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Sensors and Actuators A 108 (2003) 103–107

3-D microarrays biochip for DNA amplification


in polydimethylsiloxane (PDMS) elastomer
Xiaomei Yu a,∗ , Dacheng Zhang a , Ting Li a , Lin Hao b , Xiuhan Li a
a Institute of Microelectronics, Peking University, Beijing 100871, China
b Department of Hematology, Peking University First Hospital, Beijing 100034, China
Received 29 July 2002; received in revised form 3 July 2003; accepted 9 July 2003

Abstract

In this paper, a rapid and low-cost fabrication technique for microarrays biochips is presented, and the fluorescence-based polymerase
chain reactions (PCR) were performed in the chip for DNA amplification. The chip is consisted of 1064 column chambers. Each chamber
has a volume of 25 nl, with the diameter of 460 ␮m and depth of 200 ␮m. The PCR chips were made of inexpensive silicone elastomer—
polydimethylsiloxane (PDMS) and rapidly fabricated with micro-molding technique. The three-dimensional (3-D) PDMS replicas were
molded directly from 3-D negative silicon master, which was fabricated by deep etching technique under the inductively coupled plasma
(ICP) system. We demonstrated that the fluorescence-based PCR could be performed in the PDMS chip with nanoliter-volumes.
© 2003 Elsevier B.V. All rights reserved.

Keywords: Polymerase chain reaction (PCR); Polydimethlysiloxane (PDMS); Inductively coupled plasma (ICP)

1. Introduction Northrup et al. [1,2], scientists have made some advance-


ment for the DNA amplification with MEMS-based PCR
Recent developments in miniaturization technology reactors [3–6]. The potential merits of miniaturized reactor
have already had a great impact on the biomedical re- are automation, rapid temperature cycle, smaller amounts
search field. The MEMS-based polymerase chain reaction of sample and reagent, high sensitivity, portability and
(PCR) chamber is one of the great progresses. PCR is a mass-productivity.
well-characterized method for the selectively identical repli- The conventional substrates of making three-dimensional
cation of DNA molecules. By an enzymatic amplification (3-D) PCR chip are silicon, glass or quartz, which origi-
process, the concentration of a DNA species is nearly dou- nally developed for integrated circuit industry. Therefore,
bled through three different temperatures. In this way, The the fabrications of the chip are a little difficult, time con-
DNA concentration can be multiplied more than a million suming and high-cost. Recently, the replica molding tech-
times by about 30 cycles of temperature. It has become an nique using organic polymers has been widely used to
important analytical method for the detection of diseases. simplify the fabrication process of micro-fluidic devices
As we know, the conventional PCR systems use plastic- [7–10], such as the plastic, the Epon SU-8 photoresist, the
based tubes with relatively big volume (>25 ␮l) as reaction polymethylmethacrylate (PMMA), and the polydimethyl-
chamber. Therefore they always waste much more reagents siloxane (PDMS). Among these polymers, PDMS is one
and need longer time to reach thermal balance because their of the most promising materials for the microscale mold-
big volume tubes and slow thermal cycling. Micro-electro- ing. PDMS is a low-cost material. The advantages of
mechanical systems (MEMS) technology have been applied using PDMS to fabricate chip include the submicrometer
in analytical chemistry and biomedical-related fields for replica fidelity, easy fabrication and bonding (self-adhesion
a number of years. The microliter or nanoliter PCR chips property), mass replication, better optical properties (trans-
have been developed by using microfabrication techniques. parent at 230–700 nm wavelength) and inactive to most
Since the first report on the microfabricated PCR chip by bio-molecules. Therefore, PDMS is particularly suitable to
be used in the fabrication of biochips. The commonly used
∗ Corresponding author. Tel.: +86-10-62759370; procedures fabricating PDMS chip are: (1) fabricating a
fax: +86-10-62751789. negative master; (2) PDMS mixture is molded against a
E-mail address: xmyu@ime.pku.edu.cn (X. Yu). microfabricated negative master; (3) curing and peeling off

0924-4247/$ – see front matter © 2003 Elsevier B.V. All rights reserved.
doi:10.1016/S0924-4247(03)00370-4
104 X. Yu et al. / Sensors and Actuators A 108 (2003) 103–107

