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876 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, VOL. 32, NO.

4, DECEMBER 2009

Design and Optimization of Single-Phase Liquid


Cooled Microchannel Heat Sink
Laxmidhar Biswal, Suman Chakraborty, and S. K. Som

Abstract—Semiconductor devices for demanding automotive N Number of microchannels.


applications generate a large amount of heat (>100 W/cm2 ). Nu Nusselt number.
These high power devices can be cooled off very effectively
P Pressure drop (Pa).
by liquid coolant flowing through the microchannel heat sink.
Microchannel heat sinks are very attractive because of their com- Q Total heat (W).
pactness, light weight, and large surface-to-volume ratio. Higher Re Flow Reynolds number.
surface-to-volume ratio results in enhanced cooling performance. Rth Thermal resistance (°C/W).
In this paper, a systematic robust analytical method is pre- Rjc Junction-to-case resistance (°C/W).
sented for design and optimization of single-phase liquid cooled
Rcs Case-to-sink (interface) thermal resistance (°C/W).
microchannel heat sink. Effects of various design parameters
such as eccentricity and footprint of heat source or device, Rcon Conductive thermal resistance (°C/W).
thickness of the heat sink base, channel aspect ratio, number of Rcap Coolant capacitive thermal resistance (°C/W).
microchannels or fins, coolant flow rate, and thermal conductivity Rfin Fin thermal resistance (°C/W).
of heat sink material on heat sink thermal resistances and pres- Rsp Spreading thermal resistance (°C/W).
sure drop are delineated. Finally, analytical results are compared
t Thickness of base of heat sink (m).
with experimental data and good agreement is obtained. The
analytical method helps to reduce the design cycle time and time- Ths-maxMaximum temperature of heat sink (°C).
to-market significantly. Tf -in Inlet temperature of coolant (°C).
Tf -m Average temperature of coolant (°C).
Index Terms—Design, heat sink, microchannel, optimization,
semiconductor, single-phase, thermal resistance. Tf -outOutlet temperature of coolant (°C).
um Average flow velocity (m/s).
Vf Volumetric flow rate of coolant through channels
Nomenclature (m3 /s).
Whs Width of microchannel heat sink (m).
Ahs Footprint of microchannel heat sink (m2 ). Ws Width of heat source (m).
As Footprint of heat source (m2 ). Wch Width of microchannel (m).
Cpf Specific heat of coolant [J/(kg·K)]. Wfin Width of fin (m).
Dh Hydraulic diameter of microchannel (m). Xc Centroidal X-coordinate of heat source (m).
f Friction factor. Yc Centroidal Y-coordinate of heat source (m).
G Geometric
 −2 factor of microchannel
 Greek Symbols
(α + 1) (α−1 + 1)2 .
α Aspect ratio of microchannel (Lch /Wch ). 
K Pressure loss coefficient.
β Ratio of fin width to channel width (Wfin Wch ).
kf Thermal conductivity of coolant [W/(m·K)].
η Fin efficiency.
khs Thermal conductivity of heat sink [W/(m·K)].
µf Viscosity of coolant [kg/(m·s)].
Lch Depth of microchannel (m).
ρf Density of coolant (kg/m3 ).
Lhs Length of microchannel heat sink (m).
Ls Length of heat source (m).
.
m Total mass flow rate of coolant through channels. I. Introduction
Manuscript received June 17, 2008; revised March 1, 2009. First version
published September 15, 2009; current version published November 20, 2009.
Recommended for publication by Associate Editor T. Lee upon evaluation of
W ITH INCREASED heat generation in semiconductor
devices for very demanding automotive applications
such as hybrid electric vehicle programs, it is imperative to
reviewers’ comments.
L. Biswal is with the Department of Mechanical Engineering, Indian design and develop highly efficient cooling solutions to dissi-
Institute of Technology, Kharagpur 721302, India, on leave from DELPHI pate high amount of heat (e.g., >100 W/cm2 ). The high heat
Tech Center India, Kalyani Platina, Whitefield, Bangalore 560066, India dissipating devices need to be maintained at desired junction
(e-mail: lbiswal@mech.iitkgp.ernet.in).
S. Chakraborty and S. K. Som are with the Department of Mechanical temperature limit to achieve higher thermal reliability and
Engineering, Indian Institute of Technology, Kharagpur 721302, India (e-mail: sustained functionality. Microchannel heat sinks for cooling
suman@mech.iitkgp.ernet.in; sksom@mech.iitkgp.ernet.in). of high heat dissipating devices are particularly attractive for
Color versions of one or more of the figures in this paper are available
online at http://ieeexplore.ieee.org. they are compact, light weight, and yet offer large surface-
Digital Object Identifier 10.1109/TCAPT.2009.2025598 to-volume ratio. Higher surface-to-volume ratio results in
1521-3331/$26.00 
c 2009 IEEE

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BISWAL et al.: DESIGN AND OPTIMIZATION OF SINGLE-PHASE LIQUID COOLED MICROCHANNEL HEAT SINK 877

correlations) for designing the microchannel heat sinks and


is a subject matter of the study in this paper. Radiation and
free convection from the external surfaces of the microchannel
heat sink are neglected in comparison with forced convection
through the microchannels.

