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evaporation
C. Vijayan1, M. Pandiaraman2, N. Soundararajan3, R. Chandramohan*4 and
S. Ramaswamy1
Semiconducting silver selenide telluride (Ag2SeTe) ternary thin films of different thicknesses were
synthesised employing thermal evaporation. The variation in structure of the films with thickness
was estimated using X-ray diffraction studies. The thin films of lower thickness were amorphous,
and at higher thickness, they were polycrystalline in nature with orthorhombic structure. The film
crystallinity increased with increase in thickness. Increase in thickness beyond 320 nm caused
the appearance of new peaks with increased intensity. The structural studies on typical
Ag2Se0?2Te0?8 system revealed that the stoichiometry of the bulk corresponded to that of the thin
films. Micro-Raman spectra of the Ag2Se0?2Te0?8 thin films were recorded and analysed. The
optical image of Ag2Se0?2Te0?8 thin films was also studied. The topography of the thin film was
studied using atomic force microscopy. The results are presented.
Keywords: Ag2SeTe, Thin films, Thermal evaporation, XRD, AFM, Micro-Raman, Spectroscopy
1
3
thin films with film thicknesses using the obtained XRD
pattern and Raman spectrum respectively. Thermal using powder X-ray diffractometer (XPert PRO
evaporation route is an industrially viable reproducible PANalytical, The Netherlands) with Cu Ka radiation
technique provided that the thickness of the films is (l50?1540 nm) to determine the structure of prepared
controlled to enable industrial production. Ag2Se0?2Te0?8 thin films. Raman spectra for the bulk
material and of the prepared thin films were recorded with
Experimental the excitation wavelength of 632 nm using HeNe laser
source. The morphology was studied using atomic force
The silver selenide telluride (Ag2Se0?2Te0?8) thin films of microscopy (AFM) (model DSR-XE-100TM).
thicknesses were prepared. Films of typical thicknesses of
50, 95, 150,230 and 320 nm were prepared by thermal
evaporation on to precleaned glass substrates (0?016 Results and discussion
0?0360?001 m) using a deposition rate of 0?2 nm s21 in Structural analysis
high vacuum ,1025 mbar by the evaporation of chemi-
The formation of the bulk Ag2Se0?2Te0?8 compound at
cally synthesised Ag2Se0?2Te0?8 powder. Spectroscopically
room temperature has been confirmed by X-ray powder
pure Ag (99?999%), Se (99?999%) and Te (99?999%) were
diffraction analysis and reported.1 Figures 13 show the
used for the preparation of Ag2Se0?2Te0?8 ternary alloy
typical XRD patterns of thermally evaporated
bulk in powder form in a sealed and fused quartz ampule
Ag2Se0?2Te0?8 films of thicknesses of 50, 95 and
kept in a furnace at 1300 K for 24 h for homogenising.
230 nm respectively. In this paper, the Pearsons XRD
The samples were then annealed at 1000 K for 24 h
standard for bulk is taken as reference for the XRD
followed by slow cooling to room temperature for 2 days.2
analysis of ternary thin films.23 It is observed that the
The glass slides used for preparing thin films were
films had peaks at two theta values of 29?86, 31?66,
precleaned by immersing in hot chromic acid for 45 min
35?36, 38?82, 42?32 and 43?16 respectively. They are
and then rinsed with triple distilled water and cleaned with
prominent and intense. They are corresponding to [102],
acetone and again with triple distilled water. Thickness of
[120], [013], [122], [201] and [032] planes respectively.
films were measured by quartz crystal thickness monitor
For films grown with thickness ,50 nm, the XRD
(Hindhivac thickness monitor model DTM-101) and
shows that the films are amorphous. However, at 90 nm
confirmed in a profilometer (Mitutoyo-SJ 301) after
thickness, the characteristic peaks tend to appear
deposition. The thickness was estimated with an accuracy
distinctly. The [120] peak reported for the standard at
of 1 nm. The XRD patterns of these films were recorded
two theta values at 31?66u (Ref. 23) appears shifted
slightly to 31?42. The most intense peak at 33?58 is
absent in 90 nm. This shows that the films tend to grow
without any specific preferential orientation. The [102]
peak is also present with reduced intensity. The most
intense peak reported is at 42?32u. However, the peak
obtained at 42?42u is slightly shifted with reduced
intensity corresponding to [201] plane. The peak at
38?82u is also present at the same point with reduced
intensity. The most intense peak for 90 nm thick film
appears in 35?18, which is nothing but [013] peak, which
is one of the peaks reported for Ag2Se.3Te.7 system.23
These studies revealed that the films are ternary in
nature with selenium ,0?2 and tellurium ,0?8. This
property is supplemented using Raman studies. The
XRD studies reveal amorphous state of films at low
thickness ,50 nm, and when the thickness is increased,
the films showed crystalline orthorhombic phase. Using
2 the DebyeScherrers formula, the average grain size of
5 ac confocal micrographs of Ag2SeTe thin lms of thickness of 90, 150 and 240 nm respectively
Conclusions
The fabrication of thin films of ternary system of
Ag2SeTe using thermal evaporation has been envisaged.
X-ray diffraction pattern of these films confirmed the
formation of polycrystalline orthorhombic phase at
higher thicknesses. However, the films were amorphous
at lower thickness. The ternary Ag2Se0?2Te0?8 thin films
composition was estimated from the XRD studies.
Optical image of Ag2Se0?2Te0?8 thin films were recorded
and presented. Micro-Raman spectral results of
Ag2Se0?2Te0?8 thin films with different thicknesses
between 50 and 320 nm were analysed. Raman active
peaks are attributed to AgTe vibration modes. The
AFM images indicate the modification of morphology
and grain size during increase in thickness of this system
associated with filling of grain boundaries or voids
during addition of layers.