the replica; (4) the PDMS replica is then sealed with a flat inside the chambers and the redundant liquid can be vented
substrate. out easily in the unloading process.
This paper describes a fabrication of three-dimensional
microarrays PCR chip in PDMS elastomer directly from a 2.2. Fabrication of negative silicon master
3-D negative silicon master, and this work was going at In-
stitute of Microelectronics, Peking University. Raman spec- PDMS micro-molding techniques have been used to fab-
troscopy detected the results of fluorescence-based PCR on ricate micro-fluidic devices for a few years. The PDMS
the PDMS chip, which was performed at Department of structures are usually molded PDMS against SU-8 master.
Hematology, Peking University First Hospital. The SU-8 master with a thickness up to 100 ␮m was fab-
ricated using SU-8 thick film photolithography. With this
technique, 2-D patterned layers are usually fabricated. In or-
2. Design and fabrication der to realize 3-D structures, two or more 2-D patterned lay-
ers need to be stacked together and aligned very accurately.
2.1. Design Apart from the accurate aligning, the thickness limitation
of SU-8 master is also a problem in making deep reaction
Many clinical DNA diagnostics require multiple patient chambers, which can avoid the contamination among cham-
samples to be tested for certain diseases using microarrays bers during the PCR. The 3-D silicon master can be etched
technique. The ability to perform massively assays with sufficiently deep with inductively coupled plasma (ICP)
nanoliter quantities of sample/reagent per PCR chamber etching system, and the aligning of two 2-D chips is also
would provide substantial cost saving, and hence is highly avoided.
desirable. We designed our PCR chip with 1064 reaction The fabrication of silicon master starts from 525 ␮m thick,
chambers in a 31.5 mm × 25.7 mm chip. In order to make 4 in. silicon wafers in two mask processes. A schematic il-
the reagents to flow inside the chips smoothly, and vent the lustration of fabricating negative silicon master is shown in
air bubbles out of the chambers as many as possible, column Fig. 2(a)–(e). After wafer cleaning, thermal silicon dioxide
chambers and inclined sub-channels have been designed. has been grown as the first mask layers. The thermal sili-
The layouts of two designed chips are shown in Fig. 1. con dioxide has a selectivity of about 200 to silicon under
The reaction chambers are designed in column with the our ICP system, therefore 400 nm SiO2 had been grown
diameter of 460 ␮m and the depth of 200 ␮m. The volume of to support the channel etching of 50 ␮m. After the first
each chamber is calculated to be 25 nl. The interval between photolithography, which forms the patterns of both chan-
the two chambers is 800 ␮m. Main channels join the ports nels and chambers, the second mask layer was deposited.
and the all sub-channels, and the sub-channels connect all Aluminum and photoresist had been tested as the second
chambers. One port is designed for the liquid inlet and two mask layer in the master fabrication. It was found that
ports are for the liquid and air outlet. The inlet and outlet aluminum mask layer gives rise to roughening of silicon
sub-channels drain the solution into or out off the chambers. surface during the ICP deep etching due to the formation of
The sub-channels are designed in line (Fig. 1a) or parallel Al-protected regions on the surface of Al by mask erosion.
(Fig. 1b), with the flow direction in an angle of 45◦ (Fig. 1a) Photoresist was tested to be a good mask layer although it
or 60◦ (Fig. 1b) with the main channels, respectively. The has a low selectivity of 70 to silicon under our ICP etch-
width of the main channels and the sub-channels are 160 ␮m ing system. The selected thickness of 3 ␮m photoresist is
and 70 ␮m, respectively, and the depth of all channels is tested to be sufficient to support the chamber etching of
50 ␮m. The capillary force and syringe pressure draw the 200 ␮m.
reagents into the reaction chambers in the loading process. After the second photolithography, the silicon apart from
The outlet ports were designed open to air, therefore the air those, which are on the chambers and the channels, were
etched away to a thickness of 50 ␮m. In order to obtain
highly anisotropic and high-aspect-ratio etching, ICP etch-
main-channel ing system (multiplex ICP STS) was used in the silicon
etching. The silicon etching parameters of the ICP system
chamber
are: SF6 of 130 sccm, O2 of 19.5 sccm, C4 F8 of 100 sccm,
sub-channel coin rf forward power of 600 W, platen rf forward power of
13 W, chamber process pressure of 0.2 Pa. After above etch-
ing, the residual SiO2 on the channel surface was removed
in BHF. Then the silicon etching was carried continuously
until the needed chamber depth of 200 ␮m was reached. Re-
(a) (b) move the residual photoresist and SiO2 on chamber surface.
Fig. 1. Layouts of two designed biochips. The sub-channels are (a) The finished negative silicon master was further thermally
designed in line and in an angle of 45◦ with the main channels; (b) oxidized to obtain relatively smooth surface. Fig. 3 gives a
parallel with each other and in an angle of 60◦ with the main channels. SEM photograph of a negative silicon master.
X. Yu et al. / Sensors and Actuators A 108 (2003) 103–107 105

SiO2

(a)

(b)
photoresist

(c)

Fig. 4. The SEM photograph of a PDMS replica.


