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Departament de Qumica Fsica and Institut de Nanocincia i Nanotecnologia (IN2UB), Universitat de Barcelona, 08028 Barcelona, Spain
Dipartimento di Chimica, Materiali e Ingegneria Chimica Giulio Natta, Politecnico di Milano, 20131 Milano, Italy
a r t i c l e
i n f o
Article history:
Received 1 March 2011
Received in revised form 15 April 2011
Accepted 19 April 2011
Available online 28 April 2011
Keywords:
Electrodeposition
Cobalt
Samarium
Deep Eutectic Solvent
a b s t r a c t
The suitability of 1 choline chloride:2 urea mixture, Deep Eutectic Solvent (DES) for the electrodeposition
of cobalt, samarium and cobaltsamarium system has been studied. Its electrochemical window permits
deposition analysis to be carried out without interference from parallel reactions. Deposition was studied
at 70 C in order to stimulate mass transfer and to lower solution viscosity.
Cobalt deposits according to a nucleation and three dimensional growth mechanism, all its characteristic features do appear for all cases studied. Samarium deposition takes place through a more complex
process in which a rst potential range is found where the species formed limit the conductive character
of the substrate. When potential becomes more negative, normal behaviour is observed. When both
cobalt and samarium are present in the solution, codeposition occurs, at no potential value, any current
diminution of the current was recorded under stirred conditions. Deposits of SmCo show different morphology and composition depending on applied potential. Nodular cobalt-rich deposits are obtained at
low deposition potentials whereas ne grained samarium-rich ones are obtained at more negative deposition potentials.
2011 Elsevier B.V. All rights reserved.
1. Introduction
Electrodeposition of some metals has been restricted in aqueous
solutions at moderate temperatures to those presenting a standard
potential less negative than that of water reduction. Some of these
metals could be deposited, albeit expensively, using either organic
solvents or more drastic conditions such as molten salts [15].
In the last decade research in ionic liquids (ionic materials with
melting point below 100 C), with a wide electrochemical window,
has made it possible to deposit metals with very negative standard
potentials and their alloys [614]. Metallic coatings that up to then
had been impossible to deposit became obtainable. Different generations of ionic liquids have been developed widening the spectrum of depositable metals [1519]. However, many of them do
require a complex synthesis and a very accurate electrochemical
work, since the majority of the ionic liquids present high sensibility
to water or degradation by oxygen.
It has been shown recently that it is possible to create an ionic
uid mixing quaternary ammonium halides with an amide, carboxylic acid or alcohol moiety [2023]. Such mixtures are not,
strictly speaking, room-temperature ionic liquids (RTIL) since in
general contain an uncharged molecular component, so that, the
term Deep Eutectic Solvent (DES) was coined by Abbott [24].
Unlike the ionic liquids these room-temperature eutectic mixtures
Corresponding author.
E-mail address: e.gomez@ub.edu (E. Gmez).
1572-6657/$ - see front matter 2011 Elsevier B.V. All rights reserved.
doi:10.1016/j.jelechem.2011.04.015
are easy to prepare in pure state. They are not water reactive and
their biodegradability is proven. Moreover, the economic investment involved is much lower than that incurred using roomtemperature ionic liquids. However, little information is available
about their physicchemical properties [25].
The microelectronic industry employs many kinds of coatings in
specic parts of the devices, magnetic materials being the most popular ones. Important advances has been achieved in the preparation
of soft magnetic materials but the electrodeposition of hard magnetic ones is still restricted to a few ones [2628]. The challenge
in preparing such alloys by electrodeposition is that these alloys
contain metals that have electrocatalytic character to hydrogen
evolution, very negative standard potential, or both. Then, the use
of water-free solvents with a wide electrochemical window is welcome in this eld and its possibilities are worthy of study.
In this work we select to study the cobaltsamarium electrodeposition processing possibilities in DES medium, as this alloy is
potentially a hard magnetic material depending on the metal ratio
[2931]. Few studies of SmCo electrodeposition have been performed in aqueous medium [32] since samarium has a very
negative standard potential leading to simultaneous hydrogen evolution. A study about the preparation of SmCo by electrodeposition
in urea-acetamide-NaBr-MClx melts has been performed by Liu et
al. [33]. Our interest is to analyse the possible electrodeposition of
cobalt, samarium and cobaltsamarium systems using the eutectic
1 choline chloride:2 urea mixture as solvent due to its easy preparation, good working conditions and non aggressive nature.
19
capillary containing the DES solvent. Stable and reproducible values of the potential were obtained with this reference electrode.
Voltammetric experiments were carried out at 50 mV s 1, scanning at rst to negative potentials. Only one cycle was run in each
voltammetric experiment. Before and during experiments solutions were de-aerated with argon. Work temperature was kept
constant at 70 C to favour low viscosity and high conductivity of
the solvent. Magnetic stirrer was used when the agitation effect
was tested.
