Department of Material Science

Course: Material Study I

Barrier coating for polymer light-emitting diodes using carbon nitride thin
films deposited at low temperature by PECVD technique

Group 10 ( 第十組 ):
Nguyen Ngoc Hoang ( 阮玉煌 )-M09867019
Nguyen Quoc Dat ( 阮國達 )-M09867020
Le Thoai Huyen ( 黎話玄 )
-M09867021
Chemical vapor deposition

Abstract

Introduction

Experimental

Results

Conclusion
 CVD is a method by which solid materials were deposited from vapor phase
through chemical reactions occur at surface of substrate

Furnace

Process Precursor
gas flow

Diffusion

Heat,
plasma,
…
Chemical vapor deposition

Abstract

Introduction

Experimental

Results

Conclusion
 Abstract

Plasma-enhanced chemical vapor deposition (PECVD) system was used

to deposit carbon nitride (CN) at low deposition temperatures:
 Decrease photo-degradation of polymer film in air
 Improve the lifetime of polymer light-emitting diodes (PLEDs)

Characteristics of the carbon nitride and MEH-PPV films

 FTIR
 UV–Visible spectroscopies

Result:The carbon nitride layer

 Protects the polymer film from damage of photo-oxidation.
 Enhances the device lifetime.
Chemical vapor deposition

Abstract

Introduction

Experimental

Results

Conclusion
 Introduction PLED The aim

CN(0.7m)

Al (0.5m) Cathode
Easy to degrade by oxygen,
water and light.
… Solve problem

Carbon nitride compound

MEH-PPV(100nm)

Low friction
ITO(50nm)
Anode High wear resistance

Glass

Produce coating CN to minimize degradation of polymer layer to creasing the lifetime of PLEDs.
Chemical vapor deposition

Abstract

Introduction

Experimental

Results

Conclusion
 Experimental Carbon nitride layer

CH4 N2 He Pressure Power density Temperature

(sccm) (sccm) (sccm) ( mTorr) (mW/cm2) ( oC) Illumination Intensity 100mW/cm2

25 25 7.5 15 375 80

Process gas
ELH – type lamp
Inert
Inertgas
gas N2 CH4
HH
ee CN - PLED

Cool base 25oC

RF
RFflow
flow Schematic illustration of illumination
(13.56
(13.56MHz)
MHz) system with dichrolic lamp white
light.

 analyze chemical bonding of CN layer

wafer  effects from photo-oxidation of the

PLED
polymeric layer.

 measure the degradation process

Chemical vapor deposition

Abstract

Introduction

Experimental

Results

Conclusion
 Results FTIR Properties

Band Assigned to
3300–3500 cm-1 NH
2800–3000 cm-1 CHn stretching

2200 cm-1 C≡N stretching

1610–1660 cm-1 C=N groups
1350–1450 cm-1 CHn bending

1020–1280 cm-1 C–N

FTIR spectra of 0.7 Am thick CNx films.

The bands of C-N, C=N and NH groups increases with decreasing film thickness.

The appearance of C–N bonds is associated with the hardness of carbon nitride .

We can optimize the conditions of film fabrication and control the mechanical
properties of the film by these bands.
 Results UV - Visible Degradation process

In air

No protect – no change In illumination

In illumination
 Results Absorbance vs time

Degradation ratio normalized at 500 nm for polymeric layers in the dark and
in air, protected with carbon nitride and non protected

CN thin film can protect PLED under illumination condition

Chemical vapor deposition

Abstract

Introduction

Experimental

Results

Conclusion
 Conclusion

• The PLEDs with no protection is easily degraded under

illumination condition.

• Carbon nitride film has adequate thickness and flexibility meets

the criteria for a material that would partly block humidity and
light.

• Optimization of the deposition parameters of the carbon nitride

films may be attempted.
THANK FOR YOUR ATENTION