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Webinar Q&A
This document summarizes the responses to questions posed before and during the webinar on Acid Gas Cleaning in Aspen HYSYS.
Q: Is the new version of Aspen HYSYS that contains Acid Gas Cleaning a patch or a standalone version?
A: Acid Gas Cleaning is available in Aspen HYSYS V8.3, which is a new version that has a free upgrade for current users. For more
information, please visit http://www.aspentech.com/products/order-now/.
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Q: How many tokens does Acid Gas Cleaning cost?
A: Acid Gas Cleaning is a new feature introduced as a part of Aspen HYSYS for versions V8.3 and above. It does not cost any extra
tokens and can be accessed directly from Aspen HYSYS.
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Q: How have you validated the performance of your models? Can we have access to the validation data?
A: AspenTech has validated the results from Acid Gas Cleaning models in two ways: with Vapor-Liquid Equilibrium (VLE) data and with
operational data. The VLE data are published references anyone can access, but the access to plant data is restricted. Operational
data was validated using data that was provided to us by some of our customers, and also through external consultants who tested
our software. Since this included plant data from our customers that are under agreement, we cannot share that information.
However, we will publish a white paper soon to further discuss our validation methods and the encouraging results we obtained.
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Q: How does the new Acid Gas Cleaning functionality compare with previous Aspen HYSYS solutions and competitors?
A: The new Acid Gas Cleaning tool is a more powerful rate-based system backed by Aspen Properties for a more fundamental
modeling of the process. We have seen much better results with Acid Gas Cleaning now than were previously obtained in Aspen
HYSYS, since it uses electrolyte NRTL models in the property package for the thermodynamics, and also uses a mass-and-heat transfer
rate-based calculation method to solve the columninstead of the current widely used equilibrium calculation model. AspenTech
also engaged independent consultants to benchmark the results obtained with our new Acid Gas Cleaning functionality. The
comparison was completed using Plant Data.
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Q: What solvents are available for the Acid Gas Cleaning process in Aspen HYSYS V8.3? What amines and amine blends are
supported? What are the supported solvents?
A: Currently, we only support chemical amine-based solvents. The following amines and amine blends are available: MEA, DEA,
MDEA, PZ, DGA, DIPA, TEA, MDEA + PZ, Sulfolane + MDEA (Sulfinol-M), and Sulfolane + DIPA (Sulfinol-D). If proprietary blends include
any of the supported blends, they can be modeled in Aspen HYSYS. Physical solvents are currently not supported.
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Q: Does the new Aspen HYSYS only model gas treating or is liquid stream treating also supported?
A: In Aspen HYSYS V8.3, only gas treating using amine-based systems has been validated.