Deposits morphology were observed using Hitachi S-2300 scanning electron microscope. Elemental composition was determined
with an X-ray analyser incorporated in Leica Stereoscan S-360
equipment and by X-ray uorescence (XRF).
3. Results
Fig. 1. Cyclic voltammograms in DES solvent at: (a) black: immediately after
desoxigenation, (b) dashed: after two hours of rst scan, and (c) grey: after 50 h of
rst scan.
2. Experimental
Solvent was prepared using choline chloride (from Across
Organics) and urea (from Merck) of analytical grade. The solids,
in the molar proportion 1 choline chloride:2 urea, were warmed
and removed constantly to achieve the liquid state of the deep eutectic solvent (DES). Samarium nitrate from Aldrich, and cobalt
chloride from Fluka both of analytical grade were used as source
of electroactive species. Prior to dissolution, cobalt salt was maintained in a stove at 110 C in order to assure maximum dehydration. Solutions were prepared using the DES solvent.
A cylindrical three electrode cell of one single compartment was
used. Electrochemical experiments were carried out using an Autolab with PGSTAT30 equipment and GPES software. Working electrodes were vitreous carbon rods (from Metrohm). Vitreous
carbon electrode was polished to a mirror nish using alumina of
different grades (3.75 lm and 1.87 lm), cleaned ultrasonically
for 2 min in water and dried with air prior to be immersed in the
solution. The counter electrode was a platinum spiral. The reference electrode was an Ag|AgCl/NaCl 3 M mounted in a Luggin
Cyclic voltammetry was selected to perform the initial electrochemical study of the deposition processes. Firstly, the electrochemical response of the blank solution (DES solvent) was
recorded to establish its electrochemical window (Fig. 1) and to ensure reference electrode reproducibility in the DES medium. Fig. 1
shows the coincidence between voltammetric scans performed
immediate after electrode immersion and those made hours after.
A wide electrochemical window in vitreous carbon electrode was
observed between the reductionoxidation processes of the
solvent.
3.1. Cobalt deposition
A basic study of cobalt deposition was made using the habitual
electrochemical techniques.
Cyclic voltammetric scans were recorded at different negative
limits. By reversing the scan at very low negative overpotential,
nucleation loop was observed (Fig. 2A, curve a). For more negative
potential limits, a well dened reduction peak appeared previous
to a massive reduction current (Fig. 2A, curve b). For all the cathodic limits used, a single oxidation peak was recorded during the
positive scan.
Holding the scan in the potential range of the rst reduction
peak, an increase in the oxidation charge was recorded increasing
the hold time (Fig. 2B, curve b), as corresponds to deposition process. When the hold was made in the potential range of the
massive reduction during the same time, the oxidation charge increase recorded was less important and a widening of the peak
to positive potentials was observed (Fig. 2B, curve c).
Fig. 2. Cyclic voltammograms from CoCl2 0.113 M solution (A) at different cathodic limits, and (B) with potential holds of: (a) t = 0 s, (b) t = 30 s at
1.5 V.
20
Fig. 3. (A) jt transients at 1.2 V from different [Co(II)] solutions: (a) 0.019 M, (b) 0.036 M and (c) 0.113 M, (B) Et transients (a) [Co(II)] = 0.113 M at
the [Co(II)] = 0.036 M solution curves: (b) j = 8 mA cm 2, (c) j = 16 mA cm 2 and (d) j = 32 mA cm 2.
This general behaviour was similar using solutions with different Co(II) concentration, the only difference observed being the advance in the appearance of the reduction current and the increase
of the current recorded as the Co(II) concentration was increased.
For all the solutions tested, the potentiostatic experiments were
made stepping the potential from a potential value at which no
current was detected to different potentials values. All the jt transients recorded evolved to a maximum from which the current
8 mA cm
, and from
prole decays to attain a quasi stationary value. For a xed concentration, the maximum appeared a short deposition times as the potential applied was made more negative. By comparing the jt
curves obtained at xed potential from different cobalt (II) concentrations, a displacement of the maximum to low deposition times
and an increase in the recorded current was observed increasing
the concentration (Fig. 3A). Stirring the solutions, the current decay
after the maximum was reduced.
Fig. 4. (A) Cyclic voltammograms from different Sm(III) solutions: (a) 0.005 M, (b) 0.025 M and (c) 0.045 M, (quiescent conditions). Voltammetric potential holds under
stirred conditions from the [Sm(III)] = 0.025 M solution at: (B) 1.52 V during 60 s and (C) 1.78 and 2.34 V during 60 s.