II. Mathematical Model


Geometrical configuration of the microchannel heat sink is
shown in Fig. 1. The bottom cover is assumed to be adiabatic.
Thermal performance of the heat sink is characterized by its
total thermal resistance (Rtot ). Thermal resistance of any heat
sink is a critical parameter that decides its suitability for a
particular heat sinking application. Mathematically, Rtot should
be less than [(Tjmax − Tf -in )/Q − (Rjc + Rcs )] for a heat sink
where (Tjmax ) is the maximum junction temperature of the heat
dissipating device, (Tf -in ) is inlet temperature of the coolant,
(Q) is heat dissipation from the device, (Rjc ) is the junction-
to-case thermal resistance of the device, (Rcs ) is the interface
Fig. 1. Schematic layout of microchannel heat sink and heat source. thermal resistance between the device and the heat sink. It is
imperative to determine optimum geometrical parameters of
enhanced cooling performance. Microchannel heat sinks have the heat sink that would result in desired thermal resistance and
been studied extensively [1]-[19] and discussions on all that pressure drop for cost effective and efficient thermal solutions.
work are not repeated here for the sake of brevity. In this paper, Based on the theoretical formulation [3], total thermal
we propose a comprehensive and systematic robust analytical resistance of the microchannel heat sink with uniform heat
methodology for design and optimization of microchannel heat flux on the entire footprint of the heat sink is given by the
sinks. The analytical methodology helps to predict transport relation
phenomena (Nusselt number, heat transfer coefficient, total Ths-max − Tf -in
and spreading thermal resistance, and pressure drops) of the Rtot = = Rfin + Rcap + Rcon . (1)
Q
microchannel heat sinks with arbitrarily located semiconductor
devices (shown in Fig. 1). The footprint of semiconductor Equation (1) does not consider the spreading or constriction
devices is generally smaller than that of the microchannel heat resistance a device generally encounters while interfaced with
sink. When heat flows from the device to the liquid coolant, a relatively larger heat sink. The spreading resistance may form
it encounters various thermal impedances on its path such as a significant part of the total thermal resistance and hence
internal thermal resistance of the device (known as junction- should be included in the formulation. With consideration
to-case thermal resistance, Rjc ), interface thermal resistance of spreading resistance, the total thermal resistance of the
between device and cold plate (Rcs ), constriction/spreading microchannel heat sink for an arbitrarily located heat source
resistance (Rsp ) [20], conductive resistance (Rcon ), capacitive is given by
resistance (Rcap ) and fin resistance (Rfin ). While the two Ths-max − Tf -in
formers (Rjc and Rcs ) are external to the heat sink, the latter Rtot = = Rfin + Rcap + Rcon + Rsp . (2)
Q
fours (Rsp , Rcon , Rcap , and Rfin ) are internal to the heat sink
and will be addressed in this paper. The conductive thermal resistance is defined by
In this paper, both fully developed and simultaneously de- t
Rcon = . (3)
veloping flow through the microchannel heat sink are consid- khs Ahs
ered to delineate their relative effect on the pertinent transport The capacitive (sometimes referred to as advective) thermal
phenomena. The flow is considered to be single-phase and resistance [3] is defined by
laminar for the range of the flow Reynolds number (Re)
generally encountered in microfluidic applications. The flow 1 1 1 1 1 + β Lhs
through the microchannels transitions to turbulent flow beyond Rcap = . = = (4)
m Cpf 2ρf Cpf Vf Cpf µf Re 1 + α Ahs
the Reynolds number of 2100 as established by the micro-PIV
experiments [21]. It is also established by the experiments [21] where Vf is the volumetric flow rate of the coolant. The factor
that the hydrodynamic entrance length (Le ) is decreased from 2 is incorporated in the above equation as the average coolant
conventional value of (0.06*ReDh ) to (0.033*ReDh ) for the temperature [Tf -m = (Tf -in + Tf -out )/2] is used for the calculation
entire range of laminar flows in the microchannel heat sink. of the thermal resistance from the channel walls to bulk fluid
The reason of decrease in entrance length is attributed to the [14].
predevelopment in the upstream reservoir of the microchannel The fin thermal resistance is defined by
heat sink. This fact may lead to the safe assumption of 1 1 1 + β 2α Wch
Rfin = (5)
using developed flow correlations (instead of developing flow Nu kf 1 + 2αη 1 + α Ahs

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878 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, VOL. 32, NO. 4, DECEMBER 2009

where

⎨ = λi
Lch Wfin tanh(mα) ρf um Dh ξ = δj (14)
α= ,β = ,η = , Re = (6) ⎩
Wch Wch mα µf = βij
 ⎫
iπ ⎪
1 + α kf Vf 2Wch Lch λi = ⎪

m= Nu , um = , Dh = . (7) Whs ⎪

αβ khs NWch Lch Wch + Lch ⎪


δj = . (15)
Number of microchannels (N) required for the specified Lhs ⎪



heat sink configuration is defined as ⎪

βij = λ2i + δ2j ⎭
Whs − Wfin
N= . (8)
Wch + Wfin Pressure drop across the microchannel heat sink consists of
Semiconductor devices/packages can have a single or (a) pressure drop in the microchannel, (b) pressure drop at the
multiple integrated circuits (ICs) on the same die or multiple inlet due to the flow constriction, and (c) pressure drop at the
die. Die or junction-to-case (Rjc ) thermal resistance effectively outlet due to flow expansion.
captures the internal thermal resistance [(Tjmax − Tc )/Qt ] The friction factor for fully developed laminar flow through
of the device by considering maximum temperature (Tjmax ) the microchannel is given by [3]
of any IC or die, case temperature (Tc ) of the device and
total power dissipation (Qt ) from the device accounting for f · Re = 4.7 + 19.64G. (16a)
the power dissipation from all the ICs or die. So far as
the heat sink is concerned, it sees a single heat source in the The friction factor for developing laminar flow through
form of a device or package. For a single device or package the microchannel is given by [7]. It is interesting to
located anywhere on the base of the microchannel heat sink, note that the first term in (16b) accounts for the pressure drop
constriction/spreading resistance of the microchannel heat in the developing region and the second term in (16b) is for
sink is defined as follows [20]: the pressure drop in the developed region as shown in (16a).

