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15877
Low-cost
Cu(ln,Ga)Se2
absorbers from
degree
of
DOCTOR OF SCIENCES
presented by
MARC-ROLAND KAELIN
Dipl. Ing.
born
citizen of
Mikrotechnik EPFL
on
July 16th,
1975
Accepted
on
the recommendation of
Prof. Dr. S.E. Pratsinis, examiner Prof. Dr. A.N. Tiwari, co-examiner
Dr. T.
Meyer,
co-examiner
Zurich, 2005
1I.
Ill
Acknowledgements
First of all I would like to
express my
gratitude
to Prof.
Ayodhya
me
the
opportunity to work
and Andreas
in
his
I
laboratory.
a
Further I
acknowledge
the
help from
Dr.
Toby Meyer
Meyer.
profited
possible
help
of my
colleagues,
former and
present
Physics
group:
Dominik Rudmann, David Brmaud, Franz the thin-film solar cell makers,
Karim
Haug,
team,
Fedor Kurdesau, Antonio F. da academic
Cunha,
Maxim
our
Kmpfer,
Michael
Leopold,
our
technical staff,
secretaries.
GabyStrahm,
group's
Many
The fruitful
discussions with Olliver Wilhelm, Wendelin Stark, Lutz Mdler und Karsten
to many
new
Wegner
led
ideas.
am
very
grateful
interpretation by
Dr. Roland
Testing
and Research.
workshop
of the
Mr.
Brhwiler,
Nussbergerand
of
and excellence in
manufacturing
complicated
parts.
IV
Further,
Marc
appreciated
and his wife
Jantime
Lehky
Jaqueline
flat for
some
and
finally,
The financial
support by
Technology
and Innovation
(KTI)
is
kindly acknowledged.
This thesis resulted from the work done in the frame of the
Table of Contents
Acknowledgements
Table of Contents
III V
IX XI
Zusammenfassung
Summary
11ntroduction
1.1
Development
1.1.1
of
photovoltaics
2
2
Historical
Background
silicon solar cells
i.i.2
Crystalline
3 4 5 7
Properties
Compound
junction
7
8 9
10
Layer
structure of
1.3.3 Band
diagram
and CIGS
layer grading
1.3.4 Electrical
properties
11
12
deposition techniques
13
51
Spray pyrolysis
14 15
^
1.5.2
Electrodeposition
coating
non-vacuum
Completely Objectives
processed
16 17
of this work
19
Precursor Characterization
2.1.1 2.1.2
19
2i 22
Metals
Metal-oxides
2.1.3 Metal-selenides
24
VI
2.2
25
25
2.2.1 2.2.2
2
Metals Metal-oxides
28
30
23 Metal-selenides
2.3 Conclusion
31
3 Precursor
deposition
methods
33
3.1
Deposition
33 33
34
printing
Electrospray
34
3.2 Evaluation 3.2.1 Mixed-metal precursor 3.2.2 Metal-oxide precursor 3.3 Conclusion
36 36
39 41
4Selenization
4.1 Chemical conversion
in vacuum
43 reactor
44 44
47
Impurities
Crystallization
in non-vacuum
48
reactors
49 50
51
design
Impurity phases
Crystallization
non-vacuum
53
reactor
2.4Open
55 59
4.3 Conclusions
nanoparticle
precursor
61
5.1 Device
processing deposition
of
61
Cd(S,OH) layer
61
deposition
62
62
scribing
VII
5.2 Characterization
62 62
5.2.1 5.2.2
Contacting
Current-Voltage
characteristic
63
65
5.3 Conclusion
Inorganic
66
6.1 Doctor-blade
(Paste coating)
66
67
68
deposition
68 7 75
growth
mechanisms
76
79
82
Electrospray
Conclusions
6.3
7 Research recommendations
83
References
85
Abbreviations
93
Curriculum vitae
95
Refereed articles
96
VIII
Seite Leer /
Blank leaf
IX
Zusammenfassung
Im
Rahmen
dieser
Arbeit
wurden
kostengnstige
Solarzellen
basierend
auf
oder CIS fr
wurde fr die
Abscheidung
Sprayverfahren
bei
in
Atmosphrendruck
Form eines NanoIm
eingesetzt.
Pulvers
zweiten
mit
der
gewnschten
wird die
metallischen
in
Zusammensetzung aufgetragen.
kontrollierter
Schritt
Vorluferschicht
Atmosphre
zu
CIGS Gase
Umwandlung
dass
keine
gefhrlichen
Temperaturen
so
tief
gehalten,
kostengnstige
Fensterglas
und Metallfolien
eingesetzt
werden knnen.
Wirkungsgrade
6.7%
aufgezeigt werden.
in das Gebiet der Photovoltaik. In einem
Kapitel gibt
berblick
eine
Einfhrung
die
historischen
wird
Entwicklung
Die
der
ersten
von
Solarzelle
bis
zu
den
Dnnschichtsolarzellen effizientesten
aufgezeigt.
Eigenschaften
liefert,
Dnnschichtzellen
werden
besprochen.
Obwohl
Dnnschichtzellen im
Vergleich
zu
Zellen
aus
kristallinem Silizium
eine weitere
bereits grosses
Kostenreduktionspotenzial
Produktionskosten
haben,
damit
wird
die
noch
Senkung
der
ntig sein,
Photovoltaik
gegenber
konventionellen
Energiequellen konkurrenzfhig
wird. Ein
kostengnstigsten CIGS-Abscheidungstechniken
Arbeit werden
In
Zielsetzung
der
vorliegenden
gezeigt. Entwicklung
von
Kapitel
pulverfrmigem
Vorlufermaterial beschrieben:
Im zweiten
Kapitel
Metallselenide und
Metalloxide)
Bezug
auf
Zusammensetzung
Sintern
und
zur
Konvertierung
in
Selendampf
untersucht:
Zwar
alle
ln203
und
Cu2.xSe.
tiefen
Schmelzpunkt
sich
nicht
den
verwendet)
getesteten
bildet
zwar
bis
zu
um-grosse
um
Agglomerate
dichte
eignet
jedoch
von
Materialien
am
besten,
grosskrnige,
CIS-Schichten herzustellen.
Im dritten eine
Kapitel
werden
typische Billigdruck-Verfahren
ihrer
wie
Spraymethode bezglich
Herstellung
der
Eignung
zur
Abscheidung
Schichten
untersucht. Die
werden
Druckpasten
beschrieben.
Spraybeschichtungen
zeigen
die
beste
Homogenitt
der
Schichtdicke.
In
Kapitel
Selenisierungsbedingungen
und
auf die
von
chemische
Umwandlung
des
Vorlufermaterials
Eliminierung
Verunreinigungen untersucht.
Reaktortypen (Vakuumkammer,
geschlossene Ouarzkammer,
offenes
Ouarzrohr)
wird der
Hintergrunddruck (Stickstoff)
um
die
optimalen ntig
Umwandlungsbedingungen
ist,
um
zu
finden. Es wird
In
Kapitel
Fertigungsschritte
von
zur
fertigen
Solarzelle beschrieben. Die Solarzellen werden anhand der charakterisiert. Ein maximaler Vorlufermaterial diskutiert. erreicht.
Strom-Spannungs-Kennlinie
mit dem
Wirkungsgrad
Grnde fr
von
1.5% wurde
pulverfrmigen
werden
Die
die
niedrigen Wirkungsgrade
Kapitel
basierend
sechs auf
befasst
sich
mit
einem
neuartigen CIGS-Abscheidungsverfahren
Die
Metallsalz-Vorlufermaterial.
Druckpaste,
bestehend
in
aus
den
gelsten
mittels
organischen
Bindematerial
in
(Ethylcellulose)
der
ca.
Alkohol, wird
und
im
aufgetragen,
anschliessend
Luft
getrocknet
Selendampf zu
auf einer
umgewandelt.
600
zu
nm
amorphen
Kohlenstoffschicht.
Wirkungsgrade
bis
6.7 % wurden
es
Wirkungsgrade
die
gelingt,
und
die
ein
erhhen,
Kohlenstoffschicht
der CIGS-Schicht
zu
eliminieren
optimiertes Zusammensetzungsprofil
erhalten.
XI
Summary
Within the scope of this
or
based
were
on
polycrystalline
The CIGS with
CIS for
x=o)
absorber
layers
developed.
was
layer, being
the most
complex
and
deposited
simple
non-vacuum
equipment.
In the first
thin film of
nano-powder
precursor
The
material is
deposited,
stoichiometry.
in
a
compound
controlled
atmosphere.
and reaction lime
were
Conversion conditions
were
restricted to the
use
of non-hazardous gases
as
temperatures compatible
soda-
glass
or
to
large-area
The first
chapter gives
an
photovoltaics.
In
brief
development
chapter then
focuses
the
the
highest
compared
crystalline
potential
production costs,
photovoltaics to compete
conventional energy
is reviewed and
deposition techniques
elaborated.
Chapters
based
on
development
work of CIGS
layers
particulate
precursor materials:
Chapter
and
metal-selenides
and
metal-oxides)
with
respect
to
particle
size,
crystalline phase
state. After
reacting
formation and
sintering properties
the CIGS
phase
on
the
precursor
selenization
was
process.
Metal
(nanopowder
even
containing
Cu and In
only;
of
melting point),
though
CIS
urn,
large-grained
during
selenization.
compares
important
non-vacuum
XII
deposition.
Films
Precursor
as
well
as
set-up
is described.
resulting
deposition
if
show
superior
fixed
homogeneity
substrate.
compositional homogeneity
sprayed
on a
on
the chemical
impurity phase
Testing
open
types
an
(nitrogen)
to find
and selenium
partial
pressure
were
by
several orders of
magnitude
optimal
conversion conditions.
High
Chapter
cell
layer
by depositing the
n-CdS
part
of the
heterojunction
transparent
the
conducting
by recording
current-voltage
Chapter
six
describes
deposition
process
based
on
metal
salt
paste, prepared by
in
organic
binder
(ethyl cellulose)
alcohol,
is
deposited by
doctor-blade
600
on nm
method,
preheated
approximately
thick CIGS
layer is formed
top
of
an
amorphous
carbon
layer.
the
this
approach
largeand
6.7%. Considering
simplicity, non-toxicity
and
scalability
this is
good efficiency
improvements
with further
potential
for
improvement
the CIGS
cost-reduction. Further
can
be reached
by increasing
and
layer
layer
optimization
of the
grading profile
of the CIGS
layer.
11ntroduction
Photovoltaic
systems,
also
called
solar
cells, present
an
interesting
and
clean
with
sunlight,
into
freely
10
directly
industry
an
astonishing by
2010.
pace
over
35% annually
easily expected
on
8 billion
With further
cost-cutting
a
innovations
bright
Large
scale
production
simple,
costs
non-vacuum
as
deposition equipment.
or
Direct
manufacturing
printing
spraying
are
estimated
costs
to be in the 50-100
production
(200 $/m2)
The
with
vacuum
technology.
reasonable solar cell efficiencies is
development required.
of such
For
techniques yielding
therefore
targeted
technique
capable
of
producing
already
modules
as seen
(tj>12%)
are
not
efficiencies
are
in Table
i.i.
Table
1.1
Module cost in
$/WP calculated
for direct
manufacturing
200
$/m2 and
produced
(Zweibel, 1999)
Manufactu
'ing
costs
Module
Efficiency
$200/m2
3-3
$i5o/m2
2-5 1.9 1-5 1.25
1
$ioo/m2
17
$ 50/171*
0.8
6% 8%
10%
2-5
2
i-35
1
0.63
0.5
0.42
12%
1-7 i-3
0.83 0.67
15%
0.33
i.i
Development
Historical
of
photovoltaics
i.i.i
Background
the basis of
The
photovoltaics (PV),
was
an
first observed in
1839 by
Becquerel,
while
experimenting with
electrolytic
a
cell
(Becquerel, 1839).
was
voltage
there
a
developed
were
when
light
fell
on
the electrodes
nor
considered very
interesting, yet
In the
neither
practical applications
effect
was
any theoretical
a
explanations.
1870's
similar
photovoltaic
first studied in
solid material
can
into
electricity
and
Day, 1877).
cell
findings
cell
a
led to the
was
development
of the first
by
Fritts in
1883. The
made
conversion
efficiency
was
of -1%.
Only
in 1905,
photoelectric
effect
given by
Einstein
as
(Einstein, 1905)
same
one
effects
as
direction metal-
(rectifying mechanism)
semiconductor barriers
cells
was
reported,
1938 by
where
W.
the
theory
for
was
developed
later in
Schottky
i.i.2
Crystalline
1930's
In the
were
selenium and the copper oxide cell still had efficiencies less than 1% and
mainly employed
for
light-meters
in
photography. Despite
did
not
better
of the
silicon.