(d)

about 2 mm in depth to ensure the PDMS chip to be thick


(e) and rigid enough. The PDMS prepolymer (SYLGARD 184
PDMS Silicone Elastomer Kit, Dow Corning) and the curing agent
were thoroughly mixed in a 10:1 weight ratio and was de-
gassed with a mechanical vacuum pump for 10 min to re-
(f) move any air bubbles in the mixture and to insure complete
chamber channel mixing between the two parts.
After the PDMS was poured onto the silicon master, the
(g)
patterned PDMS was put into the vacuum system again
for another 10 min to degas the possible bubbles between
the interface of the silicon master and the PDMS mixture.
Fig. 2. Fabrication processes of silicon master and PDMS replica. (a)
The silicon wafer was thermally oxidized to form a 400 nm SiO2 . (b) The PDMS prepolymer was cured for 1 h at 65 ◦ C in oven
First photolithography, the SiO2 both on channels and chambers were left and then the PDMS replica was peeled off from the sili-
over. (c) Three micrometer thick photoresist layer was spun on wafer, con master. Fig. 4 shows the SEM photograph of a finished
and then was patterned with chamber mask. (d) The silicon was etched in 3-D PDMS replica. Another PDMS plate was molded in a
ICP system, the etching depth is 50 ␮m. (e) After removing the SiO2 on
smooth dish as the top cover using the total same fabrication
the surface of the channels, and another 150 ␮m silicon was etched away
by ICP system. (f) The PDMS prepolymer mixture was poured onto the processes as the PDMS replicas. The soft PDMS allows in-
master. (g) After curing and peering off the PDMS, the PDMS replica let/outlet ports to be created easily by pushing syringe nee-
and the PDMS plate were bonded together. dles into the top PDMS plate.
Four chips have been designed in a 4 in. silicon wafer, so
the peeled PDMS chips need to be cut after the whole wafer
2.3. Fabrication of PDMS replica molding. Narrow dicing lines have been designed on the
silicon masters; therefore the replica can be diced accurately
Fig. 2(f) and (g) illustrate the molding procedure of PDMS along the dicing lines with a sharp-edged razor. The accurate
replica. In order to peeled off the PDMS replica easily, the dicing of the PDMS chips will also confirm the later accurate
negative silicon master was first coated with a fluorocarbon and automatic dispersing of DNA samples by an automatic
layer polymerized by CHF3 plasma in a reactive ion etch- spotter system.
ing (RIE) system for 5 min under the following conditions:
CHF3 gas flow of 60 sccm, pressure of 2 Pa, and power of
2.4. Bonding and hydrophilicity
100 W. The silicon master was then placed in a petri dish of
Oxygen plasma treatments for PDMS surface activation
were carried out using RIE system in order to receive the ir-
reversible bonding between the cured top and bottom PDMS
parts. Experiments were performed many times to find the
optimum condition of plasma treatment, which are: rf power
of 100 W, oxygen gas flow of 80 sccm, pressure of 0.8 Pa,
and treatment time of 40 s. Plasma-treated samples were
immediately bonded together with activated surface facing
each other, and then baked in oven at 100 ◦ C for 2 h. Since
no patterns exist on the top cover, the two PDMS plates
need not to be aligned accurately. During the baking, small
Fig. 3. The SEM photograph of a negative silicon master. external force was applied on the chip to assist the bonding.
106 X. Yu et al. / Sensors and Actuators A 108 (2003) 103–107

