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1. INTRODUCTION
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2. EUVL_DEFINITION
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2.2 LITHOGRAPHY
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3. WHY EUVL?
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ago, when he said that the number of transistors on a microprocessor would
double every 18 months. This became known as Moore's Law.
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than across town: the electronic signals zipping around the circuitry to solve
computing problems have less distance to travel. Today's chip contains about
3,260 times more transistors than the chip of 1971.
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operating system that BIOS loads into computer memory, or an application
program is "driving" the microprocessor, giving it instructions to perform.
The following table helps you to understand the differences between the
different processors that Intel has introduced over the years.
Clock Data
Name Date Transistors Microns MIPS
speed width
8080 1974 6,000 6 2 MHz 8 bits 0.64
16
bits
8088 1979 29,000 3 5 MHz 0.33
8-bit
bus
16
80286 1982 134,000 1.5 6 MHz 1
bits
16 32
80386 1985 275,000 1.5 5
MHz bits
25 32
80486 1989 1,200,000 1 20
MHz bits
32
60 bits
Pentium 1993 3,100,000 0.8 100
MHz 64-bit
bus
32
233 bits
Pentium II 1997 7,500,000 0.35 ~300
MHz 64-bit
bus
32
450 bits
Pentium III 1999 9,500,000 0.25 ~510
MHz 64-bit
bus
32
1.5 bits
Pentium 4 2000 42,000,000 0.18 ~1,700
GHz 64-bit
bus
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4. EUVL TECHNOLOGY
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trend with strong investments in Extreme Ultraviolet (EUV) research at our
Hillsboro, Oregon, and Santa Clara, California, sites.
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5.1 CHIPMAKING
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as the light's wavelengths get smaller, the light gets absorbed by the glass
lenses that are intended to focus it. The result is that the light doesn't make it
to the silicon, so no circuit pattern is created on the wafer.
Now Moore's Law could be back on track. Chou and co-workers say
that their technique - known as laser-assisted direct imprint - can create features
as small as 10 nm on silicon wafers. The new process also eliminates the need for
the resist and washing steps
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3. The light travels into a condenser, which gathers in the light so that it is
directed onto the mask.
4. A representation of one level of a computer chip is patterned onto a
mirror by applying an absorber to some parts of the mirror but not to
others. This creates the mask.
5. The pattern on the mask is reflected onto a series of four to six curved
mirrors, reducing the size of the image and focusing the image onto
the silicon wafer. Each mirror bends the light slightly to form the
image that will be transferred onto the wafer. This is just like how the
lenses in your camera bend light to form an image on film.
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is to a car," he explains. The four mirrors of the ETS projection optics system
reduce the image and form it onto the wafer. "Again, imagine using a pocket
camera. The camera lens transmits an image to the film, which-like the wafer-
has a light-sensitive surface," says Sweeney.
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Laboratories in Livermore, Calif., which has joined with two other
Department of Energy laboratories - Lawrence Livermore National
Laboratory and Lawrence Berkeley National Laboratory - creating a Virtual
National Laboratory to help develop EUV lithography for commercial use.
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percent is absorbed by the mirror. Without the coating, the light would be
almost totally absorbed before reaching the wafer. The mirror surfaces have to
be nearly perfect; even small defects in coatings can destroy the shape of the
optics and distort the printed circuit pattern, causing problems in chip
function. Hence Before new lithography tools are even built, Chip makers
must develop and demonstrate the necessary mask making capabilities.
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6. CONCLUSION
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7. REFERENCES
• www.intel.com
• www.howstuffworks.com
• www.sandia.com
• www.whatis.com
• www.euvl.com
• www.llnl.com
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ACKNOWLEDGEMENTS
SUDEEP V D
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ABSTRACT
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CONTENTS
1. INTRODUCTION
2. EUVL DEFINITION
2.2 LITHOGRAPHY
3. WHY EUVL?
4. EUVL TECHNOLOGY
6. CONCLUSION
7. REFERENCE
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