By introducing impurities
Calvin
p-n
Laboratories
et
produced
(Chapin
grew,
was a
major breakthrough
technology
During
especially from
the US
military,
generation
over
for terrestrial
applications. Improvements
technology
of
manufacturing
(Green
to
use
polycrystalline
silicon in order to
provide
lower cost alternative, but solar cells still remained too silicon is
a
expensive
for
widespread
with
adoption. Crystalline
extreme
relatively
poor
light absorbing
material
(Fig. i.i)
sensibility
on
impurities.
typically
200-300UITI
thick absorbers of
time
solar-grade
PV
silicon wafers.
They
to
have
projected
energy
payback
(the
time
system
has to
operate
recover
production)
and
an
assumed life
polycrystalline
90% of the
(Fig. i.i)
based
that could be
processed
(00 urn).
on
In contrast to wafer
technology,
be grown
different substrate
materials
including
production (series
processing.
substrate)
as
and roll-to-roll
as one
Projected
energy
cells is
short
year.
Figure
1.1
Absorption
coefficients for
common
as a
function of incident
and
Jungblut, 1995).
thin-film solar cell materials
a
are:
Semiconductor with
however 1.1-1.5 eV
are
also suitable
High absorption
Consisting
coefficient
gap)
large
area
thin-film
deposition
with
simple
methods
stable and
A material
fulfilling
efficiency
developed
(Figure
1.2): amorphous
indium
(a-Si:H),
and
cadmium-telluride
(CdTe),
gallium-arsenide (GaAs),
phosphide (InP)
copper-indium-gallium-selenide-sulfide (Cu(ln,Ga)(Se2,S2)).
silicon
Hydrogenated amorphous
were
solar cells
first
developed. Cu2S/CdS
and the
cells showed
was
stability problems
due to
high
Cu
diffusivity
was more
development
stopped by
the
silicon
these cells
(-6% stabilized).
cells, other materials
were
efficiency
of thin-film solar
investigated
polycrystalline
CdTe and
Cu(ln,Ga)(Se2,S2),
(Wu
et
efficiency
cells
al.,
2002; Ramanathan et
al.,
2004).
1.1.4 Future
Even
generation
cells
are on
the
spot
to enter the
solar cell
concepts of
future PV devices
are
elaborated. As conventional
maximum conversion
single
are
theoretical
efficiency of -33%,
limit
concepts
beyond
Such
the
Shockley-Queisser
include
(Shockley
and Queisser,
1961)
are
being pursued.
concepts
level
tandem
systems,
fluorescent
mirrors,
impact ionization,
impurity
stacked
systems,
Except stage
for and
multi-junction
concepts
at
an
early
theoretical
1.2
Properties
a
of the CIGS
compound
which
and
can
CIGS is
l-lll-VI
compound material,
be derived
by splitting
and
the bivalent
component
VI
a mono-
trivalent
component
doubling
the
The
coefficient
(Fig. i.i)
makes the
an
compound layer
thicknesses of
1-
sufficient for
complete absorption
of
light.
IV Si.Ge
Cd,Zn
S,Se,Te
^
I VL
In, Ca, AI S, Se,Te
a
Cu.Ag.Au
Figure 1.2
Some
important semiconducting
The
phase composition
of the
ternary
CIS
compound
and
/
is
mostly
described
by
the
of the
binary Cu2Se
In the
of the stoichiometric
50%
observed: The
-phase (ordered
CulnSeJ
and
defect
compound, Culn3Se5),
8-phase (sphalerite,
cation disordered
Cu2_xSe.
room-
a-phase
is
limited to
24-24.5%
Cu
content at
temperature,
content in
not
even
including
the stoichiometric
composition
of
25%
At
Cu. The Cu
high efficiency
of
solar cells is
typically
in the range of
22-24%.
At
room
deposition
temperatures
the the
temperature
phase separation
for these
compositions. By
of sodium the
of In
by
quantities
be extended
(Herberholz
et
al., 1999).
1200
Liquid
600
500
0 10 20 30 40 X 50 60 70 80 90 100
Cu3Se
[mol. %]
In2Se3
Figure 1.3
Cu2Se and ln2Se3 pseudo-binary phase diagram (Stanbery, 2002). The chalcopyrite o>
phase
shows
at
thermodynamic
Cu2Se phase, slightly
equilibrium. Slightly
indium rich
compositions form
an
in addition the
compositions form
in addition
ordered defect
compound (-phase).
Se and S
in band gap
tailoring.
to 2.43 eV for
changes
from
to 5.35
forCuGaS2
shown in
Fig. 1.4b.
'
,,..
'
'
2.422-
-CuGaSj
2.0-
%
S
D
1-816-
CuGaSe2
1-41.2-
CulnSj
v
1.0-
^'^P
CulnSe2
1 1
5 3
5.4
5.5
56
a
S.7
5.8
b) a)
Unit cell of
Lattice constant
()
a
chalcopyrite
structure
(a-phase) with
lattice constants
and c, named
are
Chalcopyrite (CuFeS2).
arrangements
the
same as
crystal
structure,
compounds.
junction
which creates free electrons and
efficient
a
charge separation
mechanism is
required
is
to form two
poles.
In semiconductor
implemented
of the p and
carriers in the
electric field
(called
built-in
field) building
junction
area
n-semiconductor
near n-
(Fig. 1.5).
depletion
of
charge
resulting
space
and
p-semiconductor.
p-type.
This is hole
to
mobility
in semiconductors is
higher
than
mobility
and efficient
transport
of
carriers is
important
avoid recombination.
Polycrystalline
layers
are
grown
slightly
copper
deficient and
are
p-type
deep
levels
required
for the
n-type
semiconductor.
Additionally,
n-type
semiconductor
must be
nearly transparent to
allow the
light to
layer.
Figure
1.5
Schematic
drawing
of the p-n
junction of
solar cell
(in substrate
to
a
or
back-wall
carrier
separation due
built-in electrical
allows the SCR to
remains
near
An
deeply
into the
The
efficiency
of
can
be
improved by applying
p-absorber
thin
n-type
buffer
layers
Cd(S,OH)
(transparent
conducting
oxide).
The
mechanisms
responsible
for
the
cell
enhancements
are
not
fully
as
understood
and
they probably
serve
more
than
one
purpose.
They
may act
diffusion reduce
layer,
of
provide
interface
passivation,
at the
part
the solar
spectrum
same
time)
a
establish
an
inverted
region
in the absorber
homojunction.
A detailed
explanation
of the
physics
of solar cells
can
be found elsewhere
(Nelson, 2003)
1.3.2
Layer
structure of
stack of 5
A
layers deposited
on
molybdenum
back contact
is
deposited by dc-sputtering.
layer (p-type,
a
1-2 urn
thickness)
is
grown
-50
typically by
vacuum
co-evaporation
chemical bath
nm
thickness) using
deposition
realized
by sputtering
thin
intrinsic ZnO
layer (-50
thickness)
urn
followed
by
thicker ZnO:AI
increase
transparent conducting
a
oxide
is
0.3-1
thickness).
In order to
current collection
can
Ni/AI
grid
on
efficiency
the
enhancement cells/modules
be obtained
by depositing
antireflection
layer. Eventually,
are
protected against
environmental
impact by encapsulation.
ZnO:AI
ZnO
(300nm)
CdS
(50nm) (50nm)
CIGS
Molybdenum
Substrate Figure
1.6
SEM
cross-section of
layer was
deposited by
co-evaporation
of the elements.
1.3.3 Band
The band
diagram
and CIGS
layer grading
Figure
1.7a. The front contact buffer
diagram
(ZnO:AI)
is
by the
layers
which
on
are
compound depends
its
Ga/(ln+Ga)
ratio which lifts the level of the conduction band minima with
higher
Ga
nearly
unaffected
(Wei, 1995).
on
Therefore the
between
CdS(-OH)
depends
(1.4)
the
Ga/(ln+Ga)
CIGS
layer.
Some of the
deposition
processes
lead to
graded
a
layers
higher
band gap towards the CIGS/Mo interface, interface where the recombination is
keeping photoelectrons
to be
supposed
high.
A detailed
investigation
of
grading effects
is
et
al., 2003).
n
ZnO Al
mm.
n
j
nm
p
CIGS
ZnO CdS
300
[MM (llll 50 50
1.2 eV
EF
-2.5 eV
layer
a
material
nr
type
108
-
NA,ND
-
nti-reflection
MgF2
ZnO:AI
i-ZnO
137
1.9 19
3.3 eV
3.6
3-3 2-5
1 2
n+
n
1020
1016
1015
Cd(S,OH)
CIGS
24
2.9
-
P
-
1016
-
Mo
a).
Figure 1.7 a)
Band
b) diagram
of the p-n
junction of
normal Ga
grading
(Eg),
conduction
(NA, ND)
are
10
1.3-4 Electrical
When there is characteristics
properties
illumination diode. The
no a
(dark)
the solar
cell, being
p-n
junction,
in
has the
same
as
rectifying
behavior is shown
an
Fig i.8,
where the
density (JDark)
is indicated. For
density
is
given by
(
qv
e
"
JaV)=h
where J0 is
a
-1
(i.i)
current
constant
(reverse
in K.
saturation
density), KB
is
Boltzmann's
temperature
Dark
-O
( "mr'm)
dark
charge
b) a)
Solar cell current
density-voltage
(light)
circuit
voltage)
point {Vm,Jm)
be determined.
b) Equivalent
photocurrent.
the
sum
density-voltage
be
approximated
as
of the short-circuit
photocurrent (Jsc)
(photocurrent
is
positive by convention):
qV
e
*
J(V) Jx-Jl
=
(1-2)
dissipation
in
parasitic
electrical contacts
or
in
parallel
resistances created
by
shorts at
pinholes
or
at the
can
be modeled
by two
resistances in the
equivalent
11
circuit
(Fig. 1.9a)
The
and leads to
current
deteriorated
current-voltage
as:
characteristic
as
seen
in
Fig. 1.9b.
according
density
is written
q(V-R~*,,-J)
!nsiJLJ-
J{V)=Jsc-Jo
A-K.-T
-1
V-R RShunt
(1.3)
^
a)
Figure
1.9
V
vshunt
^charge
with
series resistances,
a
b)
Current
density-voltage characteristic
showing
reduced
resistances.
maximum power
efficiency
defined
efficiency,
by
output
power to the
a
input power
Standard
important characteristic of
factor 1.5
efficiency
to
air
mass
(AM1.5) spectrum,
with
an
corresponds
standard
terrestrial
conditions
(ASTM 1999)
power
integrated
solar cell is
irradiance power
density
of ioooW/m2
(Ps).
The
output
density
of
given by
P
out
-J
V
m
(14)
This value
corresponds
(FF)
to the grey
rectangular
area
(Fig.
It
i.8a).
quality of a
junction.
of the two
rectangles
drawn in
Figure
FF
J
=
-V
(1-5)
12
can
be
expressed
as:
'out
^j J
.v
SC
.ff
vOC
rr
(1.6)
P '
77:
out
J J
-V
SC
YOC
FF rr
Ps
(1-7)
deposition techniques
the best control of
CIGS
Sophisticated
composition
vacuum
and
films.
a
Maximum
cell
by the
use
three-stage co-evaporation
(Ramanathan
et
industrial
large-area
other
as
co-evaporation process
Solar,
large
1.2x0.6 m2 at Wrih
Germany (Powalla
et
b).
r-^Jlongauige
Substrate Holder
+
Heating
r i
Flux
Flux
me; measurement
ld
Substrats
1G~7mbar
Turbomolecular
pump
MH
Se Ga Cu
"NaF
Figure
1.10
High a)
vacuum
CIGS
Schematic
MBE
system with
Solar, Germany.
preferred
selenization processes
(also
called 1wo
stage
processes)
of
a
production.
deposition
subsequent
thermal
annealing
in
controlled reactive
13
atmosphere. Typically,
the
sputter deposition
of
metal-alloy
precursor is followed
or
by
a
H25e
and
H2 ambient
thermal
by evaporation
of
selenium
layer
on
by rapid
2003).
A controlled
use
grading (grading
of Ga/ln
to obtain
on
ratio)
a
difficult to
at the
of
post-sulfurization step
higher band-gap
good
process
yield, showing
technology (Kushiya
produced by
al., 2003).
Although,
low-cost CIGS
a
be
such vacuum-based
deposition techniques,
vacuum
high
investment is
required
will
for the
sophisticated
on
deposition equipment
volume and
vacuum
-
module
costs
the
production
of course-also
high
efficiencies
is
are
An overview
of the different
growth
given
in
Figure
Method
M;llii!P!iP'"j
Deposition
Various thermal
Co-evaporation
*..,
substrate
temperatures (400C-600C).
maintaining
an
excess
selenium
m-
Selenization
Selenization reaction at
substrate
a&
at low substrate
high
(two-stag process)
temperature (450-600C)
compounds with
in Se/S,
or
H2Se/S
gas ambient
alloyed
or
stacked metal
layers
polycrystalline
CIGS
layer
Substrate
Figure 1.11
growth.
deposition techniques
challenging step High
for low cost cell
layer deposition
is the most
processing,
since
complex layer
of the cell.
important
In
in order to
keep
processing
waste
as
low
as
possible.
general,
these low-cost
techniques
sequential
at low
techniques:
temperature
having
deposited
at
followed
aim is to
by
chemical
annealing step
higher
and
temperature. The
develop
technologically simple
14
equipment. Undesired
environment have to
by
be avoided
by choosing
evolved:
In
suitable precursor
one
materials and
materials
approaches
the
precursor
on
compound
of
compound layers)
as a
deposited
thin
layer
subjected
to
of the be
layers).
during deposition
includes
appealing approach,
and may
material
or
is
of
poor
quality,
impurity phases
microcrystalline
The
generally improved
second
annealed at
highertemperature.
