Momentum Training Manual

Agilent EEsof EDA
Presentation on ADS Momentum
This document is owned by Agilent Technologies, but is no longer kept current and may contain obsolete or
inaccurate references. We regret any inconvenience this may cause. For the latest information on Agilents
line of EEsof electronic design automation (EDA) products and services, please go to:
www.agilent.com/nd/eesof
ADS Momentum
A Half-Day Seminar
Keefe Bohannan
Agilent EEsof Applications Engineer
April 2003
Agenda for Half-day Momentum Seminar

30 minutes
Brief overview of Getting Started with Momentum

Creating/importing artwork in ADS Layout
Momentum versus Momentum RF
Creating substrate stack-ups and mapping layout layers as metallization layers
Placing and defining ports
Defining mesh parameters
30 minutes
Overview of Viewing and Using Momentum Results

Momentum Datasets
Momentum Visualization: currents, fields, s-parameters, gamma, Z0
ADS Data Display: s-, y-, and z-parameters, reactance (L/C), Q, etc.
60 minutes
Advanced Topics [Part 1]

Momentum Co-simulation (EM/circuit co-simulation) using Layout Components
Momentum Co-optimization (EM/circuit co-optimization) using Layout Components
Thick conductor simulations {LAB}
Spiral Inductor simulations {LAB}
15 minutes
Break
105 minutes

Advanced Model Composer (AMC)
Advanced Model Composer (AMC) {LAB}
15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_01_01
Page 2
What is meant by Planar EM simulation ?

Substrate - multiple dielectrics
Metals - traces on different layers forming component and/or thin film
interconnect
Vias - connecting different layers
Method of Moments technique
Sometimes referred to as 2.5D
It does NOT include:
Arbitrary 3D structures
Horn Antennas
Momentum Seminar
momentum_01_01
Page 3
Why are Planar EM Simulators used ?

No simple analytical model exists
Coupling between conductors or layers is significant
Arbitrary planar geometry
Narrow frequency response not captured by analytical models
Radiation patterns of planar antennas
CPW transmission lines
When full 3D analysis would take too long
Momentum Seminar
momentum_01_01
Page 4
How are Planar EM Simulators used ?

Layout driven
Created entirely within layout,
Schematic-to-Layout translation, OR
Import (DXF, GDSII, etc.)
Momentum interface within ADS Layout
Mode > Substrate/Metallization > Port > Mesh >
Simulation > Component > Optimization
Outputs
S-parameters
Current visualization
Momentum Seminar
momentum_01_01
Page 5
Creating/importing artwork in Layout
Created entirely within layout

Schematic-to-Layout translation
Momentum Seminar
momentum_01_01
Page 6

Everything is placed on a layer

There are 39 default layers
User may add new layers, remove existing layers, or
modify layer names and properties
User may define name, color, pattern, shape display
(outlined/filled), and line style associated with layers
Layers may be set to be visible/invisible,
selectable/unselectable, and insertable/uninsertable
Items on unselected layers may not be selected /
edited / moved / deleted
Only one layer is insertable at a time
Objects can only be created, copied, or moved
TO the insertable (they can be copied or
moved FROM any selectable layer)
Momentum Seminar
momentum_01_01
Page 7

Preferences which apply to things not yet placed:

Trace, Placement, Entry/Edit, Units/Scale,
Component Text, Text
Preferences which apply to things already placed:
Select, Grid/Snap, Pin/Tee, Display, Layout
units
Momentum Seminar
Preferences for schematic and layout window are set

separately
Preferences Setting are saved to file in project
layout.prf and schematic.prf
Preferences files from other projects may be read in
Options > Preferences Read... button
momentum_01_01
Page 8

Momentum Seminar
momentum_01_01
Page 9

Momentum Seminar
momentum_01_01
Page 10

Momentum Seminar
momentum_01_01
Page 11

Momentum Seminar
momentum_01_01
Page 12

Simplify hierarchical designs by

using Generating Artwork
(flattens hierarchy, but retains
multi-layer layout)
Momentum Seminar
momentum_01_01
Page 13
How are Planar EM Simulators used ?

Layout driven
Created entirely within layout,
Schematic-to-Layout translation, OR
Momentum interface within ADS Layout
Mode > Substrate/Metallization > Port > Mesh >
Simulation > Component > Optimization
Outputs
S-parameters
Current visualization
Momentum Seminar
momentum_01_01
Page 14
For more information about

Agilent EEsof EDA, visit:
Agilent Email Updates

www.agilent.com/nd/emailupdates
Get the latest information on the

products and applications you select.
www.agilent.com
For more information on Agilent Technologies
products, applications or services, please
contact your local Agilent office. The
complete list is available at:
www.agilent.com/nd/contactus
Agilent Direct
www.agilent.com/nd/agilentdirect
Quickly choose and use your test

equipment solutions with condence.
Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008
Europe & Middle East

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201
Other European Countries:
Revised: March 27, 2008
Product specications and descriptions

in this document subject to change
without notice.
Agilent Technologies, Inc. 2008
Printed in USA, May 19, 2003
5989-9596EN
Agilent EEsof EDA

Detailed Presentation on Momentum - Part 1 of 3
Using Momentum
Solution process
Select Mode
Substrate definition
Port Setup
Mesh Generation
Planar Solve
Enable regular Momentum or Momentum RF
Display Results
Define Substrate and Metallization (pre-compute option)

Modify the type and impedance of ports
Describe a possible Substrate enclosure
Create/modify Momentum Component to be used in EM/circuit co-simulation
or co-optimization
Define Mesh parameters (pre-compute option)
Setup and Perform a Momentum simulation (planar solve)
Setup and Perform a Momentum optimization (geometric perturbation based)
Display Visualization (S-parameters, current density, transmission line
parameters) and Radiation patterns
Export 3D files for HFSS
Momentum Seminar
momentum_01_02
Page 1
Using Momentum: Selecting the Analysis Mode

Click this submenu to toggle the analysis mode
Solution process
Select Mode
Momentum MomentumRF
MomentumRF Momentum
Port Setup
Mesh Generation
Planar Solve
Display Results
Momentum Seminar
momentum_01_02
Page 2
Momentum versus MomentumRF: A Snapshot

Momentum features:
Momentum RF features:
Full-Wave EM Simulation
Quasi-Static EM Simulation
Rooftop Basis Function
Star/Loop Basis Functions
Rectangular and Triangular Cells
Polygonal cells
For most passive geometry
Best for geometrically complex designs
Full accuracy for all circuit sizes
For electrically small designs ( /2)
No inherent upper frequency limit
Upper frequency depends on size
Potential instability at f <kHz to MHz
Results stable down to DC
Port Calibration
Port Calibration
Box and Waveguide inclusion
No Box / Waveguide Modes
Includes all radiation modes
For designs that dont radiate
Display 2D and 3D Radiation Patterns
No Radiation Patterns
Great for 1st pass results, even for large designs (> /2)
Simulation time and memory decrease by ~10X-25X
Momentum Seminar
momentum_01_02
Page 3
Momentum versus MomentumRF

Electrically Small condition for Momentum RF
How do I know?
Status window provides rule of thumb frequency
for which the structure is electrically small
D /2
Momentum Seminar
momentum_01_02
Page 4

Planar EM Simulation Basics
Physical Design
Substrate
Metallization
Ports
Method of Moments
Meshing
Rooftop functions
B2(r)
B1(r)
I1
I2
B3(r)
I3
/10
Heywhere did
this equation
come from?
Momentum Seminar
J(r) = I1B1(r) + I2B2(r) + I3B3(r)
momentum_01_02
Page 5
Maxwells Equations
E = -B/t
H = J + D/t
D =
B = 0
Faradays Law
Amperes Law
Gausss Law
No Name (Gausss Law for Magnetism)
where
E = Electric Field Intensity Vector

H = Magnetic Field Intensity Vector
D = Electric Flux Density (Electric Displacement Vector)
B = Magnetic Flux Density Vector
James C. Maxwell
If one then transforms these equations to the integral form, the mixed potential integral equation in very general
form as a linear integral operator equation follows:
Here, J(r) represents the unknown surface currents and E(r) the known excitation of the problem. The Green's dyadic of the
layered medium acts as the integral kernel. The unknown surface currents are discretized by meshing the planar
metallization patterns and applying an expansion in a finite number of subsectional basis functions B1(r), ..., BN(r):
Ohhhhsorry I
asked.
Momentum Seminar
momentum_01_02
Page 6

Planar EM Simulation Basics
Method of Moments
B1(r)
I1
Maxwells Equations
[Z].[I]=[V]
I1
Equivalent Circuit
[Z] = [R] + j[L] + 1/j
Momentum Seminar
I2
/10
Matrix Equation
[C]-1
L11
C11
B3(r)
B2(r)
L12
L13
I2
R22 L22
I3
L23
I3
L33
C22
C12
momentum_01_02
Page 7

Fullwave versus Quasi-Static: Fullwave
1 e jkR
R
Fullwave EM
Maxwells Equations
Fullwave electric & magnetic Greens functions
Matrix Equation
Includes space and surface radiation
[Z].[I]=[V]
[L(w)] & [C(w)] are complex and frequency dependent

[Z(w)] matrix reload CPU intensive
Equivalent Circuit
[Z] = [R] + j[L()] + 1/j [C()]-1

[S]
Momentum Seminar
momentum_01_02
Page 8

Fullwave versus Quasi-Static: Quasi-Static
Quasi-Static EM
1 e jkR
R
R1 (1 jkR + ...)
Maxwells Equations
Electro- and magneto-static Greens functions
Matrix Equation
[Zo].[I]=[V]
Near field / low freq approximation

L(w) = L0 + L1wR + L2(wR)2 +
C(w) = C0 + C1wR + C2(wR)2 +
Equivalent Circuit
[Zo] = [R] + j[Lo] + 1/j [Co]-1

[S]
Momentum Seminar
Neglects far field radiation

[L0] & [C0] are real and frequency independent
[Z0] matrix reload very fast
momentum_01_02
Page 9

A Summary of Effects Included
Layout
DC
Spice
Spice model
Momentum RF Momentum MW
S parameters
S parameters
RF
MW
quasi-static inductance . . . . . .
quasi-static capacitance . . . . .
DC conductor loss (s) . . . . . . . .
DC substrate loss (s) . . . . . . . .
dielectric loss (tan d) . . . . . . . . . . . . . . . . . . . . . . . . . . .
skin effect loss . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
substrate wave radiation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
space wave radiation . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . .
Momentum Seminar
momentum_01_02
Page 10
Using Momentum: Creating Substrate Stack-ups and

Mapping Layout Layers as Metallization Layers
Solution process
Select Mode
Port Setup
Mesh Generation
Planar Solve
Display Results
Momentum Seminar
momentum_01_02
Page 11

Once you have created or imported your artwork

Momentum Seminar
momentum_01_02
Page 12

be sure to define (or open) your substrate stack-up and map the metallization layers
Momentum Seminar
momentum_01_02
Page 13

Greens Function Substrate Calculation Time
Students Guide A-36
Momentum Seminar
momentum_01_02
Page 14

A note on layout layer conductivity
Conductivity defined as:
Perfect Conductor (lossless)
(Real, Imaginary)
(Real, thickness)
Impedance (Real, Imaginary)
The parameters selected are applied

toward a conductor loss algorithm, this
does NOT affect the layout thickness
Momentum Seminar
momentum_01_02
Page 15
Using Momentum: Creating Substrate Stack-ups and Mapping

Layout Layers as Metallization Layers: Loss Model used in Strip Conductors
Momentum treats all conductors as having zero thickness. However, the conductivity and thickness can be specified to approximate
frequency dependent losses in the metallization patterns.
Momentum uses a complex surface impedance for all metals that is a function of conductor thickness, conductivity, and frequency.
At low frequencies, current flow will be approximately uniformly distributed across the thickness of the metal. Momentum uses
this minimum resistance and an appropriate internal inductance to form the complex surface impedance.
At high frequencies, the current flow is dominantly on the outside of the conductor and Momentum uses a complex surface
impedance that closely approximates this skin effect.
At intermediate frequencies, where metal thickness is between approximately two and ten skin depths, the surface impedance
transitions between those two limiting behaviors.
This surface impedanceis added to the Method of Moments approach that is used forMomentum in general.
The formula used is a combination of a high-frequency conductivity and a low-frequency bulk resistivity. The formula is such that both
approaches (LF bulk behavior HF surface impedance) transition seamlessly.
The formula is:
Z = coth() * Zc
where Zc = the HF impedance and coth() is the correction for finite thickness
Zc = 0.5 * sqrt(j * 0 * /( + j * 0 * ))
= 0.5 * thickness * sqrt(j * 0 * * ( + j * 0 * ))
where = 2 * * f
and = conductivity = 1/resistivity [in Siemens/meter]
We will examine a
thick conductor
method later in this
seminar
The meshing density can affect the simulated behavior of a structure. A more dense mesh allows current flow to be better represented
and can slightly increase the loss. This is because a more uniform distribution of current for a low density mesh corresponds to a lower
resistance
Momentum Seminar
momentum_01_02
Page 16
Using Momentum
Solution process
Select Mode
Port Setup
Mesh Generation
Planar Solve
Display Results
Momentum Seminar
momentum_01_02
Page 17
Placing and Defining Ports

