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*, , , ,
, 310018;
, 100190
*, E-mail: crli@zstu.edu.cn
/, , . PDMS
/Pt , , .
30C 0C , . ,
, , .
.
, , ,
PACS: 91.55.Hj, 89.75.Kd, 46.70.-p, 68.35.Dv
doi: 10.1360/132011-1163
,
[1]
, . .
, 1998 , Bowdon [7](PDMS)
, Au ,
, ; ,
, ; . , ,
, . [8]/[9]
[2], [10] [11] [12]
. , [13][14]. 2005 , Li
, [1517] Ag/SiO 2
[3][4][5][6] Fibonacci . 2007 , Huang [18]
1.3
, ,
. 2009 , Chung [19](PS) . A B
/ PS , PDMS /Pt
, 30C , .
. 2011 , Duan [20] 1(f), ,
, , A
. . B
, 1(g), ,
, 30C , B
. , 0C ,
, 0C,
PDMS /Pt 30 min .
,
. , 2
,
2.1
.
.
/,
1 , ,
1.1 PDMS /Pt ,
. ,
PDMS(Dow Corning, Sylgard 184)
10:1 ,
( 1(a), URE-2000/25
), 1(b). (
0.09 MPa) 30 min, 70C
4 h. , PDMS
,
PDMS , 1(c). 30C
PDMS (HITACHI E-1010)
6 nm ,
PDMS /Pt , 1(d).
1.2
1(e), PDMS
/Pt 2 mm , 1
(a) ; (b) ; (c) ; (d) ; (e) ;
. ,
(f) A (); (g) B ()
0C . (Olympus Figure 1 The scheme of experimental procedure: (a) positive
BX51), photoresist mask; (b) casting; (c) peeling; (d) sputtering; (e) cooling;
(f) setting of sample group A (fast cooling); (g) setting of sample
3 s/. group B (slow cooling).
935
: /
, , , 3 .
. 2(a)
(b), x y , A , PDMS /Pt 30C
[21], . . 4 , y
, .
1
3 s, , ,
3
9 Ef Es2
crit , (1) ,
64 1 2 1 2
2
f s , 3 .
E (Ef Es), , f 54 s, , y
(film), s (substrate). PDMS ,
/Pt , Ef 169 GPa, f 0.38, Es 20 MPa, s , 16 m .
0.48. , crit 2.66108 Pa. ,
PDMS /Pt 30C 0C , .
, ,
, 3 .
Ef s f Td Tu , .
0 , (2)
75 s,
1 f
Td 303 K, Tu 273 K; y ,
, f 9.00106 K1, s 3.25104 K1. , 3
, 0 2.58109 Pa, .
crit, . , , .
, PDMS Pt , FFT , x
Es , . , . , ,
0 crit , .
. 111 s, y
,
2.2 ,
, . 5.8 m. FFT
, x .
, 129 s, ,
(FFT), ,
, .
,
90, .
150 s, y
,
5.8 m, FFT , PDMS
/Pt .
2 (a) /; (b)
,
Figure 2 The stressed system of compliant substrate/stiff film. y [22].
(a) The initial state; (b) the final state.
936
: 2012 42 9
,
/ 2 y / 2
2 2
0yh
my y 1, (3) . [21]
y / 2 / 2
2 2
3
1
0y y , y y
2h
1 s2 Ef 3
, (5)
. , 0y , y0,
3 1 f2 Es
my00, my y ;
, ,
( 2 1) / 2 , my , .
, my y 0. , .
, , . ,
, my , U V.
. , L
, V , , PDMS /Pt
, . [21] , . ,
1 1
E
2 2 L , .
A h 0 1 h 0 f 1 , (4) ,
c c Ef
/:
h 6 nm, 0 , c
,
. , ,
. T ( 2 1) / 2 ,
, T Tu Ti =1 K, 0 crit , ;
T 4 K, 0 crit, , A3.25 ,
nm, , . ,
T 30 K, A17.70 nm, ,
. , ,
937
: /
. B , 33.57 /mm2,
(6.50.3) m. , ,
. , ,
, , .
, , , ,
4(a). , , ,
, ; , ,
. , ,
, , .
, 4(b). , , ,
.
, 4(c). ,
.
2.3
,
3
. 5(a), A
, PDMS
78.34 /mm2, (6.50.5) m. 5(b), Pt , 30C 0C,
,
. : PDMS
/Pt ,
, ( 2 1) / 2
.
,
.
4
(a); (b); (c),
, ,
, , .
Figure 4 The schematic diagram of the formation and evolution of , ,
wrinkles: (a) malposed growth, (b)connection, (c) evolution, the thin
lines indicate boundaries, the thick lines indicate the bulges of
, .
wrinkles. , , .
5 A (a) B (b)
40 m
Figure 5 The buckling morphology. (a) Sample group A, (b) sample group B, scale bar 40 m.
938
: 2012 42 9
939
: /
A compliant substrate/stiff film stressed system usually forms disordered wrinkle when the stress exceeds critical
value. In this paper, the ordered one-dimensional wrinkle patterns were realized by the prefabricated boundaries in
the PDMS substrate/Pt film system. Meanwhile, the detailed formation processes were also systematically
investigated. By cooling the system from 30C down to 0C, we have in situ observed the dynamic formation and
evolution process of the ordered wrinkle structure. According to the mechanics principles, some processes including
the initiation and development of the wrinkle, the formation and evolution of the defect as well as the variation of
wavelength and amplitude with temperature were studied. The results offer some clues to the formation of
large-scaled high ordered wrinkle patterns.
wrinkle, dynamic process, wavelength, defect
PACS: 91.55.Hj, 89.75.Kd, 46.70.-p, 68.35.Dv
doi: 10.1360/132011-1163
940