21
Fig. 5. (A) jt transients from the [Sm(III)] = 0.025 M solution at different potentials: (a) 1.3 V, (b) 1.4 V, (c) 1.5 V and (d) 1.6 V, the rst part of the curves recorded
under quiescent conditions and from symbol, under stirring. (B) Et transients from 0.045 M Sm(III) at j = 1.6 mA cm 2 using: (a) a polished substrate at stationary
conditions, (b) a polished substrate under agitation and (c) the substrate after experiment b, at stationary conditions. (C) Et transients from [Sm(III)] = 0.045 M (a)
j = 3.2 mA cm 2 under stirring, (b) j = 6.4 mA cm 2 under stirring, (c) j = 6.4 mA cm 2 quiescent solution, (d) j = 9.5 mA cm 2 under stirring, (e) j = 9.5 mA cm 2
quiescent solution, and (f) solvent response at j = 3.2 mA cm 2.
22
Fig. 6. SEM images of Samarium deposits obtained during a voltammetric hold potential at 1.45 V under stirred conditions from the solution 0.045 M of Sm(III) after: (A)
15 min, (B) 25 min and (C) 80 min, and (D) SEM image of a deposit obtained at 1.9 V during 30 min under stirred conditions in a potentiostatic experiment.
23
Fig. 7. (A) Comparison of cyclic voltammograms obtained from 0.045 M Sm(III) solution containing: (a) [Co(II)] = 0.018 M and (b) [Co(II)] = 0 M. Inset of the gure shows the
voltammogram recorded reversing the scan at the initio of the deposition and (c) [Co(II)] = 0.018 M. (B) Voltammograms obtained from the 0.045 M Sm(III) + 0.018 M Co(II)
solution under: (a) quiescent and (b) stirred conditions.
Deposits prepared at different potentials under stirred conditions were imaged and their samarium percentage was evaluated.
Fig. 8B shows a detail of the morphology of SmCo deposit obtained
in a potential near to the minimal necessary to induce codeposition. This deposit of 27 wt.% of Sm shows nodular morphology with
rounded grains. Low deposition rate was obtained in this case, after
one hour of deposition no complete coverage was allowed. When
the potential was made more negative, ne grained deposits with
Fig. 8. (A) jt transients from 0.045 M Sm(III) + 0.018 M Co(II) solution under quiescent conditions at: (a) 1.8 V, (b) 1.9 V, and under stirred conditions at (c) 1.8 V and (d)
1.9 V and SEM pictures of deposits obtained over vitreous carbon at: (B) E = 1.3 V during 3600 s, (C) E = 1.6 V during 900 s and (D) E = 1.6 V during 2500 s.
24
4. Conclusions
This study demonstrates the DES capability to permit the electrodeposition, in non aggressive conditions, of alloys containing
some transition metal. Cobalt deposition analysis in this DES solvent reveals that cobalt deposits through a typical nucleation and
three dimensional process. All the features related to this process
are observed: loop in voltammetric experiments, maximum in
potentiostatic experiments and the typical spike in the galvanostatic ones. This result conrms also that the nucleation-growth
models developed to describe the metal deposition processes could
be applied in this kind of solvents.
However, samarium deposition in DES solvent shows a less
standard behaviour, two clear reduction regions with diverse electrochemical behaviour being detected. At low overpotentials, a
clearly less conductive coverage than the vitreous carbon used as
substrate is formed during the reduction process. When the reduction progresses the recorded current diminishes, even under stirring conditions. Overcoming this potential range, samarium
deposition takes place as expected because the process is now
not inhibited and solution stirring leads to an increase of the current density. Then, during samarium deposition in this DES solvent,
intermediate samarium species formation can occur that lowers
the conductive character of the electrode. However, the morphology and the composition of the lms prepared at low deposition
potentials do not give any insight into such intermediate Sm species nature, since they do not entirely impede samarium deposit
formation. Work is in progress in order to elucidate the nature of
this lm.
When both cobalt and samarium salts are present in the 1 choline chloride:2 urea eutectic mixture, SmCo deposits can be formed
because the potential deposition range of the alloy is included in
the electrochemical window of the solvent.
From the Sm(III):Co(II) ratio used (around 4:1), SmCo deposits
with Sm percentages that exceed 70 wt.% of samarium are obtained, when metallic substrate is used or a sufciently negative
potential is applied over vitreous carbon. This percentage is higher
than that the corresponding to SmCo5 or Sm2Co17 magnetic alloys.
To decrease the samarium percentage in the deposits, experiments
at less negative potential were made, but then the time necessary
for a deposit to form was so inordinately long as to make the process economically unviable. Moreover, at these low potentials, on
metallic substrate, the deposits obtained contain high samarium
percentage. Having demonstrated the possibility of obtaining
CoSm deposits using a DES solvent, ulterior work will be carried
out to electrodeposit SmCo lms of lower Sm percentages which
could be useful as hard magnetic material.
Although the agitation effect is lesser than the observed in parallel studies at similar Co(II) concentrations in aqueous solutions,
the observed behaviour make in evidence that the transport in this
kind of systems is another parameter to consider.
Acknowledgements
This paper was supported by contract CTQ2010-20726 (subprogram BQU) from the Comisin Interministerial de Ciencia y
Tecnologa (CICYT). The authors wish to thank the Serveis Cienticotcnics (Universitat de Barcelona) for the use of their
equipment.
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