Considerations
Keep the following points in mind when adding ports to circuits to be simulated using Momentum:
The components or shapes that ports are connected to must be on layout layers that are mapped to
metallization layers that are defined as strips or slots. Ports cannot be directly connected to vias.
Make sure that ports on edges are positioned so that the arrow is outside of the object, pointing
inwards, and at a straight angle.
Make sure that the port and the object you are connecting it to are on the same layout layer. For
convenience, you can set the entry layer to this layer; the Entry Layer listbox is on the Layout tool
bar.
A port must be applied to an object. If a port is applied in open space so that is not connected to an
object, Momentum will automatically snap the port to the edge of the closest object. This will not be
apparent from the layout, however, because the position of the port will not change.
If the Layout resolution is changed after adding ports that are snapped to edges, you must delete
the ports and add them again. The resolution change makes it unclear to which edges the ports are
snapped, causing errors in mesh calculations.
Note Do not use the ground port component (Component > Ground) in circuits that will be
simulated using Momentum. Either add ground planes to the substrate or use the ground reference
ports.
(Ground port component toolbar button:
Momentum Seminar
momentum_01_02
Page 18

Description of Momentum Port Types
Placement
Type of layer
Edge
Strip or
Slot
Edge or
Surface
Strip
Two ports with opposite polarity
Edge
Strip
Coplanar
Two ports with opposite polarity
Edge
Slots
Common Mode
Two ports with the same polarity
Edge
Strip
Ground Ref.
An explicit ground reference for a

Single or Internal port.
Edge or
Surface
Strip
Port Type
General Description
Single
(default)
Calibrated to remove mismatch at port

boundary (might also call this a
transmission line port)
Internal
Not calibrated (might also call this a

direct excitation port)
Differential
CPW NOTE: For finite ground planes, use Ground Reference ports and Internal port on center conductor.
Momentum Seminar
momentum_01_02
Page 19

Single Port Properties
It is connected to an object that is on either a strip or slot metallization layer.
It can be applied only to the edge of an object.
The port is external and calibrated. The port is excited using a calibration process that
removes any undesired reactive effects of the port excitations (mode mismatch) at the port
boundary. This is performed by extending the port boundary with a half-wavelength
calibration (transmission) line. The frequency wavelength selected during the mesh or
simulation process is used to calculate the length of the calibration line. For more information
about the calibration process, refer to "Calibration and De-embedding of the S-parameters"
on page A-7 in the Momentum manual.
The port boundary can be moved into or away from the geometry by specifying a reference
offset. S-parameters will be calculated as if the port were at this position.
When two or more single ports are on the same reference plane, coupling effects caused by
parasitics affects the S-parameters. The calibration process groups the ports so that any
coupling in the calibration arms is included in the S-parameter solution.
If the port is connected to an object on a strip layer, the substrate definition must include at
least one infinite metal layer: a top cover, ground plane, or a slot layer, or a ground
reference must be used in addition to the port.
If the port is connected to an object that is on a slot layer, the port has polarity.
Tip It is not necessary to open the Port Editor dialog box to assign this port type. Any port
without a port type specified is assumed to be a single port.
Momentum Seminar
momentum_01_02
Page 20

Defining a Single Port
Choose Momentum > Port Editor.
Select the port that you want to assign this type to.
In the Port Editor dialog box, under Port Type, select Single.
Enter the components of the port impedance in the Real and Imaginary fields,
and specify the units.
You can shift the port boundary, also referred to as the port reference plane.
Shifting the boundary enables a type of de-embedding process that effectively
adds or subtracts electrical length from the circuit, based on the characteristic
impedance and propagation characteristic of the port. Enter the offset in the
Reference Offset field, and select the units. A positive value moves the port
boundary into the circuit, a negative value moves the port boundary away from
the circuit.
Click Apply to add the definition to the port.
Momentum Seminar
momentum_01_02
Page 21

Single Port: Avoiding Overlap (of calibration arm)
Be aware that when using single ports, the calibration arm applied to a port may be
long enough to overlap another element in the circuit. In this case, the port will be
changed to an internal port type, and no calibration will be performed on it. If this
occurs, a message will be displayed during simulation in the Status window indicating
the change.
Momentum Seminar
momentum_01_02
Page 22

Single Port: Applying Reference Offsets
Reference offsets enable you to reposition single port types in a layout and thereby adjust electrical lengths in a layout, without
changing the actual drawing. S-parameters are returned as if the ports were placed at the position of the reference offset.
Why Use Reference Offsets?
The need to adjust the position of ports in a layout is analogous to the need to eliminate the effect of probes when measuring
hardware prototypes. When hardware prototypes are measured, probes are connected to the input and output leads of the Device
Under Test (DUT). These probes feed energy to the DUT, and measure the response of the circuit. Unfortunately, the measured
response characterizes the entire setup, that is, the DUT plus the probes. This is an unwanted effect. The final measurements should
reflect the characteristics of the DUT alone. The characteristics of the probes are well known, so measurement labs can
mathematically eliminate the effects of the probes, and present the correct measurements of the DUT.
There are significant resemblances between this hardware measurement process and the way Momentum operates. In the case of
Momentum, the probes are replaced by ports, which, during simulation, will feed energy to the circuit and measure its response. The
Momentum port feeding scheme also has its own, unwanted effect: low-order mode mismatch at the port's boundary, although this is
eliminated by the calibration process. However, in order for this calibration process to work well, it is necessary that the fundamental
mode is characterized accurately. This can only be accomplished when the distance between the port boundary and the first
discontinuity is sufficiently large, that is, there exists a feedline that is long enough to provide this distance.
Momentum Seminar
momentum_01_02
Page 23

Single Port: Allowing for Coupling Effects
If you have two or more single ports that lie on the same reference plane, the calibration process will
take into account the coupling caused by parasitics that naturally occurs between these ports. This
yields simulation results that more accurately reflect the behavior of an actual circuit.
The figure below helps illustrate which ports will be grouped in order for the calibration process to
account for coupling among the ports. In this setup, only the first two ports will be grouped, since the
third port is an internal port type and the fourth port is on a different reference plane. Note that even
though the second port has a reference offset assigned to it, for this process they are considered to be
on the same plane and their reference offsets will be made equal.
If you do not want the ports to be grouped, you must add a small thickness of metal to the edge of the
object that one of the ports is connected to. The ports will no longer be on the same plane, and will not
be considered part of the same group.
Momentum Seminar
momentum_01_02
Page 24

Internal Port Properties
Internal ports enable you to apply a port to the surface of an object in your design. By using internal
ports, all of the physical connections in a circuit can be represented, so your simulation can take into
account all of the EM coupling effects that will occur among ports in the circuit. These coupling effects
caused by parasitics are included in your simulation results because internal ports are not calibrated.
You should avoid geometries that allow coupling between single and internal ports to prevent incorrect Sparameters.
An example of where an internal port is useful is to simulate a bond wire on the surface on an object.
Another example of where an internal port is necessary is a circuit that consists of transmission lines that
connect to a device, such as a transistor or a chip capacitor, but this device is not part of the circuit that
you are simulating. An internal port can be placed at the connection point, so even though the device is
not part of the circuit you are simulating, the coupling effects that occur among the ports and around the
device will be included in your simulation.
Internal ports are often used in conjunction with ground references.
Momentum Seminar
momentum_01_02
Page 25

Internal Port Properties
It can be applied to the interior of a circuit by applying it to the surface of an object.

It can be applied to the edge of an object.
It can be applied to objects that are on strip layers only.
The orientation of the port is not considered if it is on the surface of an object. (For a
description of port orientation, refer to "Adding a Port to a Layout" on page B-5 in
the Momentum manual.)
No calibration is performed on the port. Because no calibration is performed on the
port, the results will not be as accurate as with a single port. However, the
difference in accuracy is small.
Defining an Internal Port

Select the port that you want to assign this type to.
Click Apply.
Momentum Seminar
momentum_01_02
Page 26

Illustration of Internal Port Excitation: Direct Point Feed
direct excitation point feed
Momentum Seminar
momentum_01_02
Page 27

Illustration of Internal Port Excitation: Direct Line/Edge Feed
direct excitation
line feed
Momentum Seminar
momentum_01_02
Page 28

Differential Port Properties
Differential ports should be used in situations where an electric field is likely to build up
between two ports (odd modes propagate). This can occur when:
The two ports are close together
There is no ground plane in the circuit or the ground plane is relatively far away
One port behaves (to a degree) like a ground to the other port, and polarity between the
ports is developed.
The ports are connected to objects that are on strip metallization layers.
The electric field that builds up between the two ports will have an effect on the circuit
that should be taken into account during a simulation. To do this, use differential ports.
Differential ports have the following properties:
They can be applied to objects on strip layers only.
They are assigned in pairs, and each pair is assigned a single port number.
Each of the two ports is excited with the same absolute potential, but with the opposite
polarity. The voltages are opposite (180 degrees out of phase). The currents are equal but
opposite in direction when the ports are on two symmetrical lines, and the current
direction is approximated for other configurations.
The two ports must be on the same reference plane.
Momentum Seminar
momentum_01_02
Page 29

Differential Port Numbering
Note: Port numbers for differential ports are treated in the following manner: on the layout, you will continue
to see the port numbers (instance names) that were assigned to each port when they were added to the
layout. Use the Momentum Port Editor dialog box to identify which pair of ports will be treated as a differential
port.
When Momentum simulates designs containing non-consecutive port numbers, the ports are remapped to
consecutive numbers in the resulting data file. The lowest port number is remapped to 1, and remaining
numbers are remapped in consecutive order. The port numbers are not changed in the design itself. A
message in the Status window announces the change, and lists the mappings.
For example, if you are simulating a design with ports numbered 1 and 3, the following status message
informs you of the changes:
Layout has non-consecutive port numbers.

Output files will have consecutive port numbers.
layout port -> output port
1
-> 1
3
-> 2
Also, when you view results, you will see S-parameters for the differential port numbers. In the example
above, the layout would show p1, p2, p3, p4. The S-parameter results will be for combinations of the original
P1 and P3 only.
Momentum Seminar
momentum_01_02
Page 30

Defining a Differential Port
Select the port that you want to assign this type
to. Note the port number.
In the Port Editor dialog box, under Port Type,
select Differential.
Under Polarity, make sure that Normal is
selected.
Click Apply.
Select the second port.
In the Port Editor dialog box, under Port Type,
select Differential.
Under Polarity, select Reversed.
Under Associate with port number, enter the
number of the previously-selected port.
Click Apply.
Repeat these steps for other differential port pairs
in the circuit.
Click OK to dismiss the dialog box.
Momentum Seminar
momentum_01_02
Page 31

Illustration of Differential Port Excitation: Direct Point Feed
1.i
direct excitationn
line feed
-1.i
line feed
ground reference
Students Guide A-32
Momentum Seminar
momentum_01_02
Page 32

Coplanar Port Properties
This type of port is used specifically for coplanar waveguide (CPW) circuits. It is similar
to a differential port, but coplanar ports are applied to objects on slot layers (that is,
where slots are used in the design). Coplanar ports should be used in situations where
an electric field is likely to build up between two ports. This can occur when:
The two ports are close together
Polarity between the ports develops
The ports are connected to objects that are on slot metallization layers
The electric field that builds up between the two ports will have an effect on the
circuit that should be taken into account during a simulation. To do this, use
coplanar ports.
Coplanar ports have the following properties:
They can be applied to objects on slot layers only.
They are assigned in pairs.
Each of the two ports is excited with the same absolute potential, but with the
opposite polarity. The voltages are opposite (180 degrees out of phase). The
currents are equal but opposite in direction when the ports are on two symmetrical
lines, and the current direction is approximated for other configurations.
The two ports must be on the same reference plane.
Momentum Seminar
momentum_01_02
Page 33

Coplanar Port Polarity
Be careful when assigning polarity to coplanar ports.
An incorrect choice of polarity can change the phase of
transmission type S-parameters by 180 degrees.
To verify polarity, zoom in on a coplanar port. You will
notice two sets of arrows applied to the port. One
appears when you add the port component to the
circuit. The second will appear after the mesh is
computed. It indicates the direction of the voltage over
the slot.
Momentum Seminar
Note: Port numbers for CPW ports

are treated similar to the manner in
which differential ports are treated.
momentum_01_02
Page 34

Defining a Coplanar Port
Note
Momentum Seminar
Coplanar ports can be applied to objects on slot layers only.

