Professional Documents
Culture Documents
BY GROUP 1
ARBI FIKRI IRSYAD
FRANS W. SITUMORANG
KHALISHA PRAMONO
TSAOME INDAH SUSIMAH
OUTLINE
INTRODUCTION
THERMODYNAMICS AND KINETICS OF CVD
TYPES OF CVD PROCESS
ADVANTAGES AND DISADVANTAGES
APPLICATION OF CVD ON CORROSION
PROTECTION
Introduction
SOLGASMIX
EKVICALC
EKVIBASE
Kinetics
Deposition Sequence
1. Reactant gases enter the reactor by forced flow.
Halides Carbonyls
Hybrides
Halide
Carbonyls
Hybrides
Purity of Reactant
Impurity
Major cause of defect on deposit
It is preferable to purify and filter the gases at the point of use
Catalytic >> reduce H2, O2, CO, and hydrocarbons impurities, < 10ppb
Palladium Diffusion >> purify hydrogen
Gettering (Zr, Ti alloy) >> O2, H2O, N2, H2, CO, CO2,
and hydrocarbons, <10ppb
Filtering >> post purifying process
Type of CVD Process
Thermal Laser
Photon Plasma
Thermal condition (High temperature 800-2000 C)
Hot Wall Reactor (isothermal, close temperature control, deposition occurs on reactors wall)
Cold Wall Reactor (induction heating, low pressure 100mbar - 1atm
Pressure Condition
1) Atmospheric (deposition is diffusion limited)
Reactor is diluted with inert gas
A glow-discharge (non-
isothermal) plasma is
generated in a gas by a high-
frequency electric field,
such as microwave (2.45
GHz), at relatively low
pressure
Electron Cyclotron Resonance (ECR)
Not restricted
to a line-of-
sight
deposition,
resulting in a
good
conformity or
uniform
thickness of the
coating
Advantages
Parameters
Ratio of Substrate
reactants temperature
etc
APPLICATIONS OF CVD ON
CORROSION
Corrosion is defined as the wearing of a surface by a
chemical action
The main problem posed by CVD is that the thermal
expansion coefficient of the substrate metal and the
coating metal should agree
The substrate should withstand the required deposition
temperature
CVD application for corrosion includes CVD Borides,
CVD Carbides, CVD Nitrides, and CVD Oxides
CVD Borides
CVD TiN, ZrN, and HfN are the most commonly used
TiN, ZrN, and HfN have high thermal and chemical
stability
TiN, ZrN, and provide a good barrier to diffusion
TiN, ZrN, and HfN is resistant to acids
TiN is extremely resistant to sea water and human
sweat
CVD Oxides