∞  2 1/2
2 cos(λi Xc ) sin(λi Ws /2)
Rsp = Ai φ(λi ) f ·Re = 3.2 (ReDh /Lhs )0.57 + (4.7 + 19.64G)2 (16b)
khs Whs Lhs Ws2 i=1 λi
∞
2 cos(δj Yc ) sin(δj Ls /2) where
+ Aj φ(δj )
khs Whs Lhs Ls j=1
2 δj
α−2 + 1
4
∞ 
 ∞ G= . (17)
+ (α−1 + 1)2
khs Whs Lhs Ws2 L2s i=1 j=1
Pressure drop across the microchannel heat sink is given as
cos(λi Xc ) sin(λi Ws /2)
×Aij  
λi ρf u2m Lhs
P = 4f +K . (18)
cos(δj Yc ) sin(δj Ls /2) 2 Dh
× ϕ(βij )
δj (9)
Loss coefficient (K) at the inlet and the outlet of the heat
sink is found out from [7]
where
     K = 0.6σ 2 − 2.4σ + 1.8 (19)
Ws Ws
2 sin (Xc + )λi − sin (Xc − )λi
Ai = 2 2
(10)
λ2i where σ is the ratio of flow cross-sectional area in the fin
structure to the overall inlet/outlet area
  Ls
  Ls

2 sin (Yc + )δj − sin (Yc − )δj NWch Lch NWch
Aj = 2 2
(11) σ= = . (20)
δ2j (Whs Lch ) Whs

16 cos(λi Xc ) sin(λi Ws /2) cos(δj Yc ) sin(δj Ls /2) Nusselt number for fully developed laminar flow in the
Aij = (12) microchannel is given by [3, 22]
λi δj βij
ht Nu 
= 8.235
ξt + tanh(ξt) 
khs 2.042 3.0853 2.4765 1.0578 0.1861
ϕ(ξ) = (13) × 1− + − + − .
ht α α2 α3 α4 α5
+ ξt ∗ tanh(ξt)
khs (21a)

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BISWAL et al.: DESIGN AND OPTIMIZATION OF SINGLE-PHASE LIQUID COOLED MICROCHANNEL HEAT SINK 879

TABLE I
Pertinent Input Parameters

Parameters Value
Lhs 10 mm
Whs 10 mm
Wch 100 µm
Lch 300 µm
Wfin 100 µm
.
V 1.0 mL/s
khs 100 W/(m·K)
Coolant Water

The average Nusselt number for simultaneous developing


laminar flow in the microchannel is given by [7]
 3 1/3
Nu = 2.22 (RePrDh /Lhs )0.33 + (8.31G − 0.02)3
(21b) Fig. 2. Total thermal resistance of the microchannel heat sink for different
locations of the device along the y-axis for fully developed (1) and developing
where Re is Reynolds number, Pr is Prandtl number, Dh is (2) flows.
the hydraulic diameter of the microchannel, Lhs is the length
of the microchannel and G is the parameter defined in (17). of the microchannel heat sink. Footprint of the device is con-
The first term in (21b) accounts for the heat transfer in the sidered at 5 mm × 5 mm and thickness of the heat sink base is
developing region and the second term in (21b) is for the heat 0.5 mm. All other input parameters are taken from Table I. The
transfer in the developed region [7]. device is placed at the center of the heat sink in the x-direction
Heat transfer coefficient (h) is found out from the following and at different locations along the y-direction (from the
relation and used in (13): center toward the upstream direction). Total thermal resistance
hDh of the heat sink is predicted using the fully developed and
Nu = . (22) developing flow heat transfer correlations such as (21a) and
kf
(21b) respectively and is shown in Fig. 2. Total thermal
resistance for fully developed flow varies from 1.1 to 0.921
III. Solution Methodology °C/W corresponding to the edge and center-located device
along the y-axis. Similarly for developing flow, total thermal
Equations (1)–(22) are solved analytically to predict spread-
resistance varies from 0.972 to 0.834 °C/W for the edge and
ing and total thermal resistance, Nusselt number, heat transfer
center-located devices along the y-axis. The difference in total
coefficient, channel aspect ratio, number of microchannels, and
thermal resistance between fully developed and developing
pressure drop.
flow is 13% for the device located at the inlet of the heat sink
and 10% for the device located at the center of the heat sink.
This difference can be considered within the permissible limit
IV. Results and Discussions
to assume the flow as fully developed. Results presented in the
The microchannel heat sink with an arbitrarily located heat subsequent sections have used developed flow correlations.
source is studied analytically for single-phase fully developed
as well as developing laminar flow with constant thermophys- B. Effect of Eccentricity of the Device
ical properties. Effects of various design parameters such as
Total and spreading thermal resistance for a heat source
eccentricity and footprint of heat sources, thickness of heat
footprint of 5 mm × 5 mm placed at different locations along
sink base, channel aspect ratio, number of microchannels or
the y-axis is shown in Fig. 3. Thickness of the microchannel
fins, coolant flow rate, and different heat sink materials are
heat sink base is considered to be 0.5 mm. Other parameters
evaluated to study total and spreading thermal resistances,
for the microchannel heat sink are taken from Table I. As the
and other transport phenomena such as Nusselt number, heat
location of the device shifts from the inlet (or edge) toward
transfer coefficient, friction factor, and pressure drop. The
the center (along the y-axis) of the heat sink, spreading resis-
pertinent input parameters listed in Table I, until and unless
tance becomes the minimum and hence lowest total thermal
stated otherwise, are used for the design and optimization
resistance is achieved. A similar trend is expected for the
studies of the microchannel heat sink.
device moving from the edge to the center of the heat sink
along the x-axis. Total thermal resistance varies from 1.1 to
A. Developed Versus Developing Flow 0.921 °C/W for the edge and center located device on the
Both fully developed and developing flows are studied to heat sink. Spreading resistance varies from 0.776 to 0.596
differentiate their relative impact on the thermal performance °C/W for the device moving from the edge to the center of