The bonding quality was examined via pulling the PDMS The PCR reaction mixture contained 1 ␮l DNA template,
pieces apart from each other. Fractures took place most on 2 ␮l MgCl2 , 1 ␮l of each dNTP, 1 ␮l of each primer, and
PDMS top plate or replica, a little at the interface of the 2.5 ␮l Tris–HCl. In the experiment, a Taqman probe specif-
two PDMS plates. We conclude that under the optimum ically to detect a point mutation was designed and used
treatment condition of oxygen plasma and the baking, the in fluorescence-based PCR. The concentration of Taq poly-
two PDMS plates can be bonded together successfully. merase was 5 U/␮l. The primer set used to the amplifica-
PDMS is a hydrophobic material after peering off. The tion of DNA was 5 -CCATAAGTCAATGACTGAGC-3 and
hydrophobicity of PDMS makes the DNA reagent difficult 5 -AAGTGGTGATAGAACCCAAG-3 . The PCR reaction
to flow inside the channels. It is found that the PDMS was first performed in tubes. The PCR products were then
elastomer rapidly lost its hydrophobicity if it is treated analyzed by conventional slab gel electrophoresis. The elec-
in oxygen plasma treatment for a short time. In our ex- trophoresis was carried out 7 h at 300 V. Ten percent poly-
periment, the oxygen plasma activation on the surface of acrylamide gel (PAGE) was used. Analyzing the ALAS2
PDMS was performed at the same time with the bond- gene of the six members of sideroblastic anemia family by
ing processes. Water flow test shows that the surfaces of PCR–SSCP analysis, the point mutation of G514A in the
PDMS chips were changed from hydrophobicity into hy- exon 5 of ALAS2 for the patients, two brothers, were con-
drophilicity easily under above oxygen plasma treatment firmed comparing their PCR products with normal male
condition. newborns. Their father and grandfather have the same elec-
trophoresis bands with the normal male newborns. But their
mother and grandmother electrophoresis bands are different
3. Testing and discussion from the normal male newborn. That is to say the abnormal
gene come from maternity.
Flow characteristics of the PDMS chip were first evaluated To verify the performance of the PDMS chip array, the
with color water. The liquid was directly injected into inlet same reaction mixtures were loaded into the PCR chip
port from the top PDMS plate by syringe because the PDMS simultaneously. The PCR of both units were set at 30 tem-
is soft enough to be pierced. The treatment of oxygen plasma perature cycles. The temperature steps used in fluorescence-
makes the liquid flowing into most of the chambers smoothly based PCR consisted of following three steps: denaturation
under the syringe pressure in 1–2 s. The outlet ports can vent at 94 ◦ C for 30 s, primer annealing at 65 ◦ C for 30 s and
the bubbles out of the chips and make the liquid flow easily. primer extension at 72 ◦ C for 30 s. The amplified products
No significant difference of flow characteristics was found were analyzed by Renishaw 1000 cofocusing Raman spec-
for the two designed chips. troscopy (Renishaw, USA) after the thermal cycling. The
To prove fluorescence-based PCR can be performed fluorescence-based PCR from the PDMS chip show the
through the PDMS chips, we carried out both the fluore- same results as routine PCR. The detected Raman signals
scence-based PCR in the PDMS chips and routine PCR in from the two patients, the mother, and the grandmother
tubes. The samples selected to do the comparison are the are positive, which show absorb at 570 nm. No absorb
DNA from a six members family and two male newborns. peaks were observed for the PCR results from the father,
The purpose of the experiment is to identify point muta- the grandfather, and the normal male newborns, the point
tions of two patients and diagnose hereditary sideroblastic mutations were not identified for them. One of the com-
anemia in this family. The point mutations of G514A in parison results was show in Fig. 5. In this figure, number
the exon 5 of ALAS2 in a hereditary X-linked sideroblas- 1 is a positive result from a brother, number 3 is a negative
tic anemia family was confirmed by PCR single-stranded
conformational polymorphism (SSCP) and sequencing.
The temperature cycle was provided with a commercial
thermalcycler controller (Gene Amp PCR System 2400,
Perkin Elman, USA). The contrast experiments between
the tubes and the PDMS chips were performed many times
with the same probes and reagents. It is found that when the
temperature display on the controller is selected the same,
the same reaction results were obtained for both methods.
That is to say the display temperature are the temperature
inside reaction chamber of the PDMS chip, and the tem-
perature uniformity inside the reaction chamber and from
chamber to chamber can be certain although the PDMS
is not a good thermally conduction materials. With this
thermalcycler controller, the circle time for our chip were
decreased down to satisfied with the requirement of smaller
amounts of reagent and sample. Fig. 5. Scanned fluorescent PCR spectra on a PDMS chip.
X. Yu et al. / Sensors and Actuators A 108 (2003) 103–107 107

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microarrays chips can perform massively assays of DNA Biographies
amplification with nanoliter quantities of sample/reagent
Xiaomei Yu, Postdoctoral, Institute of Microelectronics, Peking Uni-
per assay, which would provide substantial cost saving,
versity, China. PhD was obtained from Beijing University of Areo-
time saving and powerful analysis. Considering the many nautics and Astronautics in 2001. Her current research interests in-
advantages of microarrays PDMS chip, this fabrication clude the design and fabrication of PCR biochip and micromechanical
technique is suited for a wide range application in biochip biosensor.
and micro-total analysis system (␮-TAS).
Dacheng Zhang, Professor, Institute of Microelectronics, Peking Univer-
sity, China, received MS degree in 1998 at Peking University. His work
Acknowledgements is focused on processes and techniques of MEMS.

This work is founded by National Natural Science Foun- Ting Li, Associate Professor, Institute of Microelectronics, Peking Uni-
dation of China (founded no. 90207013) and 985 project of versity, China, received BS degree in 1991 at Beijing University of Tech-
Peking University, China. nology. His work is focused on processes and techniques of MEMS.

Lin Hao is a graduate student at Peking University First Hospital, China,


References majoring in molecular biology.

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