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1. Andre Anders and Simone Anders, Working Principle of the Hollow-Anode Plasma
Source, Lawrence Berkeley National Laboratory, University of California, Berkeley, CA
94720.
4. Growth analysis
6. http://www.nanoscience.com/technology/sem-technology/how-sem-works/
8. Metal Organic Chemical Vapor Deposition: Technology and Equipment, John L.Ziklo.
10. http://www.plasmaequip.com/WHAT%20IS%20PECVD.pdf
11. https://www.oxford-instruments.com/products/etching-deposition-and-growth/plasma-
etch-deposition/pecvd
12. http://www.meaglow.com/research-reactor/
13. Growth and Characterization of Group III- Nitrides by Migration- Enhanced After Glow
Epitaxy, Rositsa Gergova.
14. Gallium Nitride, Indium Nitride, and Heterostructure Development Using the MEAglow
Growth System, Peter W. Binsted
15. http://www.madsci.org/posts/archives/2001-02/981758142.Ph.r.html
16. http://physics.stackexchange.com/questions/266010/alternate-light-and-
dark-regions-in-cathode-ray-tube
17. Radio Frequency Plasma Sources for Semiconductor Processing, Francis F. Chen.
18. P. W. Binsted, K. S. A. Butcher, D. Alexandrov, P. Terziyska, D. Georgieva, R.
Gergova, and V. Georgiev, InN on GaN Heterostructure Growth by Migration
Enhanced Epitaxial Afterglow (MEAglow), MRS Proc., vol. 1396, Jan. 2012.
3. David B. Grave, Mark J. Kushner, Low Temperature Plasma Science, Department of Energy
Office of Fusion Energy Science workshop on low temperature plasmas, March 2008.
4. Matthew and Richard Bersin, Whats the cause of Crooks Dark Space & striations in
discharge tubes, Jan.2001.
7. A. Ganguli, R.D. Tarey, Understanding Plasma Sources, Centre of Energy Studies and
Department of Physics, Indian Institute of Technology, India.
8. Andre Anders and Simone Anders, Working Principle of the Hollow-Anode Plasma
Source, Lawrence Berkeley National Laboratory, University of California, Berkeley, CA
94720.
10. John L.Ziklo, Metal Organic Chemical Vapor Deposition: Technology and Equipment.
11. Arjen Boogaard, Nijmegen, Plasma- Enhanced Chemical Vapour Deposition of Silicon
Dioxide, Netherlands, 2011.
13. Peter W. Binsted, Gallium Nitride, Indium Nitride, and Heterostructure Development
Using the MEAglow Growth System, Ph.D. diss: Lakehead University, 2014.
14. Jonny Tot, Low Temperature Epitaxial Growths of III- Nitride Semiconductors on ITO
Glass Substrates, Ph.D. diss: Lakehead University, April 2016.
17. Barbara L Dutrow and Christine M. Clark, X-ray power diffraction (XRD), Eastern
Michigan University, Louisiana State University.