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Materials Transactions, Vol. 47, No. 7 (2006) pp.

1788 to 1792
#2006 The Mining and Materials Processing Institute of Japan

Copper Leaching Behavior from Waste Printed Circuit Board


in Ammoniacal Alkaline Solution
Kazuya Koyama1 , Mikiya Tanaka1 and Jae-chun Lee2
1
Metals Recycling Group, Research Institute for Environmental Management Technology,
National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba 305-8569, Japan
2
Minerals and Materials Processing Division, Korea Institute of Geoscience & Mineral Resources(KIGAM),
30, Gajeong-dong, Yuseong-gu, Daejeon 305-350, Korea

A novel energy-saving hydrometallurgical recovery process for copper from electronic scrap employing the Cu(I)-ammine complex has
been presented on the basis of a thermodynamic consideration. In order to experimentally explore the feasibility of the leaching stage in this
process, the copper leaching behavior from a printed circuit board (PCB) in ammoniacal alkaline solutions has been investigated under a
nitrogen atmosphere. Copper in PCB was oxidized by Cu(II) to form Cu(I)-ammine complex ions. The leaching reaction can be expressed as:
Cu Cu(NH3 )4 2 2Cu(NH3 )2 . The Cu(II)-ammine complex signicantly enhanced the leaching rate, while the Cu(I)-ammine complex
slightly depressed it. Crushing of the PCB eectively enhanced the leaching rate, because the exposed metallic copper area is increased by the
crushing. The eect of temperature on the leaching rate was insignicant. Consequently, the feasibility of the leaching stage in the proposed
copper recovery process has been experimentally conrmed. [doi:10.2320/matertrans.47.1788]

(Received January 5, 2006; Accepted May 10, 2006; Published July 15, 2006)
Keywords: copper recycling, energy-saving, oxidative leaching, printed circuit board, cupric ammine solution, cuprous ammine solution

1. Introduction experimental verication, the copper leaching behavior from


a PCB in the Cu(II)-NH3 -(NH4 )2 SO4 solutions was studied
The recovery of various metals from waste materials is an under a nitrogen atmosphere.
important issue in order to conserve the environment and
metal resources. Copper is used for cables, electric applian- 2. Copper Recovery Process
ces, etc., and is a very important material for industries in
now and the future. A printed circuit board (PCB) also The potential-pH diagram is a useful tool for understand-
contains copper in addition to many kinds of valuable metals ing various reactions such as the electrochemical reaction,
such as gold, silver, palladium, nickel and so on. The copper neutralization, etc., in aqueous solution.
content in the PCB is 10 to 30 mass%, which is the highest Figure 1 shows the potential-pH diagram of the Cu-NH3 -
among the metallic elements. There are two ways to recover H2 O system. This gure is obtained under the conditions that
copper, either pyrometallurgically or hydrometallurgically. the Cu activity is 0.5 and the sum of the concentrations of
Hydrometallurgical treatments generally have more exibil- NH3 and NH4 is 7 kmol m3 . The broken lines in this gure
ities during the process scale and control. Sulfuric and show the following reactions:
hydrochloric acid solutions are often employed as leaching 2H 2e H2 1
agents in the hydrometallurgical treatment; however, in these
O2 4H 4e 2H2 O 2
cases, the separation processes tend to become complicated
because of the poor selectivity during the leaching. Neither Cu(I) nor Cu(II) are stable ionic species in neutral
It has been reported that certain kinds of complexing and alkaline solutions without complexing agents, i.e., NH3
agents are eective for selective leaching.16) Majima et al. or CN . In the presence of excess ammonia, however, Cu(I)
reported the selective leaching of copper from motor scraps and Cu(II) are stable as Cu(NH3 )2 and Cu(NH3 )4 2 in
using cupric ammine solutions.1,2) Zhou et al. studied the neutral and alkaline solutions, respectively. The oxidation-
removal of copper from ferrous scrap by an ammonia reduction reactions of Cu(II)/Cu(I) and Cu(I)/Cu are ex-
leaching method.3,4) In these studies, Cu(I) ions were pressed as follows:
obtained under an air or oxygen atmosphere as the reaction Cu(NH3 )4 2 e Cu(NH3 )2 2NH3 3
product, and then metallic copper would be electrowon from 
Cu(NH3 )2 e Cu 2NH3 4
a sulfuric acid solution obtained by solvent extraction-
2
stripping. During this electrowinning, one mole of copper The oxidation-reduction potential of Cu(NH3 )4 /
deposition at the cathode requires two moles of electrons, and Cu(NH3 )2 is greater than that of Cu(NH3 )2 /Cu, which
oxygen is evolved at the anode. Its power consumption is indicates that Cu(NH3 )4 2 can work as an oxidizing agent for
2000 to 2500 kWh ton1 .7) In order to facilitate the hydro- metallic copper in an ammoniacal alkaline solution. Also, the
metallurgical copper recycling, a process requiring much less oxidation-reduction potential of Cu(I)/Cu is greater than that
energy should be developed. of hydrogen evolution (eq. (1)), which indicates that Cu(I)
In this paper, a novel energy-saving hydrometallurgical can be preferentially reduced to metallic copper.
process for copper recovery from electronic scraps employ- The reactions at the cathode and anode predicted by the
ing the Cu(I)-ammine complex is proposed on the basis of a thermodynamic consideration, theoretical cell voltage, and
thermodynamic consideration. As the rst step for its the power consumption in the electrowinning stage are
Copper Leaching Behavior from Waste Printed Circuit Board in Ammoniacal Alkaline Solution 1789