Select the port that you want to assign this type to. Note the port
number.
In the Port Editor dialog box, under Port Type, select Coplanar.
Under Polarity, make sure that Normal is selected.
Click Apply.
In the Port Editor dialog box, under Port Type, select Coplanar.
Under Polarity, select Reversed.
Under Associate with port number, enter the number of the
previously-selected port.
Click Apply.
Repeat these steps for other differential port pairs in the circuit.
momentum_01_02
Page 35

Coplanar Port Example: examples/Momentum/Microwave/CPW_bend_prj
Momentum Seminar
momentum_01_02
Page 36

Coplanar Port Example: examples/Momentum/Microwave/CPW_bend_prj
Momentum Seminar
momentum_01_02
Page 37

Coplanar Port Example
Momentum Seminar
Note: Visualization
displays the magnetic
currents (not the
electrical currents) for
slot metallizations.
Therefore, slots are
visualized and not metal.
momentum_01_02
Page 38

Common Mode Port Properties
Note: Can also be utilized for

thick conductor simulations
(more on this later)
Use common mode ports in designs where the polarity of fields is the same among two
or more ports (even modes propagate). The associated ports are excited with the same
absolute potential and are given the same port number.
Common mode ports have the following properties:

They can be applied to objects on strip layers only
A ground plane or other infinite metal (such as a cover) is required as part of the
design
Two or more ports can be associated
Associated ports are excited with the same absolute potential (and same polarity)
The ports must be on the same reference plane
Note Port numbers for common ports are treated in the following
manner: on the layout, you will continue to see the port numbers
(instance names) that were assigned to each port when they were
added to the layout. Use the Momentum Port Editor dialog box to
identify which group of ports will be treated as a common port.
Also, when you view results, you will see S-parameters for the common
port numbers. In the example above, the layout would show p1, p2, p3.
The S-parameter results will be for combinations of P1 only.
Momentum Seminar
momentum_01_02
Page 39

Defining a Common Mode Port

Select the port that you want to assign this type to. Note the port
number.
In the Port Editor dialog box, under Port Type, select Common
Mode.
Click Apply.
In the Port Editor dialog box, under Port Type, select Common
Mode.
Under Associate with port number, enter the number of the port
that you selected first. Make sure that the value in the Associate
with port number field is the same for additional ports. For
example, if you were associating three ports and the first port was
assigned as port 1, for the second and third port, the value
entered into the Associate with port number field would be 1. (For
the first port you choose, no value is entered in this field.)
Click Apply.
Repeat these steps for other common mode ports in the circuit.
Momentum Seminar
momentum_01_02
Page 40

Ground Reference Port
Ground references enable you to add explicit ground references to a circuit, which may
be necessary if implicit grounds are in your design.
Implicit ground is the potential at infinity, and it is made available to the circuit through
the closest infinite metal layer of the substrate. Implicit grounds are used with internal
ports and with single ports that are connected to objects on strip metallization layers.
There are instances where the distance between a port and its implicit ground is too
large electrically, or there are no infinite metal layers defined in the substrate. In these
cases, you need to add explicit ground references to ensure accurate simulation results.
For more information on using ground references, refer to "Simulating with Internal
Ports and Ground References" on page A-10 in the Momentum manual.
You can apply ground references to the surfaces of object. The object must be on strip
metallization layers.
Note: Multiple ground reference ports can be associated with the same port. To be
associated with a single port, the ground reference port should be a port attached to an
edge of an object in the same reference plane as the single port.
Momentum Seminar
momentum_01_02
Page 41

Defining a Ground Reference Port

Select the port that you want to assign as the ground reference.
In the Port Editor dialog box, under Port Type, select Ground Reference.
Under Associate with port number, enter the number of the single or
internal port that you want to associate with this ground reference. Make
sure that the distance between the port and ground reference is electrically
small.
Click Apply.
Momentum Seminar
momentum_01_02
Page 42

CPW with Finite Ground Planes using INTERNAL and GROUND REF ports
Ports 1 and 2 are internal.

Ports 3, 4, 5, and 6 are ground reference . The grounds are
associated with the internal port using the editor.
Momentum Seminar
momentum_01_02
Page 43

Remapping Port Numbers
Some designs contain non-consecutive port numbers. This results in simulation data files that
are difficult to use. When Momentum simulates designs containing non-consecutive port
numbers, the ports are remapped to consecutive numbers in the resulting data file. The
lowest port number is remapped to 1, and remaining numbers are remapped in consecutive
order. The port numbers are not changed in the design itself. A message in the Status
window announces the change, and lists the mappings.
For example, if you are simulating a design with ports numbered 37 and 101, the following
status message informs you of the changes:
Layout has non-consecutive port numbers.

Output files will have consecutive port numbers.
layout port -> output port
37 -> 1
101 -> 2
Port number remapping is done only for sampled and AFS CITIfiles and their corresponding
S-parameter datasets. It is not done for Visualization and far field files. The remapping is
done at the CITIfile level, and propagates to the dataset file. After remapping, all datasets
are in sync with the new port numbering.
Momentum Seminar
momentum_01_02
Page 44



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9597EN
Agilent EEsof EDA

Details of Momentum
Solution process
Select Mode
Port Setup
Mesh Generation
Planar Solve
Display Results
Momentum Seminar
momentum_01_03
Page 1
Defining Mesh Parameters

Mesh Setup Control
Global mesh is the default.
But you have choices.
In general, small
patterns are more
accurate but take
more time to solve.
Momentum Seminar
momentum_01_03
Page 2

Global Mesh example with Edge Mesh
1 - Port
2 - Calibration Line
Here, the cell size is the same for

all parts of the geometry, except for
the edges around each primitive.
3 - Mesh
4 - Edge Mesh
4
3
The calibration line

is automatically
drawn when the
port is defined more on this later.
1
NOTE: You can view the mesh, ports, and reference line
before simulating and make adjustments if desired.
Momentum Seminar
momentum_01_03
Page 3

Primitive Mesh example
You can combine primitive mesh,
layer mesh, and global mesh.
The center primitive of this geometry has a

different mesh (50 cells/wavelength) than the two
outside geometries (20 cells/wavelength).
1
2
Next, lets discuss ports...
Momentum Seminar
momentum_01_03
Page 4
Discretion Error - Longitudinal

Number of cells/wavelength
determines samples used for
approximation of true currents
Typical cells/wavelength is 20
30 or more is fine, but will slow down
the simulation
Minimum required to retain highfrequency accuracy is 10
Can retain accuracy AND speed with
10 cells/wavelength AND edge mesh
Remember, can also have layer-specific
meshes (or even object-specific
meshes) which allows finer meshes
where needed and coarser meshes
where current density is not as high
(such as a finite ground plane)
Momentum Seminar
momentum_01_03
Page 5
Edge Mesh Accuracy
Momentum Seminar
momentum_01_03
Page 6
Mesh: Momentum versus MomentumRF

Momentum RF & Polygon Mesh
Meshing complex geometries with POLYGONAL cells

Eliminates slivery triangles
Eliminates redundant R,L,C elements
Uncompromised accuracy for RF frequencies
Strongly reduced computer memory
Strongly reduced computation time
10
cells
reduction
4
cells
1
cell
reduction
mesh
Momentum Seminar
topology
momentum_01_03
Page 7
Using Momentum
Method of Moments
Maxwells Equations
Solution process
Select Mode
Matrix Equation
[Z].[I]=[V]
Equivalent Circuit
[Z] = [R] + j[L] + 1/j [C]-1
B1(r)
B3(r)
B2(r)
I3
/10
I1
L1
1C
1
1
L12
L1
3I2
L23
R22 L22
I3
L33
C22
C12
Port Setup
Mesh Generation
Planar Solve
Display Results
Momentum Seminar
momentum_01_03
Page 8
The Low-frequency Breakdown Problem

This problem is essentially one of mathematical aspect ratios. When rooftop basis
functions are used, the interaction matrix contains all of the reactances in a single
matrix. As frequency approaches zero, the inductive reactances approach zero while the
capacitive reactances approach infinity. This results in an ill-conditioned matrix.
Any tool that uses rooftop functions as the sub-sectional basis functions will have this
problem.
Momentum (not Momentum RF) experiences this low-frequency limitation. To help
account for this, interpolation is used for three frequencies (in addition to the selected
sweeps): DC, f0, and 2f0. The low-frequency limit (f0, typically in kHz), which is
selected in an empirical way and is a function of cell edge lengths and substrate height,
increases as cell sizes decrease (resulting in shorter edges).
Momentum RF alleviates this problem by breaking the rooftop functions into
star and loop basis functions.
Momentum Seminar
momentum_01_03
Page 9
MomentumRF & Star-Loop Basis Functions

1
2
loop basis function
star basis function
db(S11)
Loop basis functions are solenoidal
Star basis functions are irrotational
- give well-conditioned interaction

matrix at low frequencies
- eliminate LF breakdown of
numerical solution
- give stable, accurate solutions
down to DC (both magnitude and
phase)
Momentum Seminar
db(S21)
Rooftop basis functions
db(S21)
db(S11)
Star-loop basis functions
momentum_01_03
Page 10
Using Momentum
Solution process
Select Mode
Port Setup
Mesh Generation
Planar Solve
Display Results
More on this in the next section

Momentum Seminar
momentum_01_03
Page 11
Momentum Accuracy: A couple of absolutes
Directly simulated frequency points have 60 dB accuracy. (This noise floor was
characterized on through-lines. In other words, the observed numerical noise on
those structures is ~ -60 dB. This does not mean that valid results of < -60 dB
can not be obtained for designs with an isolation or other figure of merit that is <
-60 dB.)
For an AFS sweep, the simulated frequency points have 60 dB accuracy while the
AFS calculated frequency points have ~ 50 to 60 dB accuracy
The rest depends on how accurately you can define your problem.
Here are a few benchmarks
Momentum Seminar
momentum_01_03
Page 12
LTCC Filter Design

Momentum
Momentum RF
Measurements
AIR
[3]
[2]
7.2 mil
3.6 mil
[1]
25.2 mil
LTCC
GND
dB(S21)
7.29
mm
Momentum
(*) Example
Momentum RF
Mesh: 20 cells/wavelength, 3 GHz

Frequencies: 14

Frequencies: 10
Matrix size
Process size
User time
Matrix size
Process size
User time
: 218
: 14.13 MB
: 5 m 14 s
: 56
: 7.59 MB
: 45 s
phase(S21)
from National Semiconductor
Momentum Seminar
momentum_01_03
Page 13
RFIC/MMIC Applications
AIR
Momentum
Momentum RF
Measurements
r=3.9
r=3.9
[3]
[2]
1.55 um
1.7 um
[1]
600 um Silicon =12.5

GND
dB(S11)
0.30
mm
0.80
mm
Momentum
Momentum RF

Frequencies: 7

Frequencies: 7
Matrix size
Process size
User time
Matrix size
Process size
User time
: 274
: 10.29 MB
: 11m 09s
PC-NT Pentium II workstation (330 MHz)
Momentum Seminar
: 35
: 3.33 MB
: 1m 39s
dB(S21)
Rule of thumb: freq < 176 GHz

momentum_01_03
Page 14
RFIC / MMIC Applications

Momentum
Momentum RF
Measurements
AIR
[1]
100 um
GaAs
GND
0.76
mm
1.65
mm
Momentum
Momentum RF

Frequencies: 12

Frequencies: 10
Matrix size
Process size
User time
Matrix size
Process size
User time
: 221
: 6.32 MB
: 2 m 03 s
Momentum Seminar
: 203
: 4.50 MB
: 0 m 26 s
Rule of thumb: freq < 83.3 GHz

momentum_01_03
Page 15
Microwave Lowpass Filter (Stripline)

Momentum
Momentum RF
Measurements
GND
[2]
31 mil
Duroid
[1]
31 mil
Duroid
mag(S11)
GND
6.0 mm
25.4
mm
mag(S21)
Momentum
Momentum RF

Frequencies: 20

Frequencies: 15
Process size
User time
Process size
User time
: 18.07 MB
: 36 m 07 s
Momentum Seminar
: 12.29 MB
: 2 m 21 s
momentum_01_03
Page 16
RF Board Power/Ground
AIR
[1]
59 mil
Momentum
Momentum RF
Measurements
FR4
GND
Momentum
Process size : 20.8 MB
User time
: 30 m 42 s
50.8
mm
P1
P2
Momentum RF
User time
: 4 m 41 s
76.2
mm
Momentum
50.8
mm

