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N Pérez
SM Olaizola
2004
Structure
Atoms in semiconductors are arranged in crystals periodic structures
↑R METAL
If ↑T
↓R SEMICONDUCTOR
e- EC
Creation of an electron (e-) in the
conduction band
EV
EC
Creation of a hole (h+) in the
valence band
EV
Charge: e- = -q ; h+ = +q
Effective mass m*:
Function of the semiconductor (SC) material
Kmass of the e- within vacuum, mo
dv dv dv
F = −q ⋅ ξ = mo ⋅ F = − q ⋅ ξ = mn* ⋅ F = − q ⋅ ξ = m*p ⋅
dt dt dt
Quantum mechanical formulations
m n* mp*
The constants and are known values and they are different for
mo mo
every semiconductor.
Carrier number and doping
Pure semiconductor ≡ intrinsic semiconductor n = p = ni
Insignificant amount of impurity atoms Si Ge GaAs
ni: intrinsic carrier concentration ni (cm-3) 1010 2·1013 2·106
e-
p-type doping
EC EC EC
EV EV EV
T=0K ↑T Room T
n-type doping
EC EC EC
EV EV EV
T=0K ↑T Room T
Carrier Distribution: Density of states and
Fermi level (I)
3kT EC
Equilibrium carrier concentrations EF: non degenerate
Non-degenerate situation: EV + 3kT ≤ EF ≤ EC - 3kT 3kT
EV
E F − EC
n = NC ⋅ e kT
Concentrations of electrons (n) and holes (p)
EV − E F
3
p = NV ⋅ e kT
2 ⋅π ⋅ m ⋅ k ⋅ T
* 2
where: N C ,V = 2 ⋅ n, p
2
h
NC,V: effective density of conduction (valence) band states
Carrier Distribution: Equilibrium carrier
concentrations (II) and Fermi level determination
In equilibrium: n ⋅ p = n i2
Charge neutrality relationship:
uniformly doped semiconductor
+ every section of the sc is charge-neutral
equilibrium conditions
q ⋅ p − q ⋅ n + q ⋅ N D+ − q ⋅ N A− = 0 p − n + ND − N A = 0
Γ: zone center (k = 0)
Χ: zone end along <100> direction
L: zone end along <111> direction
E-k diagrams
GaAs
[ ( )]
1
Electron effective mass m = N ⋅ m ⋅m
*
n
2
el
*
l
*
t
3
2
*
( ) + (m )
3 3 3
Hole effective mass m*p = mhh 2 * 2
lh
Band gap Energy
EV E2 > Eg K. E.
EC Pair e--h+ created
Ehole = E - EC
EV Eelectron = EV - E
K. E.
K. E.
EC
Etotal r
V ( x ) = − (EC − Eref )
P. E. 1 1 dEC
EV and ξ = ⋅
Eref
q q dx
Band Bending
ξ
Drift current density:
+ - r r
+ - J P = q ⋅ µ p ⋅ p ⋅ε for holes
µn,p: e-, h+ mobilities
r r
r
J P,N
J N = q ⋅ µn ⋅ p ⋅ε for electrons n, p: e-, h+ concentrations
Carrier actions: Diffusion
JPldiff JNldiff
J Pldiffusio n = − q ⋅ D p ⋅ ∇p
+ + - - J Nldiffusion = q ⋅ Dn ⋅ ∇n
+ + + - - -
+ + + + - - - - Dn, p: Diffusion coefficients for e- and h+
x x
- EC Photogeneration process
Light hν
hν > Eg
EV
EV
- EC
Heat
+ X Direct thermal recombination
X EV
Carrier actions:
Recombination – Generation (II)
Indirect thermal R-G processes more common than
direct band to band processes
Indirect thermal R-G processes R-G centres
EC • Impurities or defects
ET • R-G centre concentration normally << ni
EV • Introduce allowed electronic levels near the
Recombination Generation centre of the gap: ET
P-N Junctions
Diffusion
diffusion Static charges build up
drift
Built-in potential
- Drift current
+
W
Carrier concentrations
Carrier density
nno
pno
pno
nno
W x
P-N Junctions
Built-in potential
K BT N A N D
Vbi = ln 2
Charge density (ρ) q n
i
1
2k sε oVbi N A + N D 2
W =
V(x) q N N
A D
V (x ) = −
1
(EC − Eref )
q
1 dEi
ξ= ⋅
q dx
k sε o d 2 Ei
ρ = 2
q dx
http://ece-www.colorado.edu/~bart/book/book/
P-N Junctions: Forward Bias
- Vj +
Forward bias +
P N
-
VA
• VA > 0
• Junction Voltage: Vj
• At equilibrium: Vj = Vbi
• Forward bias: Vj = Vbi - VA
1
2k ε N + N D 2
Depletion region width (W) W = s o (Vbi − VA ) A
q N A N D
http://ece-www.colorado.edu/~bart/book/book/
P-N Junctions: Reverse Bias
- Vj +
Reverse bias + -
P N
VA
• VA < 0
• Reverse bias: Vj = Vbi – VA
1
2k s ε o N A + N D 2
Depletion region width (W) W = ( )
Vbi − VA VA < 0 !!
q N A N D
http://ece-www.colorado.edu/~bart/book/book/
P-N Junctions
Ideal Diode equation
Diode reverse saturation current
D
qV A
D
I o = qA N n po + P pno
I = I o e − 1
KT where
LN Lp
DN,P: e-, h+ diffusion constant
LN,P: e-, h+ minority carrier diffusion length
1
A qK sε o N A N D 2
CJ =
2( N A + N D )
1
(Vbi − VA ) 2