References
6 ac Two-dimensional images (AFM) obtained for ther- 1. C. Vijayan, N. Soundararajan, R.Chandramohan, V. Dhanasekeran,
mal evaporated Ag2SeTe lms of various thicknesses K. Sundaram, K. Neivasagam and T. Mahalingam: J. Microsc.,
2011, 243, 261.
2. C. Vijayan, M. Pandiaraman, N. Soundararajan, R.Chandramohan,
cross-sectional increase in scattering, which may be V. Dhanasekeran, K. Sundaram, T. Mahalingam and A. John Peter:
attributed to chemical nature of the reactions, surface J. Mater. Sci. Mater. Electron., 2010, 22, 545.
roughness or optical property. Hence, the increase in 3. P. D. Tall, S. Ndiaye, A. C. Beye, Z. Zong, W. O. Soboyejo, H.-J.
Lee, A. G. Ramirez and K. Rajan: Mater. Manuf. Processes, 2007,
surface roughness and the change in chemical reaction 22, 175.
may contribute significantly to the intensity variations. 4. T. Otiti, Y. Cao, S. M. Allameh, Z. Zong, O. Akogwu and W. O.
Soboyejo: Mater. Manuf. Processes, 2007, 22, 195.
Micro-Raman optical image 5. D. S. Sofronov, Y. A. Zagoruiko, N. O. Kovalenko, A. S.
Gerasimenko, V. N. Baumer, P. V. Mateychenko, A. G. Mamalis
The optical image obtained for Ag2Se0?2Te0?8 thin films
and S. N. Lavrynenko: Mater. Manuf. Processes, 2013, 28, 944.
of thicknesses of 50, 95 and 230 nm using micro-Raman 6. Y.u Bai, F. L. Yu, S. W. Lee, H. Chen and J. F. Yang: Mater.
microscope is shown in Fig. 5. These micrographs reveal Manuf. Processes, 2012, 27, 58.
that the films are formed due to the clusters of 7. K. G. Prashanth and B. S. Murty: Mater. Manuf. Processes, 2010,
agglomerated grains of Ag2Se0?2Te0?8 particulates of 25, 592.
8. K. F. Tamrin, Y. Nukman and S. S. Zakariyah: Mater. Manuf.
submicrometre dimensions to form discrete islands of a Processes, 2013, 28, 857.
few micrometres, and the thermal energy was sufficient 9. W. Soboyejo: Special issue materials and manufacturing
to carry these domains to the surface of the substrate. processes on multifunctional micro- and nano-structures, Mater.
Alternatively, the evaporated particulates of few nano- Manuf. Processes, 2007, 22, 139.
10. T. Mahalingam, S. Thanikaikarasan, V. Dhanasekaran, A.
metres first reach the substrate and become centres of
Kathalingam, S. Velumani and J.-K. Rhee: Mater. Sci. Eng. B,
nuclei for attracting more vapours, and this grain gets 2010, B174, 257262.
agglomerated and spreads throughout the substrate. At 11. T. Mahalingam, V. Dhanasekaran, G. Ravi, S. Lee, J. P. Chu and
lower thickness, the distribution seems to be quite H.-J. Lim: J. Optoelectron. Adv. Mater., 2010, 12, 13271332.
uniform. For higher thicknesses, the films have some 12. V. M. Dzhagan, M. Ya Valakh, A. E. Raevskaya, A. L. Stroyuk,
S. Ya Kuchmiy and D. R. T. Zahn: Nanotechnology, 2008, 19,
grains and grain boundaries. It is, as if, the particulates 305707.
agglomerated form individual grains and are separated 13. P. Lakshmi and K. S. Raghavan: Mater. Manuf. Processes, 1992, 7,
to provide some grain boundaries. As the thickness is (1).
14. D. Sharma and S. K. Thakur: Mater. Manuf. Processes, 2011, 91, 20. A. Qin, Y. Fang, P. Tao, J. Zhang and C. Su: Inorg. Chem., 2007,
(6), 899907. 46, 18, 7403.
15. V. S. Vinogradov, G. Karczewski, I. V. Kucherenko, N. N. Melnik 21. J.-P. Ge and Y.-D. Li: J. Mater. Chem., 2003, 13, 911.
and P. Fernandez: Phys. Solid State, 2008, 50, 1, 164. 22. A. Mendoza-Galvan, E. Garcia-Garcia, Y. V. Vorobiev,
16. M. G. Sridharan, M. Mekaladevi, S. K. Narayandass, D. Mangalaraj J. Gonzalez-Hernandez: Microelectron. Eng., 2000, 5152,
and H. Chul Lee: J. Optoelectron. Adv. Mater., 2005, 7, 3, 1479. 677.
17. K. Neyvasagam, V. Ramakrishnan, C. Sanjeevaraja and N. 23. Pearsons crystal data, Powder pattern no. 310733 for
Soundararajan: Optoelectron. Adv. Mater. Rapid Commun., 2007, Ag2Se0?3Te0?7.
1, 7, 319. 24. M. Pandiaraman and N. Soundararajan: J. Theor. Appl. Phys.,
18. A. K. Samal and T. Pradeep: J. Phys. Chem. C, 2009, 113C, 13539. 2012, 6, 7.
19. H. Cao, Y. Xiao, Y. Lu, J. Yin, B. Li, S. Wu and X. Wu: Nano 25. M. Pandiaraman, N. Soundararajan, C. Vijayan, C. Kumar and
Res., 2010, 3, 12, 863. R. Ganesan: J. Ovonic Res., 2010, 6, (6), 285.