User time
: 50 m 29 s
P1
P2
76.2
mm
Momentum Seminar
Momentum RF
User time
: 5 m 33 s

momentum_01_03
Page 17
RF Board Application
AIR
[1]
30 mil
FR4
FYI
rectangular & triangular mesh
GND
Momentum
Ports: 60
Frequencies: 6
Matrix size
Process size
User time
35.60 mm
43.67 mm
: 3428
: 152.48 MB
: 11h 04m 51s
reduced polygonal mesh

Momentum RF
Ports: 60
Frequencies: 6
Matrix size
Process size
User time
: 733
: 59.35 MB
: 48m 24s
Speed & Capacity

memory: 3 x
speed: 14 x
Momentum Seminar
momentum_01_03
Page 18
Packaging Application
FYI
3
Vchip
4
ref 4
1
epoxi
ref 3
2
Vboard
FR4
GND
7.6 mm
port 4
port 3
ref 4
ref 3
port 2
port 1
S(1,1)
S(1,2)
S(1,3)
S(1,4)
7.6 mm
Momentum
Momentum RF
Matrix size
: 8244
Process size : > 1 GB
User time
: > 2 days
Matrix size
: 1354
User time
: 5h 17m 53s

Momentum Seminar

momentum_01_03
Page 19
Microwave Applications
FYI
Momentum
Momentum RF
AIR
25 mil
[1]
mag(S11)
Alumina
GND
mag(S21)
6.65
mm
9.90
mm
Momentum
Momentum RF

Frequencies: 18

Frequencies: 14
Matrix size
Process size
User time
Matrix size
Process size
User time
: 181
: 2.92 MB
: 1 m 02 s
Momentum Seminar
: 122
: 2.13 MB
: 0 m 09 s
radiated
power

momentum_01_03
Page 20
Microwave Applications
FYI
Momentum
Momentum RF
[2]
185 mil
AIR
[1]
25 mil
Alumina
mag(S11)
GND
5.21
mm
24.82 mm
Momentum
mag(S21)
Momentum RF

Frequencies: 27

Frequencies: 25
Process size
User time
Process size
User time
: 8.26 MB
: 7 m 53 s
Momentum Seminar
: 4.75 MB
: 0 m 29 s
momentum_01_03
Page 21
Digital Application
FYI
full board
isolated trace
port 1
port 1
port 2
port 2
S(1,1)
S(1,2)
S(1,1)
S(1,2)
isolated trace
isolated trace
full board
full board
Momentum
Momentum RF
Momentum Seminar
momentum_01_03
Page 22
Digital Application
FYI
isolated trace
port 1
0.4 GHz
port 2
output
Momentum Seminar
S(1,1)
S(1,2)
isolated trace
isolated trace
momentum_01_03
Page 23
Digital Application
FYI
isolated trace
harmonic signal
2.33 GHz
port 1
port 2
no output
resonance
blocks the signal
Momentum Seminar
S(1,1)
S(1,2)
isolated trace
isolated trace
momentum_01_03
Page 24
Digital Application
FYI
harmonic signal
2.33 GHz
harmonic signal is coupled to neighboring traces

and spread around the board
Momentum Seminar
momentum_01_03
Page 25



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9598EN
Agilent EEsof EDA


30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_02_01
Page1
Momentum Datasets
Variables Available in the Standard Dataset
freq
Independent frequency variable
GAMMAn
Modal propagation constant of port n (calculated for single,

differential, and coplanar ports only)
PORTZn
Impedance of Port n
S-matrix, normalized to PORTZn
S(i,j)
S-parameters for each port pairing, normalized to PORTZn
S_50
S-matrix, normalized to 50 ohms
S_50(i,j)
S-parameters for each port pairing, normalized to 50 ohms
S_Z0
S-matrix, normalized to Z0
S_Z0(i,j)
S-parameters for each port pairing, normalized to Z0 of each port
Z0n
Characteristic impedance of Port n (calculated for single,

differential, and coplanar ports only, others are 50 ohms)
(Note that these are included in the datasets for Momentum simulations but not for MomentumRF)
Momentum Seminar
momentum_02_01
Page2
Momentum Datasets
Variables Available in the AFS Dataset
All standard dataset variables, plus
S_CONV
Boolean results for AFS convergence (success=1, fail=0)

of the entire S-matrix at a given frequency
S_CONV(i,j)
Boolean results for AFS convergence (success=1, fail=0)

of S(i,j) at a given frequency
S_ERROR
Estimated error of the entire S-matrix at a given frequency

(< -60 dB for converged frequency points)
S_ERROR(i,j)
Estimated error of S(i,j) at a given frequency

(< -60 dB for converged frequency points)
Momentum Seminar
momentum_02_01
Page3
Adaptive Frequency Sampling
Simple Answer to Convergence

AFS has converged unless it tells you that it hasn't converged (e.g., when the max number of points
that you specified was too low)
Momentum Seminar
momentum_02_01
Page4
AFS Convergence Illustration
Momentum Seminar
momentum_02_01
Page5
AFS Convergence
Momentum Seminar
momentum_02_01
Page6
Momentum Datasets
Variables Available in the Far-field Dataset
THETA
Swept parameter of planar cut
PHI
Swept parameter of conical cut
Etheta & Ephi
Absolute E field strength (V) of theta and phi far-field components
Htheta & Hphi
Absolute H field strength (A) of theta and phi far-field components
Elhp & Erhp
Normalized E field strength of LHCP and RHCP far-field components
ARcp
Axial ratio, derived from LHCP and RHCP far-field components
Eco & Ecross
Normalized E field strength of co and cross polarized far-field comp
ARlp
Linear polarization axial ratio, derived from co and cross polarized

far-field components
Gain, Directivity Gain, Directivity, Efficiency (in %), and Effective area (in m2)
Efficiency,
Effective Area
Power
Momentum Seminar
Radiation intensity (in watts/steradian)

momentum_02_01
Page7
Momentum Visualization
Momentum Visualization Enables You to View and Analyze...
Currents (surface currents)
S-parameters (mag, re, im, phase, and dB of S(i,j))
Transmission line data (propagation constant, characteristic impedance)
Far-fields (radiation patterns & axial ratio in 3D and 2D)
Antenna parameters (gain, directivity, pointing angle, etc.)
Momentum Seminar
momentum_02_01
Page8
Momentum Visualization: Surface Currents

When you scroll from 0-360,
you are actually varying the
phase which illustrates the
e^jwt time dependency of
the surface currents
The lower and upper values input
into these fields represents the
lowest and highest values of the
surface current density (A/m)
which will be viewed
You also have the
option to look at the
animated currents
when click on the
Display Properties
button
Note that you can also see the

effects of an edge mesh in the
current visualization (the skin
effect is emphasized)
Note: when you are viewing the results for a slot metallization layer, the MAGNETIC currents are plotted instead of the
ELECTRIC currents. You will also be viewing the mesh in the slots instead of a mesh on the conductors when viewing the
mesh for a slot layer.
Momentum Seminar
momentum_02_01
Page9
Momentum Visualization: Surface Currents
Momentum Seminar
momentum_02_01
Page10
Momentum Visualization:
Far-field Radiation Patterns and S-parameters
Radiation Patterns are

only available with
Momentum results, not
MomentumRF
Momentum Seminar
momentum_02_01
Page11
ADS Data Display: S-parameters, L, and Q of an Inductor

Powerful post processing data display allows you to take
advantage of countless built-in functions and provides the
flexibility to wrote your own (through both measurement
equations in a schematic or equations in a data display page).
Momentum Seminar
momentum_02_01
Page12



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9599EN
Agilent EEsof EDA

Detailed Presentation on Momentum Advanced
Topics - (Part 1 of 5)

30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_03_01
Page 1
Momentum Component (EM/circuit co-simulation)

EM/Circuit co-simulation from the
schematic environment
Transparent integration of electromagnetic
simulators at the schematic design level
Include physical layout parasitics in
schematic
Layout setup
Momentum Component Generation
Momentum simulation options accessible

from schematic
Compiled Layout Components listed in
projects hierarchy
ADS circuit simulation
Model database for reuse option

ADS 2002C: EM/Circuit cooptimization
Momentum Seminar
momentum_03_01
Page 2

Example included in ADS 2002 & higher
C:\ADS2002\Examples\Momentum\emcktcosim\LTCC_prj
Momentum Seminar
momentum_03_01
Page 3

C:\ADS2002\Examples\Momentum\emcktcosim\LNAEmCktCosim_prj
Momentum Seminar
momentum_03_01
Page 4

2.
Example begins with schematic of LNA

and uses Layout>Generate/Update
Layout to create artwork
Note that vendor component libraries

were utilized for lumped element and
active device artwork. Also note that
a ground plane has been added with
uniform clearance around
traces/components.
Momentum Seminar
momentum_03_01
Page 5

3.
A symbol is defined for the schematic

subcircuit and then it is placed in a top
level design for simulation using the
component library browser. (The
results of this simulation will be
compared to the results of the next
simulation, which will include the
physical effects.)
Momentum Seminar
momentum_03_01
Page 6

Momentum Seminar
4.
The artwork is now modified to

include the vias (to connect the
poured ground plane to the explicit
ground plane) and ports are placed at
all connection points (input, output,
bias, and on each node of the lumped
elements)
momentum_03_01
Page 7

Example included in ADS 2002 & higher (slightly modified)
5.
Layout/Momentum
Component parameters
will be discussed more
later (co-optimization)
The standard example is then slightly

modified to include layout component
parameters (new in ADS 2002C).
These parameters will be used to see
the effects of a via location on gain.
Modified version provided:
(LNAEmCktCosim_prj.zap)
Momentum Seminar
momentum_03_01
Page 8

6.
The Layout/Momentum component is

then created
Momentum Seminar
momentum_03_01
Page 9

7.
Next, the Layout/Momentum component is placed in a schematic using the component library browser (just
like any other subcircuit/component). All of the lumped elements and the active device are then connected to
the pins (ports in layout are replaced with pins in the Momentum Component symbol).
Momentum Seminar
momentum_03_01
Page 10

8.
Once the model details are selected (Mode MomMW, MomRF, or data file; Frequency range; Mesh
properties), the parameters of the Layout/Momentum component are then defined to be variables, which will
be passed down from the top design. This is made possible by the next step, which uses the File>Design
Parameters submenu.
Momentum Seminar
momentum_03_01
Page 11

9.
The variables are now defined for this subcircuit. Note that we could have just placed the Layout/Momentum
component directly into the top level schematic, but this illustrates two methods of parameterization in a
schematic.
Momentum Seminar
momentum_03_01
Page 12

10. The subcircuit that includes the

Layout/Momentum component is then
placed in a top level design for
simulation using the component
library browser. (The results of this
simulation will be compared to the
results of the original simulation,
which did not include the physical
effects.)
Momentum Seminar
11. Note the use of variables which are

swept using the Parameter Sweep
component.
momentum_03_01
Page 13


Momentum Seminar
12. When each iteration of the S-parameter

simulation encounters the
Layout/Momentum component with
new values for parameters, a
Momentum simulation is also
automatically invoked in the
background (for each case that was
not previously solved).
momentum_03_01
Page 14

13. Finally, the results from each approach

are compared. Surface currents for
the Momentum component (layout) can
also be studied using Visualization.

