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INTRODUCTION
To date, the mechanisms of ML in
elemental and III-V semiconductors have
not been studied in detail. For the ML
excitation in elemental and III-V
semiconductors, the following models may
be proposed: (i) charging of newly created
surfaces, (ii) thermal generation of charge
carriers. (iii) recombination of fracturegenerated defects, and (iv) formation of
crack-induced localized states.
Theory
(1)
(2)
(3)
375
Sameer Thaker, J. Pure Appl. & Ind. Phys. Vol.2 (3A), 374-376 (2012)
1 exp
(4)
exp
1
exp
exp
1 exp
exp
(5)
(6)
1
exp
(7)
where
= a constant, = proportionality
constant, = volume of crystals
= an exponent, = an exponent, =a
constant,
=an exponent
= an exponent,
= an exponent, =
initial velocity of piston
= thickness of the sample,
= rate-constant for the relaxation of
moving piston
= time constant for the relaxation of
moving piston
and, rate constant for the decrease of
average surface area produced by the
movement of single crack
If ! , ! and ! are the rate
constants for the recombination of the
electrons then we can written as
!
(8)
!
(9)
!
(10)
exp !
(11)
exp !
(12)
exp !
(13)
exp
exp
(14)
exp
exp
(15)
and,
where
,
and
are the changes in
the number of electrons in the conduction
(16)
For
! ( , ! ( and ! (
Eqs. (14), (15) and (16) can be expressed as
)
Journal of Pure Applied and Industrial Physics Vol.2, Issue 3A, 1 July, 2012, Pages (286-402)
(17)
Sameer Thaker, J. Pure Appl. & Ind. Phys. Vol.2 (3A), 374-376 (2012)
)
)
(18)
)
(21)
(19)
)
(22)
(20)
(24)
(25)
(26)
where is given by
376
! "#
(27)
Journal of Pure Applied and Industrial Physics Vol.2, Issue 3A, 1 July, 2012, Pages (286-402)