0.8 Crushed PCB


O2
0.6
Cu2+ (2)
Cu(OH)2
Potential, E / V vs SHE

0.4 Cu(NH3)42+
Cu(OH)2 Leaching of PCB
0.2 Cu2O
(Cu(I) is produced) Residue
0
Cu(NH3)2+
-0.2
Cu2O
(1) Cu
-0.4 Purification
H2 (Zn, Ni, Ag, etc.,
-0.6 are removed)
-0.8
0 2 4 6 8 10 12 14
To cathodic compartment
pH
Fig. 1 Potential-pH diagram of the Cu-NH3 -H2 O system at 298 K
Electrowinning
calculated by assuming that the activity of copper is 0.5 and that the with diaphragm
total concentration of the ammonia is 7.0 kmolm3 . (Cathode: Cu is deposited
Anode:Cu(II) is produced)

Table 1 Comparison of electrowinning between this work and conven-


tional system. Anodic solution Cu metal
This work Conventional Fig. 2 Flowsheet of the copper recovery process with ammoniacal alkaline

Cu(NH3 )2 e  solution.
Cathode Cu2 2e Cu
Cu 2NH3
Cu(NH3 )2 2NH3 1
Anode H2 O O2 2e 2H
Cu(NH3 )4 2 e 2 the leaching process. The expected advantages of this process
Theoretical cell are as follows.
0.20 0.89
Voltage/V
a) Selectivity of the copper leaching is high, because iron,
Theoretical power
and aluminum are not dissolved.
consumption 84 750
/kWh ton1 b) Power consumption is low during the electrowinning
stage due to electrodeposition from Cu(I) at the cathode
and electrolytic oxidation of Cu(I) at the anode.
c) Additional oxidative agents are not necessary, because
shown in Table 1. The theoretical cell voltage and the power Cu(II) produced at the anode works as the oxidative
consumption by this work are much lower than those by the agent for copper in the wastes.
conventional process. This is due to the Cu(I) oxidation to
Cu(II) at the anode as well as the monovalent electro- 3. Experimental
deposition at the cathode.
On the basis of the above thermodynamic considerations, A PCB, on which no electronic device was mounted,
the copper recovery process consisting of a leaching and consisting of four layers in part, each plated with copper, was
electrowinning from Cu(I) is now presented in Fig. 2. The crushed to the average particle diameter of 3.4 mm and
waste PCB containing metallic copper is immersed in the 1.5 mm. The former was used in the leaching experiment
cupric ammoniacal solution during the leaching stage. The unless otherwise stated. The copper content in the PCB was
copper in the PCB is dissolved as cuprous ions, and the cupric 9.5 mass%. Copper particles with the average diameter of
ions are simultaneously reduced to cuprous ions. Certain 0.83 mm (99.85% purity, Kanto Chemical Co., Inc.) were
types of metals such as nickel and zinc, which form ammine also used in the leaching experiment. The leaching solutions
complexes, can be simultaneously dissolved. These ions were prepared by dissolving cupric sulfate pentahydrate,
should be separated during the purication stage. The .
CuSO4 5H2 O (98% purity, Wako Pure Chemical Industries,
puried solution, thus obtained for the electrowinning stage, Ltd.), cuprous oxide, Cu2 O (99% purity, Kanto Chemical
is poured into the cathodic compartment of the electrolytic Co., Inc.), ammonia solution, NH3 (25% purity, Wako Pure
cell with a diaphragm. Half of the Cu(I) ions are then reduced Chemical Industries, Ltd.), and ammonium sulfate, (NH4 )2 -
to metallic copper and the remaining half are transferred to SO4 (99.5% purity, Wako Pure Chemical Industries, Ltd.).
the anodic compartment in order to oxidize to Cu(II). The All the aqueous solutions were prepared using deionized
Cu(II) ions thus obtained are used as the oxidizing agent in water having a specic resistivity of 5  104 ohmm. Nitro-
1790 K. Koyama, M. Tanaka and J. Lee