Momentum Seminar
Initial schematic simulation

Momentum component in schematic
Momentum component in schematic
with swept variable for via location
momentum_03_01
Page 15
Momentum Co-Optimization
EM/circuit co-optimization (layout/Momentum components with parameters)
Adding Layout Parameters
NEW in ADS 2002C
Enables to sweep, tune or optimize geometrical variations in the

layout
- typical dimensions (length, width, gaps, spacing,)
- interdependent layout modifications (e.g. length and width varying simultaneously)
- port locations
Two ways to create a parameterized layout component

1. Using nominal/perturbed layout artwork (Momentum Optimization)
Nominal/Perturbed layout parameter

2. Using existing (built-in or GCC defined) layout artwork macros
Subnetwork layout parameter

Momentum Seminar
momentum_03_01
Page 16
Momentum > Component > Parameters
Opens the Layout Component Parameters dialog
Momentum Seminar
momentum_03_01
Page 17
Defining a Nominal/Perturbed Layout Parameter
Define the name of the parameter

Define the type of parameter
Enter the nominal value
Enter the perturbed value
Edit the perturbation
if no AEL artwork macro available

Momentum Seminar
momentum_03_01
Page 18
Steps
1. Select points in layout
2. Select perturbation type
3. Insert perturbation values
4. Apply the perturbation
Repeat these steps
Click OK to terminate
AEL artwork macro is created

primitive layout component
Momentum Seminar
momentum_03_01
Page 19
Adding Layout Parameters to a Subnetwork
Defining a Subnetwork Layout Parameter
Define the name of the parameter

Define the type of parameter
Enter the default value
Associate the parameter with a
subnetwork parameter
If artwork macro IS available

hierarchical layout component
Momentum Seminar
momentum_03_01
Page 20
Adding Layout Parameters to a Subnetwork
Use the subnetwork layout parameter to set the parameter values of one or
more subnetwork parameters in the design
Momentum Seminar
momentum_03_01
Page 21
Creating a Component
Momentum > Component > Create/Update
Opens the Create Momentum Component dialog
Dialog Entries: Symbol, Model Parameters and Model Database
These parameters are a

subset of the
Momentum simulation
control options in the
Layout Environment and
can be set from within
the Schematic
Environment
Momentum Seminar
momentum_03_01
Page 22
EM Model Database
The simulated S-parameter models are
stored in an EM Model Database for later
reuse
During the Component Create/Update, the

user has the option to:
- delete all previous entries in the model
database
- add the last simulation results obtained
from Momentum simulation in Layout to
the model database
Momentum Seminar
momentum_03_01
Page 23
Instance Parameter Dialog
Double clicking on the Layout Component Instances in the Schematic Design
Environment opens the Instance Parameter Dialog
In the Model Page, the user can specify the
- Model Type selection
- Model Parameter values
- Model Database Reuse option
In the Parameters Page, the user can

specify the layout parameter values and
the optimization setup (optional)
In the Display Page, the user can specify
which model parameters are visible in the
schematic design
Momentum Seminar
momentum_03_01
Page 24
Model Interpolation
Instance Dialog box
The EM model database can use
interpolation to significantly enhance
the efficiency of the co-simulation
The Layout Parameters are treated as
continuous parameters
Pushing the Options.. button brings up
the Set Interpolation Options dialog
Allows to specify the interpolation delta
values for each layout parameter
Default values for the interpolation deltas are
provided (derived from the model parameters)
Momentum Seminar
momentum_03_01
Page 25
Electronic
notebook for
LTCC
EM/circuit cooptimization
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
examples/Momentum/emcktcosim/LTCC_prj
momentum_03_01
Page 26
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 27
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 28
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 29
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 30
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 31
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 32
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 33
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 34
Electronic
notebook for
LTCC
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_03_01
Page 35



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9600EN
Agilent EEsof EDA


30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_03_02
Page 1
An Aside: Vias in Momentum
1. Polygon
2. Rectangle or square
3. Polyline
Vias must be mapped

through each individual
substrate layer they pass
through
For vias, only vertical currents and surface impedances are taken into account (for now). Keep in
mind that the horizontal and rotational currents are not included. One possible trick that might
be used to obtain more complete current calculations is to break up the via structure (could be any
shape, even that of a transmission line or spiral inductor) into a few thinner layers and include the
geometry on horizontal metallization layers as well. Make sure that provide the conductivity and
thickness parameters for only one of the horizontal metallization layers; otherwise, excess loss
will be calculated.
Momentum Seminar
momentum_03_02
Page 2
An Aside: Vias in Momentum
Vias are treated as one cell (in the vertical axis);

therefore, the thickness of substrates which
contain vias is limited to ~ 1/10th to 1/20th of
a wavelength (at the highest simulation
frequency). Vias passing through thicker
substrates can be accurately represented by
splitting these thick substrates into multiple
layers.
Please note that you can view both the mesh

and the surface current density (A/m) of via
structures using Momentum Visualization
Momentum Seminar
momentum_03_02
Page 3
Thick Conductor Simulations

Momentum model Finite Thickness Conductors
Zero thickness approach
loss formulation
Finite thickness approach
loss formulation
current modeling
Momentum Seminar
momentum_03_02
Page 4

Conductor Loss in Momentum: Zero Thickness Approach
The Surface Impedance Concept is used to model
conductor losses in metallizations
3D conductor
Zs(t,,)
Sheet conductor
The Surface Impedance Model Zs(t,,) takes the finite

thickness and frequency dependency (skin effect) of the
conductor loss into account
Momentum Seminar
momentum_03_02
Page 5

Conductor Loss in Momentum: Zero Thickness Approach
The Surface Impedance formula:
Zs =
j
coth ( c t )
+ j
c =
j ( + j )
>>
Zs =
s =
LF :
Zs =
1
t
LF currents run in entire cross

section of the metalization
HF :
Zs =
(1 + j )
s
HF currents run in SINGLE skin

depth surface layer
Skin depth
=4.5e7 S/m
Momentum Seminar
(1 + j ) t
(1 + j )
coth
s
s
1 MHz
10MHz
100MHz
1 GHz
75 m
23.7 m
7.5 m
2.37 m
momentum_03_02
Page 6

Conductor Loss in Momentum: Finite Thickness Approach
3D conductors:
drawn on 2 layers (, t/2) connected with vias

LF :
t/2
LF currents run in entire cross

section of the metalization
HF :
Zs(t/2,,) for top and

bottom metalization layer
HF currents run in DOUBLE

skin depth surface layer
Better loss modeling

Better current modeling (inductive)
Momentum Seminar
momentum_03_02
Page 7

Current Modeling in Momentum for 3D Conductors
y
x
Momentum Seminar
x,y surface currents on top and bottom of finite thickness conductor

z-surface currents on vias (side walls of finite thickness conductor)
momentum_03_02
Page 8

Conductor Loss in Momentum - what to use?
w
Rule of thumb:
t
h
ground plane
w/t > 5
h/w > 10
Use 1 zero thickness conductor with correct loss specification (thickness, conductivity)
, t
other cases
2 metallization layers + vias
Momentum Seminar
, t/2
, t/2
strip
via
strip
momentum_03_02
Page 9
Thick-conductor Approach: Two Approaches

thick conductor
, t/2
, t/2
layer2: , t/2
layer3: perfect conductor
2 metallization layers + vias

strip
via
strip
Air (E0)
Substrate (Er)
layer1: , t/2
Port 1
Port 1
Port 3
Port 2
Port 2
Port 4
For Single Trace Stimulus:

Common-mode ports
Momentum Seminar
For Two or More Coupled Traces:

Single ports in layout, recombine as common-mode in schematic
momentum_03_02
Page 10
Thick-conductor Approach: For Single Trace Stimulus
Port 4
Port 2
Example:
Ports 1&3 are associated as
common-mode ports, as are
ports 2&4
Port 3
Port 1
For Single Trace Stimulus:

Common-mode ports in Layout/Momentum are fine
Momentum Seminar
momentum_03_02
Page 11

30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_03_02
Page 12

Microstrip Coupled-line Filter Example: initial layout for filter generated
from schematic (substrate definition also updated from schematic)
filter_thick_metal_prj/DA_CLFilter1_untitled1.dsn
Momentum Seminar
momentum_03_02
Page 13

Microstrip Coupled-line Filter Example: verify substrate and
metallization definitions
Momentum Seminar
momentum_03_02
Page 14

Microstrip Coupled-line Filter Example: initial MomentumRF simulation
Momentum Seminar
momentum_03_02
Page 15

Microstrip Coupled-line Filter Example: save as new design and flatten
components to enable copy-to-layer for the thick-conductor method
filter_thick_metal_prj/DA_CLFilter1_untitled1_thick.dsn
Momentum Seminar
momentum_03_02
Page 16

Microstrip Coupled-line Filter Example: now begin copying the artwork
to the first two additional layers
Momentum Seminar
momentum_03_02
Page 17

Microstrip Coupled-line Filter Example: now copy the artwork to the
second of two additional layers
Momentum Seminar
momentum_03_02
Page 18

Microstrip Coupled-line Filter Example: modify substrate definitions to
include another substrate layer that is the thickness of the metal
Momentum Seminar
momentum_03_02
Page 19

Microstrip Coupled-line Filter Example: map one of the copied artwork
layers as a strip conductor above the new conductor substrate and
the other as a via in the new conductor substrate
Define the top and bottom conductors with
the proper conductivity and ONE-HALF
the total conductor thickness.
Momentum Seminar
momentum_03_02
Page 20

Microstrip Coupled-line Filter Example: place additional port on the
newly mapped strip conductor layer at each original port location
Momentum Seminar
momentum_03_02
Page 21

Microstrip Coupled-line Filter Example: assign and associate the
overlapping ports as common-mode ports
Momentum Seminar
momentum_03_02
Page 22

Microstrip Coupled-line Filter Example: define frequency sweep and
simulate
Momentum Seminar
momentum_03_02
Page 23

Microstrip Coupled-line Filter Example: something to REMEMBER!
REMEMBER:
Vias may not coincide with a port or touch a port.
So how is this simulation accomplished?
Momentum Seminar
momentum_03_02
Page 24

Microstrip Coupled-line Filter Example
By slightly moving the coincident edge of the via layer
so that it no longer touches the port!
Step 1. Begin by making the via layer the only selectable layer
Momentum Seminar
momentum_03_02
Page 25

Step 2. Drag a selection box around the edge to be moved
Momentum Seminar
momentum_03_02
Page 26

Step 3. Select the Move Relative tool
Momentum Seminar
momentum_03_02
Page 27

Step 4. Enter a sufficiently small (but non-zero) distance to move the
edge so that it does not exactly overlap the port.
Momentum Seminar
momentum_03_02
Page 28

Step 5. Zoom in to verify that the edge was indeed moved. Then repeat this for any other via edges that
coincided with a port. Now it is safe to simulate without errors.
Momentum Seminar
momentum_03_02
Page 29

Microstrip Coupled-line Filter Example: compare results for different approaches
filter_thick_metal_prj/compare_approaches.dds
Momentum Seminar
momentum_03_02
Page 30

filter_thick_metal_prj/compare_approaches.dds
Momentum Seminar
Note that for cases that do not include coupled port

stimuli, Momentum common-mode ports yield
correct results. This can be verified by re-defining
these ports as Single ports and then recombining
the ports as common-mode in a schematic. The
results are compared below (and are identical). We
will see that only the latter approach is valid for
cases that include coupled ports.
momentum_03_02
Page 31
Thick-conductor Approach: For Coupled Traces

Layout
Port 12
Port 11
Port 10
Port 6
Port 5
Port 4
Schematic
Port 7
Port 8
Port 9
Port 1
Port 2
Port 3
Term
Term1
Num=1
Z=50 Ohm
Term 6
Term 5
Term
Term1
Num=1
Z=50 Ohm
Term 4
Term
Term1
Num=1
Z=50 Ohm
Example:
Ports 1-12 are Single ports
Term 1
Term
Term1
Num=1
Z=50 Ohm
Term 2
Term
Term1
Num=1
Z=50 Ohm
Term 3
Term
Term1
Num=1
Z=50 Ohm
For Two or More Coupled Traces:

Use Single ports in the Layout Momentum Simulation
Recombine these results as common-mode ports in a schematic (this
will ensure port calibration for the coupled ports)
Momentum Seminar
momentum_03_02
Page 32

(When the Momentum Dataset is Available Method 1)
p_6 p_5 p_4
S-PARAMETERS
p_1
p_3
p_2
p_2
p_3
p_1
12
11
10
Ref
4
Using an SnP data item

(S12P in this example)
S_Param
SP1
Start=
Stop=
Step=
S12P
p_4 p_5 p_6
SNP1
File="coupled_lines_thick_momRF_50_single_ports.ds"
p_1
T erm
T erm1
Num=1
Z=50 Ohm
p_2
p_3
Term
Term
Term2
Term3
Num=2
Num=3
Z=50 Ohm
Z=50 Ohm
p_4
Term
Term4
Num=4
Z=50 Ohm
p_5
p_6
T erm
T erm
T erm5
T erm6
Num=5
Num=6
Z=50 Ohm
Z=50 Ohm
Tips/Tricks
Place an S2P
Data Item
Momentum Seminar
Use on Use S12P data

screen
item to access
editing to
dataset from
change S2P
Momentum
to S12P
OR
To reduce wiring confusion,

use wire/pin label tool to
make connections
momentum_03_02
Page 33

(When the Momentum Dataset is Available Method 2)
Lead_frame_package_thick_momRF_50_single_ports_component
Lead_frame_package_thick_momRF_50_single_ports_component_1
ModelType=Dataset
ModelFile=".\data\Lead_frame_package_thick_momRF_50_single_ports.ds"
p_1
p_6
p_2
p_5
p_3
p_4
Using a Layout/Momentum
Component as a data item
Be sure to select Dataset as the ModelType
(not Momentum MW or Momentum RF) and then
browse to the Momentum dataset that uses all
Single ports
Ref
p_1
Term
Term1
Num=1
Z=50 Ohm
p_2
p_3
Term
Term
Term2
Term3
Num=2
Num=3
Z=50 Ohm
Z=50 Ohm
p_4
Term
Term4
Num=4
Z=50 Ohm
p_5
p_6
Term
Term
Term5
Term6
Num=5
Num=6
Z=50 Ohm
Z=50 Ohm
S-PARAMETERS
S_Param
SP1
Start=
Stop=
Step=
Tips/Tricks
Use the component library

browser to place the
Momentum Component
Momentum Seminar
To reduce wiring confusion,

use wire/pin label tool to
make connections
Note that since the 12 layout ports in this

example need to be reconnected as 6
common-mode ports, it is acceptable (even
desirable) for the pin connections to short
together each pair of pins in this component
symbol. (It is impossible not to since the pins
co-exist from this top view of the layout.)
momentum_03_02
Page 34
Comments on Overlapping (Birds Eye View)