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880 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, VOL. 32, NO. 4, DECEMBER 2009

are plotted in Fig. 5(a), (b), and (c) respectively. For a given
heat source footprint, there is an optimum thickness (t) of
the heat sink base for which total thermal resistance (as well
as spreading resistance) is minimum. For (2 mm × 2 mm) heat
source the lowest total thermal resistance is 2.284 °C/W cor-
responding to 2.0 mm base thickness, for (5 mm × 5 mm) heat
source the lowest total thermal resistance is 0.826 °C/W cor-
responding to 1.25 mm base thickness, and for (8 mm × 8 mm)
heat source the lowest total thermal resistance is 0.411 °C/W
corresponding to 0.4 mm base thickness. Optimum thickness
of the heat sink base for different percentages of heat source
coverage is plotted in Fig. 5(d) and an equation fitted into
the curve is shown thereof. For the known percentage of heat
source coverage, optimum thickness of heat sink base can
be predicted using the equation depicted in Fig. 5(d). With
increase in heat source footprint, the desired (optimum) base
thickness (t) is reduced to obtain the lowest thermal resistance
Fig. 3. Total and spreading thermal resistance of the microchannel heat sink of the microchannel heat sink.
for different locations of the device along the y-axis. Temperature rise (dT)
due to total thermal resistance is also plotted for a heat source or device
dissipating 100 W/cm2 . E. Effect of Channel Aspect Ratio (α)
Different aspect ratios (α = Lch /Wch ) of the microchannel
the heat sink along the y-axis. It is noticed that spreading are studied to evaluate their effect on thermal performance of
resistance constitutes 65–70% of the total thermal resistance the heat sink. All the input parameters (listed in Table I) such
and the spreading resistance is 30% higher for the edge located as flow rate, width of fins, footprint of heat sink, and width
device than that located at the center of the heat sink. Net tem- of microchannels are kept constant. The heat source footprint
perature increase for a die dissipating 100 W/cm2 is 23.0 °C is considered at 5 mm × 5 mm. Depth of microchannels (Lch )
corresponding to a centrally-located device and 27.5 °C cor- is varied to obtain different aspect ratios (α) keeping width
responding to an edge-located (along the y-axis) device. of microchannel constant at 100 µm. It should be noted
here that fin height increases as the depth of microchannel
increases. Increase in fin height offers increased surface area
C. Effect of Footprint of the Semiconductor Device
for enhanced heat transfer. With increase in channel depth
Device or heat source with different footprints is studied. (Lch ), free area available to flow increases and velocity of
The center of the heat source or device is located at the center flow decreases for fixed flow rates. Flow Reynolds number
of the heat sink base. All the input parameters are taken (Re) decreases with decrease in flow velocity (um ) even if
from Table I. Thickness of the heat sink base is considered there is an increase in hydraulic diameter (Dh ) with increase
at 0.5 mm. Total and spreading thermal resistance is plotted in channel depth (Lch ).
in Fig. 4(a). With increase in heat source footprint, spreading Fully developed Nusselt number (Nu) and heat transfer
thermal resistance decreases and vanishes when the heat source coefficient (h) are shown in Fig. 6(a). At low aspect ratio,
footprint equals that of the heat sink. Spreading resistance for the Nusselt number and heat transfer coefficient are higher
smaller footprint devices constitutes a major portion of the because of higher flow velocity. With increase in aspect ratio,
total thermal resistance as shown in Fig. 4(a). Total thermal flow velocity decreases and hence Nu and h decrease, reach
resistance varies from 3.0 to 0.324 °C/W while spreading a minima and then increase again because of increase in
resistance varies from 2.676 to 0.0 °C/W for 4–100% heat fin surface area resulting in lower temperature rise of the
source coverage. Temperature increase of heat sink due to heat sink. At aspect ratios of 0.65, 1.0, and 10, the Nusselt
total and spreading thermal resistance for a heat source of number is 3.829, 3.61, and 6.787, respectively whereas the
100 W/cm2 is plotted in Fig. 4(b). It is seen from Fig. 4(b) average heat transfer coefficient is 32 207, 23 925, and 24 741
that increase in temperature of the heat sink due to spreading W/(m2 ·K), respectively. Though the Nusselt number is very
and total thermal resistance for 4% heat source coverage is high at highest aspect ratio than that at lowest aspect ratio,
66.9 °C and 75.0 °C respectively whereas for 25% heat source the heat transfer coefficient is not higher at highest aspect
coverage they are 14.9 °C and 25.0 °C respectively. ratio than that at lowest aspect ratio. The race between the
flow velocity and fin surface area determines the decease or
D. Effect of Base Thickness of Microchannel Heat Sink increase in the Nusselt number and associated heat transfer
Base thickness of microchannel heat sink can affect spread- coefficient at various aspect ratios.
ing and total thermal resistance significantly. Three different Total and spreading thermal resistance reach the peak at a
heat source footprints such as (2 mm × 2 mm), (5 mm × 5 mm), particular aspect ratio and lower on either side of the peak as
and (8 mm × 8 mm) located at the center of the heat sink are shown in Fig. 6(b). At aspect ratios of 0.65, 1.0, and 10, total
studied with different base thickness (t) in conjunction with the thermal resistance is 0.95, 1.026, and 0.819 °C/W whereas
input parameters listed in Table I and total thermal resistances spreading thermal resistance is 0.502, 0.569, and 0.561 °C/W,