1.5.1
Spray pyrolysis
pyrolysis technique chalcopyrites,
is
one
The spray
of the
are
best-investigated
few
et
non-vacuum
deposition
The
processes for
but there
only
reports
on
cell
performance.
a
efficiency
area
1989 (Duchemin
small The
technique
large-area coatings.
precursors,
decomposition
and reaction of
premixed
generally
or
selenourea
thiourea),
Bates,
on a
heated substrate
(300-400^) (Pamplin
technique
are
and
Feigelson,
1990).
Drawbacks of this
chalcogenide phases),
the
carbon)
relatively
small
grain
However,
treatments in controlled
atmosphere
al.,
can
reduce the
impurity concentration
and enhance
crystallinity (Krunks
et
2002; Marsillac et
al., 2003).
on
organic single
of
source
investigated.
development
single
source
temperature
on a
impurity phases,
Banger
et
synthesis
is controlled
(Hirpo
form
are
et
al.,
1993;
al.,
at
2002).
These
organic
below
precursors
decompose
the
not
CIGS
compound
temperatures
and
no
4ooC. However,
such precursors
so
commercially
available
reported
far.
15
1.5.2
Electrodeposition
has been
Electrodeposition resulting
(Guimard
in small
et
successfully
used to
a
deposit quaternary
CIGS
films,
area
subsequent
a
thermal
annealing
In and Ga and
was
high-temperature
annealing
treatment in vacuum,
efficiency
of 15.4 %
obtained
(Bhattacharya
et
al., 2000). The stability of the chemical solution, large-area uniformity and high
deposition
rates
are
still
challenge. Electrodeposition
a
of
an
elemental-layer
stack
subsequently subjected
to
al., 2003).
1.5.3 Paste
coating
are screen
printing,
can
doctor-blade
coating
and
coating.
Paste
coating
is
is
be
applied
in continuous roll-to-
roll
deposition.
The
paste
prepared
and
a
(e.g. nanoparticles)
(US
Pat No.
in the desired
stoichiometry
liquid
transfer media
5,985,691,
1999).
Paste
rheology
and
homogeneity.
In contrast to
are
liquid
(spraying),
allows
a
portions
wasted,
paste coating
densities
use
higher packing
(Eberspacher
precursors
the
containing expensive
layer
is
gallium.
CIGS
After
in
deposition,
controlled
precursor
sintered
the
layer
atmosphere.
After
some
a
preliminary
powdered
work
CIS
on
of CulnSe2
a
(CIS)
to
pellets
from
ingot (Gombia
al., 1983), it
of
was
quite
challenge
et
produce homogenous
Vervaet et
thin
layers by sintering
ground
was
material
(Arita
al., 1988;
the successful
development
of CIS, the
size
of
screen
printed
case
precursor
powders
printable pastes
had too
large particle
even
(5-50 urn)
But
chemically
synthesized
mill
pore-free
CIS
layers (Schulz
et
grinding
mechanically alloyed
powder,
which
A solution to
i6
this
problem
was
gas
atomization
(Basol, 2000).
to
alloy
is
more
ball
milling
produce
finer
powder.
CIS Devices
produced by
selenization in diluted
%,
although
some
porosity remained
film, which
was
attributed to the
randomly shaped
precursor
particles. Layers
of
metal oxide
nanoparticles uniformly
allowed
round
an
due to smaller
particle
size and
the precursor
(Eberspacher
Oct
2000).
Ga
Still
higher
is
reached
if
better
near
control
of the
grading
(e.g. optimum
Ga
concentration
higher Voc).
two
stage
reduction
step
an
hydrogen prior to
H2Se (Kapur
diluted to
a
et
al, 2003). It is
ongoing
discussion if the
gas,
though
small concentration in in
industrial
production.
more
An
uniform of
layers
with
better control,
especially
moderate
are some
temperatures
on
However, there
and
the
use
of
H2Se
European
countries
costly security
measures are
required
in industrial
production. Figure
1.12
gives
an
deposition
processes.
1.6
Completely
all the
can
non-vacuum
processed
of the cell
Although
contact)
component layers
(metal
more
buffer, front
is
be grown with
non-vacuum
methods,
research and
development
deposition
on
TCO
layers
from sintered
nanoparticles
presented, high
but the
sintering
in
temperature required
efficient solar cells
for the
application
(Ederth
et
al., 2002).
17
Precursor (low
Deposition
temperature)
Materials
Selenization/Annealing/Recrystallization
(high
substrate
substrate
temperature 450-600X)
Selenization
',: ^''.'."i'.'^w1: ^""wwi"
Methods
Pretreatment
Electrodeposition
Recrystallization
or
layers,
Selenization
in inert
or
alloys
or com
pounds with Se
5#riy pyrolysis
:lIlf'tlfP^!.
>'
Recrystallizatictn
compounds
Cu. In, Ga, 0
Tiftj
MM^vmim'Binder elimination
Selenization reaction Se/S, H2Se/S gas ambient
Paste coating
1
""'
"""""*'
compounds
stacked
H2
Small
grained, alloyed
or
layer
Substrate
Figure 1.12
Overview of
non-vacuum
CIGS
deposition
methods
1.7
The
Objectives
objective
method
of this work
of this thesis is to
develop
deposition
non-vacuum
equipment
and
avoiding
a
the
use
of
The most
on a
promising concept
is to start with
nanosized
a
powder that
The
is coated
substrate and
subsequently
allows
converted into
a
CIGS
separation
into two
independent steps
layer properties:
Deposition
of
precursor film
structure to
with
good
control
of the
resulting
film
composition (and
some
extent)
layer
to the l-lll-VI
compound layer by
suitable
pathway to
phase
formation and
grain growth
i8
i)
Precursor
2)
Chemical
Conversion
Deposition
Figure
1.13
deposition
The
experimental
on
the
following aspects:
1) Finding
following requirements:
impurity free
CIGS
Suitable chemical
conversion into
deposition
of
homogenous
precursor films
with
thickness below 5
urn.
Economical
production
in
large quantities
2) Evaluating
different
a
non-vacuum
deposition techniques
of the substrate.
for
specific
precursor
material, allowing
coating
3)
Construction
and
evaluation
of different
reactor
designs
for the
chemical
4) Development
non-vacuum
processed
CIGS absorber
layers.
19
deposition methods,
can
(Copper, Indium,
it is done in
Gallium and
vacuum
Selenium)
high
co-evaporation deposition.
the
temperatures
to
above
3ooC,
atmospheric
of
environment
into the
would
instantly
a
lead
oxidation
is
and
incorporation
which first
impurities
a
layer.
Therefore
two-stage process
preferred,
(at
room
deposits
film
containing
layer
compound
at
required (<<
i
final
layer
thickness of
only
1-2 urn,
small
particle
size
nm
urn)
has to be
employed.
Particles with
about 50-100
show different
properties compared
for many
new
high
and
responsible
aspects, e.g.
lower
melting
increased
catalytic activity,
as
modified
thermo-physical, electric,
and mechanical
properties
plasticity
melting points
high reactivity
will facilitate
are
layer sintering by
as
Therefore
nanoparticles
well suited
precursor materials.
2.1
Precursor characterization
can
Nanoparticles
flame aerosol
be
produced by
different
physical
or
or
plasma
etc.
processes, of the
cryogenic milling,
Some
specialized
to
several
kinds
of
nanoparticles.
While
milling
they
can
not be
co-
materials such
can
vacuum
precipitation
method
be
applied
for
large
range of materials.
20
were
chosen for
investigation:
Table
2.1
Investigated
precursor materials.
Precursor Material
Supplier
Production Method
Metal
Cu and In
nanoparticles
gas
phase
condensation
CulnGa
alloy
laser
spark ablation
Metal-Oxide
Cu/ln/Ga Oxide
nanoparticles
NEI
(Nanoparticle
gas
phase
condensation/
Enterprises Inc.)
Selenide precursor
Mixed metal selenide Salt precursor
SOLARONIX
oxidation
wet chemical
nanoparticles
Alfa Aesar
and
synthesis
nitrates)
uniformity
of
deposition
(smooth
and
crack-free
morphology,
homogenous thickness)
purity of
CIS/CIGS
phase
formation
(no binary
selenide
and
oxide
impurities)
CIS/CIGS
grain
( large grains
layer)
Porosity (elimination
of pores
by sintering
of the precursor
layer)
The
deposition pastes
were
all
prepared
as
suspensions
of the
nanoparticles
in
alcohol
The
are
(pentanol).
The
pastes
were
deposited
technique ( 3.1.1).
thesis
deposition
described
separately
Chapter
6.
2.1.1
Metals
metal precursors,
were
The
copper
as
(purity >99-9%)
and
indium with
a
(purity >99.g%)
particle
size of
nanoparticles,
-loonm.
obtained
nanosized activated
powder
have
a
As indicated
by the
vendor
high
sintering
powders
are
shipped
in inert hexanes.
Figure
2.1
SEM
images
of precursor
powder, (a)
Cu and
(b)
In
nanoparticles
Fig.
2.1
shows SEM
micrographs
powder.
of
The
particle
size is in
particles
agglomerates
i-2um.
The XRD
patterns
that the
deposition
atmosphere already
nanoparticles
temperature.
Gallium, having
melting point
a
of
297C,
is not available
as
metallic nanosized
alloyed
with In of the
et
Cu-ln-Ga
evacuated
quartz tube,
pulverized by
laser
spark
ablation
(Houriet
al., 1999).
Figure
2.2
particle
size is in the
range of ioo-30onm.
Figure
2.2
SEM
image of ingot
Cu-ln-Ga
Cu-
ln-Ga
2.1.2
Metal-oxides
of oxide precursors is motivated
metal-oxide
The
use
by
the
high flexibility
of several
and
good
control in
(mixed-)
processes.
nanoparticles
oxide
production
from
available
production
Inc.
were
The
in
a
metal vapor
precursors
Nanoparticle Enterprises
are
produced
desired
phase
vaporized
in the
stoichiometry.
This vapor is
rapidly
causing
copper-indium-gallium-oxide particles.
mixed and ball milled in
deposition,
the
powder
was
pentanol. Fig.
picture
of this
powder.
Figure
2.3
SEM
image
of
23
The
powder
from NEI
was
composition
ratios
fixed to 4:1.
Table
2.2
Investigated
Group
3 1.05 0.9
lll/l ratio
O.33/O.8/O.2 O.95/O.8/O.2
NEI
2:
slightly group
group I rich
III rich
NEI 3: 1.1/0.8/0.2
X-ray
diffraction
(XRD)
phases
of these
powders (Fig.
2.4).
The very
precursor.
Additionally,
are some
minor
peaks
phases,
32-34
region (Cu2ln20;,
of
an a
JCPDS file
The
occurrence
very
pronounced
ln203 peak
precursor
and
in the
case
powder mainly
is
mixture of
amorphous
or
microcrystalline
copper oxide
polycrystalline
indium oxide.
IrijOj
35
2 Theta
40
60
(degree)
Figure
2.4
on
XRD
patterns of mixed
oxide precursor
layers
(Joint
42-1120)
24
2.1.3 Metal-selenides
The formation of CIGS is often
reported
to be
reaction of
binary
selenides
(Cu2Se
-ElnSe;
suited
Orbey
as
et
to be well
reaction
precursor materials. A
was
synthesized by
(2.1)
at ambient
temperature.
H20
->
CulnSe2i
+ 2
(2.1)
powder
were
did
not
yield
stoichiometric
the
reaction chemicals
mixed in stoichiometric
quantities.
are
powder
is indium rich
obtained
by changing
The
the
of
the
reaction
chemicals
(Table
2.3a
and
are
2.3b).
composition
measurements
as
the
deposited
only
1-2 urn
thin.
