Wright State University

EE480/680 Micro-Electro-Mechanical Systems (MEMS) Summer 2006

LaVern Starman, Ph.D. Assistant Professor Dept. of Electrical and Computer Engineering Email: lavern.starman@afit.edu

Optical MEMS

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

Optical MEMS: MOEMS

Micro-Opto-Electro-Mechanical Systems (MOEMS)

Optical MEMS
Electromagnetic Spectrum
Energy of a quantum of electromagnetic radiation:
E = hf = hc/

Optical MOEMS MEMS

Electrical
-rays

380 nm (0.38 m) X-rays

Visible

720 nm (0.72 m)

U H F VH F

Frequency (Hz)
1024 10-15 10-12

(EHz) 1018 10-10

(PHz) 1015

(MHz) 106

10-6

10-3

103

U LF

Ultraviolet

Infrared mm wave (THz) (GHz) 1012 109

(kHz) 103

Mechanical Additive Color Mixing

() (nm)

10-9

(m)

(mm)

(m)

(km)

(Mm)

Wavelength (m)
EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 4

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Overview
Mirrors & Mirror Arrays
Beam Steering
Simple Reflection Corner Cube Reflector Grating Blazed Grating Phased Array

Mirrors
Different materials reflect different wavelengths with varying efficiency -- almost anything can be a form of mirror.
Reflectivity: the percentage light reflected from a surface at a given wavelength
ex. elemental comparison at 1 m wavelength

Lenses
Refractive Diffractive

Systems

Web Elements EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 5 EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 6

Mirrors: Reflectance

Mirrors: UV Reflectance

W. Driscoll and W. Vaughan, Handbook of Optics, McGraw-Hill, 1978.

W. Driscoll and W. Vaughan, Handbook of Optics, McGraw-Hill, 1978.

UV

Visible Spectrum

IR
MicroElectroMechanical Systems (MEMS) 7 EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS)

UV
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EE 480/680, Summer 2006, WSU, L. Starman

Mirrors: IR Reflectance Si

Mirrors: Distortion
Most mirrors are fabricated from surface micromachining Some drawbacks causing distortion in reflected image include:
Deposited layers conform to the topology of lower layers, therefore, embossing the mirror surface. Residual stress in deposited layers or combinations of layers can deform the mirror surface

Solutions include:
Thinner reflective coatings Stiffer mirror structures Avoid topology under mirror by design Use backsides of layers through assembly Use fabrication processes with planarized layers More appropriate combinations of multi-layer materials Different fabrication processing conditions
MicroElectroMechanical Systems (MEMS) 10

W. Driscoll and W. Vaughan, Handbook of Optics, McGraw-Hill, 1978.

10 mm thick Si sample IR

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

EE 480/680, Summer 2006, WSU, L. Starman

Mirrors: Fabrication
CRONOS -- The Multi-User MEMS Processes, or MUMPs, 1992, www.memsrus.com
15 copies of a 1 cm 1 cm die, $3,200.00

Mirrors: Fabrication
SUMMiT IV & V, Sandia National Laboratory
100 copies of a 6.34 mm 2.82 mm die, $10,000 V provides a 5th planarized layer of poly
mmpoly1_cut Polycrystalline Silicon Oxide (Si02 deposited from TEOS tetra-ethyl-ortho-silicate) Nitride (Si3N4) Crystalline Silicon Max etch hole spacing 38 m Max dimple spacing 75 m sacox2 Global oxide 2 correction for MUMPs-like layout Available CAD Layers & Minimum Width (m): mmpoly3_cut 1 mmpoly3 1 sacox3_cut 2 dimple3_cut 1.5 mmpoly2_cut 1 mmpoly2 1 sacox2_cut 2 sacox2 1 mmpoly1_cut 1 mmpoly1 1 pin_joint_cut 3 sacox1_cut 2 dimple1_cut 1 mmpoly0 1 nitride_cut 1, max 4

Metal (gold) Polycrystalline Silicon (doped with P) Oxide (PSG: Si02 doped with P) Nitride (Si3N4) Crystalline Silicon

1.5 m 0.75 m 2 m oxide2 poly1 via

poly2

0.5 m metal

0.02 m Cr

2.25 m 5.6 m CMP to 1.5 - 2 m 1.5 m 1 m 2 m 0.3 m 0.8 m 0.63 m

mmpoly3 dimple2 sacox3 cut sacox3 cut

sacox3 mmpoly2 mmpoly1 sacox1

dimple1

poly0

anchor2

mmpoly1cut sacox1 cut mmpoly0 silicon nitride silicon dioxide

nitride cut

0.5 m 0.6 m

anchor1

highly doped with P region (100) silicon wafer, n-type (P), 1-2 ohm-cm resistivity 100 mm diameter, 500 - 550 m thickness
EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 11

sacox1 cut

3 m

0. 5 m

<100> silicon wafer, n-type, 2 - 20 ohm-cm resistivity, 6 diameter, 675 m thickness EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 12

pin joint cut

2 m

oxide1

Phosphosilicate Glass

0.75 m dimple

anchor1 & via

0. 5 m 0.5 m sacox2

Mirrors: Residual Stress

MUMPs examples:
150 nm thick gold
Poly2

Mirrors: Beam Steering

Simple Reflection

Gold Poly2 Ox2 Poly1

Cowan, 1998 Reid, 1997

Gold Poly2 Poly1

0.5 m Gold on Poly2

Cowan, 1998

Gold Poly2
D. Burns, Microelectromechanical Optical Beam Steering Systems, AFIT Dissertation, 1998. 13 14

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

Mirrors: Beam Steering

Corner Cube Reflector
Modulation device -- signal always returns to source if mirrors are orthogonal to each other.

