NANOLITHOGRAPHY OF GRAPHENE USING

ATOMIC FORCE MICROSCOPY

ABSTRACT
Graphene is a two-dimensional (2D) single-atomic-layer material in which carbon
atoms are arranged in a honeycomb lattice. Graphene has high intrinsic carrier mobility,
unique band structure and many desirable physical properties at room temperature. It is
considered a promising material for ultrahigh speed and low power applications. One reason
this wonder-material has not been found in wide existence is because of the complications in
its fabrication. Electron beam lithography (EBL) followed by oxygen plasma etching is a
typical nanofabrication method to create patterns on graphene. However, it is found that the
etching process induces disorders and results in carrier mobility degradation in graphene.
Furthermore, it is difficult to observe the atomic structure and crystallographic orientation of
graphene using EBL.
Graphene layers are measured in terms of 10s of nanometres. So the lithographic
techniques required for graphene fabrication almost always violate the possible lithographic
wavelengths. These methods can only be applied on a limited range of underlying substrate
materials, which greatly hinders the applications of graphene. A viable solution is to adopt
various nanolithographic techniques like Extreme UV lithography (EUV), Multiple
Patterning lithography (MPL) and Atomic Force Microscopy (AFM). Among the patterning
techniques for graphene, AFM based nanolithography possesses the capabilities that are
specifically suitable for the precise control of graphene patterning, which include atomic
resolution imaging ability, resist-free process, direct-patterning, high degree of robustness
and precise patterning ability. An atomic force microscope (AFM) can be used to create
electronic nanostructures by means of mechanical ploughing or local anodic oxidation.
Different modes of AFM are being used in nano-scale fabrications. These are conveniently
selected depending on the nature of the material to be fabricated. AFM based nanolithography
is heavily dependent on the substrate on which the layer is being fabricated. So the selection
of substrate material also becomes an important criterion.

REFERENCE

Substrate Effect on Atomic Force Microscopy-Based Nanolithography of Graphene

- Xin Tang and King Wai Chiu Lai;
IEEE TRANSACTIONS ON NANOTECHNOLOGY, VOL.15, NO.4, JULY 2016
Quantitative Study of AFM-based Nanopatterning of Graphene Nanoplate
- Xin Tang and King Wai Chiu Lai
Proceedings of the 14th IEEE International Conference on Nanotechnology Toronto,
Canada, August 18-21, 2014