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Vacuum
journal homepage: www.elsevier.com/locate/vacuum
Laboratory of Special Ceramics and Powder Metallurgy, University of Science and Technology Beijing, Beijing 100083, China
Laboratory of Advanced Materials, Tsinghua University, Beijing 100084, China
a r t i c l e i n f o
a b s t r a c t
Article history:
Received 29 September 2014
Received in revised form
5 January 2015
Accepted 7 January 2015
Available online 14 January 2015
W/Cu Functionally Graded Materials (FGM) are promising materials to be used as plasma facing materials
(PFM) for a fusion reactor as well as a heat sink material for high power microelectronic devices. The
immiscible properties in W and Cu, however, make it difcult to join each other without introduction of
active metals like iron group elements. In this paper, pulse electro-deposited FeeW amorphous alloy
forming on a copper sheet was proposed as interlayer to join W and Cu via vacuum diffusion bonding. It
was found that an improvement in bonding strength and a decrease in bonding residual stresses was
obtained by the bidirectional diffusion of Fe, in the form of highly active amorphous state, in W and Cu at
the weld temperature. The diffusion transition regions were formed near the W/Cu interface which is
consisted of a solid solution zone and various phases between the FeeW and FeeCu binary systems and
two different fracture phenomena was observed on the basis of the microstructural characteristics. With
the introduction of this new kind amorphous coating as interlayer, the vacuum diffusion bonding joint of
W and Cu heating at 950 C for an hour with a load of 30 MPa showed a maximum tensile strength of
about 146 MPa.
2015 Elsevier Ltd. All rights reserved.
Keywords:
Vacuum diffusion bonding
Amorphous interlayer
Microstructure
Tensile strength test
Fracture mechanism
1. Introduction
The refractory metal tungsten is recommended as the leading
candidate for the divertor section of the International Thermonuclear Experimental Reactor (ITER) because of many favorable
properties such as high melting point, high sputtering threshold,
high thermal conductivity and a low coefcient of thermal expansion [1e5], and copper has been proposed as the heat sink material
behind the plasma facing materials (PFM) due to its high thermal
conductivity, high electrical conductivity and high ductility [6,7].
However, the large difference in melting point and coefcient of
thermal expansion between these two metals makes it very difcult to join them together.
Several methods have been developed to fabricate W/Cu Functionally Graded Materials (FGM), such as hot isostatic pressing
(HIP) bonding [7], diffusion bonding [8], powder metallurgy [9e11],
Vacuum plasma spraying [12], mechano-chemical progress [13],
inltration process [14], direct metal laser sintering [15,16], eld-
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2. Experimental details
2.1. Electrodeposition of amorphous FeeW coatings on Cu
Fig. 2. (a) XRD pattern for FeeW coating; (b) TEM selected area diffraction pattern for FeeW coating.
Fig. 3. (a) SEM top view morphology of as-deposited FeeW coating; (b) Cross-section morphology.
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Fig. 4. (a) The line scan map of VDB interface between W and Cu bonded at 900 C; (b) the curve of diffusion depth prole at 900 C.
water and then immersed in the bath as a cathode, in the meantime the inert graphite was selected as the counterpart anode.
The X-ray diffraction pattern of the FeeW coating electrodeposited at 0.05 A cm2 is presented in Fig. 2(a). Only one broaden
peak is found at the angle of approximately 42 , implying that the
as-deposited lm was amorphous. Fig. 2(b) showed the TEM
morphology and the selected area electron diffraction pattern of
the FeeW coating. The concentric aureole of transmission electron
microscope further demonstrated that the FeeW coating is a kind
of amorphous material.
The SEM morphology of the FeeW coating was depicted in
Fig. 3(a). Compact and smooth FeeW coating was successfully obtained by electroplating, and the content of tungsten varies from 22
to 30 at% depending on the cathodic current density applied.
Fig. 3(b) displayed the cross-section prole of the amorphous
FeeW coating, it can be seen that the thickness of the coating is
2.5 0.05 mm under the given plating conditions.
3.2. Interfacial structure of the W/Cu composite
The bonding temperature is important in determination the
formation of reaction phases involving elemental diffusion. The
melting point of copper is 1083 C, which is much lower than
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Fig. 5. (a) The line scan map of VDB interface between W and Cu bonded at 950 C; (b) the curve of diffusion depth prole at 950 C.
solubility limit. One reason for that might be the iron atomic
diffusive rate in W is much lower than that in copper. The
melting point difference is also a probable factor determining
the diffusive behaviors. Figs. 4 and 5 revealed that the diffusion
depth of Fe atom at 950 C is deeper than that at 900 C. Higher
diffusion temperature promotes a good plastic deformation capacity for copper, resulting in better tightness of the connecting
surface. The joint (under optimization bonding conditions) between W, FeeW interlayer and Cu is achieved when interdiffusion between the materials is present without the formation of voids and brittle phases such as Fe2W intermetallic
compounds. The new phases were produced during the
bonding, which would control the ultimate mechanical
properties.
3.3. Tensile strength test
Tensile strength performance further conrms the successful
jointing of W and Cu. The results of tensile strength tests on W and
Cu alloys are listed in Table 1.
As seen, the diffusion joints heated at 900 C and 950 C for a
duration of 60 min is more successful as they are higher in tensile
strength than those of joints obtained at 850 C. During the
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Fig. 6. (a) XRD pattern of the interlayer after heat treatment at 950 C-60 min; (b) The
phase constitution.
s(MPa)
Fracture location
15
142
146
Cu foil/Cu
Interface W side
Interface W side
Fig. 7. Brittle fracture surface of FeeW interlayer of a joint W/Cu, bonded at 900 C for 60 min.
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Fig. 8. (a) Fracture morphology of the interlayer W/Cu, bonded at 950 C for 60 min, A: brittle fracture and B: ductile fracture; EDS element mapping of (b) Cu; (c) Fe; (d) W.
Fig. 9. (a) Fracture morphology of the interlayer W/Cu, bonded at 950 C for 60 min, A and B: brittle fracture; C: ductile fracture; EDS element mapping of (b) Cu; (c) Fe; (d) W.
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Fig. 10. Pictures of the vacuum diffusion bonding W/Cu module samples.
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