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ABSTRACT
Gopala, Krishna, P. and Das, S.C., 1993. Enhancement of operating current density in a copper elec-
trowinning cell. Hydrometallurgy, 31:243-255.
Efforts have been made to enhance the operating current density of an open channel cell to obtain
high-quality cathode copper. Since increase of copper concentration and circulation rate did not im-
prove the nature of the cathode deposit, the cell was modified to circulate the electrolyte through jets
parallel to the cathode surface. With the modified cell it was possible to achieve quality deposits at a
current density as high as 400 A m-2. The hydrodynamic conditions of the cell were studied in detail.
The results show that high limiting current densities and high mass transfer coefficient values are
possible due to increase in the linear velocity. It has also shown that there are four distinct regions of
limiting current distribution on the cathode plate. Since there is no turbulence up to ~ 3.0 cm height
from the bottom edge of the cathode plate (dead zone), the cell with a jetting system may be used as
a high current density copper electrorefining cell.
INTRODUCTION
In this laboratory, a process has been developed for the extraction of cop-
per, zinc and lead from complex sulphides through ammoniacal leaching
[ 1,2 ]. The separation of copper from zinc in leach liquor has been carried out
by extracting the copper with LIX 64N and electrowinning it from the puri-
fied solution. In order to test the SX-EW process on a laboratory scale, the
continuous electrowinning of copper in conjuction with solvent extraction
was carried out in an open channel cell using a current density of 250 A m -z.
Because of the poor hydrodynamic conditions prevailing in the cell, copper
deposited in a powder form. In order to obtain quality cathode copper at such
a high current density, it is essential that the operating cell should provide
improved hydrodynamic conditions. Several methods have been suggested in
Correspondence to: Dr. P. Gopala Krishna, Regional Research Laboratory, C.S.I.R. Bhubanes-
war, 751013 Orissa, India.
EXPERIMENTAL
Materials
Apparatus
1.0 0.3
1.5 O, 010
.FEEDER
~
8.5
1.5 0
i
0
6.0
0 0
2
8.5
J
1.5 I 0 0 0 0
o
o
I[ o
7loi o
0
o7
o
o
8cm
2ram
---,-
Fig. 2. S c h e m a t i c d i a g r a m o f e x p e r i m e n t a l set u p a n d c a t h o d e s u r f a c e w i t h m i c r o e l e c t r o d e s :
1 = c a t h o d e s u r f a c e w i t h c o p p e r m i c r o e l e c t r o d e s ; 2 = c o p p e r a n o d e ; 3 = salt bridge; 4 = m e t e r i n g
p u m p ; 5 = r e f e r e n c e electrode; 6 = p o t e n t i o s t a t ; 7 = X - Y r e c o r d e r ; 8 = j e t orifice; 9 = v o l t a g e s c a n
generator; 10=electrometer probe.
TABLE 1
1 0.7
2 2.0
3 3.3
4 4.6
5 6.0
6 7.2
7 8.5
8 9.9
9 11.2
10 12.5
used in the cell was employed as the reference electrode. The reduction of
copper ion to copper metal was used for limiting current measurement.
L i m i t i n g current measurement
Current potential curves for copper deposition were measured with PAR
ENHANCEMENT OF OPERATING CURRENT DENSITY 247
potentiostat (Model 173 ) operated in the potentiostatic mode. The scan rate
was maintained at 5 mV s-~ controlled by a voltage scan generator (Model
ABA 26 ). The i-Vplots were recorded by using an X-Yrecorder. The effects
of different variables on i-V curves were measured for 0 to - 7 0 0 mV with
respect to copper electrode in the same electrolyte.
Deposit examination
powder formation resulted in each case (Fig. 3). Copper concentration was
then raised to 35 g 1-~, where copper deposited in the compact form at each
current density studied. The cathode surface became comparatively rough,
TABLE 2
and nodular formation appeared with higher current density (Fig. 4). At the
same time a fall in current efficiency was also noted (Table 2 ). As the copper
concentration was further raised to 40 g 1-1, comparatively better cathode
deposits (Fig. 5) than those at 35 g 1- l o f copper, were obtained at each cur-
rent density. The current efficiency in this case also showed a similar decreas-
ing tendency as in the earlier case (Table 2 ).
