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Anisotropic diffractive optical element

for generating hybrid-polarized


beams

Sergei V. Karpeev
Vladimir V. Podlipnov
Svetlana N. Khonina
Vyacheslav D. Paranin
Konstantin N. Tukmakov

Sergei V. Karpeev, Vladimir V. Podlipnov, Svetlana N. Khonina, Vyacheslav D. Paranin, Konstantin


N. Tukmakov, “Anisotropic diffractive optical element for generating hybrid-polarized beams,” Opt. Eng.
58(8), 082402 (2018), doi: 10.1117/1.OE.58.8.082402.

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Optical Engineering 58(8), 082402 (August 2019)

Anisotropic diffractive optical element for


generating hybrid-polarized beams
Sergei V. Karpeev,a,b,* Vladimir V. Podlipnov,a,b Svetlana N. Khonina,a,b Vyacheslav D. Paranin,b and
Konstantin N. Tukmakovb
a
Image Processing Systems Institute, Branch of the Federal Scientific Research Centre “Crystallography and Photonics” of
the Russian Academy of Sciences, Samara, Russia
b
Samara National Research University, Samara, Russia

Abstract. An approach is proposed to implement diffractive optical elements for the conversion of the
polarization state of beams. Calcite crystal etching technology is developed and applied to manufacture a four-
sector polarization converter. The fabricated four-sector polarization converter is experimentally investigated.
The orthogonal polarization state of beams in opposite sectors is achieved by selecting a wavelength with
a tunable laser. The experimental results of focusing the converted beams are consistent with the numerical
simulation. © 2018 Society of Photo-Optical Instrumentation Engineers (SPIE) [DOI: 10.1117/1.OE.58.8.082402]
Keywords: inhomogeneous polarization; sector polarization plates; calcite crystal etching; wavelength selection; focal patterns.
Paper 180918SS received Jun. 27, 2018; accepted for publication Sep. 27, 2018; published online Dec. 21, 2018.

1 Introduction In prior works,3–5 the above problems are combated using


Beams with various hybrid polarizations1,2 can serve for the low-frequency spatial filtration of the beam obtained by
formation of focal distributions of a given type. Beams with a a telescopic system with a point diaphragm in focus.
complex polarization state are effectively generated by sector However, this technique leads to significant energy losses.
plates in which the sectors are either half-wave plates3,4 or The effect of sector joints can be significantly reduced by
film polarizers.5 The former use a linearly polarized illumi- manufacturing a sector plate in the form of a single birefrin-
nating beam, and the latter use a circularly polarized beam. gent crystal, the sectors being formed by a microrelief on
Polarization converters based on subwavelength diffraction the crystal surface.
gratings are also known.6 The sectors of the polarization con- In essence, as in Refs. 7 and 8, the converter is imple-
verter can be made in the form of subwavelength reflective mented using diffractive optical element (DOE) technology,
gratings,7,8 which, like half-wave plates, provide rotation of but unlike Refs. 7 and 8, the sectors operate as crystal half-
the polarization plane and are used for linear polarization of wave plates and, consequently, completely eliminate all the
the illuminating beam. A distinctive feature of sector-based imperfections of subwavelength gratings.
polarization converters is the ease of use. A DOE for polarization conversion, made on a substrate
Effective conversion (virtually without energy losses) of a birefringent material, was first proposed by Niu et al.9
provides only a variant of a sector converter based on However, this DOE9 relied on a fundamentally different
half-wave plates. Obviously, a film converter has an effi- approach,10 based on the interference of a pair of laser
ciency of 50% at best. In a converter based on subwavelength modes. The DOE produces, respectively, Hermite–Gaussian
gratings, the efficiency and, consequently, the polarization modes (0, 1) and (1, 0) in the ordinary and extraordinary rays
contrast, varies depending on the angle of rotation of the that are formed at a certain distance. Then, the modes are
polarization plane by the grating. Thus, Stafeev et al.8 varied subjected to an additional phase conversion using a second
the polarization contrast in sectors from 185:1 to 6:1, which, DOE, after which a radially polarized R-TEMð0.1Þ mode is
of course, does not meet even the most minimal require- obtained. The disadvantages of the method are, first of
ments. It should also be noted that this property of a change all, the high technological complexity of manufacturing a
in efficiency theoretically follows from the very mechanism multilevel DOE with a maximum relief height of several
of the operation of subwavelength gratings and cannot wavelengths on a quartz substrate. Apparently, for this
be eliminated by any complication of the already complex reason, Niu et al.9 did not perform a full-scale experiment
technology of their fabrication. with the proposed DOE.
For gratings assembled from half-wave plates and from a Another version of the DOE on a birefringent crystal was
polarized film, the main factor that worsens the quality of proposed in Refs. 11 and 12 to generate radially and azimu-
the formed beams is the presence of sector joints. Gaps and thally polarized beams. Such a DOE is a multilevel spiral
misalignments between the sectors lead to the appearance of phase plate, at the full height of the relief the value of
parasitic diffraction patterns and additionally violate the the path difference between the ordinary and extraordinary
axial symmetry of the produced beams. The initial violation rays being 2λ. Even for a highly anisotropic material used
of the axial symmetry is determined by the limited number of in Ref. 10, the height of the relief is about 11 μm. Thus,
sectors (usually no more than 8). the approach in Refs. 11 and 12 suffers from the same draw-
backs as that in Ref. 9. In addition, the use of the element12