By adding GaCI3
of the
Cu-ln-Ga-Se
powder
pattern
produced powder
does not
peaks corresponding
state.
and therefore
amorphous
Table 2.3a
Cu/ln ratio
reaction 2.1.
chemicals
1 1.2
(at %)
32-5 30.5 33-5
In
(at %)
42
Cu/ln
Se(at%)
256 37
0.77 0.94
1.1
32.5 30.5
14
36
Table
2.3b.
as
Cu/(ln+Ga)
chemicals
1.2
(at %)
29.5
In
(at %)
29.5
Cu/(ln+Ga)
0.88
Ga
(at %)
4
Se
(at %)
37
The obtained
powder
was
highly aggregated
an
and therefore
ball-milling
was
used to
a
disperse
the brittle
powder
in
alcoholic
Cu-
In-Se precursor
powder
obtained
are
by the
chemical reaction
(2.1).
milling
some
the
big
1-3
urn
agglomerates
are
reduced to submicron
particles, although
still
bigger particles
25
Figure
2.5
SEM
images
of CIS precursor
powder
obtained
can
by
wet chemical
powder
ball
consists of loose
milling (b).
2.2
To evaluate the
layers
were
annealed at of
a
reactor consisted
two-temperature
semi-closed
one
quartz
box in
to
vacuum
chamber
(Chapter 3).
The
sample
is heated in
temperature
zone
450-550X
the second
partial-pressure
by
temperature
To
were
zone.
pumped
investigate
the
degree
X-ray
diffraction
patterns
layer
composition
metal ratio
was
measured
by
possible
distortion.
2.2.1
Metals
doctor-blade of
The
deposited
mixed
metal
precursor
was
layer
a
was
selenized
of
at
temperature
which
50oCfor
to
a
hold at
temperature
?50C
corresponds
of the
selenium
partial
Figure
morphology
layer
26
a)^l^^
Figure
2.6 SEM
b)
images showing the morphology of a metal precursor- (a) and selenized layer (b).
The selenized
layer
shows
grains
up to
i-2um
in diameter.
X-ray
diffraction confirms
35
2 Theta
40
[degree]
Figure
2.7
XRD
selenized
layer. (Joint
Committee
on
Powder Diffraction
42-
Standards, ASTM, Philadelphia, PA, 1967, Cards: CulnSej, 40-1487; ln203, 6-416; Cu2XSe, 6-680; Mo,
1120)
The precursor
layer
is not
only composed
ln203.
The that
selenized
layer
contains in addition to
CulnSe2 still
complete.
As
second
is formed in small to
quantity. The average composition during selenization changed from indium rich
slightly
copper rich
as seen
compositions
in different
places
varied and
of the
therefore the
significance
is
mixing
precursor
layer
required
for
homogenous composition.
27
Table 2.4
Composition
(in
atomic
percentage).
Cu/ln ratio Se
(at %)
48
275
In
(at%)
52
(at %)
Precursor
0.92
1.02
Selenized
45-5
The
layers
from the
alloyed
precursor
produced by
laser
spark
cracked
during
selenization.
Figure
2.8
SEM
of selenized laserablated
metal-alloy
precursor
layer
magnifications.
The XRD
patterns
revealed
an
incomplete
layer only
shows
some
Cu and In
peaks,
and
the selenized
layer
phase
as
main constituent
along
with
ln203
(112)
selenized
precurosr
(204)
CIGS
(220)
|><Brty<|l^'*V*l*tfW^W>frA^WWfrl^MH
a DC x
Cu, Se
Cu
Cu
P
1
I
'
C^
"
'
ir-T,
,,
,-
-111i
3540 3540
~t-
15
20
25
30
45
50
55
60
2 Theta
(degree)
and selenized
Figure
2.9
XRD
patterns
of laserablated
layer.
28
2.2.2
Metal-oxides
was
Selenization
performed
at
500C
to
for
a
temperature
selenized
was
250C, corresponding
partial
and
layer
growth
in
sintering (Figure
parts (Figure
210
a) During
the
layer
is
cracked
different
210
b),
where the
layer
evaporation
proceeded slowly,
in
the precursor
were
layer
excluded
deposition
methods
(Chapter 3)
Figure
2.10
SEM
image
of
morphology
layer
at two different
magnifications.
(112)
selenized
precursor
(204)
(220)
3 TO
CIGS
<0
a on
x
f-f&M
r-i
,|n
15
20
25
30
35
2 Theta
40
45
50
55
60
(degree)
Figure
2 11
XRD
29
The selenization
reaction
was
investigated by
(Figure 2.n).
oxide
ternary
is still
present
layer.
for
a
Another selenized
prerequisite
2.5,
precursor material is
layer (Table
2.6).
Table 2.5
Metal ratios of
oxide-precursor layers
Elemental
before selenization.
measured
Powder
type
Cu
:omposition
by
EDX
inat% and
(elemental fractions)
In 66 47.5 34 Ga
(0.33/0.8/0.2) (0.95/0.8/0.2)
(1.1/0.8/0.2)
23
(o-33)
(0.95) (1.1)
(o-95)
(0.98)
(0.16) (0.13)
46
53
6.5
13
(0.71)
(0.27)
Table 2.6
layers
Elemental
Powder
type
Cu
composition measured by
EDX
in at% and In
(elemental fractions)
Ga Se
NE11 NEI
2
(0.33/0.8/0.2) (0.95/0.8/0.2)
(1.1/0.8/0.2)
18.9
34.5
32.3
(0.33)
(0.95) (1.1)
58.1
32.1 29.9
8.7
5.4
4.9
14.3 28 33
NEI 3
Taking
into account is
measurement
error
of
5%,
it
can
composition
copper rich
content.
In
generally
retained
during
a
Only
for the
slight tendency
for
an
composition, indicating
via
a
completed,
proceeds
replacement
of the oxygen
2.11 was
by
selenium.
The data of
Fig.
copper rich
composition.
This
composition showed
peaks
highest
more
amount of
incorporated
selenium
(table 2.6).
suggests
that copper is
easily
gallium.
3o
2.2.3 Metal-selenides
The selenide precursor
layers
were
selenized at
to
a
500T
temperature
was
250C,
which
corresponds
partial
Figure
2.12
the selenization
step
the
layer
cracked and
grain
only
very limited
grain growth
layer compared
to the precursor
(figure 2.5).
Figure
2.12
SEM
showing large
cracks
and small
The
composition
layer
is
given
slightly
increased
during
change
is not
significant, given
the
precision
precursor material
was
increased but is still below the values for stoichiometric CIS be concluded that the CIS formation reaction is not
(-50%). Therefore,
it
can
complete.
Table 2.7
Composition
Cu/ln ratio
Precursor
32.5 26
30.5
077
25.5 43.5
Selenized
085
Fig.
also
phases
phase
ln703
present.
can
during
be
selenization in the
in
an
chamber
be
already
present
amorphous
or
microcrystalline phase
31
I
(112)
i/lo
CIS
I
Cu2.S<
I
o
I
ln203
I Cu,
Se
in203
ln203
c
40
45
50 55
15
20
25
30
35
60
2 Theta
(degree)
and after selenization.
Figure 2.13
XRD
2.3 Conclusion
The results of this
chapter
(pure metals,
a
alloyed metals,
reaction
metal
simple phase
step
CIS/CIGS
formation, but
precursor
possible
to control
the
concentrations.
However,
sintering
growth,
and
complete
elimination of
impurity phases
were
phases,
which
always
occurred
together.
complete
phase
selenides which would react with the copper selenide to form the CIS/CIGS
phase.
Cracking
of the
is another
cracked
during
step.
One
reason
seen
layer undergoes
threefold volume
expansion
Metal-
during
CIGS
formation, which
a
filling
layer.
to island and
Cracking
is
absolutely
because
subsequent deposition
of
layer,
they
through
the
32
Table 2.8
selenization
of
various
precursor
materials
in
selenium vapou r
Nanoparticle
Precursor
CIS
phase
No
impurity
Crack-free
Low
formation
+
phases
0
Large grain
+
size
porosity
layers
+
Mixed metal
Alloyed
metal
Metal-oxide
Metal-selenide
obviously provide
the best
properties
layer and
of
gallium
completely
abandoned at this
point. Cracking
of the
layers
deposition
by using
are
appropriate
method
(Chapter 3).
growth
and
very much
dependent on
(Chapter 4).
33
3 Precursor
deposition
chapter
is to
investigate
non-
deposition
methods for
nanoparticle
precursor materials.
3.1
Deposition methods
are
doctor-blade
(also
et
known
as
cup
coating
or
tape casting,
al., 2002),
screen
printing (Jabbour
are
though
on
these
techniques
readily
given
used to
deposit thick
films
(>
10
urn), only
few
reports
paste
formulations
are
in the literature. In
general,
it is
agreed
that the
paste viscosity
for
screen
liquids, higher
even
higher
printing. Figure
a) Figure
3.1
Common
b)
non-vacuum
c) deposition
methods: doctor-blade
spraying (c).
3.1.1 Doctor-blade
Doctor-blade is
is
a
one
of the
simplest
blade and
mechanism that fixes the distance between blade and substrate. The
be realized with
a
fixed distance
can
spacer that is
applied
urn
on
substrate.
In
this work
stripes
of adhesive
thick)
used. The
the precursor
Suitable
were
prepared
with alcohol
(1,2-propanediol
doctor-blade
or
i,2-propylene glycol).
was
viscosity
of the precursor
paste for
deposition
powder.
34
3-1.2 Screen
Screen
printing
is
printing
et
widely
layer deposition
et
in
dye
sensitized solar
cells
(Spth
a
printing
high-viscosity
through
at the moment of
mesh size
deposited layer
thickness for
printing
has been
widely
applications
such
printed
circuit
board
(PCB)
printing
where
usually layers
of several
deposited. By
this method is
applied
to
chemistry required
a
of additives
has
developed
to tailor the
paste properties
can
for the
organic
be removed
by
heating step
well
prior
to
sintering
higher temperature.
but
are
These
to
processing steps
introduce
a
are
layer deposition,
suspected
oxide
impurities
oxygen-free compounds
impurities
can
workaround
be removed
by
the
subsequent
selenization
were
step.
used
To
as
organic
where
a
contamination
pure alcoholic
suspensions
powder
a
was
chosen. The
screen.
done with
manual
screen
250 mesh
3.1.3
The
Electrospray
has
electrospray
recently
been
developed
pyrolysis.
The main
advantage compared
While
large
fraction of the
droplets
deposition
area,
electrospray generates
the and
to the
deposition target.
also
as
an
atomizing
which
a
speeds
up
Electrospray
precise control
a
of the gas
the
heated
even
very
high efficiency
of material usage
(>
80%
carrier
gas).
In the
present
work
no
some
vapors
produced during
has
the
evaporation
of the
suspension liquid.
in
Electrospray
successfully
as
been
applied
chemical
spray
pyrolysis
et
to
grow
(Vanzomeren
35
tin
oxide, titanium oxide (Choy, 2001) and non-oxide films like ZnS, CdS, and CdSe (Su
and
Choy, 2000).
chemical
was
While
spray
pyrolysis
uses
diluted
precursor
materials,
in
this
work
electrospray
Precursor
investigated
were
particles suspended
in alcohols.
liquids
prepared
propanediol
with
approximately 35ml
powder.
Heating
Substrate
i i i I
5kV
Figure
3.2
Schematic
drawing
of the used
electrospray setup.
Figure
of
an
electrified
plate-nozzle
of the
configuration (Vanzomeren
suspension
reservoir. is controlled
on
al., 1994)
in
normal
air
by the hydrostatic
the
tip
are
and
suspension
Depending
The
applied potential
mode
several
jets
emitted at the
nozzle
tip.
Taylor
by
cone
(Taylor, 1964),
a
deposition
with
mm
process, is defined
the emission of
single,
stable
jet, breaking
into
droplets
2.1
nearly monodisperse
outer
diameter, 1.6
mm
inner
diameter)
was
used
as
nozzle, located 50
below the
ratio of
deposited particles
spraying
cm2 in
1
on a
achieved
by
ml of the
1,2-propanediol suspension
area.
The increase in
weight
of the foil
was
compared
i
to the
weight
same
of the
residues after
heating
MDE
and
evaporation
of the alcohol of
an
ml of the of
spray
As
a
suspension. The
measurements
yielded
efficiency
a
nearly
100%.
MDE of
et
al.,
2001).
36
3-2 Evaluation
3.2.1 Mixed-metal precursor
Typical
SEM
are
pictures
of
as-deposited pastes
Fig.
3.3. In the
case
for
doctor-blade,
screen
printing
and
electrospray
shown in
of doctor-bladed
the
formation of clusters of
uniform
of thin
layers
urn.
suspension liquid,
the risk of
dislocating
layers,
particle
uniformity
present
with the
screen
printing
a
method
(Fig. 3.3b);
such films
as
forming by
In
limited to submicron
clusters
droplet
or
size of the
the substrate,
so
that the
dry
and the
particles
unable to
move
after
deposition.
Figure
3.3
SEM
images showing
the
morphology
screen
of mixed metal
nanoparticulate
precursor films
temperatures needed
of the
to
were
below
boiling temperatures
to
suspension liquids.
precisely, sprayed
room
temperature
enough
evaporate
the
ethanol
(bp
78C)
so
that the
film remains
dry.
a
Charging prevents
good
particles
from
agglomeration composition
to the
to
0.2
of
the
A
ethanol
suspension does
not
correspond
i
composition
suspension.
typically from
is observed
(Table 3.1).
increasing deposition
explained by settling
distortion,
a
agglomerates
alcohol
37
with
was
tested
(Table 3.2).