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BISWAL et al.: DESIGN AND OPTIMIZATION OF SINGLE-PHASE LIQUID COOLED MICROCHANNEL HEAT SINK 881

Fig. 4. (a) Total and spreading thermal resistance of the microchannel heat sink for different percentage of heat source coverage. (b) Temperature rise (due to
total ‘Rtot ’ and spreading ‘Rsp ’ thermal resistance) of the microchannel heat sink for different percentage of heat source coverage for a heat source dissipating
100 W/cm2 .

respectively. It is noticed that the total thermal resistance fin width, are taken from Table I. Base thickness (t) of the
decreases by 20% while spreading resistance decreases by heat sink is considered to be 0.5 mm and heat source footprint
1.4% by varying the channel aspect ratio from 1.0 to 10. This is considered at 5 mm × 5 mm. Depth of channel (Lch ) is
signifies the fact that fin resistance (Rfin ), capacitive resistance considered to be 300 µm. For variable fin width (Wfin ) model,
(Rcap ), and conductive thermal resistance (Rcon ) are decreased channel width (Wch ) is fixed at 100 µm. For variable channel
with increase in aspect ratio. At lower aspect ratio, thermal width (Wch ) model, fin width (Wfin ) is fixed at 100 µm.
resistance is lower because of higher flow velocity, and Reducing the width of fins (Wfin ) or width of microchannels
increases to a peak because of lower flow velocity resulting (Wch ) from 350 µm to 50 µm, number of microchannels (N) is
from the increase in aspect ratio and then decreases due to increased for the specified width (Whs ) of the heat sink. With
increased fin surface area resulting from the increase in aspect variable fin width model, thermal resistance decreases from
ratio even if the flow velocity is lower. Thermal resistance is 1.078 °C/W (corresponding to 21 channels) to 0.892 °C/W
lowest at higher aspect ratio channels because of significant (corresponding to 66 channels) and with variable channel
increase in fin surface areas resulting in lower temperature width model, thermal resistance decreases from 1.641 °C/W
rise of the heat sink. However, beyond a certain aspect ratio (corresponding to 22 channels) to 0.661 °C/W (corresponding
(e.g., α = 8.0), rate of change in thermal resistance is very to 66 channels) as shown in Fig. 7(a). Thermal resistance
negligible signifying the fact that infinite increase in fin attains the same magnitude for a particular value of N for both
height (increases with increase in channel depth) does not the models—variable fin width and variable channel width.
produce comparable heat transfer enhancements. However, beyond this value of N, thermal resistance decreases
Pressure drop (dP) and flow Reynolds number (Re) corre- sharply in case of variable channel width model than that with
sponding to different aspect ratios are plotted in Fig. 6(c). With variable fin width model. Total channel opening area for vari-
increase in channel aspect ratio from 0.65 to 10, Re decreases able channel and fin width models is plotted in Fig. 7(c). When
from 602 to 90 whereas pressure drop decreases from 61.88 the number of channels increases by reducing the width of the
to 1.01 kPa. For low aspect ratio channels, the flow Reynolds fin (Wfin ), the total channel opening area increases, resulting in
number is very high because of higher flow velocity accompa- lower flow velocity and lower pressure drop at fixed flow rate.
nied with significant pressure drops across the microchannel On the other hand, when the number of channels increases by
heat sink as shown in Fig. 6(c). The Reynolds number and reducing width of the channel (Wch ), the total channel opening
pressure drop decrease because of lower flow velocity resulting area decreases, resulting in higher flow velocity and higher
from the increase in channel aspect ratio. Higher aspect ratio pressure drop as evident in Fig. 7(b). In case of 66 channels,
microchannel offers lower pressure drop and lower thermal total thermal resistance for the variable channel width model is
resistance but at the cost of increased fin surface area and 0.231 °C/W lower than that with the variable fin width model
higher space requirement for the heat sink. but at the cost of 18.62 kPa increased pressure drop. A trade-
off between fin width and channel width is required in terms
F. Effect of Number of Microchannels of optimum pressure drop and thermal resistance.
Total thermal resistance and pressure drop for different
number of microchannels obtained by varying the fin width G. Effect of Flow Rate
(Wfin ) and channel width (Wch ) are plotted in Fig. 7(a) and Total thermal resistance and pressure drop are plotted in
(b), respectively. All the properties, except channel width and Fig. 8 for different flow rates of the coolant. All the properties

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882 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, VOL. 32, NO. 4, DECEMBER 2009

Fig. 5. (a) Total thermal resistance of the microchannel heat sink with variable base thickness for a heat source footprint (As ) of 2 mm × 2 mm. (b) Total
thermal resistance of the microchannel heat sink with variable base thickness for a heat source footprint (As ) of 5 mm × 5 mm. (c) Total thermal resistance of
the microchannel heat sink with variable base thickness for a heat source footprint (As ) of 8 mm × 8 mm (d) Optimum thickness of heat sink base for different
percentage of coverage of heat source footprint.