*Address all correspondence to: Sergei V. Karpeev, E-mail: karp@smr.ru 0091-3286/2018/$25.00 © 2018 SPIE

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Karpeev et al.: Anisotropic diffractive optical element for generating hybrid-polarized beams

involves the employment of an immersion cell with a special the wavelength near the calculated value of λ allow
gel and the presence of two additional quarter-wave and Eqs. (1) and (2) to be almost simultaneously exactly fulfilled.
two half-wave plates in the optical scheme. This property comes from the fact that H ≫ h.
It should be noted that there is another mechanism respon- Note that when the wavelength λi is changed by half
sible for the formation of inhomogeneous polarizations in a period, we get a new wavelength
anisotropic crystals,13–15 which is not related to the deposi-
tion of a microrelief on the crystal surface. However, this Δλ
λi ¼ λi þ ; (4)
mechanism works only in conditions of nonparaxial incident 2
EQ-TARGET;temp:intralink-;e004;326;697

beams of a special type, which are also obtained with the


help of separate DOEs. for which the etched part of the crystal will work as a half-
In this paper, we propose a new approach to the imple- wave plate, and after it the polarization plane will rotate
mentation of a DOE based on an anisotropic crystal for by π∕2. For the other part of the plate, Eq. (2) will now
the conversion of the polarization state of beams. The be satisfied and the polarization plane will not rotate. Thus,
obtained hybrid polarization states make it possible to when the wavelength is changed by half a period Δλ ∕ 2, the
form new field distributions in the focal region with high effi- polarization state in the sectors will change to an orthogonal
ciency. In this paper, a four-sector polarization converter is state each time.
fabricated on a single crystal of calcite. The distribution of Finally, consider the case of a significant deviation of the
the field formed by the manufactured optical element in the wavelength λi from the calculated wavelength, that is, when
near zone and in the focal plane of the lens is experimentally jλ − λi j ≫ Δλ. Then, the linear polarization of the transmit-
performed. ted light can be observed only after passing one pair of sec-
tors for which one of the two conditions, either Eq. (2) or
2 Principles of Designing DOEs on an Anisotropic Eq. (4), is fulfilled. Note that when Eq. (2) is met, rotation
Crystal of the polarization plane is absent. In the other pair of sectors,
an elliptical polarization of the transmitted light with ellip-
Consider the manufacture of a sector plate in the form of a ticity depending on the deviation value will be observed.
single birefringent crystal with sectors formed on the surface In the case where neither Eq. (2) nor Eq. (4) is fulfilled
by a microrelief. In this case, instead of the joints of individ- for either sector, elliptical polarization of the transmitted
ual half-wave plates, a step appears that introduces much light will be observed in all sectors, with the larger semiaxes
less distortion. As is easily understood, only four sections of the ellipses being orthogonal. In those sectors where the
can be produced on an anisotropic single-axis crystal, which crystal thickness is closer to the fulfillment of either Eq. (2)
will ensure a pairwise orthogonal polarization state of the or Eq. (4), the ellipses will be more elongated.
beams transmitted through them. To this end, the half-wave
plates should be formed in two opposite sectors by etching
3 Basic Parameters and Manufacturing
two other sectors to a certain depth. The etching depth with
Technology of the Polarization Converter
respect to the substrate must satisfy the condition
In this section, we substantiate the main parameters and
λ λ describe the technology of manufacturing the proposed
h¼ ¼ ; (1) element. First of all, we need to determine the geometric
2Δn 2ðno − ne Þ
EQ-TARGET;temp:intralink-;e001;63;377