gen gas was bubbled through the deionized water for 24

Cu concentration, C /kmol m-3


hours before preparation of solution in order to remove the
oxygen in the water.
In the leaching experiment using the copper particles, the 0.2
Cu(II) concentrations in these solutions were measured by a Cu(I)
colorimetric method, because Cu(II) in the ammoniacal
alkaline solution shows an absorbance peak at around a
0.15
630 nm wavelength and Cu(I) does not show an absorbance
peak at this wavelength. On the other hand, the total copper 0.1
were analyzed using ICP-AES (Seiko Instruments Inc. SPS-
4000). Thus, the Cu(I) concentrations were obtained by the
dierence between the total copper concentrations and Cu(II) 0.05 Cu(II)
concentrations. These leaching experiment and colorimetric
measurement were conducted under a nitrogen atmosphere in
a glove box to prevent the oxidation of Cu(I). 0
In the leaching experiment using the PCB, a 200 cm3 0 1 2 3 4 5
aqueous solution and a 10 g PCB were placed in a ask Time, t / h
under a nitrogen atmosphere. Nitrogen gas was introduced
into the reaction vessel through a saturator of 5 kmol m3 Fig. 3 Time variation of concentrations of Cu(I) and Cu(II). (Cu particle:
10 g, CuSO4 : 0.1 kmol m3 , NH3 : 5 kmol m3 , (NH4 )2 SO4 : 1 kmol m3 ,
NH3 -1 kmol m3 (NH4 )2 SO4 solution to prevent oxidation
Temp.: 298 K)
of the Cu(I)-ammine complex ions produced during the
leaching experiments. The solution was agitated by an
impeller at the rotating speed of 200 rpm. The reaction vessel
Ratio of the amount of Cu(I) increase to

was placed in a water bath kept at a specic temperature.


A 5 cm3 aliquot of the solution was periodically removed
for analysis. The copper concentrations were analyzed using
ICP-AES. The percentage of the leached copper was de-
termined as
3
that of Cu(II) decrease / -