are taken from Table I. Base thickness (t) is optimum at taken from Table I. Three different materials of heat sink such
1.25 mm for the heat source footprint of 5 mm × 5 mm. Total as silicon (Si), aluminum (Al), and copper (Cu) are evaluated
thermal resistance of the heat sink decreases from 0.826 with thermal conductivity of 100, 160, and 380 W/(m·K).
to 0.715 °C/W and pressure drop increases from 4.12 to Heat sink with higher thermal conductivity offers significant
42.11 kPa with flow rate variation from 1.0 to 8.0 mL/s. With lower thermal resistance at relatively lower footprint of the
increase in flow rate from 1.0 to 8.0 mL/s, decrease in total device. With increase in device footprint, difference in thermal
thermal resistance is 0.111 °C/W with an increase in pressure resistance of the heat sink for different materials diminishes.
drop of 37.99 kPa. An optimum operating point is that where For 4–100% heat source footprint coverage, total thermal
the curves for thermal resistance and pressure drop cross each resistance varies from 3.0 to 0.324 °C/W for Si heat sink,
other as evident in Fig. 8. Beyond this point, increasing the 2.164 to 0.3 °C/W for Al heat sink, and 1.179 to 0.277 °C/W
flow rate does not produce significant reduction in thermal for Cu heat sink whereas temperature rise varies from 75.0
resistance. to 8.1 °C, 54.1 to 7.5 °C, and 29.5 to 6.9 °C for Si, Al, and
Cu heat sink respectively. For 5 mm × 5 mm device footprint,
H. Effect of Heat Sink Materials thermal resistance or temperature rise decreases by 20% for Al
Total thermal resistance and temperature rise (above the heat sink and 42% for Cu heat sink in comparison with Si heat
inlet temperature of the coolant) for different materials of sink. Using higher thermal conductive heat sink materials, the
heat sink are plotted in Fig. 9(a) and (b), respectively. All the required coolant flow rate and associated pressure drop can be
parameters, except thermal conductivity of the heat sink, are reduced resulting in a smaller or cheaper pump.

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BISWAL et al.: DESIGN AND OPTIMIZATION OF SINGLE-PHASE LIQUID COOLED MICROCHANNEL HEAT SINK 883

Fig. 6. (a) Fully developed Nusselt number and heat transfer coefficient for different aspect ratios of the channel. (b) Total and spreading thermal resistance
of the microchannel for different aspect ratio of the channel. (c) Pressure drop across the microchannel and flow Reynolds number for different aspect ratios
of the channel.

Fig. 7. (a) Variation of total thermal resistance of the microchannel heat sink for different number of microchannels obtained by varying fin width (Wfin )
and channel width (Wch ). (b) Variation of pressure drop across the microchannel heat sink for different number of channels obtained by varying fin width
(Wfin ) and channel width (Wch ). (c) Variation of total channel opening area of the heat sink for different number of channels obtained by varying fin width
(Wfin ) and channel width (Wch ).

I. Comparison of Analytical and Experimental Results


Total thermal resistance of the heat sink and pressure
drop predicted using analytical correlations for developed and
developing flow through the microchannels are compared with
the experimental results of [14]. For comparison of analytical
and experimental results, all the inputs parameters are taken
from [14]. The device footprint is 12 mm × 12 mm. Footprint
of 21 channels and 20 fins is 15 mm × 12.2 mm etched on
aluminum block of 50 mm × 24 mm × 2.8 mm. Width of mi-
crochannels is 210 µm, depth of microchannels is 2.0 mm
and water is used as a coolant. For the purpose of analytical
prediction, footprint of microchannel heat sink is considered at
15 mm × 12.2 mm with 21 channels and 20 fins. Total thermal
resistance of the heat sink and pressure drop across the heat
sink is plotted in Fig. 10(a) and (b), respectively. It is noticed
that results predicted using developing flow correlations agree Fig. 8. Variation of total thermal resistance and pressure drop across the
well with experiments for the entire range of flow rates (in microchannel heat sink for different flow rates of the coolant.
the laminar regime) while good agreement is noticed between
results predicted using developed flow correlations and ex- footprint (15 mm × 12.2 mm) can in effect help to cool the
perimental data for the lower flow rates. In the experiments, device to some extent. The minor difference for thermal
the larger heat sink footprint (50 mm × 24 mm) having inlet resistance predicted analytically with developing flow correla-
and outlet plenums at the end of the channels and fins of tions and experiments can be attributed to the larger overall

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884 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, VOL. 32, NO. 4, DECEMBER 2009

Fig. 9. (a) Variation of total thermal resistance of the microchannel heat sink made up of silicon (Si), aluminum (Al), and copper (Cu). (b) Variation of
temperature rise (above the inlet temperature of the coolant) of the microchannel heat sink made up of silicon (Si), aluminum (Al), and copper (Cu).

Fig. 10. (a) Comparison of analytical predictions for developed and developing flow and experiments for total thermal resistance of the aluminum microchannel
heat sink for different coolant flow rates. (b) Comparison of analytical predictions for developed and developing flow and experiments for pressure drop across
the aluminum microchannel heat sink for different coolant flow rates.

heat sink block used in the experiments. Close agreement this paper would help to design and optimize the microchannel
between analytical predictions and experiments indicates that heat sink that exhibits superior thermal performance with low
the conventional heat transfer and friction factor correlations pressure drop system.
hold good for the liquid flows through the microchannels used The following items are the main observations of this paper.
in this paper. 1) The difference in total thermal resistance of the heat sink
for 25% heat source coverage (w.r.t. heat sink footprint)
using fully developed and developing flow is 13% for
V. Conclusion the device located at the inlet of the heat sink and 10%
Thermal and hydrodynamic performance of single-phase for the device located at the center of the heat sink.
liquid cooled microchannel heat sink was studied analytically 2) Spreading resistance for 25% heat source coverage is
in the laminar flow regime for the arbitrarily located heat 30% higher for the edge located device than that located
source or device. Design parameters that result in lower at the center of the heat sink.
thermal resistance and lower pressure drop were discussed. 3) Smaller footprint devices experience significant spread-
Close agreement for thermal resistance and pressure drop was ing resistance. Spreading resistance for 4% heat source
established between analytical predictions and experiments. coverage is 3.0 °C/W while that for 25% heat source
Developing flow empirical correlations hold good for a range coverage is 0.921 °C/W.
of flow rates while developed flow correlations hold good for 4) For a given heat source footprint, there is an optimum
lower flow rates. The good agreement between analytical pre- thickness (t) of the heat sink base for which total thermal
dictions and experiments indicates the fact that conventional resistance is minimum. For 4% heat source coverage the
heat transfer and friction factor correlations are valid for flows optimum base thickness is 2.0 mm while that for 25%
through the microchannels. The analytical method proposed in heat source coverage is 1.25 mm.

