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Welcome to

Fundamental of Modern Microelectronic


Fabrication Technology

Lecturer: Prof. Li Guoyuan


Office: Blk#30-Room 534
Phone: 15975510242
Email: phgyli@scut.edu.cn
Throw out a brick to attract a jade!
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Microelectronic Fabrication Introduction

Course Outline

Ch.1 Introduction (2 hrs)


Ch.2 Doping Technology (12 hour)
Ch.3 Thin film Technology (12 hrs)
Ch.4 Lithography and Etching (12 hrs)
Ch.5 Process Integration (6 hour)
Ch.6 Reliability Issues of IC devices (4
hrs)

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Microelectronic Fabrication Introduction

Reference Books:
1. Stephen A. Campbell, The Science and Engineering of Microelectronic Fabrication, second
edition, Oxford University Press, 2001
2. << >> ISBN 978-7-121-11751-0

3. :() : James D.Plummer, Michael D.Deal, Peter B.Griffin


ISBN: 7-5053-8638-7/TN.1777,
4. C. Y. Chang and S. M. Sze, ULSI Technology, McGraw-Hill, 1996
5. Plummer, James, Michael Deal, and Peter Griffin. Silicon VLSI Technology: Fundamentals,
Practice, and Modeling. Upper Saddle River, NJ: Prentice Hall, 2000. ISBN: 0130850373.
6. Wolf, Stanley, and Richard Tauber. Silicon Processing for the VLSI Era. Vol. 1. Sunset Beach,
CA: Lattice Press, 1986. ISBN: 0961672137
7. Ghandi, Sorab. VLSI Fabrication Principles: Silicon and Gallium Arsenide. 2nd ed. New York,
NY: Wiley-Interscience, 1994. ISBN: 0471580058.
8. Pierret, Robert, and Gerold Neudeck. Modular Series on Solid State Devices. Reading, MA:
Addison-Wesley, 1982. ISBN: 0201052873.
9. Grove, A. S. Physics and Technology of Semiconductor Devices. New York, NY: Wiley, 1967.
ISBN: 0471329983.
10. Colclaser, R. A. Microelectronics Processing and Device Design. New York, NY: Wiley, 1980.
Mar. 2017 0471043397.
ISBN: Introduction/lecture 1 3
Microelectronic Fabrication Introduction

Reference Books:
11. Vossen, John, and Werner Kern. Thin Film Processes. Burlington, MA: Academic Press, 1978. ISBN:
0127282505.
12. Mayer, James, and Sylvanus Lau. Electronic Materials Science: For Integrated Circuits in Si and GaAs.
Upper Saddle River, NJ: Prentice Hall, 1989. ISBN: 0023781408.
13. Murarka, Shyam, and Martin Peckerar. Electronic Materials: Science and Technology. Burlington, MA:
Academic Press, 1989. ISBN: 0125111207.
14. Ohring, Milton. The Materials Science of Thin Films. 2nd ed. Burlington, MA: Academic Press, 2001. ISBN:
0125249756.
15. Senturia, Stephen. Microsystem Design. New York, NY: Springer-Verlag, 2004. ISBN: 0792372468.
16. Madou, Marc. Fundamentals of Microfabrication: The Science of Miniaturization. 2nd ed. Boca Raton, FL:
CRC Press, 2002. ISBN: 0849308267.
17. Kovacs, Gregory. Micromachined Transducers Sourcebook. New York, NY: McGraw-Hill, 1998. ISBN:
0072907223.
18. May, G. S., and S. Sze. Fundamentals of Semiconductor Fabrication. New York, NY: John Wiley & Sons,
Inc., 2004. ISBN: 0471232793.
19. Smith, D. L. Thin Film Deposition: Principles and Practice. New York, NY: McGraw-Hill, 1995. ISBN:
0070585024.

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Microelectronic Fabrication Introduction

Chapter 1. Introduction

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Microelectronic Fabrication Introduction

What is this course all about?


Micro-fabrication Principles for IC

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

Now
8Gb
7nm
16
?

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Microelectronic Fabrication Introduction

Technology Trend

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What is 3D?
Planar vs tri-gate (1)

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What is 3D
Planar vs tri-gate (2)

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What is a fin?

The gate wraps around the


fin (see image left).
The current is controlled by
using a gate on each of the
three sides of the fin--two on
each side and one across the
top--rather than just one on top.

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Why is 3D important?
it would not have been possible to
continue Moore's law at 22nm and below
without a major transistor redesign.
With Tri-Gate transistors, Intel claims to
have extended Moore's law at least
another two years.

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Why is 3D important

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Microelectronic Fabrication Introduction

Driver--Microelectronics

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Microelectronic Fabrication Introduction

??

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Microelectronic Fabrication Introduction

Nanoelectronics Provide a Path Beyond CMOS

Nanoelectronics Provide a Path Beyond CMOS

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Microelectronic Fabrication Introduction

Nanoelectronics Provide a Path Beyond CMOS


Tunneling FET (TFET)
Impact Ionization MOS (IMOS)
Nano-electro-mechanical Switch (NEMS )
Negative-Cg FET
Resonant Tunneling Diodes (RTD)
Single Electron Transistor (SET)
Mott FET
Quantum Cellular Automata (QCA)
Atomic Switch
SpinFET
Nanomagnet Logic (NML)
Spin-Transfer-Torque (STT) for Logic
..
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Nano-electro-mechanical Switch (NEMS)

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Single Electron Transistor (SET)

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Atomic Switch

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SpinFET

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Spin-Transfer-Torque (STT) for Logic

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All Spin Logic

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Microelectronic Fabrication Introduction

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Worldwide semiconductor market
history and forecast (1992-2017F)

Source: IHS iSuppli,


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Revenue forecast by Advanced Packaging Platform 2014-2020

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Silicon Shipment Forecast

Actual Forecast

2013 2014 2015 2016 2017

Source: SEMI, October 2015; * Shipments are for semiconductor applications only and do not include solar applications

MSI 8,834 9,826 10,042 10,179 10,459

Annual Growth 0% 11% 2% 1% 3%

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2010~2015ICIC

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2013%

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