = 0
E. Chen (4-12-2004)
Bias
Film
Film
Mask