Hydrodynamic conditions in a cell are improved by high circulation rates
and thus, in turn, are the measure of operating current density of the cell. The
effect of circulation rate was studied in the range o f 15-301 h-1. During such
studies the copper concentration was varied from 30 to 40 g 1-1 and electro-
winning was carried out in the range of 300-400 A m - 2 . The results are sum-
250 P. GOPALA KRISHNA AND S.C. DAS
marized in Table 3. Copper deposited in the powdery form at all copper con-
centrations up to a circulation rate of 20 1 h-1, at 300 A m -z. On increasing
the circulation rate to 25 1 h-1, copper deposited in powder form from an
electrolyte containing 30 g 1-~ of Cu at a current density beyond 300 A m-2.
Beyond this copper concentration compact deposits were obtained at a cir-
culation rate of 25 1 h - 1 and above, within the current density range studied.
Smoother deposits were obtained at copper concentrations greater than 30 g
1-~ and circulation rates greater than 20 1 h-~. Some typical photomicro-
graphs of the deposits are shown in Figs. 6 and 7. The results so far achieved
show that incorporation of the jetting system into the cell could raise the op-
TABLE3
K= iL/nFC (2)
Figure 8 shows the plot of limiting current density (iL) versus vertical posi-
tion of the micro-electrode at different circulation rates. The results indicate
that the iL value increases with increase in circulation rate at each micro-elec-
trode. However, the iL value also changes depending on the position of the
micro-electrode on the cathode plate. The increase in the iL value with circu-
lation rates for the micro-electrode located at 10 cm height (from the bottom
252 P. GOPALA KRISHNA AND S.C, DAS
3200
A
~280C
~ 240C
z200C
160(:
~ 120C
~_ 80C Symbol X,cm Ycm Velocity/
c m . S -I
2.0 1.5 42.42
-~ 40C '~' " 84.84
0 - '~ 127.26
A ~ . 169.68
TABLE 4
Circulation rate iL
(Lh -l ) (Am -2)
4.8 1090
9.6 1639
14.4 1910
19.2 2204
Concentration of copper= 30.0 g 1 - ' ; concentration of H2SO4= 150.0 g 1-~; electrolysis tempera-
ture = 30 _+2 C; height of the micro electrode from the bottom of the cathode plate = 10.0 cm.
80
7C
6O
E
~. 5O
4O
30
20
10
0
20 40 60 80 10 10 lZ,0 160 180
V / m s -I
Figure 8 not only shows an increase in iL values with circulation rates and
position of the micro-electrodes but also shows four distinct regions on the
cathode plate as regard to the distribution of iL.
The regions and the distribution o f iL values in these regions are as follows:
(i) up to ~ 3.0 cm height from the bottom edge of the cathode plate, there
is negligible increase in iL;
(ii) from ~ 3.0 to 6.0 cm there is sharp increase in iL;
(iii) from ~ 6.0 to 8.0 cm the iL values remain almost constant; and
(iv) beyond ~ 8.0 cm the iL values slowly fall.
This shows that under experimental conditions the maximum turbulence
occurs between ~ 3.0 and 8.0 cm height on the cathode plate. The region be-
low a height o f ~ 3.0 cm acts almost as a dead zone. Similar results were ob-
tained by Ettel et al. [23] for the bottom part of the cathode plate in a con-
ventional cell. Harvey et al. [24 ] used air sparging for attaining high current
density in a copper electrowinning/electrorefining cell. They also observed a
similar unstirred zone (dead zone) near the bottom of the cathode plate. They
suggested the use o f an airosparged c~ll for copper electrorefining since the
anode slime still remain settled. The present data indicates that the cell with
254 P. GOPALAKRISHNAAND S.C. DAS
TABLE 5
Effect of orifice distance from the cathode plate (X) on mass transfer coefficient (K)
X(cm) K ( c m s -1)
1.5 37.74
2.0 38.40
3.0 37.70
TABLE 6
Effect of the height of the cathode plate over the orifice (Y) on the mass transfer coefficient (K)
0.0 37.40
0.5 36.32
1.5 38.48
CONCLUSIONS
(3) Achievement of high values for ie and K are due to increase in the
cross-sectional velocity.
NOTATION
F Faraday constant
iL Limiting current density, A m -2
K Mass transfer coefficient, cm s- 1
n Number of electrons involved in the charge transfer reaction
X Distance between the cathode plate and orifice, cm
Y Height of the electrode plate from the orifice, cm
Diffusion layer thickness
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