Cu leaching (%)
Dissolved copper/g 2
 100 5
The amount of copper in PCB/g

4. Results and Discussion 1

A leaching experiment using the copper particles was


carried out in order to investigate the behaviors of the Cu(I) 0
and Cu(II) concentrations. An aqueous solution of 0.1 0 1 2 3
kmol m3 CuSO4 -5 kmol m3 NH3 -1 kmol m3 (NH4 )2 SO4
was used as the leaching solution. Figure 3 shows the time
Time, t / h
variation of the Cu(I) and Cu(II) concentrations. The Cu(I) Fig. 4 Ratios of the amount of Cu(I) increase to that of Cu(II) decrease at
and Cu(II) concentrations increased and decreased with time, each interval. (Cu particle: 10 g, CuSO4 : 0.1 kmol m3 , NH3 : 5 kmol m3 ,
respectively. As is clear in this gure, copper was dissolved (NH4 )2 SO4 : 1 kmol m3 , Temp.: 298 K)
in this aqueous solution. The Cu(I) concentration after
leaching for 4-hours was found to be twice that of the initial
concentration of Cu(II). blue, decreased and, simultaneously, that of the Cu(I)-
In order to determine the leaching reaction, the ratio of the ammine complex, which is colorless, increased.
amount of Cu(I) increase to that of Cu(II) decrease at each The time variation in the copper leaching from PCB is
interval was shown in Fig. 4. They were found to be a shown in Fig. 5. An aqueous solution of 0.3 kmol m3
constant value of 2, which means that 2 moles of Cu(I) ions CuSO4 -5 kmol m3 NH3 -1 kmol m3 (NH4 )2 SO4 was used
were produced when 1 mole of Cu(II) ions was consumed as as the leaching solution. The percentage of the leached
the oxidizing agent. The leaching reaction is expressed by the copper increased with time and reached 67% and 82% after 2
following stoichiometric relation: and 4-hours leaching, respectively. Copper in the crushed
PCB consisted of three types: (i) electroplated on the PCB,
Cu Cu(NH3 )4 2 2Cu(NH3 )2 6
(ii) liberated from the PCB, and (iii) buried inside the PCB.
This leaching reaction corresponds to the previously describ- The leaching rate of copper inside the PCB is much lower
ed thermodynamic consideration. than that on the surface due to the limited exposed area of the
The color of the solution changed from navy blue to pale former, which resulted in the decreasing leaching rate with
blue. This is because, with the progress of leaching, the time. The time variation of the oxidation-reduction potential
concentration of Cu(II)-ammine complex, which is navy (ORP) is also shown in this gure. The oxidation-reduction
Copper Leaching Behavior from Waste Printed Circuit Board in Ammoniacal Alkaline Solution 1791

100 400 100

Potential, E / mV vs SHE
80 300
80
Leaching (%)

60 200

Leaching (%)
60
40 100 Average particle
Diameter, D / mm
20 0 40
3.4
0
0 1 2 3 4 5 20 1.5
Time, t / h

Fig. 5 Time variation of concentrations of copper leaching and oxidation- 0


reduction potential. (PCB: 10 g, CuSO4 : 0.3 kmol m3 , NH3 : 5 kmol m3 , 0 1 2 3 4 5
(NH4 )2 SO4 : 1 kmol m3 , Temp.: 298 K)
Time, t / h
Fig. 6 Eect of the size of PCB on the leaching rate. (PCB: 10 g, CuSO4 :
potential rapidly decreased with time during the initial stage 0.3 kmol m3 , NH3 : 5 kmol m3 , (NH4 )2 SO4 : 1 kmol m3 , Temp.: 298 K)
of leaching and then gradually after 30 minutes. The
oxidation-reduction reaction, which determines the oxida-
tion-reduction potential, is as follows:
Cu2 e Cu 7 C(CuSO4) / kmol m-3
RT aCu 100 0
E E0  ln 8
F aCu2 0.1
where the symbols E, E0 , R, T, F and a are the potential, 80 0.3
Leaching (%)