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BISWAL et al.: DESIGN AND OPTIMIZATION OF SINGLE-PHASE LIQUID COOLED MICROCHANNEL HEAT SINK 885

5) Higher channel aspect ratio results in higher Nusselt [11] J. H. Ryu, D. H. Choi, and S. J. Kim, “Numerical optimization of the
thermal performance of a microchannel heat sink,” Int. J. Heat Mass
number, lower thermal resistance and lower pressure Transfer, vol. 45, pp. 2823–2827, 2002.
drop. Nusselt number increases from 3.61 to 6.787, [12] C. Y. Zhao and T. J. Lu, “Analysis of microchannel heat sinks for
total thermal resistance decreases by 20% (for 25% electronics cooling,” Int. J. Heat Mass Transfer, vol. 45, pp. 4857–4869,
2002.
heat source coverage), and pressure drop decreases from [13] J. Li, G. P. Peterson, and P. Cheng, “3-D analysis of heat transfer in a
24.33 to 1.01 kPa with increase in channel aspect ratio micro heat sink with single phase flow,” Int. J. Heat Mass Transfer, vol.
from 1.0 to 10. 47, pp. 4215–4231, 2004.
[14] H. Y. Zhang, D. Pinjala, T. N. Wong, K. C. Toh, and Y. K. Joshi, “Single-
6) Higher numbers of channels obtained either by decreas- phase liquid cooled microchannel heat sink for electronic packages,”
ing the width of fin or channel within a specific heat Appl. Thermal Eng., vol 25, pp. 1472–1487, 2005.
sink width result in lower thermal resistance and lower [15] P.-S. Lee, S. V. Garimella, and D. Liu, “Investigation of heat transfer
in rectangular microchannels,” Int. J. Heat Mass Transfer, vol. 48, pp.
pressure drop. Optimum thermal resistance of 0.921 1688–1704, 2005.
°C/W (for 25% heat source coverage) is obtained for 50 [16] J. Li and G. P. Peterson, “Geometric optimization of a micro heat sink
channels with an associated pressure drop of 4.12 kPa. with liquid flow,” IEEE Trans. Compon. Packag. Technol., vol. 29, no.
1, pp. 145–154, Apr. 2006.
7) Total thermal resistance of the heat sink for 25% heat [17] D.-K. Kim and S. J. Kim, “Averaging approach for microchannel heat
source coverage decreases by 13% with increase in flow sinks subject to the uniform wall temperature condiction,” Int. J. Heat
rate from 1.0 to 8.0 mL/s but pressure drop increases Mass Transfer, vol. 49, pp. 695–706, 2006.
[18] C.-H. Chen, “Forced convection heat transfer in microchannel heat
significantly from 4.12 to 42.11 kPa. sinks,” Int. J. Heat Mass Transfer, vol. 50, pp. 2182–2189, 2007.
8) Using higher thermal conductive heat sink materials, [19] J. Li and G. P. Peterson, “3-D numerical optimization of silicon-based
the required coolant flow rate and associated pressure high performance parallel microchannel heat sink with liquid flow,” Int.
J. Heat Mass Transfer, vol. 50, pp. 2895–2904, 2007.
drop can be reduced resulting in a smaller or cheaper [20] Y. S. Muzychka, M. M. Yovanovich, and J. R. Culham, “Thermal spread-
pump. For 25% heat source coverage, thermal resistance ing resistance in compound and orthotropic systems,” J. Thermophys.
decreases by 20% for Al heat sink and 42% for Cu Heat Transfer, vol. 18, 2004.
[21] S.-Y. Lee, S. T. Wereley, L. Gui, W. Qu, and I. Muduwar, “Microchannel
heat sink in comparison with Si heat sink. flow measurement using micro particle image velocimetry,” in Proc.
ASME Int. Mech. Eng. Cong. Expos. (IMECE 2002), New Orleans, LA,
2002, pp. 1–8.
[22] R. K. Shah and A. L. London, “Laminar flow forced convection in
ducts,” Handbook of Single-Phase Convective Heat Transfer. New York:
Acknowledgment Wiley, 1987.
The authors are greatly benefited by the comments and
suggestions from the reviewers. The scope and reach of the
paper is enhanced significantly by implementing the valuable Laxmidhar Biswal received the M. Tech. degree in
feedback of the reviewers. thermal, energy and environmental engineering from
the Indian Institute of Technology (IIT), Kharagpur,
India, in 1997. He is pursuing the Ph.D. degree
in microscale heat transfer and fluid flow from the
Department of Mechanical Engineering at IIT.
References Currently, he is working in DELPHI Tech Center
India, Kalyani Platina, Whitefield, Bangalore, India
[1] D. B. Tuckerman and R. F. W. Pease, “High-performance heat sinking as an Advanced Technical Leader. Twelve out of
for VLSI,” IEEE Electron. Device Lett., vol. 2, no. 5, pp. 126–129, May his 20 years of professional experience focused on
1981. analysis and modeling in mechanical, aerospace,
[2] R. J. Phillips, “Micro-channel heat sinks,” Advanced in Thermal Mod- nuclear, and manufacturing engineering. His area of expertise is thermal
eling of Electronic Components and Systems, vol. 2, New York: ASME, management, CFD, acoustics, multi-physics, and micro-scale thermofluid
1990, ch. 3. science and engineering. He has developed several analytical tools and
[3] R. W. Knight, D. J. Hall, J. S. Goodling, and R. C. Jaeger, “Heat sink computational algorithms for heat transfer and fluid flow analysis. He is
optimization with application to microchannels,” IEEE Trans. Compon., the author of several papers published in referred journals and has presented
Hybrids Manuf. Technol., vol. 15, no. 5, pp. 832–842, Oct. 1992. papers in national and international conferences.
[4] A. Weisberg, H. H. Bau, and J. N. Zemel, “Analysis of microchannels for
integrated cooling,” Int. J. Heat Mass Transfer, vol. 35, pp. 2465–2474,
1992. Suman Chakraborty received the Ph.D. degree in
[5] S. J. Kim and D. Kim, “Forced convection in microstructures for mechanical engineering from the Indian Institute of
electronic equipment cooling,” J. Heat Transfer, vol. 121, pp. 639–645, Science (IISc), Bangalore, India, in 2002.
1999. Currently, he is a Professor at the Department of
[6] C. Perret, J. Boussey, C. Schaeffer, and M. Coyaud, “Analytic modeling, Mechanical Engineering, Indian Institute of Tech-
optimization, and realization of cooling devices in silicon technology,” nology, Kharagpur, India. He is the author of more
IEEE Trans. Compon. Packag. Technol., vol. 23, no. 4, pp. 665–672, than 130 papers published in international journals,
Dec. 2000. and has presented more than 50 papers in national
[7] D. Copeland, “Optimization of parallel plate heat sinks for forced and international conferences. He has authored ten
convection,” in Proc. 16th IEEE SEMITHERM Symp., San Jose, CA, chapters published in the Encyclopedia of Microflu-
2000, pp. 266–272. idics and Nanofluidics (Springer, 2008).
[8] C. B. Sobhan and S. V. Garimella, “A comparative analysis of studies on Dr. Chakraborty is a Fellow of the Indian National Academy of Engineering,
heat transfer and fluid flow in microchannels,” Microscale Thermophys. a Member of ASME, and Life Member of the Indian Society for heat and
Eng., vol. 5, pp. 293–311, 2001. mass transfer. He is a Member of the Editorial Advisory Committee for
[9] B. Palm, “Heat transfer in microchannels,” Microscale Thermophys. the Open Thermodynamics Journal, and an Editorial Board Member for the
Eng., vol. 5, pp. 155–175, 2001. International Journal of Micro-Nano Scale Transport, and the International
[10] W. Qu and I. Mudawar, “Experimental and numerical studies of pressure Journal of Micro and Nano Systems. He is a consultant to General Motors
drop and heat transfer in a single-phase microchannel heat sink,” Int. J. and has acted as a Principal Investigator/Coordinator in projects supported
Heat Mass Transfer, vol. 45, pp. 2549–2565, 2002. by the Indo-U.S. Science and Technology Forum, NSF, DST, DIT, BRNS,