Mirrors: Beam Steering

Diffraction Gratings
Scatter reflected in discrete directions:

sin( n ) =

where n is the discrete order, n is the order direction, is the wave length, and a is the period of the grating elements. Incident Light Grating interference orders result when light, reflected off of grating elements, combines constructively in the far field.

n a

0th Reflected Light 1st

n
Reid, 1997

a
EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 15 EE 480/680, Summer 2006, WSU, L. Starman

nth order
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MicroElectroMechanical Systems (MEMS)

Mirrors: Beam Steering

Grating Light Valve (GLV) by Silicon Light Machines
Destructive interference attenuates 0th order.

Mirrors: Beam Steering

Grating Light Valve (GLV) by Silicon Light Machines

(n=1)
/2

d=/4

a A pixel

sin( n ) =
The maximum diffracted intensity of the first order is when d = /4.

n a

For same , but different colors, choose a different a such that /a is same. -orBuild one pixel for red and deflect the same pixel less for green and blue.
EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 17 EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 18

Mirrors: Beam Steering

Blazed Grating
Gratings can be angled to direct the 0th order intensity into the direction of a higher order, therefore, enhancing the higher order direction.

Mirrors: Beam Steering

Blazed Grating

Incident Light

sin( n ) =

n a

n = n/2
nth order Reflected Light

a
EE 480/680, Summer 2006, WSU, L. Starman

n
MicroElectroMechanical Systems (MEMS) 19

D. Burns, Microelectromechanical Optical Beam Steering Systems, AFIT Dissertation, 1998. EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 20

Mirrors: Beam Steering

Blazed Grating
n=0

Mirrors: Beam Steering

Phased Array
A digital approximation of beam steering with a single tilted mirror.

n=1

n=2

n=3

D. Burns, Microelectromechanical Optical Beam Steering Systems, AFIT Dissertation, 1998. EE 480/680, Summer 2006, WSU, L. Starman

n=4
MicroElectroMechanical Systems (MEMS) 21 D. Burns, Microelectromechanical Optical Beam Steering Systems, AFIT Dissertation, 1998. EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 22

Overview
Mirrors & Mirror Arrays
Beam Steering
Simple Reflection Corner Cube Reflector Diffractive Gratings Blazed Grating Phased Array

Lenses: Refractive

Lenses
Refractive Diffractive

Systems

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

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EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

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Lenses: Refractive
Reflowed BCB lens for VCSEL de-centered lens beam steering

Lenses: Refractive
UV curable polymer lenses for 2-D scanning

A. Tuantranont et al., "MEMS-Controllable Microlens Array for Beam Steering and Precision Alignment in Optical Interconnect System," Proceedings of the 2000 Solid-State Sensor and Actuator Workshop, pp. 101-104, June 4-8, 2000. EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 25 EE 480/680, Summer 2006, WSU, L. Starman

S. Kwon et al., Stacked Two Dimensional Micro-Lens Scanner for Micro Confocal Imaging Array, 2002. MicroElectroMechanical Systems (MEMS) 26

Lenses: Refractive
Lenslet arrays with piston micromirrors for aberration correction using phase alteration.

Lenses: Diffractive
Fresnel Lens
Diffraction and constructive interference shape the nearfield light beam exiting the lens. R2 f = m m
where f is the focal length, Rm is the radius of the outer zone, m is the largest integer number of zones in the lens, and is the wavelength of the source. J. Bouchard, MS Thesis, AFIT, 1997 m=1 m=2 m=3

540 m Thick Glass Spacer UV curable epoxy Lenslet Array,Nippon Sheet Glass Company, 250 m diameter. Micromirrors

A. Tuantranont et al., "Packaging of Lenslet Array on Micromirrors," Proceedings of the SPIE `99, vol. 3631, pp. 156-164, 1999.

R3

144 pin PGA

EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 27 EE 480/680, Summer 2006, WSU, L. Starman MicroElectroMechanical Systems (MEMS) 28

Overview
Mirrors & Mirror Arrays
Beam Steering
Simple Reflection Corner Cube Reflector Grating Blazed Grating Phased Array

Optical Systems
Surface micromachined VCSEL scanning system

Lenses
Refractive Diffractive

Systems

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

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J. Bouchard, MS Thesis, AFIT, 1997

EE 480/680, Summer 2006, WSU, L. Starman

MicroElectroMechanical Systems (MEMS)

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Optical Systems
Texas Instruments Digital Micromirror DeviceTM

Optical Systems
3-Chip, Texas Instruments Digital Micromirror DeviceTM

16 m

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MicroElectroMechanical Systems (MEMS)

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