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Part I
Semiconductor Materials
I this
In thi Part
P t I,
I we will:
ill
• gain a basic understanding of semiconductor material properties
–Two types of charged carriers that exist in a semiconductor
–Two mechanisms that generate currents in a semiconductor
i) Conductor
ii) Semiconductor Nucleus
iii) Insulator
Insulator: A material that offers a very low level of conductivity under pressure
from an applied voltage source.
R
ρ=
RA (Ω ) cm 2
=
( )
= Ωcm
ρ l cm
1 cm
A=1 cm2
l 1 cm
l=1
Sub-shell/state 1s 2s 2p 3s 3p 3d 4s 4p 4d 4f
Numbers of electrons 2 2 6 2 6 10 2 6 10 14
Symbol 1s2 2s2 2p6 3s2 3p6 3d10 4s2 4p6 4d10 4f14
Total numbers
of electrons in shell 2 8 18 32
The “free”state
free state refers to existence of “free
free carriers
carriers”.
“carriers” refers to “electrons” and “holes”.
At room temperature,
temperature there are approximately 1 5 x 1010 free carriers in a
1.5
cubic centimeter of intrinsic silicon material.
The free carriers are sensitive to applied electric fields such as established by
voltage sources or any difference potential.
– Elemental semiconductors
• Silicon (Si)
– Most common semiconductor used today
• Germanium (Ge)
– First
Fi semiconductor
i d used
d iin p-n diodes
di d
– Compound semiconductors
• Gallium Arsenide (GaAs),
(GaAs) Gallium Nitride(GaN)
• Silicon Carbide (SiC)
III-V Compound
GaAs, GaP, InAs, InP
Semiconductors
II-VI Compound
ZnS,, ZnSe,, CdS,, CdSe
S i
Semiconductors
d t
Oxide Compound
Semiconductors ZnO, Cu2O
hole
Increase in free
Semiconductor carriers
Resistivity
Ev – Maximum
a u eenergy
e gy o
of a valence
a e ce e
electron
ect o oor hole
oe
Ec – Minimum energy of a free electron
Eg – Energy required to break the covalent bond
A valence electron in a
nearby bond can
move to fill the broken
bond making it
bond,
appear as if the ‘hole’
shifted locations.
− Eg
ni = BT e 32 2 kT
B – coefficient
ffi i t related
l t d to
t specific
ifi semiconductor
i d t
T – temperature in Kelvin
Eg – semiconductor bandgap energy
k – Boltzmann’s constant
−3
ni ( Si,300 K ) = 1.5 x10 cm 10
A semiconductor material that has been subjected to the doping process is called
extrinsic semiconductor.
Boron (B) replaces a Si atom and forms only three covalent bonds
with other Si atoms.
The missing covalent bond is a hole, which can begin to move
through the crystal when a valence electron from another Si atom
is taken to form the fourth B-Si bond.
This process will create p
p-type
type Si
Si.
Donor atom
Acceptor atom
n = electron concentration n = n⋅ p
2
i
p = hole concentration
n-type: p = n / ND
2
i
p-type: n = n / NA
2
i
p = NA, the acceptor concentration
Hole flow
Electron flow
In the intrinsic state, the number of free electrons in Ge or Si is due only to those
few electrons in the valence band that have acquired sufficient energy from
thermal or light sources to break the covalent bond or to the few impurities that
could not be removed.
The vacancies left behind in the covalent bonding structure give limited supply of
holes.
In an n-type material, the number of holes has not changed significantly from this
Intrinsic level. The net result, therefore, is that the number of electrons far
outweighs the numbers of holes.
In an n-type material, the electron is called the majority carrier and the hole is
called the minority carrier.
For the p-type material the number of holes far outweighs the number of electrons.
In a p-type material the hole is the majority carrier and the electron is the
minority
i it carrier.i
When the fifth electron of a donor atom leaves the parent atom, the atom
remaining acquires a net positive charge: hence the positive sign in the
donor-ion representation.
For the similar reasons, the negative sign appears in the acceptor ion.
Electrons and hole flow in opposite directions when under the influence
of an electric field at different velocities.
The drift currents associated with the electrons and holes are in the
same direction.
Low Low
The diffusion current associated with the electrons flows in the opposite
direction when compared to that of the holes.