At
25T
the
Cu/ln
(Table 3.1).
Table 3.1
Cu/ln ratio of
sprayed
films.
Suspension liquid
Ethanol
Suspended powder
Cu/ln ratio
i
Sprayed
0.2
film
Selenized film
Cu/ln ratio
Cu/ln ratio
025
0.8
1,2-Propanediol
0.7
Table 3.2
suspension liquid
(Lide, 2000).
Alcohol
Boiling
temperature [C] 78 184
viscosity [mPa s]
o
viscosity [mPa s]
25 C
1.1
viscosity [mPa s]
50 C 0.7 113
Ethanol
1.8
1,2-Propanediol
248
404
Electrospray
of ethanol
suspensions
is
delicate,
as
small
changes
in the electrostatic
configuration (charges
produce
the
near
spray)
lead to instabilities in
was
voltage
the
used to
Taylor
cone
spray mode
around 5 kV.
jet
is
more
morphology
For
electrosprayed
propanediol suspensions.
ethanol
suspensions sprayed
distributed
room-temperature
If
(Figure 3.4a)
used
as
as
the film is
composed
of
uniformly
particles.
1,2-propanediol
are
is
of several micrometers
deposited, by
shown in
sprayed
one
films
hour
was
controlled
spraying
time for
~2um
thickness,
minutes
were
sufficient with
of the
1,2-propanediol
suspensions.
This
higher viscosity
The
suspension prevents
of 1,2
particles
and
agglomerates
from
sinking.
propanediol dry
of the substrate to
keep
the substrate
during spraying.
38
Figure
3-4
SEM
images
showing
morphology
using
an
and
cross-section
of
electrosprayed
metal
1-
was
deposited
ethanol
result from
The measured
composition
as a
varied
across
the
sample Figure
sample
Except
for
composition
is
symmetrical
from the
sample sample
is
decreasing
sample edge
This
problem
in
can
be circumvented
by
common
practice
39
-10
-5
0
on
10
Position
Figure
from the
3.5
sample
deposited oxide
precursors led to
severly
cracked
layers
an
and
b)
compare the
from
morphology
of
screen-printed
The
and
oxide precursor
layer
are
1,2-propanediol suspension.
deposition
sprayed layer
due to
un-
homogeneous
and shows
only
deepenings, probably
printed layer
However,
on
the
surface.
The
shows
bigger
agglomerated
particles
and
indicates
micro-cracks.
the
subsequent
selenization of the
The width and
cracks
deposition
method
is
changed
the
from doctor-blade to
screen
printing
electrospray.
high liquid
deposited layer
precursor before
evaporation of
of the
results from
evaporation
During
the conversion of the precursor the cracks widen. The The small cracks appear
a
electrosprayed
layer
remains
during
difference in the
expansion
literature
particulate
of
precursor
a
layer.
In the
(Eberspacher
al.,
2000),
volume
expansion
reported
oxides to
crack formed
by tensile
stress.
complete (2.2.2)
40
Figure 3.6
Morphology
a
of
screen
printed (a)
and
electrosprayed
precursor
layer (b).
The
sprayed
of
layer presents
both
smoother surface
compared
to the
screen
printed layer.
Selenization led to
cracking
layers,
screen
printed (c)
and
Mechanical
compression of the
but
screen-
printed
precursor
layer prior
to selenization led to
very smooth
layer,
cracking
could not be
prevented (e).
In order to
investigate layer
was
the influence of
on
crack
formation,
After
deposition
the
covered with
3mm thick
glass plate
and
put
was
layer
shows
cracking
compressed
with
layer.
41
Figure
3.7
Morphology
of selenized
electrosprayed
oxide precursor
layers
without
(a)
and with
selenization
(b)
In the
on
rich
crystals (as
measured
by EDX)
are
formed
top
of
explained by
though
dewetting
selenized
properties
in the
phase.
Even
the two
samples
were
same
(~450C), layer
the
compressed layer
be
contained
only
20% of selenium
had
an
more
3.3 Conclusion
Three
were
non-vacuum
deposition deposition
deposition
pastes
prepared
fillers
as
suspensions
additives
as
or
simplest deposition
the
techniques.
Screen and
control
by
the mechanical
forming by
a
layers
at the cost of
much
longer deposition
improve
the spray
jet stability
to be used.
better results
layer homogeneity,
are
the
deposition pastes
due to
have to be
improved.
mainly
Ball
agglomerated particles
can
dispersed
the
liquid.
be used to
are
for
homogenous
42
layer deposition.
be avoided
The
cracking
layers during
43
4 Selenization
The conversion of the precursor material to the CIGS selenization reaction. CIGS,
phase
a
is achieved
by
the
being
and
refractory
material with
melting point
as
of
989C,
is
generally
exhibits
sintering
grain growth
the CIGS
phase
glass
and
higher
to
than
6ooC,
reaction
deposition temperatures
common
are
limited
this
maximum
temperature.
thermal
The most
selenization
agent
is selenium vapor
produced by
evaporation.
Selenium is known to
produce
various
allotropie
modifications
(cyclo-hexaselenium
Se6, cyclo-heptaselenium Se7, cyclo-octaselenium Se8, ...) with different crystalline and
amorphous
at
structures
showing red,
consists of
on
Sen molecules (n
2-10)
with
molecular size
shift the
distribution that
depends
the vapor
higher
atomic molecules is
(Steudel
and Strauss,
1987).
vapour
compositions
supposed
to influence
reproducibility.
commonly
used
reactant is
hydrogen
selenide gas
(H2Se).
are
compounds
body. Consumption
such
as
of
more
poisoning phenomena
inflammation of the
respiratory organs
if less then
0.2
powerful
immune
body.
Se also
seems
indispensable
Cd and
appropriate
their
response. It
can
(e.g.
of
Hg) allowing
room
detoxication
(Dubois
and Belleville,
1988).
Elemental Se is solid at
use
temperature requires
and therefore
unproblematic
hydrogen
and
selenide gas
and
expensive storing
disposal equipment
44
vacuum
reactor
schematic
drawing
a
stainless steel
high
vacuum
of
heated
quartz plate
and
can
be lifted. Two
temperature
zones
allow
separate heating
of the selenium
a
pellets
vacuum
chamber is evacuated to
pressure below 10'5 mbar with the lifted cap. Then which results in
on
plate,
fitting
of the cap
the
plate
on
is not
tight
and the
vacuum
selenium
chamber.
can
high
vacuum
chamber
Figure 4.1
Schematic
drawing
of CIGS
variety
of reaction
pathways
were
must
be considered
are
depending
stacked
on
best
investigated,
are
layers
(evaporated
under
or
sputtered)
annealed in
XRD
high
vacuum
excess
selenium. Time
resolved
in-situ
during
annealing
of
transformations
(Brummer
et
al., 2003):
45
paths investigated by
in-situ
high
energy with
powder
diffraction for
Cu/ln/Se
=
deposited
precursors
(substrate/Cu/ln/Se configuration
composition
Annealing
Temperature
RT
Ph
ases
Cu, Culn:,
Cujn^
Sea morphous ^
Culn2+Cu
Culn9
Sec (crystalline)
Sei (liquid)
Se3 (amorphous)
Sec
->
-
225C
35C 375C
^
+
ln4Se3 + CuSe2
lnSe
+
CuSe
Cu2.Seafter275.c
CuSe2
CuSe
+
-
^
Cu2.xSe
lnSe
Cu2.xSe
Se
2CulnSe2
In contrast to
vacuum
evaporated
stacked precursors,
nanoparticulate
precursors
have
differently. Additionally,
precursors
the observed
ln203
impurity phase
the
nanoparticle
(2.2.1)
may influence
typical
reaction
path
To
investigate
nanoparticulate
metal precursors,
temperatures (steps
temperatures
reaction time
of
iooC between
too
and
6ooC). During
source was
the
annealing
at different
the
was
temperature
30 minutes.
of the selenium
kept
constant at
3ooC. The
Figure
patterns
this
ex
quenched samples.
phase
back
at
In contrast to in situ
phase monitoring
transformation
room
(including
solidification of
and
storing
temperature.
contrast
no
In
to
the
observations
made
are
on
vacuum
deposited
stacked
and
metal
are
precursors,
intermetallic
phases
observed. The
phases Culn2
Cujn9
known to form
in the
already
at
room
elemental Cu and In
is
are
observed
nanoparticle
layer
a
composed
of small elemental
particles
very slow
intermixing.
The
ln203
nanoparticles,
may further
phase formation.
evaporated
selenium is
deposited
on
crystallizes
in its
thermodynamically stable
hexagonal
structure.
46
CulnSe,
3.
"5
c
Q 300*C
200"C
ioo-c
Precursor
i
|
28
; ii
30
|
32
rr'i'i rr\
34
rn
\
38
rn |
rryrn |
42
44
i"|"i
46
|
48
p? r|
SO
f
54
26
36
40
52
2 Theta
(degree)
Figure 4.2
XRD
patterns of selenized
Cu-ln
After
of indium
(i56C)
and
of selenium
(220C)
evaporated
stacked precursors
some
(Table 4.1),
no
indium selenide
phases
metallic indium
300C
phase newly
Cu2.xSe phase.
With
higher
temperatures
47
Table 4.2
Phases
formed
during
selenization
of
metal
nanoparticle precursors
at
various
temperatures.
Selenization Phases
Temperature (eC)
25
100
200
Cu, In,
Cu, In,
ln203
Se
ln203,
300-600
most
probably
consists of two
data of in situ
monitoring
4.1.2
The
Impurities
has shown that it is not
previous chapter
possible
to eliminate the
impurity
phases
temperatures up
to 6ooC. As
presented
Cu2_xSe phase
But
as
compound.
the
there is
(indium
is
trapped
in
the
oxide
phase)
copper
to
a
selenide
phase
converted.
strong bending
In
of the
glass
substrate and
therefore of
no
interest for
production.
Figure
4.3 the
was
phase
ln203
in the selenized
layer
are
obtained
by fitting
the XRD
patterns
with
crystal
on
phases (Powder
Diffraction Files,
Joint Committee
Card
6-416;
CulnSe2: Card
40-1487).
The oxide
phase
contributes
nearly
constant
amount of-i8wt%.
The conversion reaction in the other precursor materials has not been
in detail. Similar observations
are
investigated
(Figure 2.11).
is not in
Whereas
some
of the oxide
phases
ln203 phase
layer. Also,
ln203 phase
during
selenization
(Figure 2.13).
48
;?
w
c
8
Rt Q.
CulnSe2 ln2o3
selenization
temperature (C)
in
Figure 4.3
selenization tested
Phase fractions of
ln203
and CIS
the selenized
layer
in
function
2.0
on
of different
XRD
ln203toCIS.
Enthalpy
ln:03
to selenide
given
reaction.
ln203 + 9
Se->
ln2Se3 + 3 Se02
AH, AGr
490
kJ7mol;n7kcai/moi
; i2ikcal/mol
(4.1)
5O5 kJ/mol
The
use
of
higher
selenium
partial
pressures allows
partial
phases (2.4).
A
more
reported by Kapur
who
used
hydrogen
to CIGS
gas to reduce the oxides to metal and H2Se gas to convert the metal
alloy
(Kapur
et
not
energetically
conditions
favorable
either, the
conversion
achieved
by using non-equilibrium
(excess hydrogen
byproduct H20).
4.1.3
Crystallization
phase
starts to form at
The CIS
gradual
grains
lead to
larger grain
CIS
size. This
phenomenon
patterns
for
sharper
and
higher-intensity
The average
peaks
in the XRD
higher
temperatures.
crystallite
49
(Cheary
and
2.0
and the
Inorganic Crystal
ln203 crystal
size
as a
(CIS:
ICSD
grain
crystal
size grows
from 40 to 170
with
an
increase in selenization
no
temperature
The
ln203 crystals
further oxygen is
provided during
selenization.
c
<D
160-
U>
120-
JS
(A
fr
O o>O) re
i_
80.
> (0
401
'
'
'
300
400
500
600
selenization
Figure 4.4
Average crystal
ln203
and CIS
dependence
software.
of the selenization
2.0
Higher temperatures
constant
gradually larger
CIS
crystals,
while the
ln203 crystal
size remains
nearly
during
selenization.
non-vacuum
reactors
times. Low-cost Since
non-
equipment
is
expensive
and
cell
production
methods
therefore
aim
processes.
a
atmospheric
vacuum
during annealing,
argon
or
suitable
process
requires
an
inert
atmosphere (typically
the
considerably
the
cheaper nitrogen)
reactor may be
safety precautions
designed
sub-atmospheric
or
pressure
A further
operation
explosion.
some
advantage
of reactant pressures
orders of
magnitude higher
of
a
than used in
shifting
the chemical
equilibrium
reaction to the
desired
product.
