1950s- planar transistors acted as the basic building block
of microprocessors. 2002 -Intel developed the world’s first CMOS tri-gate transistors. Performance improved by integrating the tri-gate design with silicon process technology Tri- gate transistors are expected to replace the nanometer transistors in the Intel microprocessors by 2012 ARCHITECTURE
Built on an ultra-thin layer of fully depleted silicon
Raised source and drain structure
Compatible with the future introduction of a high K
gate dielectric
Show excellent DIBL
Thickness requirement of the Si layer is also relaxed by
about 2-3 times ARCHITECTURE MOORE’S LAW Moore's law describes a long-term trend in the history of computing hardware, in which the number of transistors that can be placed inexpensively on an integrated circuit has doubled approximately every two years.Moore's law 21st centuries precisely describes a driving force of technological and social change in the late 20th and early. FABRICATION FABRICATION DIAGRAMS PERFORMANCE COMPARISON OF PLANAR AND TRI GATE TRANSISTOR Show excellent control of short channel effects (SCE)
Higher performance, in terms of drive current
ADVANTAGES Lower leakage and consume much less power. Faster & cooler operation. 45% increase in speed or 50x reduction in off- current. The basic building blocks for future microprocessors. Moore's Law scaling can be taken well into the next decade . APPLICATIONS
Critical part of INTEL's energy efficient performance