Ports in Momentum Layout Components
When would the pins in the Layout Component symbol overlap/short?
When common-mode ports overlap on different layout layers (same xy-coordinates,
different z-coordinates). You usually want these ports to be connected/shorted in the
schematic, as shown in the previous slide.
When internal ports and ground reference ports overlap on different layers (same xycoordinates, different z-coordinates). You usually DO NOT want the pins for internal
ports to overlap/short pins that represent the ground reference ports in the schematic.
Momentum Seminar
momentum_03_02
Page 35
Comments on Overlapping (Birds Eye View)

Ports in Momentum Layout Components
(Workarounds for cases when you DO NOT want the pins for internal
ports to overlap/short pins for ground references in the schematic)
How do I avoid shorting these pins together?
When the ports are attached to an edge, it doesn't matter WHERE on that edge the port is attached, because
the current is injected in a distributed manner along the edge. So, shifting the ground reference port(s)
slightly won't make any difference in the results. The Layout Component symbol will now reflect nonoverlapping pins for the internal and ground reference ports.
When the ports are point injection ports (in the middle of the metal) then shifting them WILL make a
difference in results, so be careful. So what are your options when this is the case?
Edit the symbol page of a layout component symbol! When the Layout component is created, edit its
symbol page and look for the port pins. You can move them a little in order to correctly use the ones
that are on top of each other. This will not change the results. I have tried this and it works! You just
need to be sure to remember which pin is which, or label them with text in the symbol.
Use the "black box" symbol, then all is fine. This would be less work than the prior suggestion, but it
would not be as "pretty.
The next example will also demonstrate this
Momentum Seminar
momentum_03_02
Page 36



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9601EN
Agilent EEsof EDA


30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_03_02
Page 1
coupled_lines_prj/mlayer_lib.dsn
Coupled Lines Example: starting in a schematic
Momentum Seminar
momentum_03_03
Page 1
Coupled Lines Example: Layout>Generate/Update Layout
Momentum Seminar
momentum_03_03
Page 2
Coupled Lines Example: Auto generated layout
Momentum Seminar
momentum_03_03
Page 3
Coupled Lines Example: Update substrate definition from schematic
Momentum Seminar
momentum_03_03
Page 4
Coupled Lines Example: verify substrate and map metal layers
Momentum Seminar
momentum_03_03
Page 5
Coupled Lines Example: edit/assign port types
Momentum Seminar
momentum_03_03
Page 6
Coupled Lines Example: flatten component
Momentum Seminar
momentum_03_03
Page 7
coupled_lines_prj/coupled_lines_momRF_50.dsn
Coupled Lines Example: save as new design
Momentum Seminar
momentum_03_03
Page 8
Coupled Lines Example: setup mesh
Momentum Seminar
momentum_03_03
Page 9
Coupled Lines Example: setup simulation (zerothickness conductor standard approach)
Momentum Seminar
momentum_03_03
Page 10
coupled_lines_prj/coupled_lines_thick_momRF_50.dsn
Coupled Lines Example: save as new name to be used for

thick conductor approach
Momentum Seminar
momentum_03_03
Page 11
Coupled Lines Example: make an empty layer insertable
Momentum Seminar
momentum_03_03
Page 12
Coupled Lines Example: select original geometries
Momentum Seminar
momentum_03_03
Page 13
Coupled Lines Example: copy original geometries to the empty layer
Momentum Seminar
momentum_03_03
Page 14
Coupled Lines Example: make another empty layer insertable
Momentum Seminar
momentum_03_03
Page 15
Coupled Lines Example: copy geometries to this third layout layer
Momentum Seminar
momentum_03_03
Page 16
Coupled Lines Example: modify substrate to include a dummy layer for

the metal thickness and map the new (copied) via and strip layers
Note: the conductor

thickness has been split
between the top and
bottom strip layers that
form the new thick
conductor shell.
Momentum Seminar
momentum_03_03
Page 17
Coupled Lines Example: insert ports on the newly mapped top

metallization layer
Momentum Seminar
momentum_03_03
Page 18
Coupled Lines Example: assign/associate ports as common mode
Momentum Seminar
momentum_03_03
Page 19
Coupled Lines Example: setup the new simulation
Momentum Seminar
momentum_03_03
Page 20
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports.dsn
Coupled Lines Example: save as new name to be used for

New thick conductor approach
Momentum Seminar
momentum_03_03
Page 21
Coupled Lines Example: re-define ports as Single ports
Momentum Seminar
momentum_03_03
Page 22
Coupled Lines Example: setup the new simulation
Momentum Seminar
momentum_03_03
Page 23
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_schematic.dsn
Coupled Lines Example: now, recombine single port data as common-mode
Accomplished by either using an SnP data item

Momentum Seminar
momentum_03_03
Page 24
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_component_schematic.dsn
Coupled Lines Example: now, recombine single port data as common-mode
NOTE: IF the version of ADS that

you are using shows unconnected
pins (red diamond around pin)
when using this Layout
Component method, please edit
the Layout Component symbol so
that you can see both pins for
those that overlap. If the
connection is good (blue), then no
need to worry about this.
or by using a Layout/Momentum Component as a data item

Momentum Seminar
momentum_03_03
Page 25
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_component_schematic.dsn
Coupled Lines Example: re-defining Layout Component symbol
Step 1. Push into symbol in

schematic
Momentum Seminar
momentum_03_03
Page 26
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_component.dsn
Step 2. Enable symbol view
Momentum Seminar
momentum_03_03
Page 27
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_component.dsn
Step 3. Separate
overlapping pins by moving
one of each pair.
Momentum Seminar
momentum_03_03
Page 28
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_component_test.dsn
Step 4. After separating all

overlapping pins, save the
design. Note that the
specific location of each pin
is inconsequential since this
is only the symbol, not the
actual artwork!
Momentum Seminar
momentum_03_03
Page 29
coupled_lines_prj/coupled_lines_thick_momRF_50_single_ports_component_schematic_test.dsn
Step 5. Now you can

successfully wire all pins.
(No more unconnected pins!)
Momentum Seminar
momentum_03_03
Page 30
coupled_lines_prj/compare_approaches.dds
Coupled Lines Example: open a data display to compare results
Please note the following details regarding this data display:

This data display contains 3 pages (return loss, insertion loss, and coupling
data)
There are actually 5 approaches being compared (which are all included in this
coupled_lines_prj project). The 5 designs are:
coupled_lines_momRF_50.dsn standard MomRF simulation using Single ports

coupled_lines_thick_momRF_50.dsn thick-metal simulation using common-mode ports
coupled_lines_thick_momRF_50_single.dsn thick-metal simulation using our legacy
approach with only one Single port per node
coupled_lines_thick_momRF_50_single_ports_schematic.dsn schematic re-combination
of MomRF simulation using TWO Single ports per node (using SnP data item)
coupled_lines_thick_momRF_50_single_ports_component_schematic_test.dsn schematic
re-combination of MomRF simulation using TWO Single ports per node (using Layout
Component as a data item)
Momentum Seminar
Approach #4 and approach #5

are equivalent AND are the best
method for this type of
simulation
momentum_03_03
Page 31
Coupled Lines Example: comparing return loss (log magnitude & phase)
Momentum Seminar
momentum_03_03
Page 32
Coupled Lines Example: comparing insertion loss (log magnitude & phase)
Momentum Seminar
momentum_03_03
Page 33
Coupled Lines Example: comparing coupling (log magnitude)
Momentum Seminar
momentum_03_03
Page 34

Coupled Lines Example: visualizing various approaches
Momentum Seminar
momentum_03_03
Page 35

30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_03_03
Page 36
Spiral Inductor Simulations

Spiral Inductor simulation will be shown with the Advanced Model
Composer Lab
Ref
The project LTCC_example_AMC_prj illustrates co-simulation, swept parameters of a Layout component, cooptimization, and Advanced Model Composer capabilities for a multilayer LTCC spiral inductor. The
inductance (L) and quality factor (Q) are spiral_param
calculated for several parameter values (length of sides, length of
input line, length of output line). spiral_param_1
This highlights the usage of nominal/perturbed parameters.
An additional example is included for reference. The archived ADS

project is entitled AMC_lab1_prj.zap and is discussed in detail (with
specific steps to perform) in the presentation 2003A_physical_design.ppt.
This highlights the usage of subnetwork parameters.
Momentum Seminar
momentum_03_03
Page 37



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9602EN
Agilent EEsof EDA


30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_04_01
Page 1
Advanced Model Composer (new in ADS 2003A)
Previous ADS Capabilities

Model Composer ADS 2001
Fast & accurate circuit-level
passive parameterized models
created w/ Momentum EM
technology
Automated model generation
Patented MAPS technology
Custom standard-shape
microstrip & stripline libraries
and substrates
Generates model, symbol &
layout
Provided with Linear license
Momentum Seminar
New in ADS 2003A

Advanced Model Composer
Model Composer capabilities
plus:
Arbitrary user-defined
parameterized shapes
Passive components including
spiral inductors, TFR, etc.
No end-user license required for
use of model in schematic
Model generation uses AMC and
Momentum license
ADS Design Kit format
momentum_04_01
Page 2

Integrated Momentum EM Simulator
Momentum RF
New in ADS 2003A

Arbitrary shapes
Model Composer
Co-Simulation w/Layout Components
Co-Optimization w/Layout Components
30 GHz transition
Parameterized
Creates Design Kit
Automated
Fast Simulation
No end-user license required
Momentum
Queuing/Batch processing
Momentum Seminar
momentum_04_01
Page 3

Generate libraries for wide array of custom shaped parameterized passive
models, including:
Spiral inductors
Thin Film Resistors
MIM capacitors
Arbitrary shaped
matching networks
MomentumEM
EMengine
engine
Momentum
modelingsource
source
modeling
MAPSpatented
patentedtechnique
technique
MAPS
forcompact
compactmodel
modelfitting
fitting
for
GeneratedLibraries
Librariesdont
dont
Generated
requireusage
usagelicense
license
require
Momentum Seminar
momentum_04_01
Page 4

30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_04_01
Page 5
Momentum Co-Simulation, Co-Optimization, and AMC

An LTCC Spiral example that utilizes all of these capabilities!
LTCC_example_AMC_prj/spiral_param.dsn
Momentum Seminar
Note that the starting point for this

design was the spiral.dsn included in
the LTCC emcktcosim project.
momentum_04_01
Page 6

An LTCC Spiral example: baseline design to which we will add parameters
Momentum Seminar
momentum_04_01
Page 7

An LTCC Spiral example: add first parameter for the input line length
Note that the perturbation will need to have a

magnitude of 50 um
Momentum Seminar
momentum_04_01
Page 8

An LTCC Spiral example: select the objects to be moved and enter the
perturbation type and value
LTCC_example_AMC_prj/spiral_param_length_in.dsn
Momentum Seminar
momentum_04_01
Page 9

An LTCC Spiral example: click OK to return to main design
LTCC_example_AMC_prj/spiral_param_length_in.dsn
Momentum Seminar
momentum_04_01
Page 10

An LTCC Spiral example: now add parameter for output line length
Note that the perturbation will need to have a

magnitude of 50 um
Momentum Seminar
momentum_04_01
Page 11

An LTCC Spiral example : select the objects to be moved and enter the
LTCC_example_AMC_prj/spiral_param_length_out.dsn
Momentum Seminar
momentum_04_01
Page 12

LTCC_example_AMC_prj/spiral_param_length_out.dsn
Momentum Seminar
momentum_04_01
Page 13

An LTCC Spiral example: now add parameter for length of spiral sides
Note that each perturbation will need to have a

total magnitude of 100 um
Momentum Seminar
momentum_04_01
Page 14

Stretch (shrink) objects on left side of spiral
LTCC_example_AMC_prj/spiral_param_length_sides.dsn
Momentum Seminar
momentum_04_01
Page 15

Stretch (shrink) objects on top side of spiral
Momentum Seminar
momentum_04_01
Page 16

Stretch (shrink) objects on right side of spiral
Momentum Seminar
momentum_04_01
Page 17