parameters and to choose the material for fabricating the con-


where Δn is the birefringence, and λ is the wavelength at verter. As it is easy to understand, a single anisotropic single-
which the converter is supposed to be used. For the correct axis crystal has one axis and makes it possible to produce
operation of the half-wave plates located on the surface of an only a four-section converter. Simple calculations using
anisotropic crystal of thickness H, after passing through this Eq. (1) show that to ensure a necessary path difference in
crystal the polarization state of the beam must not change, the visible wavelength range, the step on crystalline quartz
that is, the condition should be more than 30 μm. This value presents difficulties
in terms of technology, and so a material with a much greater
Nλi anisotropy than that of quartz, for example calcite, is needed.
H¼ (2) For the visible wavelength range, the required etching depth
Δn
EQ-TARGET;temp:intralink-;e002;63;268

of the CaCO3 crystal does not exceed 2 μm. The most


should be met. N ¼ HΔn∕λi is the path difference in wave- suitable is liquid etching in a solution of the disodium salt of
lengths between the ordinary and extraordinary rays at ethylenediaminetetraacetic acid (C10 H14 N2 Na2 O8 , Trilon B).
a crystal thickness H, which, as a rule, amounts to hundreds The process provides a relatively high etch rate while main-
of wavelengths. Equation (2) is satisfied for a number of taining a good quality of polishing of the etched surface.
wavelengths λi that are quasiperiodically repeated with The chemical reaction occurs with the formation of a soluble
a local period salt:
HΔn HΔn λi λ TrB-2Na þ CaCO3 → TrB-Ca þ Na2 CO3 : (5)
Δλ ¼ λi − λiþ1 ¼ − ¼ ≈ i: (3)
EQ-TARGET;temp:intralink-;e005;326;160

N Nþ1 Nþ1 N
EQ-TARGET;temp:intralink-;e003;63;160

To prepare an etching solution, 10 g of Trilon B was


None of the wavelengths λi can exactly coincide with the dissolved in 45 ml of deionized water at a temperature of
calculated wavelength λ; however, as it is easy to see from 60°C, which corresponds to a theoretical solubility limit at
Eq. (3), the value of Δλ is so small that the choice of the a given temperature. The entire etching process was carried
wavelength λi closest to λ ensures that Eq. (1) is fulfilled out by maintaining this temperature with the aid of a pro-
to hundredths of a fraction of λ. Thus, small changes in grammable hotplate.

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Karpeev et al.: Anisotropic diffractive optical element for generating hybrid-polarized beams

Fig. 1 Profilogram of a step on a calcite crystal.