4.2.1 Reactor
design
a
Figure
precursor
reactor
can
4.5 shows
employed
non-vacuum
a
reactor. The
sample
is
placed
quartz
closed hot-wall
and which
Two inlets
capable
of
working
at
temperatures up
This reactor The
tight sealing
be
opened
to load
samples.
allow
purging
nitrogen.
top
and bottom
independent
heaters for
independent
quartz
vessel is
pumped
the
to the
same
diffusing through
a
sealing.
membrane
pump with
base
evacuating the
reactor.
roughing pump
N2-*^
Jt
pump
%
C
re
quartz container
Figure 4.5
Schematic illustration of
non-vacuum
use
of
higher
selenium
vacuum
reactor.
ln203 phase
improve
the
efficiency
be available in
large quantities,
gives
an
which is achieved
by increasing
partial
parameters
systems.
51
Non-vacuum reactor
1
Base pressure
io"5mbar
10"1 mbar
mbar mbar
100
temperature
~300C 500-550^
~500C 500-550C
temperature
4.2.2
Impurity phases
layers
similar to the
ones
Precursor
non-vacuum
used in the
vacuum
reactor
were
selenized in the
reactor.
Figure 4.6
layers
reactor
ln203
are
only detected
in
layers
processed
higher
pressure is therefore
advantageous
allow
phase. However,
excluding
layers
because of
(112)
(204)/(220)
CIS
phase
(116)/{312)
w c
(101)
(103)
(211)
Mo
(301)
"
Q x
kT
A.
non-vacuum reactor
,.
,.
A... I
..*
i
1 1 "T 1
1
c uz.xSe
1 1
11t11-r
,-,,
A
1
vacuum
reactor
Cuz-xSe
25
lnz03
1
1
ln203
1
1 1 1
11|1111)111r
111111
15
20
30
35 2 Theta
40
45
50
55
60
(degree)
in the vacuum
Figure 4.6
and the
vacuum
non-vacuum
magnitude higher
in the
non-
reactor
(Table 4.3). The high selenium pressure allows the conversion of the ln203 and Cu2XSe
CIS
compound.
52
only
small
quantity
of the oxide
phase
on
the
particle surface,
only
more
component
not
possible
incorporate
paste.
Ga203will
be
even more
difficult to convert,
than that of
having
1090, which is
even
higher
ln203 ( AH/=-926).
gallium
of
by XRD. Figure
patterns
the oxide precursor selenized in different reactors. The the oxide precursor much better than the
vacuum
non-vacuum reactor
converts
a
broad,
low-intensity peak
of the
20=
30.50.
CIGS
phase
(112)1
Mo
(204)/(220)
(116)/(312)
(0 c
at
(101)
X
(301)
>^.
non-vacuum reactor
X
ln23
I 1" T
'
^^v^^^
vacuum reactor
T -r
t11r-
Cuz.xSe
-111r
lnz03
T 1
Cu2.xSe2.*Se
1
1 1 1 I
"
15
20
25
35
2 Theta
40
50
55
60
(degree)
Figure 4.7
vacuum
Comparison
non-vacuum
of XRD
patterns of
NEI2 oxide
nanoparticle
and the
non-vacuum
reactor
ln203
and
Figure 4.8
patterns
powder
conversion in the
non-vacuum
reactor is
reactor. in the
This is
seen
in the
complete layer.
phase
two
which is still
present
vacuum
selenized
peaks
large
top
and broad
peaks
of the back
of the
molybdenum
was
resulting
from reaction of
molybdenum
not observed
53
can
be
explained by
of metal
the different
sintering
behavior leads
to
of the
precursors:
While
selenization
a
and
oxide
precursors
densification of the
layer by
the
undergo
densification takes
access
layer gives
to
molybdenum
again
non-vacuum
process.
CIS
phase
(101)
non-vacuum reactor
15
20
35 2 Theta
40
60
(degree)
in the
non-
Figure 4.8
vacuum
Comparison
non-vacuum
of XRD
and
vacuum
reactor
ln203
In
and
Cu2.
xSe, which
is still
large
amounts in
are
vacuum
selenized
layers,
to the CIS
compound.
addition,
identified. This
phase forms
in this precursor
access
4.2.3
The
Crystallization
of the selenized metal
morphology
nanoparticle layer
indicates
compact
and of
a
large-grained
5
urn
structure
grain growth
thick
sprayed
precursor
the
layer
after selenization
and
a
layer
layer.
consists of
As the
large-grained,
surface is first
porous
small-grained
bottom
layer
54
exposed
on
phase
results in
expansion
vapor
the
which
leads to
compact, pore
free
layers. However,
layer.
the densification
stops
transport
Therefore after
sintering
of the
top layer
1.5 to 2pm
compact
CIS
layer
is obtained in
suitable for
rapid
thermal
processing
of thin precursor
layers.
Figure
4.9
SEM
micrograph
of metal precursor
layer
selenized in
non-vacuum
reactor
showing
the
morphology (a)
layer.
and cross-section
(b), showing
densified top
layer
and
porous, small
grained
bottom
Although
the
the chemical
conversion
improved using
non-vacuum
layer
cracking
of the
layer could
not be
prevented.
Figure 4.10
precursor.
SEM
micrograph
of
a vacuum
(a)
and
a non-vacuum
(b)
selenized selenide
nanoparticle
it is still
Although
the obtained
grain
size in the
non-vacuum
selenized
layer
is much
larger
highly porous.
55
Sintering
difficult
and densification of the selenide precursors has turned out to be very The
use
(Figure 2.12).
a
of
a non-vacuum
process with
high
selenium pressure
resulted in
resulting layers
change
the
obtained
by
Whereas
vacuum
selenization
not
a
morphology
the
of the precursor
layer,
the the
non-vacuum
reaction leads to
coarsening
of
layer
remains porous.
4.2.4
The
Open
non-vacuum
reactor
design
of
imposed
some
The main
problem
parts
the
sealing
quartz
vessel
(Figure
high
4.1).
The two
were
carefully adjusted
system
was
give
Therefore, after
evacuation the
presented
first
runs
after
set-up. Subsequent
not able to
reproduce
the
can
same
results
and the
in the
layers.
This
phenomenon
be
explained
by two
reasons:
The
quartz sealing
so
the vessel
dropped.
on
Direct evidence
was
selenium
vapor condensed
reason
impurity phases
phase
the
byproducts
may
(e.g.
in the form of
Se02).
reactor may then lead to concurrent reactions which favor the formation of
oxide
phases.
These drawbacks
were
eliminated
by using
an
open reactor
design
as
shown in
figure 4.11.
56
r-,
It
ij:iiniiimnin
Substrate N,
If
t
-
* i
Pump
350C
T~550C
non-vacuum
Figure 4,11
Scheme of the
employed
Nitrogen
gas flows
over
source
to the substrate
region.
The outlet
region
keep
at
as
the selenium
350-400^.
This
design
as
high
(Figure 4.12).
reactor does not
The open
non-vacuum
produce
the
not
ln203 crystals.
so
could be converted
phase
is
known to be
highly conductive
important
layer.
compound
et
leads to increased
reduced
mobility
(Haba
al., 1990).
non-vacuum
deposited
and selenized
separately
for
20
selenized copper
layer
shows
clearly
defined
large
In
crystals
grains.
layer do
neither show
sharp edges
nor a
smooth surface.
57
(112)
(204) (220)
(hkl)
CIS
phase
Impurity phases
(116) (312)
Mo
(101)
reactor
jfl
(211)
(301)
550C 20 min
1 mbar
open
non-vacuum
reactor
reactor
Cu2.xSe
20
ln203
1!!!!!! !
Cuz.xSe
,
,
rh2o,
,r ~i:ii i )r
15
25
30
35
40
45
50
55
60
2 Thta
(degree)
Figure
4.12
nanoparticle
partial
precursor films selenized under different conditions. selenium pressure and reactor
type
are
indicated
on
diagram.
28fc.V.';.':X2-.:0'0#
a)HHHHHHHHHMHHHiHMHM
b)
of
a
Figure
4.13
SEM
selenized copper
(a)
58
analysis
was
performed
investigate
The selenized
copper
no
layer
has
through
depth
range and
oxygen is detected in the film, except for surface contamination. Therefore the
can
be considered
as
complete through
layer
shows
complete
reaction
only
Below
increasing
they
nm.
nanoparticles
particles.
,...y y-yy.~
60
s?
-60
o
50-|
c
5 40-
g
c
40
o
o
g
o
30
20
*-*-*-*-
i
Q
20
I
0.0 0.4 0.8 1.2
10-
'
0.0
0.4
0.8
1.2
a)
Figure 4.14
XPS
b)
depth profile
(a)
and indium
(b) nanoparticle
layers.
59
4-3 Conclusions
The selenization treatment is used to convert various precursor
absorber
layers
into CIS/CIGS
layers. Different
reaction
were
tested and
evaluated
by
means
of CIGS
cracks and
in
density.
The conversion
a
of the metallic
nanoparticle
investigated
more
vacuum
evaporated,
alloying
of the
to the
nanoparticle
metals
area
limited contact
particles,
alloy
surface of the In
particles
reactivity
for metal
formation. Vacuum
was
reaction to the
ternary
CIS
phase
is not
complete.
A closed
non-vacuum
designed
to allow
were
higher
selenium
partial
pressures.
High
partial
very efficient in
even
during
compound.
The
resulting layers
a
high
selenium
partial
pressure
during
annealing
complete
conversion than
vacuum
reaction time,
i
substrate
temperature reactors).
base pressure
(<io'5
mbar for
reactors,
mbar for
non-vacuum
layer
top
of the
layer,
near
the back
difficult.
Layers
with
thickness of
easily converted.
nano
However, the
deposition
include
of thin
(<i urn)
and
1
homogeneous layers
particles (which
agglomerates
up to
urn)
is
an
unsolved
problem.
CIGS
Metal-oxide
even
layers,
if
converted
in
higher-pressure
selenium vapor.
Although coarsening
resulted in the
to
directly
on
access
molybdenum
MoSe2 phase
top of
the
molybdenum
phase
was
only
Despite
obtain
the
promising
non-vacuum
reactor
reproducibility to
was
not
possible.
Reaction
byproducts
compete
completely
cleaned
periodically.
To
this
problem,
an
open
non-vacuum
6o
reactor
was
designed
partial
pressures, it is less
in
a
processing
reproducible
The difficulties of
of the oxide
homogeneous
precursor
layer deposition
a new
and
complete
conversion
impurities
depositing
and
more
homogeneous
of
and thinner
optimal incorporation
gallium
in the selenized
6i
nanoparticle
precursor
Only
solar
chapter
on
describes the
processing
cells based
were
nanoparticle
precursors
CI(G)S layers
resulting
cells
shunted.
5.1 Device
The
CIGS
processing
of
processing
complete
(Figure 1.4)
includes three
steps
after
deposition:
CdS buffer
deposition
in
chemical bath
optionally
collection
metallic
applied
on
top
for
improved
current
Cell
area
definition
by scribing
deposition
of Cd(S,OH)
layer
in conventional CIGS
heterojunction
of the buffer
by
the
non-vacuum
so
chemical bath
deposition
of this
process has
yielded
highest-efficient
respect
to
far. The
the
advantages
deposition
method with
vacuum
evaporation
are
etching
even
of the CIGS
layer
surface
50
prior
to
deposition
and the of
perfect
surface coverage
layers (<
oxides)
CdS. The
nm).
The
a
incorporation
results in
properties compared
to
vacuum
deposited
recipe
mixing
hydroxide
solution before
to
immersing
the
substrate and
reaction
heating
room
temperature
65C.
The chemical
taking place
is written
Cd(CH3COO)2 + SC(NH2)2
CdS^
+ 2
CH3COOH+ CH2N2
(5.1)
62
The
typical deposition
time is 20 minutes
during
65C.
by
can
simultaneous CdS
be
deposition
by
Mo coated
glass,
layer
thickness
-50
nm
easily
estimated
an
corresponding to
Cd(S,OH)
is found to be
deposition
cells,
an
rf-sputtered
ZnO
bilayer
front contact
was
applied. First,
buffer
first 50
nm
intrinsic ZnO
layer
is
deposited
is
on
the
layer.
thickness of 0.3 to
as a
1 urn
sputtered.
layer
must be chosen is
trade-off between
transparency
a
conductivity.
Qn
If
metallic
grid
deposited
on
top
of the TCO
layer,
sheet
et
resistance of 70
is sufficient for
can
high
(Ramanathan
al.,
2003)
be
optimized for
transparency.
5.1.3 Cell
After the
scribing
of the CIGS solar cell, the cell
area
has to be defined
by
scribing clearly
for
measurements. The
layer
is therefore
partitioned
into smaller
defined cells
x 1
by scratching through
defined for
all the
layers
on
the
molybdenum. Typically,
cells of 0.5
cm2
were
laboratory
scale characterization.