Stretch (shrink) objects on bottom side of spiral

Momentum Seminar
momentum_04_01
Page 18

All sides are now 100 um shorter
Momentum Seminar
momentum_04_01
Page 19

An LTCC Spiral example: click OK to accept parameters
Momentum Seminar
momentum_04_01
Page 20

An LTCC Spiral example: create a layout component symbol for schematic use
Momentum Seminar
momentum_04_01
Page 21

An LTCC Spiral example: click OK to create Layout Component symbol
Momentum Seminar
momentum_04_01
Page 22

An LTCC Spiral example: use component library browser to locate a place an
instance of the Layout Component in a new schematic
LTCC_example_AMC_prj/spiral_param_schematic.dsn
Momentum Seminar
momentum_04_01
Page 23

An LTCC Spiral example: Layout Component placed, now setup simulation
Momentum Seminar
momentum_04_01
Page 24

An LTCC Spiral example: double-click Layout Component to verify model details
Momentum Seminar
momentum_04_01
Page 25
An LTCC Spiral example: now verify values of parameters (0 nominal value)
Momentum Seminar
momentum_04_01
Page 26

An LTCC Spiral example: baseline results for the Inductor
LTCC_example_AMC_prj/spiral_param_schematic.dds
(page L and Q)
Momentum Seminar
momentum_04_01
Page 27

An LTCC Spiral example: baseline results for the Inductor (L & Q only)
(page L and Q only)
Momentum Seminar
momentum_04_01
Page 28

An LTCC Spiral example: setup a swept parameter simulation
LTCC_example_AMC_prj/spiral_param_schematic_sweep.dsn
Momentum Seminar
momentum_04_01
Page 29

An LTCC Spiral example: view resulting L & Q for each parameter sweep
(page L and Q only (swept params))
Momentum Seminar
momentum_04_01
Page 30

An LTCC Spiral example: re-use swept cases to optimize for desired L & Q
LTCC_example_AMC_prj/spiral_param_schematic_optimize.dsn
Momentum Seminar
momentum_04_01
Page 31

An LTCC Spiral example: optimized L & Q (and resulting parameter values)
(page L and Q only (optimize))
Momentum Seminar
momentum_04_01
Page 32

An LTCC Spiral example: create Advanced Model Composer model
Momentum Seminar
momentum_04_01
Page 33

An LTCC Spiral example: define specific sweep types for model parameters
Momentum Seminar
momentum_04_01
Page 34

An LTCC Spiral example: define specific sweep types for model parameters
Momentum Seminar
momentum_04_01
Page 35

An LTCC Spiral example: during model generation, can view status at any time
Momentum Seminar
momentum_04_01
Page 36

An LTCC Spiral example: can see status of current simulation, too
Momentum Seminar
momentum_04_01
Page 37

An LTCC Spiral example: final status model generation complete
Momentum Seminar
momentum_04_01
Page 38

An LTCC Spiral example: create design kit
Momentum Seminar
momentum_04_01
Page 39

An LTCC Spiral example: install design kit to access the AMC model
Momentum Seminar
momentum_04_01
Page 40

An LTCC Spiral example: selecting the design kit files and installation level
Momentum Seminar
momentum_04_01
Page 41

An LTCC Spiral example: successful installation of kit
Momentum Seminar
momentum_04_01
Page 42

An LTCC Spiral example: use component library browser again to find AMC
model from installed design kit
LTCC_example_AMC_prj/spiral_param_schematic_sweep_AMC.dsn
Momentum Seminar
momentum_04_01
Page 43
An LTCC Spiral example: select DK AMC model from Layout Components library
Momentum Seminar
momentum_04_01
Page 44

An LTCC Spiral example: note that parameters are just as any standard
component, now (not a Momentum Layout Component) define values
Momentum Seminar
momentum_04_01
Page 45

An LTCC Spiral example: compare swept parameter results to those from
Momentum Layout Component results
LTCC_example_AMC_prj/spiral_param_schematic.dds (page L and Q only (swept params, compare co-sim vs AMC))

Momentum Seminar
momentum_04_01
Page 46

An LTCC Spiral example: optimize for L & Q using AMC model
LTCC_example_AMC_prj/spiral_param_schematic_optimize_AMC.dsn
Momentum Seminar
momentum_04_01
Page 47
An LTCC Spiral example: compare results (desired L & Q values obtained with both AMC and
Momentum Layout Component if want same optimum parameter values, would need to
lock values of 2 params and optimize 1)
LTCC_example_AMC_prj/spiral_param_schematic.dds (page L and Q only (optimize, compare co-sim vs AMC))
Momentum Seminar
momentum_04_01
Page 48
Momentum Co-Optimization/Tuning
EM/circuit TUNING (layout/Momentum components with parameters)
Example: Tuning of layout parameters
microstrip coupled stubs
2 layout parameters: L1 and L2
L1
L2
Step 1. Parameter Sweep

to fill the EM model database
variable L1 = L2 = L mil
sweep L = 100 130 mil step 3 mil
L2 [mil]
m000
130
Coupled_stubs
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
100
100
130
L1 [mil]
examples/Momentum/emcktcosim/Coupled_Stubs_tune_prj
momentum_04_01
Page 49
Example: Tuning of layout parameter
Step 2. Set the Interpolation Delta equal to or greater than the distance
between the samples
L1-step = 3 mil
L2-step = 3 mil
Delta = 6 mil
Coupled_stubs
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
examples/Momentum/emcktcosim/Coupled_Stubs_tune_prj
momentum_04_01
Page 50
Example: Tuning of layout parameter
Step 3. Start the tuning session
Coupled_stubs
example
(shipped with
ADS 2002C and
higher)
Momentum Seminar
momentum_04_01
Page 51
Note: Momentum Batch Mode Queue Manager

New in
ADS 2003A
Batch Mode Simulation
Batch mode simulations are setup and controlled using the Queue Manager dialog box. The Queue Manager is automatically started when
submitting a queued job, or it can be invoked by selecting Tools > Queue manager in the ADS Main window. Exiting ADS will stop the
Momentum queue and all running jobs.
When the queue is running in normal operation (queue connected), the first waiting job will automatically start after the current job
finishes. If the queue is in Queue Disconnected mode, then the first waiting job will not start automatically when the current job finishes.
When connected, the Queue Manager can be used to view jobs in the queue. When the queue is disconnected, or hasn't been started, the
Queue Manager not only can be used to view jobs in the queue but can also be used to add jobs, modify or delete scheduled jobs, or
change the order of jobs in the queue.
Note Jobs cannot be modified using the Queue Manager when they are currently active (simulating). To modify these jobs, disconnect
the queue, stop the simulation, (see Stopping a Simulation) make your modifications, and resume.
To run a batch mode simulation:
Define the design you want to simulate.
In the Momentum > Simulation > S- parameters dialog box, select Queued in the Process Mode and then select simulate.
Repeat the previous two steps to add additional simulations to the queue.
Select Start Simulations in the Queue Manager to begin simulating after all simulations are queued.
Note If the Queue Manager indicates that simulations are running when they are not, type
dialog box to fix the problem.
queue_reset() in the command line
Caution Running Momentum simulations in parallel (e.g., a direct Momentum simulation and a queued Momentum simulation)
from the same ADS session may cause the loss of simulation data if both simulations end simultaneously
Note When Momentum batch simulations are run from different projects, the active project directory changes when the
simulation finishes if a new one needs to be loaded from a different project.
Momentum Seminar
momentum_04_01
Page 52
Note: Momentum Batch Mode (Legacy Method)

This is discussed in great detail (with an included example project,
L_optimize_using_artwork_macro_prj.zap) in the appendix
provided in the seminar CD. This method also includes a legacy
parametric design capability.
Momentum Seminar
momentum_04_01
Page 53



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9603EN
Agilent EEsof EDA


30 minutes

30 minutes

Momentum Datasets
60 minutes

15 minutes
Break
105 minutes

15 minutes
Final Q&A Session
4 hours 15 minutes
Momentum Seminar
momentum_04_01
Page 1
Extras Whats in the Folder?

Momentum Box/Waveguide Information
This is a topic for which some advanced users might want to
know the theory behind our implementation.
For a thorough discussion on how the standard waveguide and
box models are implemented, see the document:
Box_waveguide.pdf
Momentum Seminar
momentum_04_01
Page 2

Momentum Configuration Information
Momentum config file.txt
Momentum Seminar
momentum_04_01
Page 3

RLGC Netlist from MomentumRF Information
MomentumRF_RLGC_equivalent_circuit_netlist.ppt
Momentum Seminar
momentum_04_01
Page 4

Material Properties DesignGuide
Momentum Seminar
Materials.deb
momentum_04_01
Page 5

Momentum Seminar
Materials.deb
momentum_04_01
Page 6

Momentum Seminar
Materials.deb
momentum_04_01
Page 7
Remember
Momentum Examples
Included with ADS
Momentum Seminar
momentum_04_01
Page 8
Remember Links to Additional Momentum Resources

Momentum Product Webpage:
http://eesof.tm.agilent.com/products/e8921a-a.html
Momentum Technical Articles Webpage:
http://eesof.tm.agilent.com/products/e8921a-b.html#Technical Articles
Co-simulation with Momentum Layout Components

(online demo): http://eesof.tm.agilent.com/demos/#usability
Free MomentumRF NetSeminar (from 2001):
http://netseminar.com/nss/showSeminar?sem_num=413
Advanced Model Composer Product Webpage:

AMC Technical Articles Webpage:
http://eesof.tm.agilent.com/products/e8926a-a.html
http://eesof.tm.agilent.com/products/e8926a-b.html#Technical Articles
Momentum Training Class Webpage: http://eesof.tm.agilent.com/products/e8921a-d.html#Training Classes

(also available as eTraining class): http://eesof.tm.agilent.com/education/etraining.html
Momentum Support Docs on Knowledge Center:
http://edasupportweb.soco.agilent.com:7778/portal/page?_pageid=36,34228&_dad=portal&_schema=PORTAL&cid=53737&a=1&lang=1
Momentum Support Examples on Knowledge Center:

http://edasupportweb.soco.agilent.com:7778/portal/page?_pageid=36,34228&_dad=portal&_schema=PORTAL&cid=8895
Momentum Discussion Forum on Knowledge Center:

http://edasupportweb.soco.agilent.com:7778/cgi-bin/yabb/YaBB.pl?board=ads_momentum
Momentum Manual (online version):

Knowledge Center:
Tech Support:
Momentum Seminar
http://eesof.tm.agilent.com/docs/adsdoc2002C/mom/index.html
http://www.agilent.com/find/eesof-knowledgecenter
http://www.agilent.com/find/eesof-support
momentum_04_01
Page 9
Wrap-up:
Momentum Seminar
Q&A
Questions?
momentum_04_01
Page 10



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9604EN
Agilent EEsof EDA

Momentum Appendix
APPENDIX
Graphical Cell Compiler (GCC)
Momentum Batch Simulations
A Method for Utilizing Momentum Batch
Simulation Results in EM/circuit Cooptimizations (useful before true co-optimization
was introduced)
Momentum Optimization (a review of the

original capability)
Momentum Seminar
Page 1
Note: Momentum CAN be run in a batch mode
Obtain usermenu.ael and instructions from your local ADS Applications Engineer (AE).
Once you load usermenu.ael in your $HOME/hpeesof/de/ael directory (this is usually the
users/default/hpeesof/de/ael directory), restart ADS and you will see a new user menu in the layout window
that enables you to run Momentum in a batch mode.
You can even sweep the parameters of a parameterized design.
Momentum Seminar
Page 2
Momentum Optimization using Batch Simulation

First Step : Initial Layout entry (example using Graphical Cell Compiler)
This GCC macro was taken from

\ADS2003A\Examples\RF_Board
\GCC_examples_prj
Momentum Seminar
Page 3
Custom Layout Macros: Graphical Cell Compiler
FYI
ADS Components can call custom layout macros

Allows for Parameter-driven geometry creation
Layout Macros are AEL functions
Graphical Cell Compiler can be used to generate layout macros
Writing your own macros allows for extra flexibility:
-ports placed on specific layers
-rounding functions to keep ports on-grid
-custom warning or error messages
-physical dimensions calculated from electrical data
-Boolean flags to control layout - clockwise, counter-clockwise, etc.
Momentum Seminar
Page 4
Graphical Cell Compiler (Macro): Introduction
FYI
Purpose:
adding Parameterized Artwork Macros (PAM)
Advantages:
simpler than coding in AEL
getting started very quickly
create a special model quickly, without the need to know AEL
Momentum Seminar
Page 5
Graphical Cell Compiler
FYI
Macro control operations:

Stretch / Move
Flip / Rotate
Repeat
Polar
Viewer
Modify
Add
Delete
Detail
Compile
Momentum Seminar
Page 6
Graphical Cell Compiler
FYI
Stretch
Flip / Rotate
stretch = - 25 mil
rotation = 33
rotation = 90
original
original
stretch = 150 mil
rotation = 0
Polar
Repeat
original
polygon
original
rectangle
repeat x and y = 5 x 4
Momentum Seminar
circle
path
polyline
polar sweep PI radians
Page 7
GCC Example
FYI
C:\ADS2003A\Examples\RF_Board\GCC_examples_prj
Parameterized Inductor that is a

function of :
start with
turns
space
width
sides
becomes
Momentum Seminar
Page 8
GCC: How to build a PAM
FYI
1) Define the artwork graphically in a Layout window

2) Define parameters to control the artwork dimensions
3) Compile the macro
4) Set the parameter default values and save the macro
5) Insert the new component (macro) in a layout
6) Edit the parameters for each instance of the new component
Momentum Seminar
Page 9
GCC: How to build a PAM, Step 1
FYI
Define the artwork graphically in a Layout window

- the first step is to design your artwork macro
This artwork will be used as an element and will be able to be

- stretched in length
- stretched in width
- rotated
- repeated
Momentum Seminar
Page 10
FYI
Define parameters to effect the artwork

Macro > Stretch
Macro > Repeat...
Macro > Width
Macro > Rotate/Mirror

Macro > Polar
Macro > User-Defined...
before defining parameters, draw construction lines

use the Macro toolbar to define parameters
Momentum Seminar
Page 11
Momentum Seminar
FYI
Page 12
FYI
Compile the macro

- Macro>Compile
- the macro will be saved as
<design_name>_art.ael
- the model name is the name
used to select the artwork
from the libary
Momentum Seminar
Page 13
FYI
Set the parameter default values and save the macro:

Macro > Compile
File > Design/Parameters
In the General tab :

define the characteristics
of the sub-network
Momentum Seminar
Page 14
FYI
In the Parameter tab :

- set the default values
- default values are used
when the PAM is placed
Momentum Seminar
Page 15
GCC: How to build a PAM, Step 5&6
FYI
Insert the new component (macro) in a layout

Edit the parameters for that instance of the new component
- parameters can be edited when the PAM is inserted or later
Momentum Seminar
Page 16

First Step : Initial Layout entry (example using Graphical Cell Compiler)
Momentum Seminar
Page 17

First Step : Initial Layout entry (place instance in new layout)
Momentum Seminar
Page 18

First Step : Initial Layout entry (assign parameters and add ports)
Momentum Seminar
Page 19

First Step : Initial Layout entry (enter substrate/metallization data)
Momentum Seminar
Page 20

First Step : Initial Layout entry (enter mesh data)
Momentum Seminar
Page 21

Second Step : use parametric design menu to generate designs
Momentum Seminar
Page 22

Only bug in this unsupported AEL approach is that if you are sweeping a parameter that is
unitless, you will see these errors and will need to go into each design to delete the None text.
THIS WILL NOT OCCUR IF YOU ARE SWEEPING A PARAMETER THAT HAS UNITS.
Momentum Seminar
Page 23

Momentum Seminar
Page 24

Momentum Seminar
Page 25

Momentum Seminar
Page 26

Momentum Seminar
Page 27

Third Step : prepare for Batch simulation (note that designs were
automatically added to que)
Momentum Seminar
Page 28

Fourth Step : Batch simulation
Momentum Seminar
Page 29

Fifth Step : create discrete model subcircuit (use DAC to access the
data)
Momentum Seminar
Page 30

Fifth Step : create discrete model subcircuit (assign a parameter to
sweep through data using File>Design Parameters)
Momentum Seminar
Page 31

Fifth Step : create discrete model subcircuit (create a symbol optional)
Momentum Seminar
Page 32

Sixth Step : use discrete model subcircuit in top level schematic to
sweep data (use component library browser)
Momentum Seminar
Page 33

sweep data
Momentum Seminar
Page 34

sweep data (viewing swept data)
Momentum Seminar
Page 35

Seventh Step : use the dataset from the simulation (which interpolated
data by means of S-parameter controller) and verify results vs discrete
Momentum Seminar
Page 36

Seventh Step : use the dataset from the simulation (verify results vs
discrete swept data results)
Momentum Seminar
Page 37

Eighth Step : now you can use the interpolated approach to simulate a
new case WITHOUT using Momentum again
Momentum Seminar
Page 38

Eighth Step : now you can use the interpolated approach to simulate a
new case WITHOUT using Momentum again (view data)
Momentum Seminar
Page 39

Ninth Step : now you can even optimize the parameter (within the bounds
of the initial swept range of the parameter) of this EM-based model to
achieve a given behavior (optimizing for inductance)
Momentum Seminar
Page 40

achieve a given behavior (optimizing for inductance viewing iterations)
Momentum Seminar
Page 41

achieve a given behavior (update optimized value and re-simulate w/o opt)
Momentum Seminar
Page 42

achieve a given behavior (viewing optimized results)
Momentum Seminar
Page 43

Tenth Step : you could also setup other parameters to be swept or
optimized to achieve other desired performance/behavior
Momentum Seminar
Page 44

Note: No errors encountered since these parameters have units!
Momentum Seminar
Page 45

Momentum Seminar
Page 46
Tenth Step : you could also setup other parameters to be swept or optimized to achieve
other desired performance/behavior (now use this data in a similar test bench to the
previous steps)
Momentum Seminar
Page 47

That was a great capability, but is
there a more automated process?
Now there is! You can benefit from

both EM/circuit co-optimization and
Advanced Model Composer to
accomplish this and more!
Momentum Seminar
Page 48
Momentum Optimization
Another way to optimize...

NEW in ADS 2002C
Enables to sweep, tune or optimize geometrical variations in the

layout
- typical dimensions (length, width, gaps, spacing,)
- interdependent layout modifications (e.g. length and width varying simultaneously)
- port locations
Two ways to create a parameterized layout component

1. Using nominal/perturbed layout artwork (Momentum Optimization)
Nominal/Perturbed layout parameter

2. Using existing (built-in or GCC defined) layout artwork macros
Subnetwork layout parameter

Momentum Seminar
Page 49

Model Composer ADS 2001
Fast & accurate circuit-level
passive parameterized models
created w/ Momentum EM
technology
Automated model generation
Patented MAPS technology
Custom standard-shape
microstrip & stripline libraries
and substrates
Generates model, symbol &
layout
Provided with Linear license
Momentum Seminar
New in ADS 2003A

Model Composer capabilities
plus:
Arbitrary user-defined
parameterized shapes
Passive components including
spiral inductors, TFR, etc.
No end-user license required for
use of model in schematic
Model generation uses AMC and
Momentum license
ADS Design Kit format
Page 50

Integrated Momentum EM Simulator
Momentum RF
New in ADS 2003A

Arbitrary shapes
Model Composer
Co-Simulation w/Layout Components
Co-Optimization w/Layout Components
30 GHz transition
Parameterized
Creates Design Kit
Automated
Fast Simulation
No end-user license required
Momentum
Queuing/Batch processing
Momentum Seminar
Page 51

Generate libraries for wide array of custom shaped parameterized passive
models, including:
Spiral inductors
Thin Film Resistors
MIM capacitors
Arbitrary shaped
matching networks
MomentumEM
EMengine
engine
Momentum
modelingsource
source
modeling
MAPSpatented
patentedtechnique
technique
MAPS
forcompact
compactmodel
modelfitting
fitting
for
GeneratedLibraries
Librariesdont
dont
Generated
requireusage
usagelicense
license
require
Momentum Seminar
Page 52
A Review of the Legacy Approach
Flashback!
Optimization means varying physical dimensions to

achieve S-parameter goals.
Momentum Seminar
Page 53
A Review of the Legacy Approach: example included with ADS
C:\ADS2002\Examples\Momentum\optimization\double_folded_stub_filter_prj
Momentum Seminar
Page 54
A Review of the Legacy Approach: Parameters used to perturb
Start here...
1
Name the variable

and set the values.
3
Nominal layout: line.dsn
W + W
20
Nominal
Value
Select the vertices that

represent the variable
(W). The result is
another layout.
25
4
Perturbed
Value
Perturbed layout: line_W.dsn
Momentum Seminar
Page 55
A Review of the Legacy Approach: Optimization goals
Goals require Frequency values and
Response values (S-parameters).
1
Multiple goals can
2
be set up with various
weighting: For example,
W = 5 means the Error* is
multiplied by 5. The
greater the weight, the
greater the goal importance.
*Error for optimization is a
measure of how much the
goal differs from the
solution. Zero error means
the solution = goal.
Momentum Seminar
Activated = 0
Not Activated = X
Page 56
A Review of the Legacy Approach: Optimization control
Optimization
status...
Goal achieved: Optimal value.
Momentum Seminar
Finally, simulate the optimized layout

and display the results.
Page 57
A Review of the Legacy Approach: Summary of Tips
GEOMETRY:
Keep structures electrically small
Make the drawing as simple as possible
Take advantage of symmetries
Make text notes in the layout, schematic, or data displays for reference
OPTIMIZATION:
Make a written list of parameters and limit the number you use
Perform what-if analyses in ADS circuit simulator
In general, plan the base geometry for optimization.

Create geometry that allows modification of parameters.
But there are new ways to optimize...
See Momentum co-simulation/co-optimization and Advanced Model
Composer in the main presentation. Also, see Momentum batch
simulation content in this appendix.
Momentum Seminar
Page 58



www.agilent.com
Agilent Direct

Americas
Canada
Latin America
United States
(877) 894-4414
305 269 7500
(800) 829-4444
Asia Pacic
Australia
China
Hong Kong
India
Japan
Korea
Malaysia
Singapore
Taiwan
Thailand
1 800 629 485

800 810 0189
800 938 693
1 800 112 929
0120 (421) 345
080 769 0800
1 800 888 848
1 800 375 8100
0800 047 866
1 800 226 008

Austria
0820 87 44 11
Belgium
32 (0) 2 404 93 40
Denmark
45 70 13 15 15
Finland
358 (0) 10 855 2100
France
0825 010 700*
*0.125 /minute
Germany
01805 24 6333**
**0.14 /minute
Ireland
1890 924 204
Israel
972-3-9288-504/544
Italy
39 02 92 60 8484
Netherlands
31 (0) 20 547 2111
Spain
34 (91) 631 3300
Sweden
0200-88 22 55
Switzerland
0800 80 53 53
United Kingdom 44 (0) 118 9276201

without notice.
5989-9605EN

Momentum Training Manual

Uploaded by

Document Information

Copyright

Available Formats

Share this document

Share or Embed Document

Sharing Options

Did you find this document useful?

Is this content inappropriate?

Copyright:

Available Formats

Momentum Training Manual

Uploaded by

Copyright:

Available Formats

Agilent EEsof EDA

Presentation on ADS Momentum

Agenda for Half-day Momentum Seminar

Brief overview of Getting Started with Momentum

Overview of Viewing and Using Momentum Results

Advanced Topics [Part 1]

Advanced Topics [Part 2]

Final Q&A Session

What is meant by Planar EM simulation ?

Why are Planar EM Simulators used ?

How are Planar EM Simulators used ?

Creating/importing artwork in Layout

Created entirely within layout

Creating/importing artwork in Layout

Created entirely within layout

Everything is placed on a layer

Creating/importing artwork in Layout

Created entirely within layout

Preferences which apply to things not yet placed:

Preferences for schematic and layout window are set

Creating/importing artwork in Layout

Created entirely within layout

Creating/importing artwork in Layout

Created entirely within layout

Creating/importing artwork in Layout

Created entirely within layout

Creating/importing artwork in Layout

Created entirely within layout

Creating/importing artwork in Layout

Created entirely within layout

Simplify hierarchical designs by

How are Planar EM Simulators used ?

For more information about

Agilent Email Updates

Get the latest information on the

Quickly choose and use your test

1 800 629 485

Europe & Middle East

Product specications and descriptions

Agilent EEsof EDA

Enable regular Momentum or Momentum RF

Define Substrate and Metallization (pre-compute option)

Using Momentum: Selecting the Analysis Mode

Momentum versus MomentumRF: A Snapshot

Rooftop Basis Function

Star/Loop Basis Functions

Rectangular and Triangular Cells

For most passive geometry

Best for geometrically complex designs

Full accuracy for all circuit sizes

For electrically small designs ( /2)

No inherent upper frequency limit

Upper frequency depends on size

Potential instability at f <kHz to MHz

Results stable down to DC

Box and Waveguide inclusion

No Box / Waveguide Modes

Includes all radiation modes

For designs that dont radiate

Display 2D and 3D Radiation Patterns

Momentum versus MomentumRF

Momentum versus MomentumRF

J(r) = I1B1(r) + I2B2(r) + I3B3(r)

E = Electric Field Intensity Vector