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886 IEEE TRANSACTIONS ON COMPONENTS AND PACKAGING TECHNOLOGIES, VOL. 32, NO. 4, DECEMBER 2009

and DBT (Govt. of India). His areas of research are bio-microfluidics and S. K. Som received the Ph.D. degree in mechanical
microscale transport processes, CFD, laser materials processing, solidification, engineering from Indian Institute of Technology
phase transitions and interfacial phenomena and modeling and simulation (IIT), Kharagpur, India in 1977.
of transport phenomena in materials processing/manufacturing. He has won He is a Professor in mechanical engineering in the
several awards, including: the Scopus Young Scientist Award in 2008, the Department of Mechanical Engineering at IIT, and
Swarnajayanti Award, the Indo-U.S. Fellowship for partial support toward his teaching experience spans more than 34 years.
Visiting Professorship in Stanford University, the Platinum Jubilee Young He has guided 15 Ph.D. and many Masters students
Scientist Award by the National Academy of Science in 2007, the Alexander during his illustrious teaching career. From 2004
von Humboldt Fellowship in 2005, 2006, and 2007, the Anil Kumar Bose to 2007, he was the Head of the Department of
Memorial Award in 2007 by National Science Academy (INSA), the INAE Mechanical Engineering at IIT, and he is currently
(Indian National Academy of Engineering) Young Engineer Award in 2004, the Dean of Undergraduate Studies. He is the author
the INSA (Indian National Science Academy) Medal for Young Scientist in of more than 50 papers published in several peer-reviewed international
2003, the “Best CFD Thesis Award” based on a world-wide competition in journals and delivered several keynote speeches in national and international
2002 (sponsored by StarCD and CD-Adapco), and the Best Thesis Award conferences. His areas of research are fluid mechanics, thermodynamics, heat
from the Mechanical Eng. Department and Division of Mechanical Sciences, transfer, and combustion modeling. He has authored two books—Introduction
Bangalore, in 2002. to Fluid Mechanics and Fluid Machines (Tata McGraw-Hill, 1998 and 2nd
edition 2004) and Introduction to Heat Transfer (Prentice Hall of India, 2008).
He has developed video course materials for distance education in the
National Educational Network Channel EKALAVYA on Fluid Mechanics,
Fluid Machines, Introduction to Compressible Flows, and Thermodynamics.
Dr. Som is a Fellow of the Indian National Academy of Engineering, and
also of the National Academy of Sciences (India) and Institution of Engineers
(India). He is a consultant for several industrial and research organizations
such as the Indian Space Research Organization, National Metallurgical
Laboratory, Usha Martin, Tata Iron and Steel Company, and Aeronautical
Research and Development Board.

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