(ii) application of the photoresist by centrifugation at


1500 rpm, which provides a resist layer of about
1.5 μm in thickness;
(iii) drying of the photoresist on the hotplate at a temper-
ature of 130°C for 2 min;
(iv) exposure through a contact mask by a 405-nm LED
source; and
(v) development in a UPF-1B universal buffer developer
(based on alkali) for 30 s.

To prevent etching of the back side of the crystal, after


the photoresist mask was coated we applied a self-adhesive
high-performance polyamide film to the crystal.
At the initial stage of etching, we repeatedly used white
Fig. 2 Microphotographs of the joint between two sections of an eight- light interferometry to perform several control measurements
sector plate based on multiorder half-wave plates.16 of the etching depth to assess the etching rate and stability of
the process. To do this, the crystal was immersed in a pre-
The CaCO3 crystal covered with a given photomask was viously prepared Trilon B solution for 1 min, after which the
etched using a positive FP-2512 photoresist, which has height difference was measured between the etched and
an increased chemical resistance and makes it possible to masked areas, taking into account the thickness of the photo-
produce relatively thick layers. The lithographic process resist layer. Thus, the etching rate was determined to be
consisted of the following stages: 0.27 μm∕ min. Further etching of the crystal was carried
out taking into account the rate obtained. At the end of the
(i) purification of the parent crystal in IPA followed by dissolution process, the polyamide film was mechanically
washing in deionized water; removed. The photoresist mask was removed by dissolving

Fig. 3 Phase and polarization state distribution upon passage of a beam with a wavelength of λ0 through
a relief and a crystalline substrate whose thickness corresponds to a path difference of (a) λ0 , (b) 0.1λ0 ,
(c) 0.25λ0 , and (d) 0.4λ0 .

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Fig. 4 Focusing of a Gaussian beam transmitted through the converter at different wavelengths.

in acetone followed by washing in isopropyl alcohol and of λ0 ¼ 678 nm. The number N in this case is about 400,
deionized water. The profilogram of the obtained step is which guarantees that Eq. (1) is fulfilled no worse than
shown in Fig. 1. One can see that the etching depth was λ∕800. The size of the plate is 15 × 15 mm. The width of
about 1970 nm at a plate thickness of about 1.5 mm. This the raster zone is about 40 μm. This relatively large value
etching depth gives the fulfillment of Eq. (1) at a wavelength is apparently due to the difference in etching rates along

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Fig. 5 Intensity distributions formed by a four-section plate at different wavelengths (negative images).
The size of the images is 4 × 4 mm.

and across the crystal axis, but this is still four times smaller was directed parallel to the bisectrix of the sector angle.
than the width of the joints when assembling the converter In Fig. 3, the crystal axis is located vertically.
from separate half-wave plates.16 The polarization plane of the incident light forms an angle
For comparison, Fig. 2 shows microscope photos of a π∕4 with the crystal axis. For the step of the 1970-nm-high
joint between two sections of an eight-sector plate based relief, as mentioned above, Eq. (1) will be satisfied for
on multiorder half-wave plates.16 One can see that the gap the wavelength λ0 ¼ 678 nm. If Eq. (2) is satisfied for the
between the plates is about 180 μm. The edges of the plates substrate, then the polarization state of the transmitted light
also have defects up to 50 μm in width. in neighboring sectors will be orthogonal. Figure 3 shows
the simulation results for a linearly polarized beam converted
by the optical element in question at various deviations of
4 Simulation the thickness of the crystalline substrate from Eq. (2) for
In this section, we simulate the polarization conversion by the calculated wavelength λ0 ¼ 678 nm. The deviations of
the sectoral relief formed on the surface of the calcite crystal. the substrate thickness by 0.1λ0 in both directions lead to
The crystal axis in the manufactured polarization converter the appearance of elliptical polarizations approximating

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Fig. 6 Results of an experimental study of a focused beam transmitted through the converter at different
wavelengths.

