Prince of Songkla University

Contact Angle of Glass Substrate

Coated with TiO2/SiO2 Thin Film

Jiraporn Damchan1, Lek Sikong1*, Kalayanee Kooptarnond1, Sutham Niyomwas2

1Department
of Mining and Materials Engineering Faculty of
Engineering
*NANOTEC Center of Excellence at Prince of Songkla University
2Department of Mechanical Engineering, Faculty of Engineering,
Prince of Songkla University, Hat Yai, 90112
 Outline
„ Introduction
„ Objective
„ Experiment procedure
„ Result and discussion
„ Conclusion
„ Acknowledgements
 Photocatalyst Applications

www.concretedecor.net
 Photocatalyst, TiO2 (http://staff.aist.go.jp)

The crystal structure of Anatase (Tetragonal) Brookite (Orthorhombic)

rutile.(Tetragonal)

Anatase is the best photocatalytic activity

Mechanism of the decomposition of organics

3.2 eV

www.nanobest.co.kr
Chemical reduction

TiO 2 + h *ν → e − cb + h + vb
− −
O 2 + e cb → O 2
+ • +
H 2O + h vb → OH + H
 Objective

To study the effect of amount of SiO2 on

Photocatalytic activity and Hydrophilic of
glass substrate coated with TiO2 film
catalyst
 Parameters

„ Calcination temperatures at 500°C

„ Content of SiO2 (5 -20mol%)
„ Photocatalytic reaction time is 1-6 h
„ Contact angle of between water and composite
film in conditions dark place and 30 minute UV
irradiation
 Experimental

„ Sol – Gel Method for coating agent synthesis

„ Spin Coating Process for coated glass substrate
„ Spin speed = 1700 rpm for 30 sec.

„ Glass substrate 10x10x0.3 cm

„ Photocatalytic reaction time 1-6 h , λ = 664 nm

„ Contact angle measurement, CAM-PLUS Tantec
Synthesis of TiO2/SiO2 using sol-gel method

TTIP TEOS C2H5OH

Mix solution

TiO2 sol

Spin coating Dried and calcined

on Soda lime glass

Thin film Photocatalytic powder XRD,SEM

reaction test ,AFM
 Spin Process

Spin speed 1700 rpm for 30 sec

Dried and calcined Substrate

TiO2/SiO2 film
 Photocatalytic Reaction Test

-black light 50 W in dark chamber

- Irradiation time 1-6 h
-Methylene blue = 1x10-5 M

Soda lime glass

Results and Discussion
Morphology of film
Pure TiO2 film
Particle size :
R = 3.766 nm
TiO2>5%SiO2/TiO2

5%SiO2/TiO2 film Surface roughness (R):

R = 0.7279 nm

Pure TiO2 > 5%SiO2/TiO2

Effect of SiO2 content

XRD patterns
Crystallite size of TiO2/SiO2 samples at 500ºC

Content of SiO2 (mol %) Crystallite size (nm)

0(pure TiO2) 23.64 Amount of SiO2

5 13.47
Crystallite size
10 8.27

15 9.18

20 9.19

SiO2 prevents the formation of anatase crystalline and grain growth

 Contact angle of composite thin film
UV light irradiation and in dark place (500oC)
Effect content of SiO2 contact angle of composite
thin film after irradiation UV light (500oC)

uncoated pure TiO2 5%SiO2/TiO2

10%SiO2/TiO2 15%SiO2/TiO2 20%SiO2/TiO2

50
45
40
Contact angle (degree)

35
30
25
20
15
10
5
0
0 5 10 15 20 25 30
Time after irradiation (min)
 Photocatalytic Decolour of MB
20%SiO2 pureTiO2
PureTiO2
UV 6 h

5%SiO2/TiO2

Degradation of MB
Pure TiO2 5%SiO2/TiO2 10%SiO2/TiO2 15%SiO2/TiO2 20%SiO2/TiO2

Pure TiO2 = 41.5%

80
70 5%SiO2/TiO2
Degradation of MB (%)
60
50
40

5%SiO2/TiO2 =73.3% 30

20
PureTiO2

10
0
0 1 2 3 4 5 6 7
Irradiation time (h)
 Conclusion

¾ SiO2/TiO2 show photocatalytic activity higher

than pure TiO2 by adding 5mol% SiO2 to the
film ,percent of degradation of MB

¾PureTiO2 films = 42 %
¾5mol% SiO2 films = 73%
 Conclusion (Cont.)

„ Hydrophilic of films
Content SiO2 20 hydrophobic
15 hydrophilic
10 hydrophobic
5

hydrophilic
0
 Acknowledgements
The financial support for this research by

„ Department of Mining and Materials

Engineering ,Prince of Songkla University

„ NANOTEC Center of Excellence at Prince of

Songkla University

„ Thailand and partially financial from National

Research Council of Thailand (NRCT)