5.2 Characterization
5.2.1
If
a
Contacting
grid
has been
metallic
as
deposited
on
top
by the probe
on
needles
the front contact. Otherwise the front contact is connected back contact is connected at the
directly
the
TCO. The
molybdenum
are
edge
of the
sample.
Contact
resistances
monitored
by 4-terminal
Kelvin connections.
63
5.2.2
The
Current-Voltage
characteristic
current-voltage
output performance
of
solar cells
maximum
short-circuit current
(lsc),
fill factor
(FF),
the
voltage
at maximum power
(Vm),
current at
maximum power
(lmax)
Kelvin connections
enable the
minimizes
use
of
separate
voltage
measurement
errors
by eliminating voltage-drop
resulting
from
nanoparticle
precursors
was
was a
metal precursornon-
deposited by electrospraying.
a
The precursor
reactor at
maximum
temperature
of 6ooC.
Figure
voltage
C30
E
FF:
33%
V0C:219mV
/
/
20
c
Jsc
17.3 mA/cm
Efficiency:
1.24%
i
1 1 1 1
D.2
-0.1
0.1
&
0.3
0.
Voltage (V)
-10
^^__^-~~'3o
Figure 5.1
from metallic
Current
-
Voltage
characteristics of
non-vacuum
processed
prepared
nanoparticles.
With
FFof 33%, Vqc of 219mV, lsc of 17.3 mA/cm2 all the values
are
values of
measures
good, vacuum-processed
the
factor, which
a
"squareness"
large
low
shunt resistance.
In order to
investigate
CIS
the
layer composition
was
at different
depth levels,
XPS
depth
profiling
of
layer
was
done. Material
by argon-ion
64
sputtering
in-between
consecutively acquired
Figure
5.2 shows the
XPS
spectra.
The
sputter
rate
is
approximately 100
nm/min.
50 r
Sputter
rate:
100 nm/min
OL
0 5 10 15 20
depth profiles
of
selenized metal
(soda-lime glass)
can
be
seen.
Although
the
molybdenum
concentration
was
not measured
or
(perturbation by Se3s
allows
peak)
the
binding energies
of the oxygen
(either ln203
and
12
to
SiOx)
identifying the
a
10
min
sputter
time. With
nm
thickness of
about 300
nm
for the Mo
layer,
layer
is 800
thick.
Remaining
porosity
and the
inhomogeneous
are
responsible
concentration
profile. However,
the
profile
shows
clear copper
deficiency
500
nm
layer
partly
deviations due to
settling
liquid
so
that
sprayed
film
are
was
top part of
layer (3.2).
But similar
observations
made for
deposited
(Kurdesau
Cu-ln et
alloy layers
al., 2004).
65
5-3 Conclusion
A
variety of
on
CIS
and
CIGS
layers
from
different
precursor
powders
were
deposited
molybdenum
coated
glass
substrates and
processed
yielded only
photovoltaic
behavior.
Measurable
and
photovoltaic properties
were
sprayed
a
screen-printed
nanoparticles.
yielded
maximum
efficiency
only
good
processed
CIS cells.
different
reasons
efficiency
depth
have
a
profiles rough
images
layers layers
surface and
high porosity
is
which lead in
places
to very thin
where and
electrical
shunting
are
possible.
The
mixing
of the precursor
particles
with
is not
perfect
agglomerates
deviations. But copper
formed which
lead to
precursor
a
layers
local
composition
of
single-phase already
CIS is limited to
narrow
excess
composition range
24-24.5%
(1.2)
and
the low-resistive
66
Inorganic
long
time for
non-vacuum
CIGS
layer deposition
containing salts
in
are
the
spray
pyrolysis
process.
a
Copper-,
indium-
and
galliumin
a
dissolved
on a
together
with
soluble
chalcogenide compound
react
liquid
and
sprayed
heated cell
they
compound.
Obtained
solar
rather
poor,
probably
due
to
nanocrystallinity
et
byproducts during
the reaction
(Krunks
al., 2002).
Within the work of this
in alcohol solvent
are
used to
deposit
layer
instead of
depositing
the CIGS
compound
the solvent
directly.
and
layer deposition,
The
the
sample
is dried to
is
evaporate
binder
dry
precursor
material
then
converted
to
CIGS
by
of
liquid
problems
particles
encountered in
nanoparticle
mixing.
reaction
precursor
pastes
such
as
agglomeration
of
and
non-perfect
lowers the
Atomic
scale-mixing generally
rate and
temperature. However,
the anion
the
extracted
during
chemical conversion.
Inorganic
salts
chosen to
prevent
carbon
contamination.
6.1 Doctor-blade
The precursor
an
(Paste coating)
deposition
of
an
paste
of
(Table
6.1)
good availability.
as
show
good solubility
variety using
and
of alcohols such
nitrates include
methanol, ethanol,
process,
propanol
exclusion
advantages
of
simplicity of the
contamination,
salts.
their
low
decomposition temperatures
compared
to other
inorganic
67
Table 6.1
Inorganic salts
Precursor
paste preparation
in this work
Molecular formula
Purity (%)
99-999 99-99 99-99 Techn.
mp (PC)
(C)
-
CuCl,
630/300 dec.
115
Copper
nitrate
Cu(N03)2xH20
InClj
170 dec.
583
100
500 subi.
-
ln(N03)3xH20 Ga(N03)3xH20
grade
dec. dec.
Gallium nitrate
99-999
no
easily
be
applied
by spin by
or
spraying. However,
et
two main
problems
have to be solved
adjusting
the
al., 2004):
the mixed metal salts lead to local
evaporate,
segregation
decomposition
temperatures/rates.
Dewetting
extent of
occur
gelation
and the
hydrogen bonding.
binder material, which
is
Therefore,
an
organic
decomposes
as a
upon heat-treatment, is
added to the
paste. Ethylcellulose
was
widely
used
coating
applications
the
and
adopted
in this
approach.
Because the
ethylcellulose
of
a
influences after
in
solubility
precipitation
white
powder
some
days (which
not further
are
investigated),
before
the precursor
paste
was
prepared
two
components,
which
mixed
just
deposition:
of Cu nitrate, In
is
Precursor
pastes
were
hydrate
a
composition
adjusted
to
concentration of
mili-mole
(mmol)
is
gram methanol. In
parallel,
high viscosity
with
a
cellulose
paste
prepared: Ethylcellulose
pastes
are
(30-50 mPas)
in
a
1-pentanol yield
a
weight
paste
mixed
weight
precursor
with suitable
rheology
for doctor-
blade
coating. pastes
were
prepared containing
Cu chloride
or
In
nitrate
were
or
and cell
properties
68
6.1.2 Paste
deposition
glass
substrate is coated with
For doctor blade
a
A1 mm-thick soda-lime
400
nm
thick
molybdenum
of scotch
area.
layer by
conventional
dc-sputtering.
1 cm
deposition,
two
stripes
wide)
are
applied
is
on
deposition
In
paste
evenly
By weighing
the
deposited
precursor
layer
has
a
and
calculating
parts
10
in the
layer,
After
it
can
layer
mmol/m2.
complete yield
a
during preheating
600
nm.
and selenization,
this will
layer
thickness of
roughly
problems
encountered for
kept
low.
6.1.3 Preheating
The
as-deposited sample
is
placed
to
on a
hotplate
and heated to
250-350^
for
few
minutes in ambient
atmosphere
on
evaporate
the cellulose.
in different
Depending
layer changes
its color
steps.
For the
paste described
in
6.1.1 the
color
changes
a
from white to
layer
sample
hotplate
Longer heating
and and
higher temperatures
changes
molybdenum layer
further to
a
layer
rough
reddish surface.
Homogenous
heating
rates
are
important to
colors.
regions
where the
preheated layer
shows different
on
the
drying conditions,
crystalline
patterns
heating
can
indium
are
detected. It
though
the precursor
layer was
heated to
350C
in air
for several minutes the group III metals did not form
crystalline heating
complicate
(Chapter 4).
ethyl
After
the
sample
to
50C
to
dry
film of
cellulose
containing
are
During evaporation
of the
69
CuCI
(111)
o
Mo
cl
'c a
CuCI
(220)
50C
0*4*4hMl%MMW*<vMl*l
Wi^WVrfJW
(air)
3 (S
3
IT*
mi
CuCI
(311)
mu
f*nnn>iiji
iimiit-nii
**
rt
n'
350C
MMHIWWm*'
Wy WHMWI
*hKiimtuHnAv^mflMimMMWHiW **Am
*^W*ti^^.,jjwy'vimfmwWW^^aff*1^!!!
Mo I
(N2)
420C
__iW
i
Uli T'
T"- "il
'"**-
^Tifl
_,
(N2)
t
r rrr
|
30
|
40
|-i
|
50
|'
60
20
2 Thta
(degree)
at different conditions:
Figure 6.1
alcohol at
XRD
evaporation
in
of the
5o"C, heating
35o"C (Joint
in
air, heating
on
to
350C
in
nitrogen, heating
to
420C
nitrogen for
Committee
Philadelphia, PA,
1967, Cards: CuCI, 06-0344; CuO, 05-0661; Cu, 85-1326; Mo, 42-1120)
low
solubility
and
early precipitation
for
350C,
which is the
procedure
sample preparation
a
work, fumes
are
produced (burning
the CuCI
are
ethylcellulose)
a
until
stage
crystals
strong texturing
is done in
in the
(in)
phase
detected.
heating
nitrogen atmosphere,
pattern
peaks
phase
but elemental Cu
nitrogen leads
pronounced peaks
20
phase
is not detected
region,
peak,
indicates
some
amorphous
experiments
It
do
provide
detailed reaction be
path
of the
precursor
material
during preheating.
could
nevertheless
shown
that the
(Table 6.2):
Table 6.2
Precursor
during preheating
in air
or
nitrogen
Modified Precursor
Preheating
Condition
ln(lll,CI3
lnl?)X
Cu(l)CI
Cu("CI, Cu(ll)0
3
air,3SOC
N 350C N 420C
Cu"CI, Cu<>
Cu(o)
6.1.4
Selenization of precursor
preheated
precursor
samples
is
was
performed
up to
is
in the open
reactor
(4.2.4).
The
sample temperature
whereas the
ramped
source
56oC
and then
at
a
held
constant for
10
minutes
selenium
mass
maintained selenium
temperature
of
~350C during
selenization. The
run.
of the
evaporated
was
Typical
amounts of 20-30img
were
evaporated
sample.
precursors
the
conversion
of the
or
metal
separately,
were
precursor
in
pastes
to
containing only
the copper
only
prepared
a
analogy
(6.1.1).
Cu2.xSe
EDX measurements
and
nearly complete
Composition of separately selenized copper nitrate and indium chloride precursor (EDX).
precursor
Cu(N03)2
(at %)
Selenized
In Se
InCI,
precusor
(at %)
39.7
62.3
37.7
60.3
o
Cl
71
Figure
6.2
and
non-vacuum
deposition
and
Figure layers
morphology
of
separately
show different
morphology
liquid
when
compared
nanoparticle
of thin films
layers (4.14).
Due to the
deposition
layers
are
large
grains,
clearly
visible
adhesion of
layer
on
the Mo coated
glass
was
selenization.
Figure 6.3
Morphology
a
of
non-vacuum
deposited
and
selenized
CIGS
precursor
layer.
The
smooth surface
The
morphology
of
layer containing
has
a
the precursors
as
described in
6.1.1
as
is shown in
Figure 6.3.
large grains
formed.
grains
are
72
Energy (keV)
Figure 6.4
EDX
a
Energy (keV)
spectra
layer
on
glass
substrate
(therefore
showing
no
Mo- but
Si-signal).
In
Figure 6.4
the EDX
are
spectra
of the precursor
(after heating
to
350C)
and the
selenized
layer
introduced
selenium and
reduced the
in
(1-2
at
%)
completely
Typical composition
Precursor
layer
measured
by
EDX.
Precursor
layer
Selenized
layer
Changes
selenized
layer/
paste
Cu
In Ga
i
% relative to Cu
22.0
i
precursor
paste
reference
+
0.85
0.4 2-55
-
1.18 0.41
21.4
0.97 0.25
0
14%
7-9
49-5
-
5-5
0
-60% -100%
+
CI
Se
2.53
-
51.1
2.32
100%
The
Cu/(ln+Ga)
the
In/Ga ratios
changed nearly by
explained by
a
factor
to the selenized
layer.