the corresponding linear ones. In the case of a deviation results of Sec. 1. Then, the wavelength was reduced to
by 0.25λ0, corresponding to a quarter-wave plate, linear 586.4 nm. As can be seen from Fig. 5 (third row), Eq. (2)
polarization undergoes transition into circular polarization. is also satisfied for this wavelength. The period Δλ for
Figure 4 shows the simulation results of the focusing of a this wavelength is 1.16 nm. The first change in the polari-
Gaussian beam converted by the optical element under con- zation state of the sectors, close to the orthogonal state,
sideration for different wavelengths at a 1.5-mm-thick crystal occurs at a wavelength of 586.9 nm, as follows from the
substrate. As can be seen from Fig. 4, if the wavelength is calculations. However, Eq. (1) for this wavelength is not
chosen in such a way that the deviations from Eqs. (1) and satisfied as accurately as for λ0 ¼ 678 nm; therefore, as
(2) are small and close to plane polarization (and this is was shown in Sec. 1, the resulting polarizations are elliptical,
possible in the wavelength range from 600 to 750 nm), the which leads to a decrease in the polarization contrast
distributions of the total intensity and the intensities of the between the sectors in Fig. 5.
x- and y-components in the focal plane practically do not Next, we focused the obtained beams with a lens having
change and do not depend on which quadrants the polariza- a focal length of 100 mm. The obtained distributions are
tion planes are rotated. In this case, the intensity distributions given in Fig. 6.
of x- and y-components are significantly different. For other In general, the results of the experimental study agree
wavelength ranges, where the polarization of light after with those of the simulation. For the wavelength λ ¼
passing through different quadrants is already substantially 630 nm, the experimental result is fairly close to the simu-
different from the plane one, there are also significant lation result for λ ¼ 650 nm. As for the result of the experi-
differences from the distributions considered above, mainly ment for λ ¼ 650 nm, the regularity of conservation of the
in the distribution of the y-component. x-component distribution is observed, with the y-component
being substantially weakened, which results in significant
5 Experiment changes in the total intensity distribution.
In our experimental study, the wavelengths λi were selected
to ensure the fulfillment of Eq. (2). Initially, the wavelength
6 Conclusions
was varied near the calculated wavelength λ0 ¼ 678 nm,
which should provide the closest wavelength to the calcu- We have considered the work of a DOE in the form of a step
lated one. To select the wavelength, we used a tunable on the surface of an anisotropic crystal. We have developed a
EKSPLA NT-200 laser, which provides the wavelength method for manufacturing sector plates for the conversion of
tuning with a step of 0.1 nm. In Fig. 5, the first row shows the polarization state of beams. The method based on etching
the distribution of the light intensity passed through the of a calcite crystal has been developed and implemented.
converter without an analyzer and with an analyzer for The resulting width of the steps on the calcite crystal
λi ¼ 678.3 nm. One can see from Fig. 5 that for this wave- is four times smaller than the width of the joints in a con-
length Eq. (2) is satisfied, which ensures a pairwise orthogo- verter assembled from half-wave plates. We have numeri-
nal polarization state in the corresponding sectors. The cally simulated polarization conversions when light passes
calculated value of Δλ for this wavelength is 1.74 nm. In through a converter at different wavelengths, and also when
Fig. 5, the second row shows the light intensity distribution the transmitted beam is focused by a lens. The results of
for λi ¼ λi þ ðΔλ∕2Þ ¼ 678.3 nm þ 0.87 nm ≈ 679.1 nm. the experimental study of the manufactured four-sector
As can be seen, dark and light sectors changed places, polarization converter are in good agreement with the results
which is consistent with the calculations and simulation of calculations and numerical simulation.

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Acknowledgments 7. G. Nalimov et al., “Reflected four-zones subwavelength microoptics


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This work was financially supported by Russian Foundation Opt. 38(2), 229–236 (2014).
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Comput. Opt. 39(5), 709–715 (2015).
16-07-00825-a) and by the Federal Agency of Scientific 9. C.-H. Niu et al., “A new method for generating axially-symmetric and
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