standard potential, gas constant, temperature, Faraday con-


stant and activity, respectively. It was assumed that Cu and
Cu2 activities increased in proportion to the concentrations 60
of the Cu(I)-ammine complex ion and Cu(II)-ammine
complex ion, respectively. The Cu(II) concentration only
slightly decreased with during the experiment since the 40
Cu(II) in the initial aqueous solution was quadruple as much
as the copper in the PCB. Therefore, the decrease in the 20
oxidation-reduction potential indicates that the concentration
of the Cu(I)-ammine complex ion increased with time, which
corresponds to Fig. 3. 0
Figure 6 shows the eect of the average diameter of PCB 0 1 2 3 4 5
on the copper leaching. An aqueous solution of 0.3 kmol m3
CuSO4 -5 kmol m3 NH3 -1 kmol m3 (NH4 )2 SO4 was used as
Time, t / h
the leaching solution. Although the copper contents were the Fig. 7 Eect of the Cu(II) concentration on the leaching rate. (PCB: 10 g,
same, the leaching rate for the smaller PCB particles was NH3 : 5 kmol m3 , (NH4 )2 SO4 : 1 kmol m3 , Temp.: 298 K)
greater than that for the larger one. The percentage of leached
copper in the PCB with a 1.5 mm average diameter was 93%
after 2.5-hours leaching, while that in the PCB with a 3.4 mm was varied from 0 to 0.3 kmol m3 , the leaching rate was
was 82% after 4-hours leaching. Copper on the surface of the signicantly enhanced. The percentages of the leached
PCB completely dissolved after the experiment using the copper after 4-hours leaching were 1, 30 and 82% for the
PCB particles with a 3.4 mm average diameter. Copper inside initial Cu(II) concentrations of 0, 0.1 and 0.3 kmol m3 ,
the layer, however, did not completely dissolved due to the respectively. Enhancement of the leaching rates with the
insucient diusion of the solution containing the oxidizing Cu(II) concentration were reported in the previous paper.3)
agent. The longer crushing time makes the PCB particles When the initial Cu(I) concentration was varied from 0 to
smaller and the exposed area of copper inside the PCB 0.2 kmol m3 , the leaching rate slightly decreased. The
greater. From this result, crushing was found to enhance the percentages of the leached copper after 4-hours leaching
leaching rate. were 82, 71 and 68% for the initial Cu(I) concentrations of
Figures 7 and 8 depict the eects of the initial Cu(II) and 0, 0.1 and 0.2 kmol m3 , respectively. Smith et al. studied
Cu(I) concentrations on the copper leaching, respectively. the kinetics of the dissolution of copper in cupric ammonium
Copper(II) acts as an oxidizing agent in this study and Cu(I) carbonate solutions and reported the similar eect of the
is the reaction product. When the initial Cu(II) concentration Cu(I) concentration on the dissolution rate.8)
1792 K. Koyama, M. Tanaka and J. Lee

C(Cu(I)) / kmol m-3


100 0 100
0.1
0.3
80 80
Leaching (%)

Leaching (%)
60 60

40 Temp.,T / K
40
298
20 20 313
328
0 0
0 1 2 3 4 5 0 1 2 3 4 5
Time, t / h Time, t / h
Fig. 8 Eect of the Cu(I) concentration on the leaching rate. (PCB: 10 g,
CuSO4 : 0.3 kmol m3 , NH3 : 5 kmol m3 , (NH4 )2 SO4 : 1 kmol m3 , Temp.: Fig. 9 Eect of the temperature on the leaching rate. (PCB: 10 g, CuSO4 :
298 K) 0.3 kmol m3 , NH3 : 5 kmol m3 , (NH4 )2 SO4 : 1 kmol m3 )

The eect of the temperature on the copper leaching slightly depressed it. Increasing the exposed area of metallic
from PCB was also studied. Figure 9 shows the leaching copper by crushing the PCB was important in order to
rate curves for 0.1 kmol m3 CuSO4 -5 kmol m3 NH3 -1 enhance the leaching rate. The eect of temperature on the
kmol m3 (NH4 )2 SO4 at 298 K, 313 K and 328 K. The leaching rate was slight. Consequently, the leaching stage in
leaching rates slightly increased with the rise in temperature. the proposed copper recovery process has been experimen-
As previously reported,9) the activation energy for the tally veried.
leaching of copper with Cu(II) ions in the ammoniacal
alkaline solution was 8 to 13 kJ mol1 . This suggests that the
leaching reaction is limited by the diusion in the diusion REFERENCES
layer, which seems to be in accord with the present
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(Shigen-to-Sozai) 111 (1995) 5558.
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thermodynamic considerations. As the rst step for its 6) J. Sedzimir and M. Bujanska: Corrosion Science 20 (1980) 10291040.
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The leaching reaction is expressed as: Cu Cu(NH3 )4 2 9) B. C.-Y. Lu and W. F. Graydon: J. Am. Chem. Soc. 77 (1955) 6136
2Cu(NH3 )2 . The Cu(II)-ammine complex signicantly 6139.
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