This may be
the
inhomogeneous distribution
of In and Ga in the
and
binary phases.
a
The
high
layer
may be
explained
with
matrix effect
73
resulting
crystals
in
an
amorphous
In and Ga
containing
(101)
I
' ' '
'
TI
1II
1-
'
'
'
'
'
'
'
'
15
20
25
30
35
2 Theta
40
45
50
55
60
(degree)
Figure 6.5
XRD of converted CIS and CIGS precursors. The addition of the Ga precursor results in
non-symmetrical
peaks. (Cu
Ka
radiation)
incorporation
of Ga into CIS
a
was
investigated by 1/1.1)
XRD
CIS
(Cu/ln
ratio of
and CIGS
ratio of 1/0.8/0.6)
layers.
asymmetrical peaks
with their maxima shifted to
20
values than
indicating
expected
change
for the
in the lattice
less
measured
layer composition
non-uniform electron
investigation, Auger
performed
Figure
6.6
As
seen
in
(a) except
for the
top part,
the
layer
large
signal
removing all
the the
(Figure
6.6a and
a
6.7). Figure
6.6b
only.
Ga/ln
a
graded composition
low Ga content
on
the
layer thickness.
a
The CIGS
composition changes
from
the surface to
high
Ga
74
Such
grading
can
lead to
since
(Lundberg
limiting
et
low Ga content
near
the
Voc parameter
in solar cells
(6.1.6).
U-
/
y y
70-
(%}
/
< Ui fr
actions
u.
0
X
/
v
/'
\
\ Se^.'c
<=_Cu
*
J
1
0
30-
^^~~_
100-
'
'
'
T"
<
m"l
3
Time
a)
Figure 6.6
sputter
time
a
Sputter
(min)
b)
of
a
Auger
carbon
electron
layer. After
short
signal
is detected with
showing the
metal concentrations
only,
are
ignored (b).
layer showing
double
layer
layer formed
on
is taken from
selenized is
layer.
The
figure
double
layer structure,
where the
bottom-layer
75
responsible analysis
on
signal
in the AES
EDX
composition
which
focused
point
in the lower
layer
showed C, O, Se and Ga
a
signals, layer
corresponds
CIGS
thickness
of about 6oo
urn
which is considered
optimal
for total
light absorption
and
required
6.1.5
CIGS
growth
mechanisms
of the precursor and
an
deposition
paste containing
binder
stoichiometry
precursor
organic
material
thin
and
homogenous
are
layer
upon
evaporation
Crystals
of CuCI
formed in the
layer whereas
amorphous
state in the
organic organic
matrix. When
heated to
300-350C
atmosphere,
some
of the
material
layer.
In addition
to the CuCI
crystals,
small
organic
matrix.
During selenization,
CIGS
on
compound.
taking place
at
temperature
500C
organic layer,
where
they
added to the formed CIGS film. Because of the difference in the reaction
(Marudachalam
et
CIS
compound
forms
in the
phase.
This leads to
depletion
gallium
higher
Ga content in the
Complete decomposition
the
burning
with its
CIGS
ethylcellulose
layer
high
carbon content is
trapped
between the
molybdenum
layer.
an
Having
therefore
between the CIGS absorber and the back contact may be detrimental for the solar cell
Spray deposition
tested in order
carbon
layer (6.2).
76
6.1.6 Solar cell device characterization
Selenized precursor
estimate the
layers
were
finished to
complete
a
solar cells
on a
according
to
5.1.
To
homogeneity of the
21
selenized
area
layer,
solar cell
was
scribed into
an
(Figure 6.8)
were
individually
conditions.
characterized
by
AM1.5 illumination
Figure 6.9
parameters
nearly
constant
the whole
sample (and
may
only
reflect the
inhomogeneity
the FF and
single-lightparameters
source sun
simulator)
larger variations.
The
are
more
column
are
3)
than
perpendicularly
may be found in
to it. As differences in
a
not
probable,
the
reason
non-uniform
(manual)
deposition
resulting
in different
layer thicknesses.
Figure 6.8
21
area
arranged
in three columns
(11
mm
spacing)
and 7
(5.5
mm
spacing).
77
a)
b)
c) Figure 6.9
over
d)
The cell
area.
FF
the substrate
Degradation
edges.
Table 6.4
Voc(mV)
340
34
FF(%)
43.6
3-5
Efficiency (%)
3.52 072
average value
23.5
i.i
standard deviation
were
obtained
on
smaller
area
cells.
Figure
6.10
shows the IV
curve
and cell
is
parameters
an area
mainly
due to the
high
mV
compound containing
6 at %Ga.
78
730
FF
:
61 %
/
/
.20
c
Voc: Jsc:
404 mV 27.2
mA/cm2
:
/
/
I10
[).2
-0.1
Efficiency
6.7 %
0.1
0.2
0.3
0/4
0.
Voltage (V)
-10
-20
-30
Figure
vacuum
6.io
Current-Voltage
CIGS
non-
deposited
layers
based
inorganic
salts.
External
measurements were
performed
to
identify
the
A
a
sensitivity of the
wavelengths
a
of the illumination
spectrum.
with
comparison
conventional
of the
diagram
of
non-vacuum
processed
solar cell
co-evaporated
solar cell
(Figure 6.n)
reveals
significant
losses in the
o z
400
600
800
1000
1200
Wavelength (nm)
Figure processed
6.11
non-vacuum
conventionally vacuum-processed
losses in the middle and
cell is at
i20onm
pronounced absorption
non-vacuum
long
a
wavelength region.
band gap energy of
The cut-off
wavelength
of the
processed
indicating
only -1
eV.
79
medium to
layer
is too thin to
spectrum.
cut-off
with
a
wavelength
of
approximately
corresponds
compound
by
band gap of 1.04 eV. The addition of Ga should increase the band gap
0.2-0.3 eV DUt
inhomogeneous
Ga
distribution, which
The
is
supported by
the
depth profile
a
measurements
(Figure 6.6b).
a
top part
of the
layer consists
of CIGS
with
compound.
6.2
Electrospray
the spray method,
Using
deposition
of low
viscosity liquids
a
as
in methanol is
possible. Therefore,
the addition of
paste formulation
in order to
prevent
the CIGS
the formation of
carbon
layer
between the
molybdenum
layer. layers
would allow
a
superstrate configuration.
on
CIGS is
deposited
the
molybdenum
junction
near
the and
layer, superstrate
junction
between
TCO
layer
deposited
amorphous
properties
carbon
layer
in the
the cell
layers
are a
prerequisite. pastes
were
Precursor
prepared accordingly
to
6.1.1
but
only containing
the
1,2-propanediol (Ga
was
stage).
was
In order to
on a
prevent incorporation
layer, spraying
After
done
heated
glass
substrate
(iooC)
in
inert
nitrogen atmosphere.
deposition
at
the
550C. Figure
6.12 shows the XPS
depth profile
of
layer deposited
on a
molybdenum
coated substrate
by electrospray.
paste
gallium signal
more
selenium
LMM4 Auger
which is
evaluated
of the C KLL
Auger peak,
quantify.
The
resulting
peak
8o
concentrations
are
covered
by
noise
was
70
60
50Mo
.Ml*.
>
40-
V.
V Se*
***
0.5
1.5
Figure
6.12
XPS
carbon free
compound formation.
The reduction of the carbon content should also be reflected carbon blade of the
by
elimination of the
in the doctoron
layer
was
present
morphology
is dominated
by large grains
a
top
show
1.5
urn
thick smalla
grained
surface
bottom
layer
with
high
roughness.
No
distinct carbon
was
electrospray
deposition
layer
in the doctor-blade
deposited layers.
of the selenized surface.
Compositional analysis
the elements
across
layers
the
sample
Contrary
electrosprayed
copper rich
metal
nanoparticle sample
of
layers (3.2.1)
center
the
tendency
poor
was a
region
in the
and
copper
composition
may be
in
the
edges. However,
this
problem
compositional non-uniformity
overcome
by a moving
substrate.
8i
Figure 6.13
precursor
SEM
images: Morphology
and
cross-section
of
selenized
electrospray-deposited
layer.
Solar cells
produced
from
0.1
electrosprayed
or
(<
%)
just
an
ohmic behavior
produced by
Considering
Figure 6.13
large
Cu-rich
crystals
are
responsible
for
shunting
crystals growth
results from of
layers
which may be
explained by
substrate
the
large
CuCI
deposition. Higher
the precursor film
temperatures
keep
sprayed layer
from
recrystallization
to
larger
salt
particles.
investigation
of
optimized deposition
conditions.
82
6.3 Conclusions
In
spite
aspects of the
compound
usually
(Kaelin
heating (Beck
and Cocivera,
1996).
previous study
al., 2004a) revealed difficulties in converting the stable compound ln203, and
into their selenide
are
probably Ga203,
no
vapors. As
seen
in
Figure 6.1,
organic
oxide
phases
detected upon
preheating the
precursor to
250C
a
in air. The
matrix may
prevent
beneficial effect
by
reducing the
conversion time.
paste
allows
adjustments
CuCI
in
paste
upon
rheology
for
optimal coating
of the
larger
crystals
evaporation
However,
obtained
an
amorphous
layer
layer.
The
cell
efficiencies
demonstrate
the pm
carbon
layer
is
not
completely
performance, although
although by
layers deposited
required
to
improve the
adhesion. Carbon-free
in
were
prepared by electrospraying
heated to iooC followed
and had
cellulose-free
pastes
nitrogen
CIGS
ambient
were
substrates
by
selenization. Such
layers
extremely rough
Ga
can
irreproducible compositions.
into the selenized
near
be
incorporated
layer
has to be
improved (higher
Ga concentration
layer)
to achieve
or an
higher Voc
additional
longer
selenization times
et
al., 1997).
as
ln(N03)3
precursors in
paste formulations
and
successfully
compound, but
were
investigation
is
needed to
optimize
the
conversion processes.
83
7 Research recommendations
A novel CIGS absorber formation process
was
developed, which,
due to its
simplicity
manufacturing
of low-cost CIGS
costs and the remains the
manufacturing
efficiency
of the
produced
solar cells.
Optimization
of the cell
efficiency
Comparing nanoparticles
conversion
the
results
obtained
with
metal/metal-oxide/metal-selenide
to those with
inorganic
given
higher potential
to
yield
high-efficiency
research and The
following topics
should
development activities:
reaction
chemical conversion
of the
precursor
fully
clear
yet.
It is
important
products
chloride
atmosphere.
(in
to
An
investigation
of
remaining
oxide and
or
impurity traces
the CIGS
crystals,
at
grain boundaries,
in the carbon
bottom-layer)
help
optimize
selenization conditions
(time, layers
temperature
but lacked of blade
ramps, Se vapor
carbon-free
compositional
allows
pastes
an
good
composition
and the
layer
a
structure
but
introduces which
amorphous
carbon
layer
Finding
binder material
undergoes
controlled
decomposition during
solve this
problem.
process is
lacking
Ga/ln
composition
are
engineering
near
in the CIGS
layer.
Selenization processes
known to accumulate
gallium
the
molybdenum
region.
back contact
yielding mainly
CIS
compound
in the CdS-CIGS
interface
introducing
top
cell
an
layer
region,
which leads to
higher during
efficiency
additional sulfurization
resulting band-gap
of
investigated.
cells,
concept
completely
has to be
non-vacuum
processed
a
CIGS solar
the
sputter-deposited
TCO
TCO
layer
replaced by
as
low-cost,
non-vacuum
processed
layer.
Similar precursor
paste chemistry
synthesis
84
should be
investigated
for TCO
deposition
processes,
using
layer
bring
the reaction
temperatures
and
minimum
(below
250C,
layers
electrical
conductivity of the
layer.
85
References
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Abbreviations
AES
AMi.5
factor 1.5
bp
CBD CIGS CIS EDX
deposition
Ga, Se
;
;
usually Culn^Ga^ej
In, Se
usually CulnSe2
Eg
EOE
l-V
energy
quantum efficiency
Current-voltage
Current
J-V
density-voltage
density
Jsc
MBE
epitaxy
mp
PV SCR
space
charge region
electron
SEM SLG
TCO
UHV
Scanning
microscopy
Soda-lime
glass
oxide
transparent conducting
Ultra
high
vacuum
Voc WP
Open
Watt
1000
circuit
voltage
Unit for
peak,
indicating
the
output power
of solar cells
at
XRD
XPS
94
95
Curriculum vitae
Date of birth:
i6
July 1975
Place of birth:
Bern, Switzerland
Swiss
Nationality:
May 2000
present
Research and
Teaching Associate,
Solid
State
Physics Group,
(Swiss
Federal
Laboratory
of
Physics,
Institute of Technology)
Zrich, Switzerland
Oct.!995
Apr.
2000
Studies in Microtechnical
Institute of
Engineering,
EPF
(Swiss
Federal
Technology) Lausanne,
Switzerland
Diploma
processing
and
1998
Oct.
1998
Student
Mexico
Mexico
1995-Oct. 1995
Military
1989-J un.
1995
Mathematisch
Bern
Naturwissenschaftliches
Gymnasium
in
Primary
96
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(2004)
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E. P.,
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A.
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G.
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F.
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CIGS
A. N.
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layers from
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coevaporation
431-432: 37-40.
on
structural
properties
of
Cu(ln,Ga)Se2