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.
. And so on
.
f n (1, 2, 3................... n)=0
Here the equations matrix is represent as
f 1 ( 1, 2, 3................... n )
f 2 ( 1, 2, 3................... n )
f ()= f 3 ( 1, 2, 3................... n )
......
......
f n ( 1, 2, 3................... n )
Linear approximations for vectors is done in this fashion.
f ()=f ( 0)+ Df ( 0)(0 )................1
f 1 ( 0)
1
f 2 ( 0)
Df (0 )= 1
...
f n ( 0 )
1
f 1 ( 0 )
2
f 2 ( 0 )
2
...
f n ( 0 )
2
...
...
...
...
f 1 ( 0 )
n
f 2 ( 0 )
n
...
f n ( 0 )
n
Q2)
Use the above method to solve
x 1+2 x 2=2 ..............1
x 1 +2 x2 2
x 21 +4 x22 4
x1 x1
1 2 1 x 1+2x 22
( )=( ) (
) ( 2 2 )
2
x
8
x
x 2 x 2 initial
x 1+4 x 24
1
2
In the first iteration the values of
In the second iteration values of
In the third iteration values of
x 1=0.5 , x 2=1.25
x 1=0.08333 , x 2=1.04166
x 1=3.205103 , x2 =1.0016
x 1=1 , x 2=1
x 1=0 , x2 =1
x 2 is
Q3)
A)
Assuming electrons as the only type of carriers and an undoped semiconductor,
write the appropriate form of poissons equation for electrostatics (assume that the
current is zero, and Maxwell-Boltzmann statistics for carriers).
From the electrostatics the poisson equation is given as
2 =
where
Initially because of temperature there are electron hole pairs generation and they are in equal in
number.
At equilibrium electron concentration is equal to hole concentration and that is called as intrinsic
electron or hole concentration.
Even by applying electric field the electron hole pairs are generated at certain temperature.
But according to the question here it is assumed that only electrons are generated.
Initially the electrons are assumed to be of number ni and it is intrinsic concentration.
After applying the electric field the number of electrons are going to be
ni e
q i
k BT
2 =
qni e
q i
kB T
B)
Discretize the above equation such that finite difference method could be used to
solve the same.
q i
2 kB T
qni h e
i +12 i + i1=
C)
here
When the equations are written in linearized taylor series then the matrix is
...
0 1
q
1initial value
1 1
q2 ni 2 k T
( ... )=( ... ) (1 2
)
e
....) (
...
kBT
n n initial
0
..
0
1
1
...
0 1
q
q 2 ni 2 k T
1 2
e ....
kB T
..
0
1
1
Qd)
Consider a semiconductor (say, Silicon) of thickness 200m. Assume that one
end (A) is held at at 100mV while the other (B) is held at zero potential. Using a-c
given above, solve for this system using Newtons method. Use a linearly varying
potential profile as the initial guess. Plot the potential and carrier density profiles.
plot:
Qe)
Repeat (d) for applied biases like 200mV, 400mV, and 600mV. Analyze your
solutions
plots for 200mV
From above graphs it is observed that as the voltage is increased the accumulation of charges at the
edge(x=0) . As we go away from the edge the charge concentration is same for all the
voltages(0.1,0.2,0.4,0.6). This indicates that even though the decrement is same for all voltages away
from the edge the increment in charge particles at edge becoming prominent as the voltage is
increased. The additional number of charge particles are supplied by source when we consider the
semiconductor is grounded. Ground acts like a negative potential souce.
CODE FOR 200mV
clear all
clear all
close all
L=2*10^-4;
nx=200;
p=linspace(0,L,nx);
dx=p(nx-1)-p(nx-2);
A=zeros(nx,nx);
rhs=zeros(nx,1);
z=zeros(nx,1);
y=zeros(nx,1);
k=(dx^2)*8.95*10^8;
for i=1:nx
z(i,1)=-500*p(i)+0.1;
end
for i=2:nx-1
rhs(i,1)=z(i+1,1)-2*z(i,1)+z(i-1,1)-((dx^2)*2.3198*10^7)*(exp(38.68168*z(i,1)));
end
rhs(1,1)=z(1,1)-0.2;
rhs(nx,1)=z(nx,1);
count=0;
for i=1:nx
if(abs(rhs(i,1))>0.00000001)
count=count+1;
end
end
fprintf('%d',count);
while (count>10)
count=0;
for i=2:nx-1
A(i,i)=-2-k*exp(38.68168*z(i,1));
A(i,i-1)=1;
A(i,i+1)=1;
end
A(1,1)=1;
A(nx,nx)=1;
for i=2:nx-1
rhs(i,1)=z(i+1,1)-2*z(i,1)+z(i-1,1)-((dx^2)*2.3198*10^7)*(exp(38.68168*z(i,1)));
end
rhs(1,1)=z(1,1)-0.2;
rhs(nx,1)=z(nx,1);
for i=1:nx
if(abs(rhs(i,1))>0.000001)
count=count+1;
end
end
z=z- inv(A)*rhs;
end
for i=1:nx
y(i,1)=1.5*10^16*exp(38.68168*z(i,1));
end
%plot(p,z);
plot(p,y);
grid on;
xlabel('distance');
ylabel('particle density');
%ylabel('potential');
rhs(i,1)=z(i+1,1)-2*z(i,1)+z(i-1,1)-((dx^2)*2.3198*10^7)*(exp(38.68168*z(i,1)));
end
rhs(1,1)=z(1,1)-0.4;
rhs(nx,1)=z(nx,1);
for i=1:nx
if(abs(rhs(i,1))>0.000001)
count=count+1;
end
end
z=z- inv(A)*rhs;
end
for i=1:nx
y(i,1)=1.5*10^16*exp(38.68168*z(i,1));
end
%plot(p,z);
plot(p,y);
grid on;
xlabel('distance');
ylabel('particle density');
%ylabel('potential');
A(i,i)=-2-k*exp(38.68168*z(i,1));
A(i,i-1)=1;
A(i,i+1)=1;
end
A(1,1)=1;
A(nx,nx)=1;
for i=2:nx-1
rhs(i,1)=z(i+1,1)-2*z(i,1)+z(i-1,1)-((dx^2)*2.3198*10^7)*(exp(38.68168*z(i,1)));
end
rhs(1,1)=z(1,1)-0.6;
rhs(nx,1)=z(nx,1);
for i=1:nx
if(abs(rhs(i,1))>0.000001)
count=count+1;
end
end
z=z- inv(A)*rhs;
end
for i=1:nx
y(i,1)=1.5*10^16*exp(38.68168*z(i,1));
end
%plot(p,z);
plot(p,y);
grid on;
xlabel('distance');
ylabel('particle density');
%ylabel('potential');
Qf)
Assume that SiO 2 of thickness 20nm is deposited at the end A and the potential is
applied across the SiO2 and the Semiconductor. Modify your code in (d) and find
the carrier density profiles inside the semiconductor for an applied bias of 1V.
Comment on your results.
PLOT:
POTENTIAL VS DISTANC:
From above graph the potential across the oxide changes linearly. And from the graph it is
observed that the voltage drop across the oxide is approximately 0.13 V. so the remaining
voltage is going to drop across semiconductor and the charge particles at the edge will be more
compared to earlier voltages(0.1,0.2,0.4,0.6).