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COATINGS - ANTIFRICTION
PVD COATING
BRIEF NOTES ON THE DEPOSITION TECHNOLOGY techniques in solid source (cathodic deposition, such as This development has made it possible to improve the characte-
sputtering or arc) and techniques in molten source (such as ristics of this technology, while diminishing its weaknesses.
Surface treatments can be divided into two main categories:
evaporation due to joule effect or by the electron gun). Today, for example , with the cathodic arc, it is possible to achie-
ve high levels of ionization of the plasma through the use of
• Filler surface treatments, PACVD sources of new generation which, besides improving the intrin-
• Surface modification treatments. PACVD Plasma Assisted Chemical Vapour Deposition. sic quality of the deposited layers, in parallel allow to reduce to
In the case of the PACVD, the generation takes place by chemical. a minimum the phenomenon of “ droplets “, which has always
The “filler surface treatments” are also referred to as “coa- The elements which compose the coating layer are supplied in been considered the only small demerit of this technology.
tings” and among the best known are the galvanic coating, in gaseous form and, through chemical reactions assisted by the
CVD, in PVD and in PACVD. presence of the plasma, are made available for the deposition.
Among the “surface modification treatments”, to name only The transport to the parts to be treated is carried through the
the most well-known, we find the nitriding, the carburizing and same plasma (ionized gas at low pressure), while the deposi-
the oxidation. tion is facilitated by the presence of a potential difference.
The PACVD technology combines the advantages of the CVD
Filler surface treatments
to those of the PVD and enables the deposition of various
The coatings allow the deposition of compounds with different
coatings at low temperature (180 °C).
intrinsic properties.
The mechanisms of deposition are common in all the various
technologies and can be schematized in three steps:
1) generation STS TECHNOLOGY “Droplets” effect refers to the presence in the deposited layer
2) transport
3) deposition of tiny droplets of material that, after being evaporated, has
The continuous testing of different compounds for the rea-
aggregated not in atomic form.
lization of new coatings, has increasingly directed the deve-
CVD The modern technology available today in STS, called HDP,
lopment towards the cathode sources, in order to be able to
The CVD technology (Chemical Vapour Deposition), generates allows to obtain layers of coatings almost “droplet- free”.
deposit alloys of dissimilar elements (eg Nitrides of Titanium
metal vapors by means of a chemical reaction. The transport is
and Aluminium, Titanium nitrides and silicon, etc.).
accomplished through an atmosphere of reactant gases and the
deposition occurs by reaction of this vapor with the surface.
PVD
Physical Vapour Deposition.
In the case of PVD, the generation takes place by physical
evaporating metals which compose the coating layer.
The transport from the sources to the parts to be treated ta-
kes place through the plasma (ionized gas at low pressure). Scratch test:
It is a tool capable of
The deposition is instead favored by the presence of a poten- measuring adhesion force
tial difference. and tribological aspects
The PVD techniques are varied, but may briefly be divided into of the coatings.
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HDP COATINGS QUALITY STS
The most recent result of technological development in the technology), together with an extraordinary speed of deposi-
field of PVD coatings is referred to by the acronym of HDP tion (4-5 µm / hour).
(High Density Plasma). The name identifies a highly evolved Taking into consideration instead the intrinsic structure of
HDP deposition system at high-density plasma which allows the coatings due to its superior plasma density obtained with
to reach levels of performance never achieved before. the HDP system, highly compact layers capable of reaching
Based on the arc cathode, the system combines HDP new higher levels of hardness are made, while managing to main-
technical solutions that allow the deposition of coatings with tain an equally high degree of toughness.
process parameters that were previously considered imprac- HDP is based on a high plasma density obtained thanks to
tical, thus obtaining sensational results as the elimination of new cathodic sources combined with a pulsed polarization of
“ droplets “ (for years considered as congenital of the arc the parts to be coated.
Section of HDP coating made of two different layers. High Density Plasma source
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COATING
(Diamond Like Carbon)
SUBSTRATES
• Steel, ferrous alloys in general
• Aluminium and its alloys
• Titanium and its alloys
• Copper and its alloys (bronze, Cu -Be)
• Tungsten Carbides
a-C:H PA-CVD 1.500 - 3.000 0,05 - 0,1 0,5 - 3 250 400 Black
sp2-sp3
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FIELDS OF USE
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COATING
Carbide of Tungsten Magnetron 1.300 - 1.500 0,15 1-4 <180 350 Anthracite
and Carbon Sputtering
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COATING
Magnetron
MoS2 - 0,1 1 <100 700 Grey
Sputtering
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COATING
PVD TECHNOLOGY The use of PLC is very appreciated in areas such as auto-
matic machines where the mechanical parts are subject to
PLC stands for Polymer Like Carbon and is classified as friction, and in the automotive sector.
Me-DLC.
Dark
Carbon Monolayer 1.500 0,1 1 140 - 480 300 Grey
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COATING
HDP-PVD TECHNOLOGY
The Chromium Nitride, better known as CrN, has many im-
portant features that suggest its use in many applications.
Light
Chromium Nitride Monolayer 1.800 0,5 1 - 10 140 - 480 750 Grey
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COATING
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COATING
PVD-HDP TECHNOLOGY (Food and Drugs Administration), one can easily imagine
how this coating turns out to be a good solution in the are-
The Titanium Nitride better known as TiN, has been on the
as of medical, food industry, automatic machines, racing
market for decades and still occupies a position of absolu-
and mechanical parts.
te importance in the panorama of PVD coatings.
Titanium Yellow
Monolayer 2.200 0,6 1-4 140 - 480 500
nitride gold
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