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Photocathodes
Michael Pellin
Argonne Distinguished Fellow
Director, Materials Science Division
Photocathode Workshop
July 20-21, 2009
University of Chicago
ALD Reaction Scheme
4000
Ellipsometry Atomic Force Microscopy
ALDinvolvestheuseofapairofreagents.
3500
eachreactswiththesurfacecompletely
3000 Nouniformlineofsightrequirement!
eachwillnotreactwithitself
Thissetupeliminateslineofsite
Thickness ()
1000
Addsprecisely1monolayer
500
Pinholesseemtoberemoved. PulsedValvesallowatomiclayerprecision
0 Seagate, SingleCell,9cell,reentrant,insitu
Stephen Ferro ingrowth
0 500 1000 1500 2000 2500 Viscousflow(~1torr)allowsrapidgrowth
3000
AB Cycles RMS Roughness = 4 (3000Cycles)
~1m/14hours
Film growth is linear with Flat, Pinhole-Free Film
AB Cycles ALDFilmsFlat,Pinholefree
ALD Thin Film Materials
Photocathode Workshop
July 20-21, 2009
University of Chicago
Why Aerogels?
Dark Current vs Signal
Readily fabricated -> everywhere the same
radius of curvature
Extraordinary surface area and
amplifying ability
Before Coating
Weight = 0.0176 g
After Coating
ALD Coating Conditions:
19 Cycles DEZ/H2O
3 nm ZnO Coating
10 Torr, 100 s Exposures Weight = 0.1122 g
T=177 C
Weight Increase
=537%
Aerogel Photoelectrodes:
TCO
Continuous coating by ALD
(conductivity measurements and
SEM)
Growth on TCO platforms Aerogel film
High porosity
Lower manufacturing cost than other PV technologies
8 nm ZnO on Aerogel
Non-vacuum, low temperature fabrication
Very tolerant to impurities (no clean room necessary)
light absorption and charge separation occur close to
interface
Inexpensive, abundant, benign materials (e.g. TiO2, ZnO)
Robust nanoscale process
Carbon Aerogels
10 nm filaments
150 nm
W C
Photocathode Workshop
July 20-21, 2009
University of Chicago
W Growth on C Aerogel
3cW 7cW
SEM
80 nm 80 nm
TEM
Photocathode Workshop
July 20-21, 2009
University of Chicago
Conclusions: Aerogels
Photocathode Workshop
July 20-21, 2009
University of Chicago